• Analytical Science and Technology
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• v.5 no.1
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• pp.135-142
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• 1992

Indium tin oxide(ITO) films coated on the window glass selectively transmit the solar energy and infrared. We call this system passive solar collectors. Selectively absorbing properties of sol gel dip coated ITO films were characterized by UV-VIS-NIR spectroscopy. The effects of heat treating temperature, time, atmosphere, substrate and barrier layers are concerned. Indium tin oxide films heat-treated at $500^{\circ}C$ in a reducing atmosphere show intrinsic properties. Efficiency of solar energy transmittance was enhanced by coating of $SiO_2-ZrO_2$ as an alkali ion barrier layer. Energy was saved by the double layers of $SiO_2-ZrO_2$ and ITO since solar energy is transmitted and heat generated inside(${\lambda}$ > 2700nm) is reflected.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.343-346
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• 1999

We have investigated the dielectric and electrical characteristics of palrnitic acid(PA), stearic acid(SA) and arachidic acid(AA) Langmuir-Blodgett(LB) films because these fatty acid systems have a same hydrophilic group and a different hydrophobic one(alky1 chain lqngth). The dielectric characteristics such as the capacitance-frequency(C-F) characteristics and the dielectric dispersion and absorption characteristics of PA, SA and AA through-plane were measured. In the result, the relative dielectric constants of PA, SA and AA LB films were about 3.0-4.6, 2.7-4.1 and 2.4-3.8, respectively. The relative dielectric constants were decreased in proportion to the chain length of alkyl group. Also, the dielectric dispersion and absorption of each fatty acid LB films have arisen from the dipole polarization in the range of $10^4~10^5[Hz]. And, the conductivity of PA, SA and AA LB films obtained from I-V characteristics were about $9{\times}10^{-14}, 3{\times}10^{-l4} and 5{\times}10^{-15}[S/cm], respectively. These results have shown the insulating materials and could control the conductivity by changing the length of alkyl group. Also, we have confirmed that the barrier height of fatty acid systems were about 1.32-1.40[eV] and the dielectric constant were about 3.0-4.2. These values were almost the same ones obtained from dielectric characteristics.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.11
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• pp.961-968
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• 2009

In this work, transparent conductive oxide(TCO) films such as $In_2O_3-SnO_2$(ITO) and $In_2O_3-ZnO$(IZO) were prepared on polyethylene naphthalene(PEN) and glass substrates by using rf-magnetron sputtering system. The TCO films deposited on PEN substrate show very poor conductivity as compared to that of the TCO films deposited on glass substrates. From the results of the residual gas analysis(RGA) test, this poor stability of plastic substrate is presumed to be caused by the deteriorated adhesion between the TCO films and the plastic substrate due to outgassing from the plastic substrate during deposition of TCO films. From our experiment, it is found that the vaporization of some defects in the plastic substrates deteriorate the adhesion of the TCO films to the plastic substrate, because the most plastic substrates containing the water vapor and/or other adsorbed particles such as organic solvents. Mixing of these gases vaporized in the sputtering process will also affect the electrical property of the deposited TCO films. Inorganic thin composite $(SiO_2)_{40}(ZnO)_{60}$ film as a gas barrier layer is coated on the PEN substrate to protecting the diffusion of vapors from the substrate, so that the TCO films with an improved quality can be obtained.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.450-450
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• 2012

In recent days, advances in ZnO-based oxide semiconductor materials have accelerated the development of thin-film transistors (TFTs), which are the building blocks for active matrix flat-panel displays including liquid crystal displays (LCD) and organic light-emitting diodes (OLED). In particular, the development of high-mobility ZnO-based channel materials has been proven invaluable; thus, there have been many reports of high-performance TFTs with oxide semiconductor channels such as ZnO, InZnO (IZO), ZnSnO (ZTO), and InGaZnO (IGZO). The reliability of oxide TFTs can be improved by examining more stable oxide channel materials. In the present study, we investigated the effects of an ALD-deposited water vapor permeation barrier on the stability of ZnO and HfZnO (HZO) thin film transistors. The device without the water vapor barrier films showed a large turn-on voltage shift under negative bias temperature stress. On the other hand, the suitably protected device with the lowest water vapor transmission rate showed a dramatically improved device performance. As the value of the water vapor transmission rate of the barrier films was decreased, the turn-on voltage instability reduced. The results suggest that water vapor related traps are strongly related to the instability of ZnO and HfZnO TFTs and that a proper combination of water vapor permeation barriers plays an important role in suppressing the device instability.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.186-186
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• 2012

최근 Flexible organic electronics 분야에 대한 관심과 더불어 소자의 산소 및 수분의 침투를 방지하기 위한 투습방지막 연구가 활발히 진행되고 있다. 이에 본 연구에서는 Closed Drift Linear Source(CDLPS) 플라즈마 공정을 이용하여 저온 고속의 $SiO_xC_yH_z$ barrier flims 형성 연구를 진행하였다. HMDSO(hexamethyldisiloxane), TMS(trimethylsilane)와 산소를 기반으로 HMDSO/HMDSO+산소의 비율에 따라 $Si(-O_x)$ 변화에 따른 특성 평가를 진행하였다. X-ray photoelectrom spectroscopy(XPS) 및 Ft-IR spectrometer 측정 시 3.7% 비율에서 실리콘 원소가 산소 라디칼과 효율적인 반응을 함으로써 단일한 $SiO_2$ 박막이 형성됨을 확인 하였다. 그와 반면에 비율의 증가로 인해 다량의 HMDSO 물질이 주입 되었을 시 산소 라디칼과 충분히 반응 되지 못하여 $SiO_2$에 비해 $Si(CH)_x$ 가 많이 함량 된 Polymer like한 $SiO_x$가 많이 형성되었다. 박막의 증착율의 경우에는 3.7%에서 18%로 증가함에 따라 35 nm/min에서 180 nm/min의 증착율을 가지는 것을 확인 하였다. 3.7% 비율의 단일 $SiO_2$ 공정 조건으로 유기태양전지에 형성 하였을 시 소자의 에너지 변환 효율(PCE)이 변화 없는 것을 확인하였다. 이는 기존 공정에 비해 CDLPS 플라즈마 공정의 경우 유기소자에 플라즈마로 인한 열에너지나 이온 충격 에너지로 인한 영향 없는 것을 확인 할 수 있다. 이런 장점을 통해 CDSPS를 이용한 공정 기술은 다양한 유기 소자의 barrier 형성 연구에 큰 도움이 될 것이다.

• Korean Journal of Materials Research
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• v.9 no.12
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• pp.1216-1221
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• 1999

GaN films were deposited on sapphire [$Al_2O_3(0001)$] substrates at relatively low temperature by MOCVD using N-atom source based on a Dielectric Barrier Discharged method. Ammonia gas($NH_3$is commonly used as an N-source to grow GaN films in conventional MOCVD process, and heating to high temperature is required to provide sufficient dissociation of $NH_3$. We used a dielectric barrier discharge method instead of $NH_3$ to grow GaN film relatively low temperature. DBD is a type of discharge, which have at least one dielectric material as a barrier between electrode. DBD is a type of controlled microarc that can be operated at relatively high gas pressure. Crystallinity and surface morphology depend on growth temperature and buffer layer growth. With the DBD-MOCVD method, wurtzite GaN which is dominated by the (0001) reflection was successfully grown on sapphire substrate even at $700^{\circ}C$.

• KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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• v.5 no.2
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• pp.9-16
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• 1999

Edible films were prepared from proteins extracted from soybean curd residue by alkaline extraction and isoelectric precipitation. Effects of film forming solution pH and plasticizers on mechanical and barrier properties of edible films were studied. films were formed within pH $7{\sim}11$ with tensile strength (TS) of $2.9{\sim}3.3$ MPa. Films produced under pH 10 had the highest TS and Elongation (E) (3.3 MPa and 60.1%) but no significant difference was observed among water vapor permeabilities (WVP) of film. Glycerol, sorbitol and its mixture (1:1, w/w) were added as plasticizers. The concentration and mixing ratio of plasticizers also affected the TS, E and WVP of films. TS of films decreased from 15.0 MPa to 2.9 MPa as plasticizer concentration increased from 0.4 to 0.8 g plasticizer/g protein. At a plasticizer concentration, the highest TS was observed when sorbitol was used whereas the highest E was measured when mixture of glycerol and sorbitol was used as plasticizer WVP of films increased as the plasticizer concentration increased. Films plasticized with glycerol showed the highest WVP among the films with the same plasticizer concentrations. Edible films prepared from soybean curd residue protein showed very low oxygen permeabilities ($29.5{\sim}61.1aL{\cdot}m/m^2{\cdot}s{\cdot}Pa$) and oil resistance at all plasticizer concentration level tested.

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.58 no.4
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• pp.532-534
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• 2009

The ceramics superconductor may have a high degree of homogeneity and a more open structure through which atoms can easily diffuse without having to overcome the high activation barrier. Infrared detectors of ceramic superconductor materials have been studied. Ceramic superconductor have smaller reflection coefficient than metal superconductor and therefore infrared light can more easily penetrate into bulks. YBCO thick films show sensitivity of 250 V/W. The accumulation of particles decrease the superconducting energy gap.

• Journal of the Korean Society for Precision Engineering
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• v.29 no.12
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• pp.1272-1278
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• 2012

The micro barrier rip array structures have been applied in a variety of areas including as privacy films, micro heat sinks, touch panel and optical waveguide. The increased aspect ratio (AR) of barrier rip array structures is required in order to increase the efficiency and performance of these products. There are several problems such as burr, defect of surface roughness and deformation and breakage of barrier rip structure with machining high-aspect ratio micro barrier rip array structure using orthogonal cutting method. It is essential to develop technological methods to solve these problems. The optimum machining conditions for machining micro barrier rip array structures having high-aspect ratio were determined according to lengths ($200{\mu}m$ and $600{\mu}m$) and shape angles ($2.89^{\circ}$ and $0^{\circ}$) of diamond tool, overlapped cutting depths ($5{\mu}m$ and $10{\mu}m$), feed rates (100 mm/s) and three machining processes. Based on the optimum machining conditions, micro barrier rib array structures having aspect ratio 30 was machined in this study.

• Korean Journal of Materials Research
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• v.26 no.6
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• pp.342-346
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• 2016

To observe the bonding structure and electrical characteristics of a GZO oxide semiconductor, GZO was deposited on ITO glasses and annealed at various temperatures. GZO was found to change from crystal to amorphous with increasing of the annealing temperatures; GZO annealed at $200^{\circ}C$ came to have an amorphous structure that depended on the decrement of the oxygen vacancies; increase the mobility due to the induction of diffusion currents occurred because of an increment of the depletion layer. The increasing of the annealing temperature caused a reduction of the carrier concentration and an increase of the bonding energy and the depletion layer; therefore, the large potential barrier increased the diffusion current dna the Hall mobility. However, annealing temperatures over $200^{\circ}C$ promoted crystallinity by the defects without oxygen vacancies, and then degraded the depletion layer, which became an Ohmic contact without a potential barrier. So the current increased because of the absence of a potential barrier.