• Title/Summary/Keyword: Atomic vapor

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Atomic Coherence Spectroscopy in the Paraffin Coated Rb Atom Vapor Cell (파라핀 코팅된 Rb원자 증기 셀에서 원자결맞음 분광)

  • Lee, Hyun-Joon;Yu, Ye-Jin;Bae, In-Ho;Moon, Han-Seb
    • Korean Journal of Optics and Photonics
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    • v.19 no.4
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    • pp.334-340
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    • 2008
  • We investigated the electromagnetically induced transparency (EIT) and the Hanle spectrum in a paraffin coated Rb vapor cell. The EIT spectrum was observed in the $F_g=2$, $3{\rightarrow}F_e=3$ transition of the $^{85}Rb$ $D_1$-line by using two independent external cavity diode lasers, and the Hanle spectrum was observed by using one external cavity diode laser in the $\Lambda$-type scheme between the Zeeman sublevels of the $F_g=2{\rightarrow}F_e=1$ transition of the $^{87}Rb$ $D_1$-line. In the Hanle spectrum, we could observe the dual-structured spectrum in the paraffin coated vapor cell. We investigated the dual-structured lineshape by applying an external magnetic field, and varying the direction of the magnetic field. The narrow linewidth of dual-structured EIT was measured to be approximately 200 Hz.

Assessment of COBRA-TF for Critical Heat Flux

  • Chun, Tae-Hyun;Lim, Jong-Sun;Motoaki Okazaki
    • Proceedings of the Korean Nuclear Society Conference
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    • 1996.05b
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    • pp.75-81
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    • 1996
  • COBRA-TF is a two fluid, three field subchannel code. Three fields are continuous vapor, continuous liquid and droplet. Some assessments are conducted to validate the related models and to estimate a code ability through dryout and post-CHF experiment in a tube and DNB test in rod bundles. It turned out form dryout and post-CHF experiment that the predicted dryout locations and wall temperature profiles are in close agreement with the experiments. On the other hand, DNB prediction of COBRA-TF are performed for two kinds of rod bundles along with EPRI CHF correlation. To estimate its performance COBRA-IV of homogeneous model is also run for the same data. The results say that COBRA-TF/EPRI is better in DNB prediction than COBRA-IV/EPRI. In addition the thermal-hydraulic behaviors due to the different two-phase flow models are presented at the condition of CHF.

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Recent Progress on the Application of Atomic Layer Deposition for Lithium Ion Batteries (원자층 증착법을 적용한 리튬 이온 전지 연구 동향)

  • Kim, Dong Ha;Choi, Byung Joon
    • Journal of Powder Materials
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    • v.23 no.2
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    • pp.170-176
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    • 2016
  • Lithium-ion batteries (LIBs) are rapidly improving in capacity and life cycle characteristics to meet the requirements of a wide range of applications, such as portable electronics, electric vehicles, and micro- or nanoelectro-mechanical systems. Recently, atomic layer deposition (ALD), one of the vapor deposition methods, has been explored to expand the capability of LIBs by producing near-atomically flat and uniform coatings on the shell of nanostructured electrodes and membranes for conventional LIBs. In this paper, we introduce various ALD coatings on the anode, cathode, and separator materials to protect them and improve their electrochemical and thermomechanical stability. In addition, we discuss the effects of ALD coatings on the three-dimensional structuring and conduction layer through activation of electrochemical reactions and facilitation of fluent charge collection.

Recent Developments in H2 Production Photoelectrochemical Electrode Materials by Atomic Layer Deposition (원자층증착법을 이용한 수소 생성용 광전기화학 전극 소재 개발 동향)

  • Han, Jeong Hwan
    • Journal of Powder Materials
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    • v.25 no.1
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    • pp.60-68
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    • 2018
  • The design and fabrication of photoelectrochemical (PEC) electrodes for efficient water splitting is important for developing a sustainable hydrogen evolution system. Among various development approaches for PEC electrodes, the chemical vapor deposition method of atomic layer deposition (ALD), based on self-limiting surface reactions, has attracted attention because it allows precise thickness and composition control as well as conformal coating on various substrates. In this study, recent research progress in improving PEC performance using ALD coating methods is discussed, including 3D and heterojunction-structured PEC electrodes, ALD coatings of noble metals, and the use of sulfide materials as co-catalysts. The enhanced long-term stability of PEC cells by ALD-deposited protecting layers is also reviewed. ALD provides multiple routes to develop improved hydrogen evolution PEC cells.

Tribological Properties of Annealed Diamond-like Carbon Film Synthesized by RF PECVD Method

  • Choi, Won-Seok
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.3
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    • pp.118-122
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    • 2006
  • Diamond-like carbon (DLC) films were prepared on silicon substrates by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the tribological properties of the DLC films using friction force microscopy (FFM). The films were annealed at various temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The surface morphology and surface energy of the films were examined using atomic force microscopy and contact angle measurement, respectively. The hardness of the DLC film was measured as a function of the post annealing temperature using a nano-indenter. The tribological characteristics were investigated by atomic force microscopy in FFM mode.

Characteristics of Semiconductor-Atomic Superlattice for SOI Applications (SOI 응용을 위한 반도체-원자 초격자 구조의 특성)

  • 서용진
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.6
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    • pp.312-315
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    • 2004
  • The monolayer of oxygen atoms sandwiched between the adjacent nanocrystalline silicon layers was formed by ultra high vacuum-chemical vapor deposition (UHV-CVD). This multilayer Si-O structure forms a new type of superlattice, semiconductor-atomic superlattice (SAS). According to the experimental results, high-resolution cross-sectional transmission electron microscopy (HRTEM) shows epitaxial system. Also, the current-voltage (Ⅰ-Ⅴ) measurement results show the stable and good insulating behavior with high breakdown voltage. It is apparent that the system may form an epitaxially grown insulating layer as possible replacement of silicon-on-insulator (SOI), a scheme investigated as future generation of high efficient and high density CMOS on SOI.

Implementation of Differential Absorption LIDAR (DIAL) for Molecular Iodine Measurements Using Injection-Seeded Laser

  • Choi, Sungchul;Baik, Sunghoon;Park, Seungkyu;Park, Nakgyu;Kim, Dukhyeon
    • Journal of the Optical Society of Korea
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    • v.16 no.4
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    • pp.325-330
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    • 2012
  • Differential absorption LIDAR (DIAL) is frequently used for atmospheric gas monitoring to detect impurities such as nitrogen dioxide, sulfur dioxide, iodine, and ozone. However, large differences in the on- and off-line laser wavelengths can cause serious errors owing to differential aerosol scattering. To resolve this problem, we have developed a new DIAL system for iodine vapor measurements in particular. The suggested DIAL system uses only one laser under seeded and unseeded conditions. To check the detection-sensitivity and error effects, we compared the results from a system using two seeded lasers with those from a system using a seeded and an unseeded laser. We demonstrate that the iodine concentration sensitivity of our system is improved in comparison to the conventional two seeded or two unseeded laser combinations.

AN EXPERIMENTAL STUDY ON POST-CHF HEAT TRANSFER FOR LOW FLOW OF WATER IN A $3\times3$ ROD BUNDLE

  • MOON SANG-KI;CHUN SE-YOUNG;CHO SEOK;KIM SE-YUN;BAEK WON-PIL
    • Nuclear Engineering and Technology
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    • v.37 no.5
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    • pp.457-468
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    • 2005
  • An experimental study on post-CHF heat transfer has been performed with a $3\times3$ rod bundle using a vertical steam-water two-phase flow at low flow conditions. The effects of various parameters on the post-CHF heat transfer are investigated and the reasons for the parametric effects are discussed. As the heat transfer regime changes from CHF to post-CHF, the radial wall temperature distribution is changed depending on the pressure and the mass flux conditions. The superheat of the fluid increases considerably with an increase of the wall temperature (or heat flux) and with a decrease of the mass flux. This implies, indirectly, a strong thermal non-equilibrium at high wall temperature and low mass flux conditions. In order to improve the prediction accuracy of the existing post-CHF correlations, it is necessary to perform more experiments, particularly direct measurement of the vapor superheat, and to modify the correlation by considering a strong thermal non-equilibrium at low flow and low pressure conditions.

Microstructure of ZrC Coatings of TRISO Coated Particles by Codeposition of Free Carbon and Control of Stoichiometry (유리탄소의 동시증착에 의한 TRISO 피복입자의 ZrC 코팅층 미세구조와 화학양론비 제어)

  • Ko, Myung-Jin;Kim, Daejong;Park, Ji Yeon;Cho, Moon Sung;Kim, Weon-Ju
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.446-450
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    • 2013
  • TRISO coated particles with a ZrC barrier layer were fabricated by a fluidized-bed chemical vapor deposition (FBCVD) method for a use in a very high temperature gas-cooled reactor (VHTR). The ZrC layer was deposited by the reaction between $ZrCl_4$ and $CH_4$ gases at $1500^{\circ}C$ in an $Ar+H_2$ mixture gas. The amount of free carbon codeposited with in ZrC was changed by controlling the dilution gas ratio. Near-stoichiometric ZrC phase was also deposited when an impeller was employed to a $ZrCl_4$ vaporizer which effectively inhibited the agglomeration of $ZrCl_4$ powders during the deposition process. A near-stoichiometric ZrC coating layer had smooth surface while ZrC containing the free carbon had rough surface with tumulose structure. Surface roughness of ZrC increased further as the amount of free carbon increased.

Study on the Atomic Layer Deposition System and Process of the MgO Thin Layer for the Thin Film Encapsulation of OLED (OLED의 Thin Film Encapsulation을 위한 MgO 박막의 원자층 증착 장치 및 공정에 관한 연구)

  • Cho, Eou Sik;Kwon, Sang Jik
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.3
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    • pp.22-26
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    • 2021
  • Thin-film encapsulation (TFE) technology is most effective in preventing water vapor and oxygen permeation in the organic light emitting diodes (OLED). Of those, a laminated structure of Al2O3 and MgO were applied to provide efficient barrier performance for increasing the stability of devices in air. Atomic layer deposition (ALD) method is known as the most promising technology for making the laminated Al2O3/MgO and is used to realize a thin film encapsulation technology in organic light-emitting diodes. Atomic layer deposited inorganic films have superior barrier performance and have advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the control system of the MgCP2 precursor for the atomic layer deposition of MgO was established in order to deposit the MgO layer stably by the injection time of second level and the stable heating temperature. The deposition rate was obtained stably to be from 4 to 10 Å/cycle using the injection pulse times ranging from 3 to 12 sec and a substrate temperature ranging from 80 to 150 ℃.