• 방사성폐기물학회지
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• 제18권4호
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• pp.497-508
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• 2020

In the geochemical field, the chemical speciation of hexavalent uranium (U(VI)) has been widely investigated by performing measurements to determine its luminescence properties, namely the excitation, emission, and lifetime. Of these properties, the excitation has been relatively overlooked in most time-resolved laser fluorescence spectroscopy (TRLFS) studies. In this study, TRLFS and continuous-wave excitation-emission matrix spectroscopy are adopted to characterize the excitation properties of U(VI) surface species that interact with amorphous silica. The luminescence spectra of U(VI) measured from a silica suspension and silica sediment showed very similar spectral shapes with similar lifetime values. In contrast, the excitation spectra of U(VI) measured from these samples were significantly different. The results show that distinctive excitation maxima appeared at approximately 220 and 280 nm for the silica suspension and silica sediment, respectively.

• 한국전기전자재료학회논문지
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• 제23권10호
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• pp.747-751
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• 2010

In the study, the characteristics of the etched Zinc oxide (ZnO) thin films surface, the etch rate of ZnO thin film in $Cl_2/BCl_3/Ar$ plasma was investigated. The maximum ZnO etch rate of 53 nm/min was obtained for $Cl_2/BCl_3/Ar$=3:16:4 sccm gas mixture. According to the x-ray diffraction (XRD) and atomic force microscopy (AFM), the etched ZnO thin film was investigated to the chemical reaction of the ZnO surface in $Cl_2/BCl_3/Ar$ plasma. The field emission auger electron spectroscopy (FE-AES) analysis showed an elemental analysis from the etched surfaces. According to the etching time, the ZnO thin film of etched was obtained to The AES depth-profile analysis. We used to atomic force microscopy to determine the roughness of the surface. So, the root mean square of ZnO thin film was 17.02 in $Cl_2/BCl_3/Ar$ plasma. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the plasmas.

• 한국작물학회지
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• 제49권spc1호
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• pp.269-276
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• 2004

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.124-125
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• 2012

Korea institute of materials science (KIMS) use a linear deposition source called as a closed drift linear plasma source (CDLPS) as well as dual magnetron sputtering (DMS) to deposit SiOxCyHz films in $HMDSO/O_2$ plasma. The CDLPS generates linear plasma using closed drifting electrons and can reduce device degradations due to energetic ion bombardments on organic devices such as organic photovoltaic and organic light emission diode by controlling an ion energy. The deposited films are investigated by Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Optical emission spectroscopy (OES) is used to measure relative radical populations of dissociation and recombination products such as H, CH, and CO in plasma. And SiOx film is applied to a barrier film on organic photovoltaic devices.

• 반도체디스플레이기술학회지
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• 제22권2호
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• pp.35-39
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• 2023

Silicon oxide thin films have been deposited by plasma-enhanced chemical vapor deposition in SiH4 and N2O plasma along the variation of the gas flow ratio. Optical emission spectroscopy was employed to monitor the plasma and ellipsometry was employed to obtain refractive index of the deposited thin film. The atomic ratio of Si, O, and N in the film was obtained using XPS depth profiling. Fourier Transform Infrared Spectroscopy was used to analyze structures of the films. RI decreased with the increase in N2O/SiH4 gas flow ratio. We noticed the increase in the Si-O-Si bond angles as the N2O/SiH4 gas flow ratio increased, according to the analysis of the Si-O-Si stretching peak between 950 and 1,150 cm-1 in the wavenumber. We observed a correlation between the optical emission intensity ratio of (ISi+ISiH)/IO. The OES intensity ratio is also related with the measured refractive index and chemical composition ratio of the deposited thin film. Therefore, we report the added value of OES data analysis from the plasma related to the thin film characteristics in the PECVD process.

• 분석과학
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• 제17권5호
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• pp.416-422
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• 2004

시간분해 레이저 유도 파열 분광분석 (TRELIBS) 시스템을 구성하여 원자력발전소 계통재질의 성분을 정성 분석하는 데 응용하였다. 본 연구에서는 탄소강 (A106 Gr. B, A336 P11, A335 P22), 스텐인레스강 (type 304, type 316) 및 인코넬 계열 합금(인코넬 600, 인코넬 690, 인코넬 800) 시료를 사용하였다. 탄소강의 종류는 485~575 nm 파장영역에서 나타난 Cr/Fe과 Mo/Fe의 TRELIBS 피크 비에 의해서 서로 구분 가능하였다. type 304와 type 316 스텐인레스강은 485~575 nm 파장영역에서 나타나는 Mo의 TRELIBS 피크 존재 여부에 의해서 쉽게 구분 가능하였다: type 304는 어떤 Mo의 피크도 나타내지 않지만, type 316은 Mo의 피크를 보여준다. 인코넬 계열 합금강 종류는 420~510 nm 파장영역에서 나타난 Cr/Fe과 Ni/Fe의 TRELIBS 피크비에 의해서 서로 구분 가능하였다. TRELIBS는 시료의 전처리 없이 빠르고 쉽게 합금을 분석할 수 있는 효과적인 분석 기술임이 입증되었다.

• Bulletin of the Korean Chemical Society
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• 제28권4호
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• pp.553-556
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• 2007

We previously reported a 27.12 MHz inductively coupled plasma source at atmospheric pressure for atomic emission spectrometry based on polymer microchip plasma technology. For the PDMS polymer microchip plasma, molecular emission was observed, but no metallic detection was done. In this experiment, a lab-made electrothermal vaporizer (ETV) with tantalum coil was connected to the microchip plasma for aqueous sample introduction to detect metal ions. The electrode geometry of this microchip plasma was redesigned for better stability and easy monitoring of emission. The plasma was operated at an rf power of 30-70 W using argon gas at 300 mL/min. Gas kinetic temperatures between 800-3200 K were obtained by measuring OH emission band. Limits of detection of about 20 ng/mL, 96.1 ng/mL, and 1.01 μ g/mL were obtained for alkali metals, Zn, and Pb, respectively, when 10 μ L samples in 0.1% nitric acid were injected into the ETV.

• Elastomers and Composites
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• 제33권3호
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• pp.201-209
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• 1998

고무배합물의 충진제로 사용되는 알루미나 분말의 제조에 있어서 재래식 및 마이크로파 에너지원에 의하여 황산용액중의 카올린으로 부터 알루미나를 얻는다. 이때 카올린으로부터 알루미나 분말의 최대 추출율은 각각 재래식의 경우는 $80^{\circ}C$, 1M 황산, 180분에서 72.8%이고, 마이크로파 추출 공정의 경우는 $90^{\circ}C$, 1m 황산, 60분에서 $99\%$였다. 또한 추출된 시료는 TG/DTA, XRD, SEM, Atomic Emission Spectroscopy 및 BET법에 의하여 분석하였다..

• 대한화학회지
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• 제44권6호
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• pp.592-599
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• 2000

여러 가지 온도, 조성 및 농도에서 이성분계 세라믹 복합체 TPSZ(titania partially-stabilized zirconia)의 미분말을 초음파분무열분해법에 의하여 합성하였으며, 합성공정인자가 분체특성에 미치는 영향을 검토하고, 합성된 분체의 특성을 조사하였다. 출발용액의 제조는 금속염의 농도가 0.025~0.1 M이 되도록 증류수에 용해하고, 그 조성비는 $ZrO_2$ 90~97.5 wt%에 $TiO_2$ 2.5~10 wt%가 되도록 하였다. 합성시 열분해 영역에서의 온도는 건조부가 400~550$^{\circ}C$, 반응부는 800~1100$^{\circ}C$로 하였으며, 합성된 분체는 습식으로 포집하여 110$^{\circ}C$에서 3시간 동안 건조하였다. 합성된 미분체의 특성을 Raman Spectroscopy, X-ray diffraction(XRD), Scanning Electron Microscopy(SEM), Transmission Electron Microscopy (TEM) 및 Particle Size Analyzer(PSA)로써 조사하였고, Inductively Coupled Plasma-Atomic Emission Spectroscopy(ICP-AES)로써 순도 및 조성을 분석하였다.

• 분석과학
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• 제37권1호
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• pp.12-24
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• 2024

In this study, laser-induced breakdown spectroscopy (LIBS) was used to estimate the degree of rice polishing. As-threshed rice seeds were dehusked and polished for different times, and the resulting grains were analyzed using LIBS. Various atomic, ionic, and molecular emissions were identified in the LIBS spectra. Their correlation with the amount of polished-off matter was investigated. Na I and Rb I emission line intensities showed linear sensitivity in the widest range of polished-off-matter amount. Thus, univariate models based on those lines were developed to predict the weight percent of polished-off matter and showed 3-5 % accuracy performances. Partial least squares-regression (PLS-R) was also applied to develop a multivariate model using Si I, Mg I, Ca I, Na I, K I, and Rb I emission lines. It outperformed the univariate models in prediction accuracy (2 %). Our results suggest that LIBS can be a reliable tool for authenticating the degree of rice polishing, which is closed related to nutrition, shelf life, appearance, and commercial value of rice products.