• Corrosion Science and Technology
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• v.4 no.6
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• pp.217-221
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• 2005

In the present investigation, holographic interferometry was utilized for the first time to monitor in situ the thickness of the oxide film of aluminium samples during anodization processes in boric acid solutions. The anodization process (oxidation) of the aluminium samples was carried out by the technique of the electrochemical impedance spectroscopy(EIS), in different concentrations of boric acid (0.5-5.0% $H_3BO_3$) at room temperature. In the mean time, the real-time holographic interferometry was used to measure the thickness of anodized (oxide) film of the aluminium samples in solutions. Consequently, holographic interferometry is found very useful for surface finish industries especially for monitoring the early stage of anodization processes of metals, in which the thickness of the anodized film of the aluminium samples can be determined without any physical contact. In addition, measurements of electrochemical values such as the alternating current (A.C) impedance(Z), the double layer capacitance($C_{dl}$), and the polarization resistance(Rp) of anodized films of aluminium samples in boric acid solutions were made by the electrochemical impedance spectroscopy(EIS). Attempts to measure electrochemical values of Z, Cdl, and Rp were not possible by holographic interferometry in boric acid especially in low concentrations of the acid. This is because of the high rate of evolutions of interferometric fringes during the anodization process of the aluminium samples in boric acid, which made measurements of Z, Cdl, and Rp are difficult.

• Corrosion Science and Technology
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• v.21 no.6
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• pp.487-494
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• 2022

Anodizing is a typical electrochemical surface treatment method that can improve the corrosion and insulating properties of aluminum alloys. The anodization process can obtain a dense structure. It can be used to artificially grow the thickness of an anodization film. Aluminum 3003 alloy used in this study is the most commonly used alloy for batteries due to its high strength and excellent formability as well as its weldability and corrosion resistance. Aluminum 3003 alloy was anodized at 0 ℃ with 0.3 M oxalic acid at 20 V, 40 V, or 60 V for 1 hour, 6 hours, or 12 hours. As a result of analyzing the composition of each specimen with an Energy Dispersive Spectrometer (EDS), aluminum was converted into an oxide film. The thickness of the formed anodization film increased when the applied voltage and anodization time increased. High corrosion potential values and low corrosion current density values were observed for the thickest oxide layer. The anodization film formed by anodization acted as a protective layer. The electrical resistance increased as the applied voltage and anodization time increased.

• Corrosion Science and Technology
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• v.5 no.4
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• pp.137-140
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• 2006

The effect of pre-existing barrier-type film on porous aluminum oxide film formation during anodization was investigated to control the uniform film growth rate. Initial potential fluctuations during anodization indicated that the breakdown of barrier-film is preceded before the porous formation and the induction time for the porous film growth increases with the increases of pre-existing film thickness. The porous film growth mechanism is lot affected by the presence of barrier film on aluminum surface. In parallel, uniform growth of barrier film underneath the porous structure was attained by two-step anodization processes.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.33-33
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• 2010

Recently, a self-organizing process that occurs during the anodization of aluminum in acidic electrolytes has attracted a vast amount of research attentions, coupled with the ever-increasing demand for the development of effective, inexpensive and technologically simple methods for the synthesis of low-dimensional nanostructures over a macroscopic area overcoming many of the drawbacks of conventional lithographic techniques. In this presentation, recent progress in the fabrication of ordered nanoporous anodic aluminum oxide (AAO), including conventional anodization techniques, newly developed pulse anodization, hard anodization processes, and generic approaches to three-dimensional pore structures with periodically modulated diameters. Discussion will also cover the applications of AAO for the development of structurally well-defined extended arrays of low-dimensional nanostructures, such as nanodots, nanotubes, and nanowires, which could be model systems in investigating a diverse range of research problems in chemistry and physics and also be starting materials in realizing advanced electronic devices.

• Korean Journal of Materials Research
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• v.14 no.9
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• pp.664-669
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• 2004

Anodic aluminum oxide (AAO) with pores of various diameter, density, and thickness values was obtained through control of the anodization parameters including voltage, temperature, pore widening time, anodization time, etc. The pore diameter was controlled by a pore widening in an etchant, and alumina templates having stepped nano-channels were fabricated by repetition of anodization and pore widening processes. Stepped carbon nanotubes (CNTs) were then grown on the stepped AAO templates by pyrolysis of acetylene without using the catalyst. High-resolution transmission electron microscopy images revealed that CNTs have a multi-wall structure made of graphite flakes of several nm sizes. The current-voltage characteristic of the sloped and linear CNTs were also examined.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.53-53
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• 2003

There has been increasing interest in the fabrication of nano-sized structures because of their various advantages and applications. Anodic Aluminum Oxide (AAO) is one of the most successful methods to obtain highly ordered nano pores and channels. Also It can be obtained diverse pore diameter, density and depth through the control of anodization condition. The three types of substrates were used for anodization; sheets of Aluminum on Si wafer and Aluminum on Mo-coated Si wafer. In Aluminum sheet, a highly ordered array of nanoholes was formed by the two step anodization in 0.3M oxalic acid solutions at 10$^{\circ}C$ After the anodization, the remained aluminum was removed in a saturated HgCl$_2$ solution. Subsequently, the barrier layer at the pore bottom was opened by chemical etching in phosphoric acid. Finally, we can obtain the through-channel membrane. In these processes, the effect of various parameters such as anodizing voltage, anodizing time, pore widening time and pre-heat treatment are characterized by FE-SEM (HITACH-4700). The pore size. density and growth rate of membrane are depended on the anodizing voltage and temperature respectively. The pore size is proportional to applied voltage and pore widening time The pore density can be controlled by anodizing temperature and voltage.

• Journal of the Korean institute of surface engineering
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• v.52 no.6
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• pp.298-305
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• 2019

We investigated a correlation between morphology and photoelectrochemical properties of TiO₂ nanotubes fabricated by well-controlled anodization processes. Anodization in an ethylene-glycol-based electrolyte solution accelerated the rapid grow rate of TiO₂ nanotubes, but also cause problems such as delamination at the interface between TiO₂ nanotubes and a Ti substrate, and debris on the top of the nanotube. The applied voltages for the anodization of TiO₂ were adjusted to avoid the interface delamination. The heat treatment and the anodizing time were also controlled to enhance the crystallinity of the as-prepared TiO₂ nanotubes and to increase the surface area with the varied length of the anodized TiO₂ nanotubes. Additionally, a 2-step anodization process was utilized to remove the debris on the tube top. The photoelectrochemical properties of TiO₂ nanotubes prepared with the carefully tailored conditions were investigated. By removing the debris on TiO₂ nanotubes, applied bias photon-to-current efficiency (ABPE) of TiO₂ nanotubes increased up to 0.33%.

• Journal of Institute of Control, Robotics and Systems
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• v.14 no.5
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• pp.420-425
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• 2008

PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.

• Journal of the Korean Vacuum Society
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• v.12 no.1
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• pp.40-45
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• 2003

High quality $Ta_2O_5$ thin films have been obtained from the anodization of deposited tantalum (Ta). The as-deposited amorphous films of 750 $\AA$ thickness have excellent electrical properties. These properties include refractive indices 2.1~2.2 dielectric constants ~25, and leakage currents $10^{-8}$ /A$\textrm{cm}^{-2}$ at 1 MV$\textrm{cm}^{-1}$. We fabricated a MIM element with the $Ta_2O_5$ films. They have perfect current-voltage symmetry characteristics. A high performance MIM device was formed by newly developed processes based on our unique anodization and annealing treatment. The effects of various processing conditions (top-electrode metals, annealing conditions) on the MIM device performances will be extensively discussed throughout this work.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.1573-1575
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• 2004

An alumina membrane with nano-sized pores was fabricated by anodic oxidation. The shape and structure of the pore on alumina membrane were changed according to the roughness of aluminum surface. The shape and structure of the nano-sized pre were investigated according to purity of aluminum substrate for the anodization process. The aluminum substrates with 99.5% and 99.999% purities were used. The aluminum substrate(99.5%) was anodized after the processes of pressing, mechanical polishing, chemical polishing, and electrochemical polishing. The nano-sized pores with the pore size of 50 - 100nm, the cell size of 20-50nm and the thickness of $10{\mu}m{\sim}45{\mu}m$ were obtained. Even though the electrochemical polishing was used for the aluminum substrate (99.999%), the same characteristics as the aluminum substrate (99.5%) was obtained. The alumina membrane prepared by anodization for 5 min using fixed voltage method shows the pore with irregular shape. The pore shape was changed to regular shape after pore widening process.