• 한국레이저가공학회지
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• 제17권2호
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• pp.5-10
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• 2014

Aluminum has been widely used in the electric applications because of light metals. When mechanical element is periodically moving with contacting other surfaces, the anodizing process for aluminum is useful for avoiding the abrasive damage. The anodized element has quietly different characteristics with respect to the distribution of hardness and crystal structure. In this work, the laser drilling of anodized surface is studied experimentally. Fusion drilling method - laser drilling with inert gas blowing - is used. The effect of various process parameters (gas pressure, laser power, focus position) is investigated with respect to the hole size and circularity.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 추계학술대회 논문집
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• pp.507-512
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• 2000

The ob.jective of this study is to determine fracture behaviors(penetrati0n modes) and resistance to penetration duringballistic impact of Al 5052-H34 alloy laminates and anodized Al 5052-H34 alloy laminates. Resistance to penetration is determined by $V_{50}$ ballistic limit, a statical velocity with 50% probability for complete penetration, test method. Fracture behaviors and ballistic tolerance, described by penetration modes, are respectfully observed that result from V50 test and Projectile Through Plates (PTP) test at velocities greater than $V_{50}$. PTP tests were conducted with 0" obliquity at room temperature using 5.56mm ball projectile. $V_{50}$ tests with 0" obliquity at room temperature were conducted with projectiles that were able to achieve near or complete penetration during PTP tests. Surface Hardness, resistance to penetration, and penetration modes of A1 5052-H34 alloy laminates compared to those of anodized Al 5052-H34 alloy laminates.y laminates.

• Korean Chemical Engineering Research
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• 제46권5호
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• pp.852-857
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• 2008

광촉매의 고정화는 광촉매의 이용범위를 넓히기 위해서 매우 중요한 기술이다. 광촉매를 고정화시키기 위해 티타늄 표면을 양극산화 시켜 $TiO_2$로 전환시킬 수 있다. 양극산화에 의해 제조된 $TiO_2$는 광촉매 활성을 가지고 있으며 표면은 스펀지와 비슷한 형태를 나타내었다. 다양한 초기농도, 습도, 방전전압 하에서 양극산화에 의해 티타니아를 제조 이를 이용하여 기상의 아세트알데히드와 VOC의 광촉매 분해반응을 연구하였다. 양극산화 티타니아의 반응성은 상대습도가 증가함에 따라 증가하였으나 너무 높은 습도는 반응성을 감소시켰다. 광촉매 반응과 전기 방전을 결합시키면 VOC 제거효율이 크게 증가 되었으나, 과도한 전압을 가하여 코로나 방전이 발생되면 반응속도가 오히려 감소되었다. 최적 상대습도는 40%였으며 최적 방전전압은 암방전 영역인 5 kV였다.

• Corrosion Science and Technology
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• 제20권2호
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• pp.85-93
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• 2021

The corrosion damage of materials in marine environment mainly occurs by Cl^- ions due to the breakdown of passive films. Additionally, various characteristics in seawater such as salinity, temperature, immersion time, flow rate, and biological activity also affect corrosion characteristics. In this study, the corrosion characteristics of stainless steels (STS 304 and STS 316L) and anodized aluminum alloys (AA 3003 and AA 6063) were evaluated with seawater temperature parameters. A potentiodynamic polarization experiment was conducted in a potential range of -0.25 V to 2.0 V at open circuit potential (OCP). Corrosion current density and corrosion potential were obtained through the Tafel extrapolation method to analyze changes in corrosion rate due to temperature. Corrosion behavior was evaluated by measuring weight loss before/after the experiment and also observing surface morphology through a scanning electronic microscope (SEM) and 3D microscopy. Weight loss, maximum damage depth and pitting damage increased as seawater temperature increased, and furthermore, the tendency of higher corrosion current density with an increase of temperature attributed to an increase in corrosion rate. There was lower pitting damage and lower corrosion current density for anodized aluminum alloys than for stainless steels as the temperature increased.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.143-143
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• 2009

본 연구에서는 Ti 합금에 Nb과 Zr을 첨가하여 Ti-29Nb-xZr(x : 3, 5, 7, 10, 15 wt %) 3원계 합금을 제조하고 Zr의 함량과 전압 그리고 용액의 농도를 다르게 하여 양극산화 시킨 후 합금의 표면을 관찰하고 특성을 조사하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.219-219
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• 2009

In this study, electrochemical impedance characteristics of anodic oxide layer formed on titanium ternary alloy surface have been investigated, Titanium oxide layers were grown on Ti-29Nb-xZr(x=3, 5, 7, 10 and 15 wt%) alloy substrates using phosphoric acid electrolytes.

• Journal of Periodontal and Implant Science
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• 제33권3호
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• pp.499-518
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• 2003

The surface characteristics of titanium have been shown to have an important role in contact ossseointegration around the implant. Anodizing at high voltage produces microporous structure and increases thickness of surface titanium dioxide layer. The aim of present study was to analyse the response of rat calvarial osteoblast cell to commercially pure titanium and Ti-6A1-4V anodized in 0.06 mol/l ${\beta}$-glycerophosphate and 0.03 mol/l sodium acetate. In this study, rat calvarial osteoblasts were used to assay for cell viability and cell proliferation on the implant surface at 1,2,4,7 days. 1. Surface roughness was 1.256${\mu}m$ at 200V, and 1.745${\mu}m$ at 300V. 2. The thickness of titanium oxide layer was increased 1 ${\mu}m$ with the increase of 50V. 3. The proliferation rate of osteoblastic cells was increased with the increase of the surface roughness and the thickness of titanium oxide layer. 4. There was no difference in cell viability and cell proliferation between commercially pure titanium and Ti-6A1-4V anodized at the same condition. In conclusion, the titanium surface modified by anodizing was biocompatible, produced enhanced osteoblastic response. The reasons of enhanced osteoblast response might be due to reduced metal ion release by thickened and stabilized titanium dioxide layer and microporous rough structures.

• Corrosion Science and Technology
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• 제8권4호
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• pp.143-147
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• 2009

In biomedical implants and dental fields, titanium has been widely utilized for excellent corrosion resistance and biocompatibility. However, Ti and its alloys are nonbioactive after being implanted in bone. In this study, for the purpose of improvement in biocompatibility the anodic $TiO_2$ layer on Ti-xNb alloys were fabricated by electrochemical method in phosphate solution, and the effect of Nb content on the pore size, the morphology and crystallinity of Ti oxide layer formed by the anodic oxidation method was investigated. The Ti containing Nb up to 3 wt%, 20 wt% and 40 wt% were melted by using a vacuum furnace. The sample were cut, polished, and homogenized for 24 hr at $1050^{\circ}C$ for surface roughness test and anodizing. Titanium anodic layer was formed on the specimen surface in an electrolytic solution of 1 M phosphoric acid at constant current densities ($30mA/cm^2$) by anodizing method. Microstructural morphology, crystallinity, composition, and surface roughness of oxide layer were observed by FE-SEM, XRD, EDS, and roughness tester, respectively. The structure of alloy was changed from $\alpha$-phase to $\beta$-phase with increase of Nb content. From XRD results, the structure of $TiO_2$ formed on the Ti-xNb surface was anatase, and no peaks of $Nb_2O_5$ or other Nb oxide were detected suggesting that Nb atoms are dispersed in $TiO_2$-based solid solution. Surface roughness test and SEM results, pore size formed on surface and surface roughness decreased as Nb content increased. From the line analysis results, intensity of Ti peak was high in the center of pore, whereas, intensity of O peak was high in the outside of pore center.

• 한국재료학회지
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• 제23권11호
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• pp.661-665
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• 2013

We investigated the characteristics of electroless plated Cu films on screen printed Ag/Anodized Al substrate. Cu plating was attempted using neutral electroless plating processes to minimize damage of the anodized Al substrate; this method used sodium hypophosphite instead of formaldehyde as a reducing agent. The basic electroless solution consisted of $CuSO_4{\cdot}5H_2O$ as the main metal source, $NaH_2PO_2{\cdot}H_2O$ as the reducing agent, $C_6H_5Na_3O_7{\cdot}2H_2O$ and $NH_4Cl$ as the complex agents, and $NiSO_4{\cdot}6H_2O$ as the catalyser for the oxidation of the reducing agent, dissolved in deionized water. The pH of the Cu plating solutions was adjusted using $NH_4OH$. According to the variation of pH in the range of 6.5~8, the electroless plated Cu films were coated on screen printed Ag pattern/anodized Al/Al at $70^{\circ}C$. We investigated the surface morphology change of the Cu films using FE-SEM (Field Emission Scanning Electron Microscopy). The chemical composition of the Cu film was determined using XPS (X-ray Photoelectron Spectroscopy). The crystal structures of the Cu films were investigated using XRD (X-ray Diffraction). Using electroless plating at pH 7, the structures of the plated Cu-rich films were typical fcc-Cu; however, a slight Ni component was co-deposited. Finally, we found that the formation of Cu film plated selectively on PCB without any lithography is possible using a neutral electroless plating process.

• 한국자기학회지
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• 제17권2호
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• pp.90-94
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• 2007

유연하고 얇은 0.025 mm와 0.2 mm의 두께를 지닌 알루미늄 포일을 사용하여 다공성 알루미나 막을 제작하였다. 알루미늄 포일들은 에탄올/과염소산 용액에서 전해연마하여 표면처리를 하였으며, 0.3 M의 옥살산 용액 안에서 양극산화 시켰다. 양극산학 시용액의 온도는 $9^{\circ}C$로 유지시켰으며, 전극에 가해주는 전압을 0.4와 40 V 사이에서 변화시킨 후, 형성된 알루미나 막의 표면을 주사전자현미경으로 관찰하였다. 관찰 결과, 장시간의 양극 산화 시 사용되는 전압의 크기가 1 V 이상일 경우 강한 전기분해 반응으로 인해 생성된 산화막 표면이 파괴되어 있음을 확인할 수 있었다. 반면 1 V 이하로 처리할 경우, 장시간에 걸쳐 안정적으로 양극산화시킬 수 있음을 알 수 있었다. 이 실험을 통해 얇은 알루미늄 포일의 경우 두꺼운 알루미늄 판과 달리 장시간의 양극산화를 통해 다공성 알루미나 막을 형성하기 위해선 1 V 이하의 낮은 전압이 요구되는 것을 확인할 수 있었다.