• Proceedings of the Korean Magnestics Society Conference
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• 2008.12a
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• pp.104.1-104.1
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• 2008

• Proceedings of the Korean Magnestics Society Conference
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• 2008.12a
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• pp.47.1-47.1
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• 2008

• Proceedings of the Korean Magnestics Society Conference
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• 2008.12a
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• pp.268.1-268.1
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• 2008

• Korean Journal of Optics and Photonics
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• v.21 no.5
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• pp.185-189
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• 2010

We demonstrate a single-frequency wavelength tunable erbium-doped fiber (EDF) ring laser. We used an unpumped-EDF as a saturable-absorber in order to obtain a stable single-frequency with a narrow-linewidth single-polarization mode in the ring cavity. The lasing wavelength was controlled by using bending-induced strain, such as tension and compression strain corresponding to the bending direction, applied to the fiber gratings. The fiber laser exhibited an output power of -1.85 dBm at a wavelength of 1540.72 nm for a pumping power of ~400 mW. An extinction ratio was measured to be more than 60 dB. The proposed tunable fiber laser maintains nearly the same output power while its lasing wavelength is controlled over in a wavelength range of 5 nm.

• Journal of the Korean Vacuum Society
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• v.9 no.2
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• pp.110-115
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• 2000

Deposition conditions of diamond thin films were optimized using hot-filament chemical vapor deposition (HFCVD). Boron-doped diamond thin films with varying boron densities were then fabricated using B4C solid pellets. Current-voltage responses and field emission currents were measured to test the characteristics of field emission display (FED). With the increase of boron doping, the crystal size of diamond decreased slightly, but its quality was not changed significantly in case of small doping. The I-V characterization was performed for Al/diamond/p-Si, and the current of doped diamond film was increased $10^4\sim10^5$ times as compared with that of undoped film. In the field emission properties, the electrons were emitted with low electric field with the increase of doping, while the emission current increased. The onset-field of electron emission was 15.5 V/$\mu\textrm{m}$ for 2 pellets, 13.6 V/$\mu\textrm{m}$ for 3 pellets and 11.1 V/$\mu\textrm{m}$ for 4 pellets. With the incorporation of boron, the slope of Fowler-Nordheim graph was decreased, revealing that the electron emission behavior was improved with the decrease of the effective barrier energy.

• Proceedings of the KIEE Conference
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• 1998.07d
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• pp.1370-1372
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• 1998

Boron doped CdS films were prepared by CBD(Chemical Bath Deposition) method using boric acid ($B_3HO_3$) as donor dopant source, and their properties were investigated. As-grown CdS films were highly adherent and specularly reflective. Boron doped CdS film which was fabricated under the condition of 0.01 $B_3HO_3/Cd(Ac)_2$ mole ratio, exhibited the lowest resistivity of $2{\Omega}cm$ and the highest optical bandgap of 2.41eV. Also, CdS/CdTe solar cells were fabricated with various doping concentration of CdS films. Using optimized CdS film as the window layer of CdS/CdTe solar cell, the characteristics of the cell were improved. ( $V_{oc}$=610mV, $J_{sc}$=37.5mA/cm, FF=0.4, $\eta$=9.1% )

• Progress in Superconductivity
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• v.3 no.1
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• pp.13-16
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• 2001

We have measured the reflectivity of superconducting infinite-layer compounds $Sr_{0.9}$ $Ln_{0.1}$ Cu $O_2$ (Ln=La, Gd, Sm) with $T_{c}$ : 39 K using a Fourier-transform infrared spectrometer. We have identified the optical phonon modes from their infrared reflectivity and conductivity spectra and have proposed possible displacement patterns. The La- and the Gd-doped compounds exhibited only four ($2A_{2u}$ $+2E_{u}$) out of the five ($2A_{2u}$ $3E_{u}$) infrared-active phonons predicted by a group theoretical analysis whereas the Sm-doped compound exhibited all five modes. For the La-doped sample, we investigated the temperature dependence of the optical response functions in a wide temperature range of 7 - 300 K. In FIR region, the reflectivity is apparently enhanced below ~120 $cm^{-1}$ as temperature decreases across $T_{c}$. The value of $2$\Delta$/k_{B}$ $T_{c}$ is about 4.5, which is consistent with maximum gap value of d-wave $high- T_{c}$ cuprates.> c/ cuprates.uprates.s.

• Korean Journal of Materials Research
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• v.21 no.6
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• pp.299-302
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• 2011

[ $WO_3$ ]powders were ball-milled with an alumina ball for 0-72 hours. $In_2O_3$ doped $WO_3$ was prepared by soaking ball-milled $WO_3$ in an $InCl_3$ solution. The mixed powder was annealed at $700^{\circ}C$ for 30 min in an air atmosphere. A paste for screen-printing the thick film was prepared by mixing the $WO_3$:In2O3 powders with ${\alpha}$-terpinol and glycerol. $In_2O_3$ doped $WO_3$ thick films were fabricated into a gas sensor by a screen-printing method on alumina substrates. The structural properties of the $WO_3$:$InO_3$ thick films were a monoclinic phase with a (002) dominant orientation. The particle size of the $WO_3$:$InO_3$ decreased with the ball-milling time. The sensing characteristics of the $In_2O_3$ doped $WO_3$ were investigated by measuring the electrical resistance of each sensor in the test-box. The highest sensitivity to 5 ppm $CH_4$ gas and 5 ppm $CH_3CH_2CH_3$ gas was observed in the ball-milled $WO_3$:$InO_3$ gas sensors at 48 hours. The response time of $WO_3$:$In_2O_3$ gas sensors was 7 seconds and recovery time was 9 seconds for the methane gas.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.429-429
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• 2012

To investigate the gettering effect of B-doped n-type monocrystalline silicon wafer, we made the p-n junction by diffusing boron into n-type monocrystalline Si substrate and then oxidized the boron doped n-type monocrystalline silicon wafer by in-situ wet and dry oxidation. After oxidation, the minority carrier lifetime was measured by using microwave photoconductance and the sheet resistance by 4-point probe, respectively. The junction depth was analyzed by Secondary Ion Mass Spectrometry (SIMS). Boron diffusion reduced the metal impurities in the bulk of silicon wafer and increased the minority carrier lifetime. In the case of wet oxidation, the sheet resistance value of ${\sim}46{\Omega}/{\Box}$ was obtained at $900^{\circ}C$, depostion time 50 min, and drive-in time 10 min. Uniformity was ~7% at $925^{\circ}C$, deposition time 30 min, and drive-in time 10 min. Finally, the minority carrier lifetime was shown to be increased from $3.3{\mu}s$ for bare wafer to $21.6{\mu}s$ for $900^{\circ}C$, deposition 40 min, and drive-in 10 min condition. In the case of dry oxidation, for the condition of 50 min deposition, 10 min drive-in, and O2 flow of 2000 SCCM, the minority carrier lifetime of 16.3us, the sheet resistance of ${\sim}48{\Omega}/{\Box}$, and uniformity of 2% were measured.

• JSTS:Journal of Semiconductor Technology and Science
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• v.9 no.3
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• pp.166-173
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• 2009

The reliability of hafnium oxide gate dielectrics incorporating lanthanum (La) is investigated. nMOSFETs with metal/La-doped high-k dielectric stack show lower $V_{th}$ and $I_{gate}$, which is attributed to the dipole formation at the high-k/$SiO_2$ interface. The reliability results well correlate with the dipole model. Due to lower trapping efficiency, the La-doping of the high-k gate stacks can provide better PBTI immunity, as well as lower charge trapping compared to the control HfSiO stacks. While the devices with La show better immunity to positive bias temperature instability (PBTI) under normal operating conditions, the threshold voltage shift (${\Delta}V_{th}$) at high field PBTI is significant. The results of a transconductance shift (${\Delta}G_m$) that traps are easily generated during high field stress because the La weakens atomic bonding in the interface layer.