• 제목/요약/키워드: Atmospheric Plasma

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Effect of Atmospheric Pressure Plasma on the Quality of Commercially Available Sunsik (대기압 플라즈마가 선식의 품질 특성에 미치는 영향)

  • Kim, Hyun-Joo;Woo, Koan Sik;Jo, Cheorun;Lee, Seuk Ki;Park, Hye Young;Sim, Eun-Yeong;Won, Yong-Jae;Lee, Sang-Bok;Oh, Sea-Kwan
    • Journal of Food Hygiene and Safety
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    • 제31권5호
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    • pp.375-379
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    • 2016
  • Atmospheric pressure plasma (APP) was applied to examine microbial safety and qualities of commercial Sunsik. APP was generated in a square-shaped plastic container (250 W, 15 kHz, ambient air) and dielectric barrier discharge plasma treatment was applied for periods of 0, 5, 10, and 20 minutes. The total aerobic bacterial count in the control was 4.44 log CFU/g. Under plasma treatment for 20 minutes, Sunsik samples inoculated with Bacillus cereus, B. subtilis, and Escherichia coli O157:H7 resulted in a reduction of bacterial counts by approximately 2.20, 2.22, and 2.52 log CFU/g, respectively. The pH of the sample was found to decrease after APP treatment. Although hunter color $L^*$ of Sunsik increased, $a^*$ and $b^*$ value decreased as a result of APP. Increasing the APP time also enhanced the peroxide value. Further, sensory evaluation revealed that APP decreased color, flavor, taste and overall acceptability. The results of this study indicated that APP treatment improved the microbial quality of Sunsik, although further studies should be conducted to reduce the deterioration of sensory quality induced by APP.

Study of using Waste Industrial Catalyst for the Removal of Harmful Organic Compounds (유해 유기화합물의 제거를 위한 폐 산업용 촉매의 이용에 관한 연구)

  • Seo, Seong-Gyu;Kim, Sang-Chai
    • Journal of Korean Society for Atmospheric Environment
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    • 제20권5호
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    • pp.663-670
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    • 2004
  • The catalytic oxidation of benzene, toluene and xylene over a spent industrial catalyst (Pd-based) was investigated in a fixed bed flow reactor system. According to the priming condition, the properties of a spent Pd-based catalyst were characterized by XRD(X-ray diffraction). BET(Brunauer-Emmett-Teller) and ICP(Inductively coupled plasma). When air was used as a primer, optimum priming temperature was found to be 200$^{\circ}C$, and the catalytic activity decreased as the priming temperature increased. When a spent Pd-based catalyst primed with air at 200$^{\circ}C$ was re-treated with hydrogen at 200$^{\circ}C$, 300$^{\circ}C$ or 400$^{\circ}C$, respectively, the catalytic activity increased and thermal effect were negligible. $HNO_3$ aqueous solution priming resulted in slight decrease of the catalytic activity, with little effects on $HNO_3$ concentrations. The activity of a spent Pd-based catalyst with respect to VOC molecule was observed to follow sequence: xylene> toluene> benzene. Benzene. toluene and xylene could be removed to almost 100% by a spent Pd-based catalyst primed with hydrogen.

Characteristics of Atmospheric Respirable Particulate Matters and Trace Elements within Industrial Complex and Residential Sites in an Industrial City (산업 도시의 산업단지 부지와 주거 지역의 대기 중 호흡성 분진과 구성 미량 원소의 특성)

  • Kim, Mo-Geun;Shin, Seung-Ho;Jo, Wan-Kuen
    • Environmental Analysis Health and Toxicology
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    • 제25권1호
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    • pp.27-40
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    • 2010
  • The current study was designed to scientifically evaluate the atmospheric particulate pollution in residences relative to their proximity to a Korean major iron/metal industrial complex (IMIC). This objective was achieved by measuring the concentrations and elemental composition of particulate matter with aerodynamic diameters equal to or less than 10 ${\mu}m$(PM10) in industrial ambient air from IMIC and residential ambient air with relative proximities to IMIC. The trace metals were analyzed using an inductively coupled plasma-atomic emission spectroscopy (ICP-AES). The industrial mean values exceeded the Korean year/70-${\mu}g/m^3$ standard for PM10, whereas the residential mean values did not. However, the maximum residential values did exceed or were close to the Korean PM10 year standard. For individual elements, the ambient concentrations ranged widely from values in the order of a few $ng/m^3$ to thousands of $ng/m^3$. The residential mean mass concentrations in the PM10 measured in the present study were higher than or similar to those reported in earlier studies. This study suggests that residents in neighborhoods near the IMIC are exposedto elevated particulate levels compared to residents living further away from such a source.

Seasonal and solar activity variations of the Weddell Sea Anomaly observed in the TOPEX TEC measurements

  • Jee, Geon-Hwa;Burns, Alan G.;Kim, Yong-Ha;Wang, Wen-Bin
    • Bulletin of the Korean Space Science Society
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    • 한국우주과학회 2008년도 한국우주과학회보 제17권2호
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    • pp.25.1-25.1
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    • 2008
  • The Weddell Sea Anomaly (WSA) in the ionosphere is characterized by higher plasma density at night than during the day in the region near the Weddell Sea. According to previous studies on the WSA, it is known to occur mostly in southern summer and has not been reported in other seasons. We have utilized more than 13-year TOPEX TEC measurements in order to study how the WSA varies with seasons and how it changes with solar activity. The TOPEX TEC data have been extensively utilized for the climatological study of the ionosphere due to its excellent spatial and temporal coverage. We investigate the seasonal and solar activity variations of the WSA using four seasonal cases (Mar. equinox, Jun. solstice, Sep, equinox, and Dec. solstice) and two solar activity conditions (F10.7<120 for solar minimum and F10.7>120 for solar maximum conditions) for geomagnetically quiet periods. Our analysis shows that the WSA occurs only in the southern summer hemisphere for low F10.7, as in previous studies, but the WSA occurs all of seasons except for winter when F10.7 is high: it is most prominent during the December solstice (southern summer) and still strong during both equinoxes. The WSA appears to be an extreme case of global longitudinal variations at mid- and high-latitudes.

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Fast, Upward, Long-Lasting, Transit Echoes as an Evidence of New-Type of Meteor-Trail Leader Discharge in the Summer Polar Upper Mesosphere

  • Lee, Young-Sook;Kirkwood, Sheila;Kwak, Young-Sil
    • Journal of Astronomy and Space Sciences
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    • 제35권2호
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    • pp.93-103
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    • 2018
  • Non-specular, vertically upward transit, fast-moving radar echoes are observed in the summer polar upper mesosphere near 90 km using 52 MHz VHF radar at Esrange, Sweden. By resolving maximum echo power movement, the unusual meteor trails propagate vertically upward with taking horizontal displacements at an initial speed of 10 km/s exponentially decreasing with increasing height from 85-89 km, lasting for 3.5 sec. Another upward transit is observed as following a downward transit echo target in about ~1 sec, lasting over 5 sec. The upward motion cannot be explained with the dynamics of penetrating meteors or by atmospheric dynamics. The observation proposes that secondary produced plasma jets occurring from meteor trail are possibly responsible for upward fast moving echoes. The long-lasting (3-5 sec), ascending meteor trails at speeds of a few $10^4m/s$ are distinctive from any previous occurrences of meteors or upper atmospheric electrical discharges in the aspect of long-lasting upward/downward motions. This result possibly suggests a new type of meteor-trail leader discharge occurring in the summer polar upper mesosphere and lower thermosphere.

Simulation of Low Temperature Plasmas for an Ultra Violet Light Source using Coplanar Micro Dielectric Barrier Discharges

  • Bae, Hyowon;Lee, Ho-Jun;Lee, Hae June
    • Applied Science and Convergence Technology
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    • 제25권6호
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    • pp.138-144
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    • 2016
  • The discharge characteristics of pulse-driven coplanar micro barrier discharges for an ultraviolet (UV) light source using Ne-Xe mixture have been investigated using a two-dimensional fluid simulation at near-atmospheric pressure. The densities of electrons, the radiative excited states, the metastable excited states, and the power loss are investigated with the variations of gas pressure and the gap distance. With a fixed gap distance, the number of the radiative states $Xe^*(^3P_1)$ increases with the increasing driving voltage, but this number shows weak dependency on the gas when that pressure is over 400 Torr. However, the number of the radiative states increases with the increase of the gap distance at a fixed voltage, while the power loss decreases. Therefore, a long gap discharge has higher efficiency for UV generation than does a short gap discharge. A slight change in the electrode tilt angle enhances the number of radiative species 2 or 3 times with the same operation conditions. Therefore, the intensity and efficiency of the UV light source can be controlled independently by changing the gap distance and the electrode structure.

A Study on Water-soluble Components in the Dustfall Matter at Cheju and Ullung Island (제주도와 울릉도의 강하분진중 수용성 성분에 관한 연구)

  • Choi, Jae-Cheon;Kim, San;Lee, Min-Young;Lee, Sun-Ki
    • Journal of Korean Society for Atmospheric Environment
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    • 제11권4호
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    • pp.331-337
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    • 1995
  • This study was carried out to investigate the chemical composition of dustfall at Cheju(mean sea level; 71.7m, 33$^{\circ}$17'N, 126$^{\circ}$10'E) and Ullung island(mean sea level; 22.1m, 38$^{\circ}$29'N, 130$^{\circ}$54'E) from October 1993 to september 1994. The dustfall matter samples were collected by deposit gauges. The ionic components of each samples was analyzed by Ion Chromatograpy (Dionex 4000i), While heavy metals by Inductively Coupled Plasma Atomic Emission Spectrometry(ICP/AES; Shimadzu ICP-4). The results for seasonal variation of dustfall matter matter total amount, water-soluble ionic components and water-soluble ionic components total deposition amount to two sites were compared each other. The seasonal variations of dustfall amount at Ullung and Cheju island were found in order of Spring>Winter>Fall>Summer, and the maximum of dustfall amount were during the Yellow Sand period. Also, Total amount of water-soluble components except for $F^{[-10]}$ were high in Cheju more than Ullung island.more than Ullung island.

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Anti-corrosion Properties of SiOxCy(-H) thin Films Synthesized and Oxidized by Atmospheric Pressure Dielectric Barrier Discharge (대기압 유전체배리어방전으로 합성 및 산화 처리된 SiOxCy(-H) 박막의 부식방지 특성)

  • Kim, Gi-Taek;Kim, Yoon Kee
    • Journal of Surface Science and Engineering
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    • 제53권5호
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    • pp.201-206
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    • 2020
  • A SiOxCy(-H) thin film was synthesized by atmospheric pressure dielectric barrier discharge(APDBD), and a SiO2-like layer was formed on the surface of the film by oxidation treatment using oxygen plasma. Hexamethylcyclotrisiloxane was used as a precursor for the SiOxCy(-H) synthesis, and He gas was used for stabilizing APDBD. Oxygen permeability was evaluated by forming an oxidized SiOxCy(-H) thin film on a PET film. When the single-layer oxidized SiOxCy(-H) film was coated on the PET, the oxygen gas permeability decreased by 46% compared with bare PET. In case of three-layer oxidized SiOxCy(-H) film, the oxygen gas permeability decreased by 73%. The oxygen permeability was affected by the thickness of the SiO2-like layer formed by oxidation treatment rather than the thickness of the SiOxCy(-H) film. The excellent corrosion resistance was demonstrated by coating an oxidized SiOxCy(-H) thin film on the silver-coated aluminum PCB for light emitting diode (LED).

Evaluation of the Potential of Nitrogen Plasma to Cosmetics (질소 플라즈마의 화장품 가능성 평가)

  • Lee, So Min;Jung, So Young;Brito, Sofia;Heo, Hyojin;Cha, Byungsun;Lei, Lei;Lee, Sang Hun;Lee, Mi-Gi;Bin, Bum-Ho;Kwak, Byeong-Mun
    • Journal of the Society of Cosmetic Scientists of Korea
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    • 제48권3호
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    • pp.189-196
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    • 2022
  • Plasma refers to an ionized gas that is often referred to as "the fourth phase of matter", following solid, liquid, and gas. Plasma has traditionally been utilized for industrial applications such as welding and neon signs, but its promise in biomedical fields such as cancer treatment and dermatology has lately been recognized. Indeed, due to its beneficial effects in promoting collagen production, improving skin tone, and eliminating harmful bacteria in the skin, plasma treatment constitutes an important target for dermatological research. In this study, a plasma device for cosmetic manufacturing based on nitrogen, the main component of the atmosphere, was designed and assembled. Moreover, nitric oxide (NO) was selected since is easier to follow and evaluate than other nitrogen plasma active species, and its contents were measured to perform a quantitative and qualitative evaluation of plasma. First, an injection method, using different proximities labeled "sinking" and "non sinking" treatments, was performed to test the most efficient plasma treatment method. As a result, it was observed that the formulation obtained by a non sinking treatment was more effective. Furthermore, toner and ampoule were selected as cosmetics formulations, and the characteristics of the formulation and changes in the injected plasma state were observed. In both formulations, the successful injection of NO plasma was 2 times higher in toner formulation than ampoule formulation, and it gradually decreased with time, having dissipated after a week. It was confirmed that the nitrogen plasma used did not affect the stability of the toner and ampoule formulations at low temperature (4 ℃), room temperature (25 ℃), and high temperature (37 ℃ and 50 ℃) conditions. The results of this study demonstrate the potential of plasma cosmetics and highlight the importance of securing the stability of the injected plasma.

Selective etch of silicon nitride, and silicon dioxide upon $O_2$ dilution of $CF_4$ plasmas ($CF_4$$O_2$혼합가스를 이용한 산화막과 질화막의 선택적 식각에 관한 연구)

  • 김주민;원태영
    • Electrical & Electronic Materials
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    • 제8권1호
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    • pp.90-94
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    • 1995
  • Reactive Ion Etching(RIE) of Si$_{3}$N$_{4}$ in a CF$_{4}$/O$_{2}$ gas plasma exhibits such good anisotropic etching properties that it is widely employed in current VLSI technology. However, the RIE process can cause serious damage to the silicon surface under the Si$_{3}$N$_{4}$ layer. When an atmospheric pressure chemical vapor deposited(APCVD) SiO$_{2}$ layer is used as a etch-stop material for Si$_{3}$N$_{4}$, it seems inevitable to get a good etch selectivity of Si$_{3}$N$_{4}$ with respect to SiO$_{2}$. Therefore, we have undertaken thorough study of the dependence of the etch rate of Si$_{3}$N$_{4}$ plasmas on $O_{2}$ dilution, RF power, and chamber pressure. The etch selectivity of Si$_{3}$N$_{4}$ with respect to SiO$_{2}$ has been obtained its value of 2.13 at the RF power of 150 W and the pressure of 110 mTorr in CF$_{4}$ gas plasma diluted with 25% $O_{2}$ by flow rate.

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