• Title/Summary/Keyword: BZO Thin Film

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Optical properties of the $O_2$ plasma treatment on BZO (ZnO:B) thin films for TCO of a-Si solar cells

  • Yoo, Ha-Jin;Son, Chang-Gil;Cho, Won-Tea;Park, Sang-Gi;Choi, Eun-Ha;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.454-454
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    • 2010
  • In order to achieve a high efficient a-Si solar cell, the TCO (transparent conductive oxide) substrates are required to be a low sheet resistivity, a high transparency, and a textured surface with light trapping effect. Recently, a zinc oxide (ZnO) thin film attracts our attention as new coating material having a good transparent and conductive for TCO of solar cells. In this paper the optical properties of $H_2$ post-treated BZO (boron doped ZnO, ZnO:B) thin film are investigated with $O_2$-plasma treatment. The BZO thin films by MOCVD (Metal Organic Chemical Vapor Deposition) are investigated and the samples of $H_2$ post-treated BZO thin film are tested with $O_2$-plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. We measured the optical properties and surface morphology of BZO thin film with and without $O_2$-plasma treatment. The optical properties such as transmittance, reflectance and haze are measured with integrating sphere and ellipsometer. This result of the BZO thin film with and without $O_2$-plasma treatment is application to the TCO for solar cells.

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Influence of O2-Plasma Treatment on the Thin Films of H2 Post-Treated BZO (ZnO:B) (수소 플라즈마 처리된 BZO 박막에 산소 플라즈마의 재처리 조건에 따른 BZO 박막 특성)

  • Yoo, H.J.;Son, C.G;Yoo, J.H.;Park, C.K.;Kim, J.S.;Park, S.G.;Kang, H.D.;Choi, E.H.;Cho, G.S.;Kwon, G.C.
    • Journal of the Korean Vacuum Society
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    • v.19 no.4
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    • pp.275-280
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    • 2010
  • The influence of $O_2$-plasma treatment on $H_2$ post-treated BZO (ZnO:B) thin film using MOCVD (Metal-Organic Chemical Vapor Deposition) are investigated. An $O_2$-plasma treatment of the $H_2$ post-treated BZO thin films resulted in XRD peak of (100), (101) and (110). Also, electrical properties resulted in an increase in sheet resistance and work function. The weighted optical transmittance and haze at 300~1,100 nm of BZO thin films with $O_2$-plasma treatment on the $H_2$ post-treatment show approximately 86% and 15%, respectively.

$H_2$ plasma treatment effects on electrical and optical properties of the BZO (ZnO:B) thin films

  • Yoo, Ha-Jin;Son, Chan-Hee;Choi, Joon-Ho;Kang, Jung-Wook;Cho, Won-Tae;Park, Sang-Gi;Lee, Yong-Hyun;Choi, Eun-Ha;Cho, Guang-Sup;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.309-309
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    • 2010
  • We have investigated the effect of $H_2$ plasma treatment on the BZO (ZnO:B, Boron doped ZnO) thin films. The BZO thin films are prepared by LP-MOCVD (Low Pressure Metal Organic Chemical Vapor Deposition) technique and the samples of BZO thin film are performed with $H_2$ plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. After exposing $H_2$ plasma treatment, measurement of transmittance, reflectance and haze spectra in 300~1100 nm, electrical properties as resistivity, mobility and carrier concentration and work function was analysed. Regarding the results of the $H_2$ plasma treatment on the BZO thin films are application to the TCO for solar cells, such as the a-Si thin films solar cell.

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Electrical and Optical Properties of BZO Thin Films Deposited by RF Magnetron Sputtering with Various Annealing Temperatures (열처리 온도에 따른 BZO 박막의 전기적 및 광학적 특성)

  • Seong-Jun Kang;Yang-Hee Joung
    • The Journal of the Korea institute of electronic communication sciences
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    • v.19 no.1
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    • pp.47-52
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    • 2024
  • The effects of annealing temperature on the optical and electrical properties of BZO thin films, grown on glass substrate, have been investigated. Analysis of the XRD shows that regardless of the annealing temperature, all BZO thin films indicate the c-axis orientation. The full width of half maximum (FWHM) decreases from 1.65 to 1.07° as the annealing temperature increases from 400 to 600℃. The average transmittance in the visible light region showed a high value of 85% without significantly affecting the annealing temperature. The results of Hall effect measurements indicate that the carrier concentration and mobility increased and the resistivity decreased as the annealing temperature increased. The resistivity and the carrier concentration of the BZO thin films annealed 600℃ were 9.75×10-2 Ω·cm and 4.21×1019 cm-3 respectively, showing the best value. The optimization of deposition and annealing conditions will certainly make the BZO thin films promising materials for the application to the next generation of optoelectronic devices.

The Effect of the Addition of BZO Nanopowder in the YBCO PLD Targets on the Flux Pinning Properties of BZO-YBCO Thin Film (YBCO PLD 타겟에 BZO 나노분말 첨가에 따른 PLD-YBCO 박막의 자속고정 효과)

  • Song, K.J.;Ko, R.K.;Lee, Y.S.;Park, Y.M.;Yang, J.S.;Kim, H.S.;Ha, H.S.;Ha, D.W.;Kim, S.W.;Oh, S.S.;Kim, D.J.;Park, C.;Yoo, S.I.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.20-21
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    • 2005
  • [ $BaZrO_3$ ], nanopowder was added to YBCO powder to make ($BazrO_3)_x(YBCO)_{(100-x)mol.-%}$ ($BZO_x$-YBCO) ($0{\leq}x{\leq}10$) composite targets fur pulsed laser deposition of superconducting layer in order to investigate the effect of the addition of BZO nanopowder in the YBCO target on the flux pinning properties of $BZO_x$-YBCO thin films. All the $BZO_x$-YBCO thin films were grown on single crystal STO substrate under similar conditions in the PLD chamber. The effect of YBCO targets doped with BZO on the flux pinning properties of $BZO_x$-YBCO thin films has been investigated comparatively. The isothermal magnetizations M(H) of the films were measured at temperatures between 5 and 80 K in fields up to 5 T, employing a PPMS. The optimal amount of BZO nanopowders in $BZO_x$-YBCO thin films to obtain the strongest flux pinning effects at high magnetic fields is about 6 mol.-%.

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The Properties of Boron-doped Zinc Oxide Film Deposited according to Oxygen Flow Rate

  • Kim, Dong-Hae;Son, Chan-Hee;Yun, Myoung-Soo;Lee, Jin-Young;Jo, Tae-Hoon;Seo, Il-Won;Jo, I-Hyun;Roh, Jun-Hyung;Choi, Eun-Ha;Uhm, Han-Sup;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.358-358
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    • 2012
  • The application of BZO (Boron-doped Zinc Oxide) films use as the TCO(Transparent Conductive Oxide) material for display and solar cell industries, where the conductivity of the BZO films plays a critical role for improvement of cell performance. Thin BZO films are deposited on glass substrates by using RF sputter system. Then charging flow rates of O2 gas from zero to 10 sccm, thereby controlling the impurity concentration of BZO. BZO deposited on soda lime glass and RF power was 300 W, frequency was 13.56 MHz, and working pressure was $5.0{\times}10-6$ Torr. The Substrate and glass between distance 200 mm. We measured resistivity, conductivity, mobility by hall measurement system. Optical properties measured by photo voltaic device analysis system. We measured surface build according to oxygen flow rate from XPS (X-ray Photoelectron Spectroscopy) system. The profile of the energy distribution of the electrons emitted from BZO films by the Auger neutralization is measured and rescaled so that Auger self-convolution arises, revealing the detail structure of the valence band. It may be observed coefficient ${\gamma}$ of the secondary electron emission from BZO by using ${\gamma}$-FIB (Gamma-Focused Ion Beam) system. We observed the change in electrical conductivity by correlation of the valence band structure. Therefore one of the key issues in BZO films may be the valence band that detail structure dominates performance of solar cell devices. Demonstrating the secondary electron emission by the Auger neutralization of ions is useful for the determination of the characteristics of BZO films for solar cell and display developments.

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Thermal Degradation of BZO Layer on the CIGS Solar Cells

  • Choi, Pyungho;Kim, Sangsub;Choi, Byoungdeog
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.458-458
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    • 2013
  • We investigated a study on the thermal degradation of boron doped zinc-oxide (BZO) layer which used as a transparent conducting layer on the Cu (In1-xGax) Se2 (CIGS) based thin film solar cells. Devices were annealed under the temperature of $100^{\circ}C$ or 100 hours and then Hall measurement was carried out to characterize the parameters of mobility (${\mu}Hall$), resistivity (${\rho}$), conductivity (${\sigma}$) and sheet resistance (Rsh). The initial values of ${\mu}Hall$, ${\rho}$, ${\sigma}$ and Rsh were $29.3cm^2$/$V{\cdot}s$, $2.1{\times}10^{-3}{\Omega}{\cdot}cm$, $476.4{\Omega}^{-1}{\cdot}cm^{-1}$ and $19.1{\Omega}$/${\Box}$ respectively. After the annealing process, the values were $4.5cm^2$/$V{\cdot}s$, $12.8{\times}10^{-3}{\Omega}{\cdot}cm$, $77.9{\Omega}^{-1}{\cdot}cm^{-1}$ and $116.6{\Omega}$/${\Box}$ respectively. We observed that ${\mu}Hall$ and ${\sigma}$ were decreased, and ${\rho}$ and Rsh were increased. In this study, BZO layer plays an important role of conducting path for electrons generated by incident light onthe CIGS absorption layer. Therefore, the degradation of BZO layer characterized by the parameters of ${\mu}Hall$, ${\rho}$, ${\sigma}$ and Rsh, affect to the cell efficiency.

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Effect of MoSe2 on Contact Resistance of ZnO/Mo Junction in Cu(In,Ga)Se2 Thin Film Solar Module (MoSe2가 Cu(In,Ga)Se2 박막 태양전지 모듈의 ZnO/Mo 접합의 접촉 저항에 미치는 영향)

  • Cho, Sung Wook;Kim, A Hyun;Lee, Gyeong A;Jeon, Chan Wook
    • Current Photovoltaic Research
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    • v.8 no.3
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    • pp.102-106
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    • 2020
  • In this paper, the effect of MoSe2 on the contact resistance (RC) of the transparent conducting oxide (TCO) and Mo junction in the scribed P2 region of the Cu(In,Ga)Se2 (CIGS) solar module was analyzed. The CIGS/Mo junction becomes ohmic-contact by MoSe2, so the formation of the MoSe2 layer is essential. However, the CIGS solar module has a TCO/MoSe2/Mo junction in the P2 region due to structural differences from the cell. The contact resistance (RC) of the P2 region was calculated using the transmission line method, and MoSe2 was confirmed to increase RC of the TCO/Mo junction. B doped ZnO (BZO) was used as TCO, and when BZO/MoSe2 junction was formed, conduction band offset (CBO) of 0.6 eV was generated due to the difference in their electron affinities. It is expected that this CBO acts as a carrier transport barrier that disturbs the flow of current, resulting in increased RC. In order to reduce the RC caused by CBO, MoSe2 must be made thin in a CIGS solar module.