• 제목/요약/키워드: Blocking Layer

검색결과 348건 처리시간 0.033초

Analysis of the Abnormal Voltage-Current Behaviors on Localized Carriers of InGaN/GaN Multiple Quantum well from Electron Blocking Layer

  • Nam, Giwoong;Kim, Byunggu;Park, Youngbin;Kim, Soaram;Kim, Jin Soo;Son, Jeong-Sik;Leem, Jae-Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.219-219
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    • 2013
  • The effect of an electron blocking layer (EBL) on V-I curves in GaN/InGaN multiple quantum well is investigated. For the first time, we found that curves were intersected at 3.012 V and analyzed the reason for intersection. The forward voltage in LEDs with an p-AlGaN EBL is larger than without p-AlGaN EBL at low injection current because the Mg doping efficiency for p-GaN layer was higher than that of p-AlGaN layer. However, the forward voltage in LEDs with an p-AlGaN EBL is smaller than without p-AlGaN EBL at high injection current because the carriers overflow from the active layer when injection current increases in LEDs without p-AlGaN EBL and in case of LED with p-AlGaN EBL, the carriers are blocked by EBL.

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전류차단층의 기생효과 해석 (Parasitic Effects due to Current Blocking Structure)

  • 김동철;심종인;어영선;박문규;강중구;계용찬;장동훈
    • 한국광학회:학술대회논문집
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    • 한국광학회 2003년도 제14회 정기총회 및 03년 동계학술발표회
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    • pp.148-149
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    • 2003
  • The parasitic effects due to the current blocking layer limit the bandwidth of the semiconductor laser diode. Thus, the parasitic response of various blocking layers was analyzed. The inin type was the best choice for the leakage current reduction and the bandwidth expansion.

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MONOS 구조의 트랩특성 조사를 위한 열자극전류 측정 (Measurements of the Thermally Stimulated Currents for Investigation of the Trap Characteristics in MONOS Structures)

  • 이상배;김주연;김선주;이성배;서광열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
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    • pp.58-62
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    • 1995
  • Thermally stimulated currents have been measured to investigate the trap characteristics of the MONOS structures with the tunneling oxide layer of 27${\AA}$ thick nitride layer of 73${\AA}$ thick and blocking oxide layer of 40${\AA}$ thick. By changing the write-in voltage and the write-in temperature, peaks of the I-T characteristic curve due to the nitride bulk traps and the blocking oxide-nitride interface traps ware separated from each other experimentally. The results indicate that the nitride bulk traps are distributed spatially at a single energy level and the blocking oxide-nitride interface traps are distributed energetically at interface.

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Bias stress effect in organic thin-film transistors with cross-linked PVA gate dielectric and its reduction method using $SiO_2$ blocking layer

  • Park, Dong-Wook;Lee, Cheon-An;Jung, Keum-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.445-448
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    • 2006
  • Bias stress effect in pentacene organic thin-flim transistors with cross-linked PVA gate dielectric is analyzed. For negative gate bias stress, positive threshold voltage shift is observed. The injected charges from the gate electrode to the defect states of gate dielectric are regarded as the main origin of $V_T$ shift. The reduced bias stress effect using $SiO_2$ blocking layer confirms the assumed mechanism. It is also demonstrated that the inverter with $SiO_2$ blocking layer shows the negligible hysteresis owing to the reduced bias stress effect.

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비휘발성 메모리 소자의 Gate-Blocking Layer 적용을 위한 $TiO_2$ 박막 특성 (Characteristic of $TiO_2$ Thin Film for Nonvolatile Memory Device's Gate-Blocking Layer)

  • 최학모;이광수;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.199-200
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    • 2007
  • 본 논문에서는 $SiO_2$ Gate 유전체를 대체할 재료의 하나인 $TiO_2$, Gate 유전체의 기판 증착 온도에 따른 특성을 알아보고자 한다. 디바이스의 고집적화가 높아짐에 따라 얇은 두께의 Gate 유전체의 절대적인 필요에 따라 두께를 최소화하면서 유전율은 높아 전기적 특성이 우수한 소재를 찾게 되었다. 본 논문의 실험에서는 비휘발성 메모리 소자 제작시 Gate Blocking Layer 적용을 위해 High-k 물질인 $TiO_2$, 박막 증착 실험을 하였고, APCVD 방법을 사용하여 성장하였다. 증착 온도에 따른 I-V 특성을 분석하고 그에 따른 소자의 물리적 구조를 SEM을 통해 확인하면서 소자 제작시 최적의 온도를 찾고자 하였다.

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$CuPc/C_{60}$을 이용한 유기 광기전 소자에서 엑시톤 억제층과 전극 변화에 따른 광기전 특성 연구 (Photovoltaic Effects of Exciton Blocking Layer and Electrodes in Organic Semiconductor $CuPc/C_{60}$)

  • 허성우;오현석;이원재;이준웅;김태완
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.112-115
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    • 2004
  • Photovoltaic effects in $CuPc/C_{60}$ heterojunction structure have been studied depending on thickness of exciton blocking layer(BCP) and electrodes. Bare ITO and polymer coated electrode(PEDOT:PSS) were used as an anode, and Al, Ca/Al, Mg/Al, LiF/Al, and LiAl were used as a cathode. Photovoltaic parameters depending on BCP layer thickness from 0 to 60 nm and electrodes having different work function were measured using Keithley 236 source-measure unit and a 500W xenon lamp (ORIEL 66021). We have seen that the BCP layer thickness severely affects on the performance of photovoltaic cells.

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A study on the simplified fabrication structure for the multi-color OLED display

  • Baek, H.I.;Kwon, D.S.;Lee, C.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1046-1049
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    • 2006
  • We proposed a simplified fabrication structure and method which can provide separate Red (R), Green (G), Blue (B), and White (W) OLED pixels with 2 metal-mask changes in emitting layer fabrication inspired from the structure of multi-layer white OLED and carrier blocking mechanism. A red emission layer for the R and W pixel with 1st mask, and then a blue emission layer with hole blocking layer for the B and W pixel with 2nd mask, and finally a common green emission layer were deposited sequentially. We expect that this concept would be very useful to the actual fabrication of multi-color OLED display although additional optimization is needed.

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Active Materials for Energy Conversion and Storage Applications of ALD

  • 신현정
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.75.2-75.2
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    • 2013
  • Atomic layer deposition (ALD), utilizing self-limiting surface reactions, could offer promising perspectives for future efficient energy conversion devices. The capabilities of ALD for surface/interface modification and construction of novel architectures with sub-nanometer precision and exceptional conformality over high aspect ratio make it more valuable than any other deposition methods in nanoscale science and technology. In the context, a variety of researches on fabrication of active materials for energy conversion applications by ALD are emerging. Among those materials, one-dimensional nanotubular titanium dioxide, providing not only high specific surface area but also efficient carrier transport pathway, is a class of the most intensively explored materials for energy conversion systems, such as photovoltaic cells and photo/electrochemical devices. The monodisperse, stoichiometric, anatase, TiO2 nanotubes with smooth surface morphology and controlled wall thickness were fabricated via low-temperature template-directed ALD followed by subsequent annealing. The ALD-grown, anatase, TiO2 nanotubes in alumina template show unusual crystal growth behavior which allows to form remarkably large grains along axial direction over certain wall thickness. We also fabricated dye-sensitized solar cells (DSCs) introducing our anatase TiO2 nanotubes as photoanodes, and studied the effect of blocking layer, TiO2 thin films formed by ALD, on overall device efficiency. The photon convertsion efficiency ~7% were measured for our TiO2 nanotubebased DSCs with blocking layers, which is ~1% higher than ones without blocking layer. We also performed open circuit voltage decay measurement to estimate recombination rate in our cells, which is 3 times longer than conventional nanoparticulate photoanodes. The high efficiency of our ALD-grown, anatase, TiO2 nanotube-based DSCs may be attributed to both enhanced charge transport property of our TiO2 nanotubes photoanode and the suppression of recombination at the interface between transparent conducting electrode and iodine electrolytes by blocking layer.

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전류 차단 층을 갖는 LED의 향상된 광세기 (Enhanced Luminous Intensity in LEDs with Current Blocking Layer)

  • 윤석범;권기영;최기석
    • 디지털융복합연구
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    • 제12권7호
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    • pp.291-296
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    • 2014
  • GaN LED의 p-패드 금속과 에피층 사이에 $SiO_2$ 전류 절연 층을 제작하고, p-전극 금속의 패턴을 핑거(finger) 형태로 확장하여 형성함으로써, 대면적 고출력 소자에서 전류가 균일하게 퍼지도록 유도함과 동시에 p 패드 금속 표면에서의 광 손실을 줄여 광 출력을 증진시켰다. $SiO_2$ 절연 층의 면적과 두께를 다르게 하면서 광 출력의 증가를 비교 확인하였고, 실바코 사의 ATLAS 툴을 이용하여 컴퓨터 시뮬레이션을 실시함으로써 LED 내 활성 층에서의 전류 밀도 분포를 계산하였다. $SiO_2$ 절연 층의 두께가 $50{\mu}m$$100{\mu}m$ 인 두 경우 모두, p 패드의 직경이 $105{\mu}m$이고 핑거의 폭은 $12{\mu}m$인 경우와 비교할 때, p 패드의 직경이 $100{\mu}m$이고 핑거의 폭이 $6{\mu}m$인 경우가 더 높은 광 출력 특성을 나타냈다.

차단막 코팅을 이용한 광전기화학셀 효율 개선 (Improvement of Efficiency of Photoelectrochemical Cells by Blocking Layer Coatings)

  • 문병호;곽동주;박차수;성열문
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1485-1486
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    • 2011
  • A layer of $TiO_2$ thin film less than ~500nm in thickness, as a blocking layer, was coated by sol-gel method directly onto the anode electrode to be isolated from the electrolyte in dye-sensitized solar cells (DSCs). This is to prevent the electrons from back-transferring from the electrode to the electrolyte (I-/I3-). The effects of heat treatment conditions of the gel and as-coated film on the thickness and consolidation to substrate were studied. The flexible DSCs were fabricated with working electrode of Ti thin foil coated with blocking $TiO_2$ layer, dye-attached mesoporous $TiO_2$ film, gel electrolyte and counter electrode of Pt-deposited indium doped tin oxide/polyethylene naphthalate (ITO/PEN). The photo-current conversion efficiency of the cell was 5.3% ($V_{oc}=0.678V$, $J_{sc}=12.181mA/cm^2$, ff=0.634) under AM1.5, 100 mW/$cm^2$ illumination.

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