• 제목/요약/키워드: Back-contact layer

검색결과 65건 처리시간 0.02초

백제 관모에 사용된 직물 연구 (A Study of the Fabrics Used for the Official Hats in Baekje Dynasty)

  • 백윤미
    • 복식
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    • 제59권3호
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    • pp.82-95
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    • 2009
  • The kind and the use of the fabrics for crown manufacture in the Baekje period has been studied by characterizing the imprinted fabrics on the crowns and the diadem ornaments from the old tomb. The contact region with the skin inside of the crown and the region between the bark of white birch and the gilt bronze openwork plates contained fabrics. The fabrics used in the gilt-bronze crown were all plain weave silk except that of Yongwonri tomb where loosely woven thin tabby was used. There have been 4-types of iron framed diadem of the Baekje, which comprise the inverted triangle-shaped diadem only with iron frame, the diadem with gold plate ornament in the iron frame, the diadem decorated with mica plate and gold plate, and the diadem with silver ornament in the iron frame. The fabrics used in the triangle shaped iron frame diadem include plain weave silk, irregular plain woven silk, thin tabby, complex silk gauze, twill weave on plain ground, and warp-faced compound weave. The iron frames were wrapped with the fabrics from one layer up to three layers, and the iron diadem was covered with one later of loosely woven textile such as irregular plain woven silk, thin tabby, and complex silk gauze. But in case of decorating the iron diadem with gold Plate ornaments, multiple layers of fabric were used to sustain the weight of the ornaments. The fabrics in the iron diadem frame were sewed with running stitch, overedge stitch or hemming stitch, diagonal hemming stitch, half back stitch), and overcast stitch.

Cu 도핑과 열처리가 ZnTe 박막의 물성에 미치는 영향 (Influence of Cu Doping and Heat Treatments on the Physical Properties of ZnTe Films)

  • 최동일;윤세왕;김동환
    • 한국재료학회지
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    • 제9권2호
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    • pp.173-180
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    • 1999
  • Thermally evaporated ZnTe films were investigated as a back contact material for CdS/CdTe solar cells. Two deposition methods, coevaporation and double-layer methods, were used for Cu doping in ZnTe films. ZnTe layers (0.2$\mu\textrm{m}$ thick) were deposited either on glass or on CdS/CdTe substrates without intentional heating of the substrates. Post-deposition annealing was performed at 200,300 and $400^{\circ}C$ for 3,6 and 9 minutes, respectively. Band gap of 2.2eV was measured for both undoped and doped films and a slight change in the shape of absorption spectra was observed in Cu-doped samples after annealing at $400^{\circ}C$. The resistivity of as-deposited ZnTe decreased from 10\ulcorner~10\ulcornerΩcm down to 10\ulcornerΩcm as Cu concentration increased from 0 to 14 at.%. There was not a noticeable change in less of annealing temperature up to $300^{\circ}C$ whereas films annealed at $400^{\circ}C$ revealed hexagonal (101) orientations as well. Some of Cu-doped ZnTe revealed x-ray diffraction (XRD) peaks related with Cu\ulcornerTe(x=1.75~2). Grain growth was observed from about 20nm in as-deposited films to 50nm after annealing at $400^{\circ}C$ by scanning electron microscopy (SEM). Cu distribution in ZnTe films was not uniform according to Auger electron spectroscopy (AES) measurements.

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Fabrication of Cu2ZnSnS4 Films by Rapid Thermal Annealing of Cu/ZnSn/Cu Precursor Layer and Their Application to Solar Cells

  • Chalapathy, R.B.V.;Jung, Gwang Sun;Ko, Young Min;Ahn, Byung Tae;Kwon, HyukSang
    • Current Photovoltaic Research
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    • 제1권2호
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    • pp.82-89
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    • 2013
  • $Cu_2ZnSnS_4$ thin film have been fabricated by rapid thermal annealing of dc-sputtered metal precursor with Cu/ZnSn/Cu stack in sulfur ambient. A CZTS film with a good uniformity was formed at $560^{\circ}C$ in 6 min. $Cu_2SnS_3$ and $Cu_3SnS_4$ secondary phases were present at $540^{\circ}C$ and a trace amount of $Cu_2SnS_3$ secondary phase was present at $560^{\circ}C$. Single-phase large-grained CZTS film with rough surface was formed at $560^{\circ}C$. Solar cell with best efficiency of 4.7% ($V_{oc}=632mV$, $j_{sc}=15.8mA/cm^2$, FF = 47.13%) for an area of $0.44cm^2$ was obtained for the CZTS absorber grown at $560^{\circ}C$ for 6 min. The existence of second phase at lower-temperature annealing and rough surface at higher-temperature annealing caused the degradation of cell performance. Also poor back contact by void formation deteriorated cell performance. The fill factor was below 0.5; it should be increased by minimizing voids at the CZTS/Mo interface. Our results suggest that CZTS absorbers can be grown by rapid thermal annealing of metallic precursors in sulfur ambient for short process times ranging in minutes.

저가 지상전력을 위한 다결정 실리콘 태양전지 제작 (The Fabrication of Poly-Si Solar Cells for Low Cost Power Utillity)

  • 김상수;임동건;심경석;이재형;김홍우;이준신
    • 태양에너지
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    • 제17권4호
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    • pp.3-11
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    • 1997
  • 다결정 실리콘에서 결정입계는 광생성된 반송자들의 재결합 중심으로 작용할 뿐 아니라 전위장벽으로 작용하여 태양전지의 변환효율을 감소시킨다. 결정입계의 영향을 줄이기 위해 열처리, 결정입계에 대한 선택적 식각, 결정입계로 함몰전극을 형성하는 방법, 다양한 전극 구조, 초박막 금속 형성 후 전극형성 등 여러가지 요소들을 조사하였다. 질소 분위기에서 $900^{\circ}C$ 전열처리, $POCl_3$ 확산을 통한 게터링, 후면전계 형성을 위한 Al 처리로 다결정 실리콘의 결함밀도를 감소시켰다. 결정입계에서의 반송자 손실을 감소시키기 위한 기판 처리로 Schimmel 식각액을 사용하였다. 이는 texturing 효과와 함께 결정입계를 선택적으로 $10{\mu}m$ 깊이로 식각하였다. 결점입계를 우선적으로 식각한 후면으로 Al을 확산하여 후면에서의 재결합 손실을 감소시켰다. 전극 핑거(grid finger) 간격이 0.4mm인 세밀한 전극 구조에 결정입계로 $0.4{\mu}m$ 깊이로 함몰전극을 추가로 형성하여 태양전지의 단락 전류 밀도가 개선되었다. 80% 이상의 광투과율을 보인 20nm 두께의 크롬 박막 형성으로 직렬 저항을 감소시켰다. 본 논문은 저가의 고효율, 지상 전력용 태양진지를 위해 결정입계에 대한 연구를 하였다.

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ITO 투명전극의 $O_2$ 플라즈마 처리가 고분자 유기발광다이오드의 전기.광학적 특성에 미치는 영향 (Dependence of $O_2$ Plasma Treatment of ITO Electrode on Electrical and Optical Properties of Polymer Light Emitting Diodes)

  • 공수철;백인재;유재혁;임현승;양신혁;신상배;신익섭;장지근;장호정
    • 한국표면공학회지
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    • 제39권3호
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    • pp.93-97
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    • 2006
  • Polymer light emitting diodes (PLEDs) are expected to be commercialized as next generation displays by advantages of the fast response time, low driving voltage and easy manufacturing process for large sized flexible display. Generally, the electrical and optical properties of PLEDs are affected by the surface conditions of transparent electrode. The PLED devices with ITO/PEDOT:PSS/PVK/PFO-poss/LiF/Al structures were prepared by using the spin coating method. For this, PEDOT:PSS(poly(3,4-ethylenedioxythiophene):poly(styrene sulfolnate)) Al 4083 and PVK(N-vinylcabozole) were used as hole injection and transport layers. The PFO-poss(poly(9,9-dioctylfluorene)) was used as the emitting layer. The dependence of $O_2$ plasma treatment of ITO electrode on the electrical and optical properties of PLEDs were investigated. The sheet resistances increased slightly with an improved surface roughness of ITO electrode as the RF power increased during $O_2$ plasma treatment. The PLED devices prepared on the ITO/Glass substrates, which were plasma-treated at 40 watt in RF power for 30 seconds under 40 mtorr $O_2$ pressure, showed the maximum external emission efficiency of 0.86 lm/W and the maximum luminance of $250\;cd/m^2$, respectively. The CIE color coordinates are ranged $X\;=\;0.13{\sim}0.18$ and $Y\;=\;0.10{\sim}0.16$, showing blue color. emission.