• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.869-873
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• 2004

[ $Sr_xBa_{1-x}Nb_2O_6$ ] (SBN, $0.25{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient, piezoelectric, and a photo refractive properties. In this study, SBN60(x=0.6) thin film was manufactured by ion beam sputtering technique. Using the prepared SBN60 target in $Ar/O_2$ atmosphere as-deposited SBN60 thin film on Pt(100)/$TiO_2/SiO_2/Si$ substrate crystallization and orientation behavior as well as electric properties of SBN60 thin film were examined. SBN60 deposition up to $3000{\AA}$ in thickness, SBN60 thin film was heat-treated at $650^{\circ}C{\sim}800^{\circ}C$. The orientation was shown primarily along (001) plane from XRD pattern where working pressure was $4.3{\times}10^{-4}$ torr. The deposited layer was uniform, preferred orientatin and crystallization behavior resulted in the change of $O_2$ ratio was observed. In electric propertie of Pt/SBN60/Pt thin film capacitor remnant polarization (2Pr) value was $10{\mu}C/cm^2$, the coercive filed (Ec) 50 kV/cm, and the dielectric constant 615, respectively.

• 한국전기전자재료학회논문지
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• 제33권6호
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• pp.445-449
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• 2020

Non-volatile memory is approaching its fundamental limits with the Si₃N₄ storage layer, necessitating the use of alternative materials to achieve a higher programming/erasing speed, larger storage window, and better data retention at lower operating voltage. This limitation has restricted the development of the charge-trap memory, but can be addressed by using high-k dielectrics. The paper reviews the doping of nitrogen, titanium, and yttrium on high-k dielectrics as a storage layer by comparing MONOS devices with different storage layers. The results show that nitrogen doping increases the storage window of the Gd₂O₃ storage layer and improves its charge retention. Titanium doping can increase the charge capture rate of HfO₂ storage layer. Yttrium doping increases the storage window of the BaTiO₃ storage layer and improves its fatigue characteristics. Parameters such as the dielectric constant, leakage current, and speed of the memory device can be controlled by maintaining a suitable amount of external impurities in the device.

• 광물과 암석
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• 제34권1호
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• pp.1-14
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• 2021

운산 금 광상은 한반도의 3대(대유동 광상, 광양 광상) 금 광상중의 하나였다. 이 광상의 지질은 선캠브리아기의 변성퇴적암류와 중생대의 반상화강암으로 구성된다. 이 광상은 선캠브리아기의 변성퇴적암류와 중생대의 반상화강암내에 발달된 단층대를 따라 충진한 함 금 석영맥 광상으로 조산형 금 광상에 해당된다. 이 광상의 석영맥은 광물조합에 따라 1) 방연석-석영맥형, 2) 자류철석-석영맥형, 3) 황철석-석영맥형, 4) 페크마틱 석영맥형, 5) 백운모-석영맥형 및 6) 단순석영맥형으로 분류된다. 연구된 석영맥은 황철석-석영맥형이며 견운모화작용, 녹니석화작용 및 규화작용이 관찰된다. 백색운모는 유색대에서 백색석영, 황철석, 녹니석, 금홍석, 모나자이트, 저어콘, 인회석, 칼리장석 및 방해석 등과 함께 세립질 내지 중립질 입단으로 산출된다. 이 백색운모의 화학조성은 (K0.98-0.86Na0.02-0.00Ca0.01-0.00Ba0.01-0.00 Sr0.00)1.00-0.88(Al1.70-1.57Mg0.22-0.09Fe0.23-0.10Mn0.00Ti0.04-0.02Cr0.01-0.00V0.00Ni0.00)2.06-1.95 (Si3.38-3.17Al0.83-0.62)4.00O10(OH2.00-1.91F0.09-0.00)2.00로써 이론적인 이중팔면체형 운모류 값보다 Si가 높고 K, Na, Ca는 낮다. 이 광상의 엽리상 석영맥에서 산출되는 백색운모의 화학조성 변화는 팬자이틱(phengitic) 또는 Tschermark 치환[(Al3+)VI+(Al3+)IV <-> (Fe2+ 또는 Mg2+)VI+(Si4+)IV] 및 직접적인 (Fe3+)VI <-> (Al3+)VI 치환에 의해 일어났음을 알 수 있다. 엽리상 석영맥에서 산출되는 녹니석의 화학조성은 (Mg1.11-0.80Fe3.69-3.14Mn0.01-0.00Zn0.01-0.00K0.07-0.01Na0.01-0.00Ca0.04-0.01Al1.66-1.09)5.75-5.69 (Si3.49-2.96Al1.04-0.51)4.00O10 (OH)8로써 이론적인 녹니석보다 Si 함량이 높다. 이 녹니석의 화학조성 변화는 팬자이틱(phengitic) 또는 Tschermark 치환(Al3+,VI+Al3+,IV <-> (Fe2+ 또는 Mg2+)VI+(Si4+)IV) 및 팔면체적 Fe2+ <-> Mg2+ (Mn2+) 치환에 의해 일어났음을 알 수 있다. 따라서 운산 광상의 엽리상 석영맥 및 변질광물은 조산운동 시 연성전단(ductile shear) 시기에 형성되었음을 알 수 있다.

• Coupled systems mechanics
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• 제1권2호
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• pp.205-217
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• 2012

A smart beam made of magneto-electro-elastic (MEE) material having piezoelectric phase and piezomagnetic phase, shows the coupling between magnetic, electric, thermal and mechanical under thermal environment. Product properties such as pyroelectric and pyromagnetic are generated in this MEE material under thermal environment. Recently studies have been published on the product properties (pyroelectric and pyromagnetic) for magneto-electro-thermo-elastic smart composite. Hence, the magneto-electro-elastic beam with different volume fractions, investigated under uniform temperature rise is the main aim of this paper, to study the influence of product properties on clamped-free boundary condition, using finite element procedures. The finite element beam is modeled using eight node 3D brick element with five nodal degrees of freedom viz. displacements in the x, y and z directions and electric and magnetic potentials. It is found that a significant increase in electric potential observed at volume fraction of $BaTiO_3$, $v_f$ = 0.2 due to pyroelectric effect. In-contrast, the displacements and stresses are not much affected.

• 전자공학회논문지D
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• 제35D권5호
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• pp.33-39
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• 1998

The BST (Ba$_{1-x}$ Sr$_{x}$TiO$_{3}$)(50/50) thin film has been grown by RF magnetron reactive sputtering and its characteristics such as crystallization, surface roughness, and electrical properties have been investigated with varying the film thickness. The crystallization and surface roughness of BST thin film are investigated by using XRD and AFM, respectively The BST thin film anealed at 800.deg. C for 2 min has pure perovskite structure and good surface roughness of 16.1.angs.. We estimate that the thickness and dielectric constant of interface layer between BST film and electrode are 3nm and 18.9, respectively, by measuring the capacitance with various film thickness. As the film thickness increases form 80nm to 240nm, the dielectric constant at 10kHz increases from 199 to 265 and the leakage current density at 200kV/cm decreases from 0.682.mu.A/cm$^{2}$ to 0.181 .mu.A/cm$^{2}$. In the case of 240nm-thick BST thin film, the charge storage density and leakage current density at 5V are 50.5fC/.mu.m$^{2}$ and 0.182.mu.A/cm$^{2}$, respectively. The values indicate that the BST thin film is a very useful dielectric material for the DRAM capacitor.or.

• 한국정보통신설비학회:학술대회논문집
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• 한국정보통신설비학회 2003년도 하계학술대회
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• pp.286-288
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• 2003

In this paper, in order to obtain a large differential phase shift with a little change in applied voltage, a ferroelectric reflective load circuit has been designed on top of barium strontium titanate $(Ba,Sr)TiO_3$ [BST] thin film. The design of the ferroelectric reflection-type phase shifter is based on a reflection theory of terminating circuit, which has a reflection-type analogue phase shifter with two ports terminated in symmetric phase-controllable reflective networks. To achieve large amounts of phase shift in low bias-voltage range, the effects of change of capacitance and transmission line connected with two coupled ports of a 3-dB $90^{\circ}$ branch-line hybrid coupler have been investigated. A large phase shift with a small capacitance change in the parallel terminating circuit has been demonstrated in the paper.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.180-181
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• 2008

화학양론적 $BaTiO_3$의 소결은 고온의 에너지를 필요로 하며, 내부전극과 세라믹충의 동시소성과정에서 Ni이 세라믹층으로의 확산이 발생되어 PTC의 물성저하를 초래한다. 본 연구에서는 저온에서 액상을 형성하여 소결온도를 낮추는 것으로 알려진 산화물 및 비산화물계 소결첨가제가 적층 PTC 세라믹스의 미세구조 및 전기적 특성에 미치는 영향에 대하여 고찰하였다. 소결과정에서 분해되어 기체를 형성하는 BN, $Li_2CO_3$, LiF의 경우 기공율을 증가시켜 산소의 이동경로를 형성하였으며, 이는 입계의 재산화를 용이하게 하여 PTC 효과를 보였다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권3호
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• pp.116-121
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• 2006

Most high-k materials are well known not to be etched easily, Some problems such as low etch rate poor sidewall angle, plasma damage, and process complexity were emerged from the high-density DRAM fabrication. Chemical mechanical polishing (CMP) by a damascene process was proposed to pattern this high-k material was polished with some commercial silica slurry as a function of pH variation. Sufficient removal rate with adequate selectivity to realize the pattern mask of tera-ethyl ortho-silicate (TEOS) film for the vertical sidewall angle were obtained. The changes of X-ray diffraction pattern and dielectric constant by CMP process were negligible. The planarization was also achieved for the subsequent multi-level processes. Our new CMP approach will provide a guideline for effective patterning of high-k material by CMP technique.

• 전자공학회논문지D
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• 제35D권3호
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• pp.63-69
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• 1998

In this paper, a new input method is proposed to improve shift-invariant property of a photorefractive correlator andwe implemented real-time optical pattern recognition system using it. In the conventional photorefractive correlator, it is vrey difficult to satisfy the Bragg condition in the pattern recognition process. So, correlation peak is decreased heavily for the shift of input image. If a liquid crystal television(LCTV) without an anlyzer is used as input device, we can get the correlation result regardless of shift of input image because beam path is not changed during storage of holographic filter and correlation process. Also recording time of a holographic matched filter in photorefractive crystal is reduced and the correlation peak is increased because incident beam on the LCTV is transmitted completely. Therefore total optical efficiency is improved. We compared and analyzed the correlation results of proposed photorefractive correlator by computer simulation and optical experiment. We used a BaTiO$_{3}$ single crystal which has high diffraction efficiency in optical experiment.

• 한국전기전자재료학회논문지
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• 제36권5호
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• pp.525-530
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• 2023

Stretchable piezoelectric energy harvester (S-PEHs) based on composite materials are considered one of the potential candidates for realizing wearable self-powered devices for smart clothing and electronic skin. However, low energy conversion performance and expensive stretchable electrodes are major bottlenecks hindering the development and application of S-PEHs. Here, we fabricated the S-PEH by adopting the piezoelectric composites with enhanced stress transfer properties and kirigami-patterned textile electrodes. The optimum contents of piezoelectric BaTiO₃ nanoparticles inside the carbon nanotube/ecoflex composite were selected as 30 wt% considering the trade-off between stretchability and energy harvesting performance of the device. The final S-PEH shows an output voltage and mechanical stability of ~5 V and ~3,000 cycles under repeated 150% of tensile strain, respectively. This work presents a cost-effective and scalable way to fabricate stretchable piezoelectric devices for self-powered wearable electronic systems.