• Title/Summary/Keyword: Arrays

검색결과 2,107건 처리시간 0.034초

양극산화법에 의한 TiO2 나노튜브 어레이의 제조 및 광전기화학적 특성에 관한 연구 (Fabrication of TiO2 Nanotube Arrays by Anodic Oxidation Method and its Photoelectrochemical Properties)

  • 김선민;조권구;최영진;김기원;류광선
    • 한국분말재료학회지
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    • 제17권3호
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    • pp.216-222
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    • 2010
  • Self-standing $TiO_2$ nanotube arrays were fabricated by potentiostatic anodic oxidation method using pure Ti foil as a working electrode and ethylene glycol solution as electrolytes with small addition of $NH_4F$ and $H_2O$. The influences of anodization temperature and time on the morphology and formation of $TiO_2$ nanotube arrays were investigated. The fabricated $TiO_2$ nanotube arrays were applied as a photoelectrode to dye-sensitized solar cells. Regardless of anodizing temperature and time, the average diameter and wall thickness of $TiO_2$ nanotube show a similar value, whereas the thickness show a different trend with reaction temperature. The thickness of $TiO_2$ nanotube arrays anodized at $20^{\circ}C$ and $30^{\circ}C$ was time-dependent, but on the other hand its at $10^{\circ}C$ are independent of anodization time. The conversion efficiency is low, which is due to a morphology breaking of the $TiO_2$ nanotube arrays in manufacturing process of photoelectrode.

CoP나노선재의 자기적 성질에 미치는 미세구조와 크기 효과 (Variation of the Magnetic Properties of Electrodeposited CoP Nanowire Arrays According to Their Size and Microstructure)

  • 김이진;이관희;정원용;김광범
    • 전기화학회지
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    • 제6권3호
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    • pp.208-211
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    • 2003
  • 본 연구에서는 CoP나노선재의 미세구조 및 크기에 따른 자기적 성질의 변화를 고찰하였다. 우선 나노선재를 제조하기 위하여 기공의 직경이 각각 20nm, 200nm인 알루미나 형틀을 제조하였고, 이 형틀을 이용하여 전기도금 방법으로 CoP나노선재를 제조하였다. 직경이 20nm인 나노선재의 경우 나노선재의 길이방향으로의 각형성 및 보자력이 각각 0.8, 2600 Oe으로서 지금까지 보고된 나노선재들에 비해 우수한 자기적 성질을 나타내었고 전기도금 시 전류밀도의 영향이 거의 없었다. 그러나 직경이 200nm인 나노선재는 나노선재의 길이방향으로 각형성 및 보자력이 각각 0.15, 1200 Oe으로 20nm나노선재보다 현격하게 감소하였으며 나노선재의 자기적 성질이 전류밀도에 따라 많은 영향을 받고 있음을 확인하였다 즉, 상대적으로 낮은 전류밀도에서 제조된 나노선재일 수록 나노선재와 평행한 방향으로 자화용이축이 배향되어 길이방향으로 각형성 및 보자력이 증가하였다.

Fabrication of Microwire Arrays for Enhanced Light Trapping Efficiency Using Deep Reactive Ion Etching

  • 황인찬;서관용
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.454-454
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    • 2014
  • Silicon microwire array is one of the promising platforms as a means for developing highly efficient solar cells thanks to the enhanced light trapping efficiency. Among the various fabrication methods of microstructures, deep reactive ion etching (DRIE) process has been extensively used in fabrication of high aspect ratio microwire arrays. In this presentation, we show precisely controlled Si microwire arrays by tuning the DRIE process conditions. A periodic microdisk arrays were patterned on 4-inch Si wafer (p-type, $1{\sim}10{\Omega}cm$) using photolithography. After developing the pattern, 150-nm-thick Al was deposited and lifted-off to leave Al microdisk arrays on the starting Si wafer. Periodic Al microdisk arrays (diameter of $2{\mu}m$ and periodic distance of $2{\mu}m$) were used as an etch mask. A DRIE process (Tegal 200) is used for anisotropic deep silicon etching at room temperature. During the process, $SF_6$ and $C_4F_8$ gases were used for the etching and surface passivation, respectively. The length and shape of microwire arrays were controlled by etching time and $SF_6/C_4F_8$ ratio. By adjusting $SF_6/C_4F_8$ gas ratio, the shape of Si microwire can be controlled, resulting in the formation of tapered or vertical microwires. After DRIE process, the residual polymer and etching damage on the surface of the microwires were removed using piranha solution ($H_2SO_4:H_2O_2=4:1$) followed by thermal oxidation ($900^{\circ}C$, 40 min). The oxide layer formed through the thermal oxidation was etched by diluted hydrofluoric acid (1 wt% HF). The surface morphology of a Si microwire arrays was characterized by field-emission scanning electron microscopy (FE-SEM, Hitachi S-4800). Optical reflection measurements were performed over 300~1100 nm wavelengths using a UV-Vis/NIR spectrophotometer (Cary 5000, Agilent) in which a 60 mm integrating sphere (Labsphere) is equipped to account for total light (diffuse and specular) reflected from the samples. The total reflection by the microwire arrays sample was reduced from 20 % to 10 % of the incident light over the visible region when the length of the microwire was increased from $10{\mu}m$ to $30{\mu}m$.

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써픽스 배열 합병을 이용한 일반화된 써픽스 배열의 효율적인 구축 알고리즘 (Efficient Construction of Generalized Suffix Arrays by Merging Suffix Arrays)

  • 전정은;박희진;김동규
    • 한국정보과학회논문지:시스템및이론
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    • 제32권6호
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    • pp.268-278
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    • 2005
  • 본 논문에서는 A와 B의 써픽스 배열이 주어졌을 때 두 배열을 합병하여 이들의 일반화된 써픽스 배열을 구축하는 방법을 연구하였다. 흘수 써픽스와 짝수 써픽스같이 특별한 경우의 두 써픽스를 합병하는 알고리즘은 이미 발표되었지만, A와 』가 임의의 문자열인 일반적인 경우 두 써픽스 배열을 합병하는 효율적인 알고리즘은 아직 개발되지 않았다. 따라서 현재까지는 A와 B의 써픽스 배열을 합병하기 위해서 A와 B의 써픽스 배열이 이미 주어져 있음에도 불구하고 A$\#$B$\$$라는 문자열에 대한 써픽스 배열을 다시 구축해야했다. 본 논문에서는 상수 문자집합이나 정수 문자집합에서 정의된 임의의 두 문자열 A와 B에 대한 써픽스 배열을 합병하는 효율적인 알고리즘을 제시한다. 실험결과 상수문자집합의 경우 A$\#$B$\$$에대한 써픽스 배열을 다시 구축하는 것보다 합병하는 것이 5배 정도 빨랐다. 여기서 제시한 알고리즘은 써픽스 배열 A에서 스트링 B의 모든 써픽스를 검색하여야 한다. 이를 위해 써픽스 배열에서 정의한 써픽스 링크를 사용하였고, 또 써픽스 링크를 계산하는 효율적인 알고리즘도 개발하였다. 써픽스 링크는 생물정보학에서 사용되는 매칭 통계나 최장 공통 부분 문자열 검색처럼 다른 스트링의 써픽스 배열에서 주어진 스트링의 모든 써픽스를 찾는 데 이용할 수 있으므로, 이를 계산하는 효율적인 방법을 제시한 것 역시 많은 의미를 가진다. 실험을 통해 여기서 제시한 방법이 기존 알고리즘 중 가장 빠른 방법보다 3$\~$4배 정도 빠르다는 것을 보였다.

UV 나노 엠보싱 공정을 이용한 고종횡비 고분자 나노 섬모 어레이 제작 (Manufacture of High-Aspect-Ratio Polymer Nano-Hair Arrays by UV Nano Embossing Process)

  • 김동성;이현섭;이정현;이건홍;권태헌
    • 대한기계학회논문집A
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    • 제30권7호
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    • pp.773-778
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    • 2006
  • High-aspect-ratio nano-hair or nano-pillar arrays have great potential in a variety of applications. In this study, we present a simple and cost-effective replication method of high-aspect-ratio polymer nano-hair arrays. Highly ordered nano-porous AAO (anodic aluminum oxide) template was utilized as a reusable nano-mold insert. The AAO nano-mold insert fabricated by the two-step anodization process in this study had close- packed straight nano-pores, which enabled us to replicate densely arranged nano-hairs. The diameter, depth and pore spacing of the nano-pores in the fabricated AAO nano-mold insert were about 200nm, $1{\mu}m$ and 450nm, respectively. For the replication of polymer nano-hair arrays, a UV nano embossing process was applied as a mass production method. The UV nano embossing machine was developed by our group for the purpose of replicating nano-structures by means of non-transparent nano-mold inserts. Densely arranged high-aspect-ratio nano-hair arrays have been successfully manufactured by means of the UV nano embossing process with the AAO nano-mold insert under the optimum processing condition.

유전박막이 도포된 나노원뿔 패턴된 단결정 Si 기판의 광특성 (Optical Characteristics of Nanocone-patterned c-Si Wafers Coated with Dielectric Thin Films)

  • 김은아;박지민;고은지;김동욱
    • Current Photovoltaic Research
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    • 제5권2호
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    • pp.55-58
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    • 2017
  • We investigated the influences of dielectric thin film coating on the optical characteristics of c-Si wafers with nanocone (NC) arrays using finite-difference time-domain (FDTD) simulations. Dielectric thin films on high-refractive-index surface can lower optical reflection and reflection dips appear at the wavelengths where destructive interference occurs. The optical reflection of the NC arrays was lower than that of the dielectric-coated planar wafer in broad wavelength range. Remarkable antireflection effects of the NC array could be attributed to beneficial roles of the NCs, including the graded refractive index, multiple reflection, diffraction, and Mie resonance. Dielectric thin films modified the optical reflection spectra of the NC arrays, which could not be explained by the interference alone. The optical properties of the dielectric-coated NC arrays were determined by the inherent optical characteristics of the NC arrays.

MARCINKIEWICZ-TYPE LAW OF LARGE NUMBERS FOR DOUBLE ARRAYS

  • Hong, Dug-Hun;Volodin, Andrei I.
    • 대한수학회지
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    • 제36권6호
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    • pp.1133-1143
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    • 1999
  • Chaterji strengthened version of a theorem for martin-gales which is a generalization of a theorem of Marcinkiewicz proving that if $X_n$ is a sequence of independent, identically distributed random variables with $E{\mid}X_n{\mid}^p\;<\;{\infty}$, 0 < P < 2 and $EX_1\;=\;1{\leq}\;p\;<\;2$ then $n^{-1/p}{\sum^n}_{i=1}X_i\;\rightarrow\;0$ a,s, and in $L^p$. In this paper, we probe a version of law of large numbers for double arrays. If ${X_{ij}}$ is a double sequence of random variables with $E{\mid}X_{11}\mid^log^+\mid X_{11}\mid^p\;<\infty$, 0 < P <2, then $lim_{m{\vee}n{\rightarrow}\infty}\frac{{\sum^m}_{i=1}{\sum^n}_{j=1}(X_{ij-a_{ij}}}{(mn)^\frac{1}{p}}\;=0$ a.s. and in $L^p$, where $a_{ij}$ = 0 if 0 < p < 1, and $a_{ij}\;=\;E[X_{ij}\midF_[ij}]$ if $1{\leq}p{\leq}2$, which is a generalization of Etemadi's marcinkiewicz-type SLLN for double arrays. this also generalize earlier results of Smythe, and Gut for double arrays of i.i.d. r.v's.

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액체금속로 중간열교환기 관다발에서의 튜브배열과 경사각도가 압력강하에 미치는 영향 (The Effects of Tube Arrangement and Inclination on the Pressure Drop in Tube Bundles of Intermediate Beat Exchanger in Liquid Meta Reactor)

  • 남호윤;김종만;최종현
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2002년도 학술대회지
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    • pp.659-662
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    • 2002
  • The present paper presents the experimental results for pressure drop in inclined tube bundles located in a rectangular duct. Measurements are made for pressure drop in triangular and rotated triangular tube arrays having P/d ratio of 1.6 and inclination angles of 30,45,60 and 90 degrees. The Reynolds number based on the free stream velocity and tube diameter ranges from $8{\times}10^2\;to\;6.3{\times}10^{4}$. The experimental results show that the magnitude of dimensionless pressure drop decreases significantly when the inclined angle is less than 45 degree. The measured data are compared with two existing correlations available in the literatures. The ESDU correlation agrees well with the present data far the triangular arrays. But some discrepancies are observed for the rotated triangular arrays when the inclined angles are 30 and 45 degrees. The Idel'chik correlation generally agrees well with the measured data for the rotated triangular arrays except for the inclined angle of 30 degree. The Idel'chik correlation needs modification for the triangular arrays. The modified Idel'chik correlation agrees well with the measured data within $10{\%}$. It is found that the present measured data can be applied to the evaluation and modification of previous correlations.

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3D Image Correlator using Computational Integral Imaging Reconstruction Based on Modified Convolution Property of Periodic Functions

  • Jang, Jae-Young;Shin, Donghak;Lee, Byung-Gook;Hong, Suk-Pyo;Kim, Eun-Soo
    • Journal of the Optical Society of Korea
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    • 제18권4호
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    • pp.388-394
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    • 2014
  • In this paper, we propose a three-dimensional (3D) image correlator by use of computational integral imaging reconstruction based on the modified convolution property of periodic functions (CPPF) for recognition of partially occluded objects. In the proposed correlator, elemental images of the reference and target objects are picked up by a lenslet array, and subsequently are transformed to a sub-image array which contains different perspectives according to the viewing direction. The modified version of the CPPF is applied to the sub-images. This enables us to produce the plane sub-image arrays without the magnification and superimposition processes used in the conventional methods. With the modified CPPF and the sub-image arrays, we reconstruct the reference and target plane sub-image arrays according to the reconstruction plane. 3D object recognition is performed through cross-correlations between the reference and the target plane sub-image arrays. To show the feasibility of the proposed method, some preliminary experiments on the target objects are carried out and the results are presented. Experimental results reveal that the use of plane sub-image arrays enables us to improve the correlation performance, compared to the conventional method using the computational integral imaging reconstruction algorithm.

Acoustic Sources Localization in 3D Using Multiple Spherical Arrays

  • Wang, Fangzhou;Pan, Xi
    • Journal of Electrical Engineering and Technology
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    • 제11권3호
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    • pp.759-768
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    • 2016
  • Direction of arrival (DOA) estimation of multiple sources using sensor arrays has been widely studied in the last few decades, particularly, the spherical harmonic analysis utilizing a spherical array. Both the number of sensors on the aperture and size of the sphere can affect the estimation accuracy dramatically. However, those two factors are conflicted to each other in a single spherical array. In this paper, a multiple spherical arrays structure is proposed to provide an alternative design to the traditional single spherical array for the spherical harmonic decomposition, to obtain better localization performance. The new structure consists of several identical spheres in a given area, and the microphones are placed identically on each sphere. The spherical harmonic analysis algorithm using the new multiple array structure for the problem of multiple acoustic sources localization is presented. Simulation results show that the multiple spherical arrays can provide a more accurate direction of arrival (DOA) estimation for the multiple sources than that of a single spherical array, distinguish several adjacent sources more efficiently, and reduce the number of microphones on each sphere without decreasing its’ estimation accuracy.