Remote plasma etching of amorphous silicon using pin to plate dielectric barrier discharge (Pin to Plate Dielectric Barrier Dischrge 방식의 Romote 대기압 플라지므라르 이용한 비정질 Si 식각)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2006.10a
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- pp.31-32
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- 2006