• 제목/요약/키워드: Annealing atmosphere

검색결과 419건 처리시간 0.025초

다양한 열처리 조건에 따른 SBT 박막의 전기적 특성 (Electric Properties of SBT Thin Films with various Annealing Conditions)

  • 조춘남;김진사;오용철;신철기;박건호;최운식;김충혁;홍진웅;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.589-592
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    • 2002
  • The $Sr_{0.7}Bi_{2.3}Ta_2O_9$(SBT) thin films are deposited on Pt-coated electrode(Pt/TiO2/SiO2/Si) using RF magnetron sputtering method. The structural and electric properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealing atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grains largely grew in oxygen annealing atmosphere. The maximum remanent polarization and the coercive electric field in oxygen annealing atmosphere are $12.40{\mu}C/cm^2$ and 48kV/cm respectively. The dielectric constant and leakage current density annealing in oxygen atmosphere are 340 and $6.81{\times}10^{-10}A/cm^2$ respectively. The fatigue characteristics of SBT capacitors did not change up to $10^{10}$ switching cycles.

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다양한 열처리 분위기에 따른 SBT 커패시터의 누설전류 특성 (Leakage Current Properties of SBT Capacitors with various Annealing Atmosphere)

  • 조춘남;오용철;김진사;신철기;최운식;김충혁;홍진웅;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 제5회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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    • pp.77-81
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    • 2003
  • The $Sr_{0.7}Bi_{2.6}Ta_2O_9$(SBT) thin films are deposited on Pt-coated electrode(Pt/$TiO_2/SiO_2$/Si) using RF magnetron sputtering method. The structural and electrical properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealed atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grains largely grew in oxygen annealing atmosphere. The dielectric constant and leakage current density of capacitors annealed oxygen atmosphere are 340 and $2.13{\times}10^{-9}[A/cm^2]$ respectively.

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다양한 열처리 분위기에 따른 SBT 커패시터의 전기적 특성 (Electrical Properties of SBT Capacitors with various Annealing Atmosphere)

  • 조춘남;김진사;신철기;최운식;김충혁;홍진웅;이준웅
    • 한국전기전자재료학회논문지
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    • 제16권3호
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    • pp.207-213
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    • 2003
  • The Sr$\_$0.7/Bi$\_$2.6/Ta$_2$O$\_$9/(SBT) thin films are deposited on Pt-coated electrode(Pt/TiO$_2$/SiO$_2$/Si) using RF magnetron sputtering method. The structural and electrical properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealed atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grain largely grew in oxygen annealing atmosphere. The maximum remnant polarization and the coercive electric field in oxygen annealing atmosphere are 12.40[${\mu}$C/cm$^2$] and 30[kV/cm] respectively. The dielectric constant and leakage current density of capacitors annealed oxygen atmosphere are 340 and 2.13${\times}$10$\^$-9/ [A/cm$^2$] respectively. The fatigue characteristics of SBT capacitors did not change up to 10$\^$10/ switching cycles.

다양한 열처리 분위기에 따른 SBT 커패시터의 강유전체 특성 (Ferroelectrical Properties of SBT Capacitors with various Annealing Atmosphere)

  • 조춘남;오용철;김진사;최운식;김충혁;박용필;홍진웅;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 제5회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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    • pp.72-76
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    • 2003
  • The $Sr_{0.7}Bi_{2.6}Ta_2O_9$(SBT) thin films are deposited on Pt-coated electrode(Pt/$TiO_2/SiO_2$/Si) using RF magnetron sputtering method. The structural and electrical properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealed atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grains largely grew in oxygen annealing atmosphere. The maximum remanent polarization and the coercive electric field in oxygen annealing atmosphere are $12.40[{\mu}C/cm^2]$ and 30[kV/cm] respectively. The fatigue characteristics of SBT capacitors did not change up to $10^{10}$ switching cycles.

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플라즈마 용사된 부분안정화 지르코니아 코팅의 상온 마모거동에 미치는 열처리온도 및 분위기의 영향 (The Effects of the Annealing Temperature and Environments on Room Temperature Wear Behavior of Plasma-Sprayed Partially Stabilized Zirconia Coatings)

  • 김장엽;임대순
    • 한국세라믹학회지
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    • 제31권10호
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    • pp.1176-1180
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    • 1994
  • The sliding wear behavior of the plasma-sprayed zirconia containing 3 mol% yttria was investigated after the annealing at room temperature to 80$0^{\circ}C$ in various concentrations of humid atmosphere as laboratory, humid, dry argon atmosphere. Both of the friction coefficient and the wear loss increased with increasing temperature up to 80$0^{\circ}C$. Surface morphology of the worn samples changed with annealing temperature. The change of monoclinic/tetragonal (m/t) x-ray peak intensity ratio effected the wear behavior. The m/t ratio had maximum value at 20$0^{\circ}C$ and decreased with increased temperature in laboratory and humid atmosphere. In argon atmosphere the m/t ratio had no maximum value and decreased with increasing temperature. At all the annealing temperature humid atmosphere had more the m/t ratio value than any other atmosphere. The change of toughness was showed the inversed result of m/t ratio change. The results indicated that the resudial stress which was induced by the different amount of phase transformation takes a detrimental role in wear behavior.

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인바재료의 기계적 성질에 미치는 풀림 열처리의 영향 (The Effects of the Annealing Heat Treatments on the Mechanical Properties of the Invar Materials)

  • 원시태
    • 한국정밀공학회지
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    • 제18권1호
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    • pp.129-138
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    • 2001
  • This study examined the effects of the annealing heat treatments on the mechanical properties of the Invar(Fe-36%Ni Alloy) materials. Invar materials were annealed at various temperatures range 900~120$0^{\circ}C$ in vacuum(10-4Torr) and hydrogen atmospheres. And annealing conditions were changed by cooling rate and holding time at 110$0^{\circ}C$. The grain size of rolled Invar materials was very fine but those of annealed Invar materials at 900~120$0^{\circ}C$ in vacuum and hydrogen atmosphere increased with increasing annealing temperature. The micro-vickers hardness values of annealed Invar materials were decreased about 15% that of the rolled Invar materials, regardless of the various of annealing temperatures, atmosphere(vacuum, hydrogen) and annealing conditions. The tensile strength and yield strength of annealed Invar materials at 900~120$0^{\circ}C$ in vacuum and hydrogen atmosphere were decreased 10.0~14.4% and 34.6~39.1% those of the rolled Invar materials, respectively. The strength ratio(tensile strength/ yield strength) of annealed Invar materials was improved to 1.7~1.8 from the value of 1.2~1.3 of rolled Invar materials. The degree of spring back of annealed Invar materials was about 50% of the rolled Invar materials, regardless of the various of annealing temperatures, atmosphere(vacuum, hydrogen) and annealing conditions.

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Annelaing Effects on the Dielectric Properties of the (Ba, Sr) $TiO_3$Films on $RuO_2$Bottom Electrodes

  • Park, Young-Chul;Lee, Joon;Lee, Byung-Soo
    • The Korean Journal of Ceramics
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    • 제3권4호
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    • pp.274-278
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    • 1997
  • (Ba, Sr) TiO$_3$(BST) thin films were prepared on RuO$_2$/Si substrates by rf magnetron sputtering and annealing was followed at temperatures ranging from 550 to 80$0^{\circ}C$ in $N_2$or $O_2$atmosphere. The effects of annealing conditions on the properties of BST film deposited on RuO$_2$bottom electrodes were investigated. It was found that the crystallinity. surface roughness, and grain size of BST films vary with the annealing temperature but they are not dependent upon the annealing atmosphere. The flat region in the current-voltage (I-V) curves of BST capacitors shortened with increasing annealing temperature under both atmospheres. This is believed to be due to the lowering of potential barrier caused by unstable interface and the increase of charge The shortening of the flat region by $O_2$annealing was more severe than that by $N_2$-annealing. As a result, there was no flat region when the films were annealed at 700 and 80$0^{\circ}C$ in $O_2$atmosphere. The dielectric properties of BST films were improved by annealing in either atmosphere. however, a degradation with frequency was observed when the films were annealed at relatively high temperature under $O_2$atmosphere.

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IGZO 박막 증착 후 진공과 대기 중에서 열처리한 후 결합구조와 전기적인 특성의 비교 (Comparison between the Electrical Properties and Structures after Atmosphere Annealing and Vacuum Annealing of IGZO Thin Films)

  • 안용덕;연제호;오데레사
    • 산업진흥연구
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    • 제1권1호
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    • pp.7-11
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    • 2016
  • IGZO의 접합특성을 조사하기 위해서 진공 중에서와 대기 중에서 열처리를 하여, 전지적인 특성을 조사하였다. 진공 중에서 열처리를 한 IGZO는 비정질특성을 나타내었지만 대기 중에서 열처리를 하면 결정질 특성을 가졌다. 열처하는 방법에 따라서 산소공공의 함량이 달라지기 때문이다. 대기 중에서 열처리를 하면 IGZO의 산소공공이 증가하였다. 산소공공은 전류를 증가시키고 따라서 대기 중에서 열처리를 한 IGZO는 오믹 접합을 나타내었다. 그러나 진공 중에서 열처리를 한 IGZO는 쇼키접합을 나타냈다.

BPSG막의 Flow 특성 (Flow Characteristics of the BPSG Film)

  • 홍성현;이종무;송성해
    • 한국세라믹학회지
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    • 제26권3호
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    • pp.381-389
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    • 1989
  • Effects of annealing temperature, time, and atmospehre on the flow characteristics of Atmospheric Pressure Chemical Vapor Deposition-borophosphosilicate glass were investigated. Stable step coverage can be obtained by annealing the BPSG film at 90$0^{\circ}C$ for 30 minutes in N2 atmosphere, but further heat treatment isnot effective. Flow characteristics of the BPSG film was better in steam atmosphere than in N2 atmosphere, and the factors which cause it were analyzed. The concentration of boron in the BPSG film was measured pretty accurately by FTIR spectrum. Boron content in the BPSG film was reduced by annealing treatment. The decrement of boron was greater in steam atmosphere than in the N2 atmosphere. Also it was found from the FTIR spectroscopic analysis that PH3 inhibited the oxidation of B2H6.

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$YMnO_3$ 강유전 박막의 열처리 분위기가 결정화거동과 전기적 특성에 미치는 영향 (Effects of Annealing Atmosphere on Crystallization and Electrical Properties in $YMnO_3$ Ferroelectric Thin Films)

  • 윤귀영;김정석;천채일
    • 한국세라믹학회지
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    • 제37권2호
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    • pp.168-173
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    • 2000
  • YMnO3 thin films were prepared on Pt/Ti/SiO2/Si substrate by chemical solution deposition method. The films were crystallized by heat-treatment at 85$0^{\circ}C$ for 1 hour. Effects of an annealing atmosphere(O2, Ar, vacuum) on the crystallization behavior and electridcal properties were investigated. YMnO3 thin films annealed under Ar atmosphere showed a superior crystallinity and a very strong c-aix preferred-orientation which was a polar axis. Leakage current density of the films decreased with lowering oxygen partial pressure of the annealing atmosphere. C-V and P-E ferroelectric hysteresis were observed only in the thin film heat-treated under Ar atmosphere.In order to prepare YMnO3 thin films having both low leakage current and ferroelectricity, the annealing atmsphere should be kept under a proper oxygen partial pressure which was about 1 Pa in this work. Leakage current density at 1 volt, dielectric constant($\varepsilon$r), remanent polarization(Pr), and coercive field(Ec) were 1.7$\times$10-8 A/$\textrm{cm}^2$, 25, 1.08$\mu$C/$\textrm{cm}^2$, and 100 kV/cm, respectively.

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