• Title/Summary/Keyword: Amorphous Carbon

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Field Electron Emission from Amorphous Carbon Thin Film Grown Using Rf Magnetron Sputtering Method (RF 마그네트론 스퍼터링법으로 성장된 Amorphous carbon 각막의 전계전자방출)

  • ;;K. Oura
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.3
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    • pp.234-240
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    • 2001
  • Using RF magnetron sputtering, amorphous carbon(a-C) thin films as electron filed emitter were fabricated. these a-C thin films were deposited on Si(001) substrate at several temperatures. The field electron emission property of these a-C thin films was estimated by a diode technique. As the result, we observed that the field emission properties of the films were changed singnificantly with the substrate temperature and structural features of a-C film. The field emission properties were promoted by higher substrate temperatures. Furthermore N-doped a-C film exhibits more field emission property than that of undoped a-C film. These results are explained as change of surface morphology and structural properties of a-C film.

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Fabrication of amorphous carbon thin film using laser ablation technique (레이저 층착법에 의한 비정질 탄소계 박막의 제작)

  • ;;;K. Oura
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.484-487
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    • 2001
  • Amorphous carbon thin films were deposited using laser ablation technique on Si(100) substrates at different temperatures. In this study, effects of the substrate temperature on the properties of amorphous carbon films were systematically investigated. The surface morphologic and structural properties of the films were studied by scanning electron microscopy (SEM) and raman spectroscope, respectively. With increasing of the substrate temperature, the surface morphologies were changed singnificantly. Moreover the intensity ratio of D-band and G-band and the full width at half maximum of these bands were dependent on substrate temperatures.

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Electrical Properties of Organic Materials as Low Dielectric Constant Materials

  • Oh Teresa;Kim Hong Bae;Kwon Hak Yong;Son Jae Gu
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2005.05a
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    • pp.67-72
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    • 2005
  • The bonding structure of organic materials such as fluorinated amorphous carbon films was classified into two types due to the chemical shifts. The electrical properties of fluorinated amorphous carbon films also showed very different effect of two types notwithstanding a very little difference. Fluorinated amorphous carbon films with the cross-link breakage structure existed large leakage current resulting from effect of the electron tunneling. Increasing the cation due to the electron-deficient group increased the barrier height of the films with the cross-link amorphous structure, therefore the electric characteristic of the final materials with low dielectric constant was also improved. The lowest dielectric constant is 2.3 at the sample with the cross-link amorphous structure.

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Hydrophobic and Mechanical Characteristics of Hydrogenated Amorphous Carbon Films Synthesized by Linear Ar/CH4 Microwave Plasma

  • Han, Moon-Ki;Kim, Taehwan;Cha, Ju-Hong;Kim, Dong-Hyun;Lee, Hae June;Lee, Ho-Jun
    • Applied Science and Convergence Technology
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    • v.26 no.2
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    • pp.34-41
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    • 2017
  • A 2.45 GHz microwave plasma with linear antenna has been prepared for hydrophobic and wear-resistible surface coating of carbon steel. Wear-resistible properties are required for the surface protection of cutting tools and achieved by depositing a hydrogenated amorphous carbon film on steel surface through linear microwave plasma source that has $TE_{10}-TEM$ waveguide. Compared to the existing RF plasma source driven by 13.56 MHz, linear microwave plasma source can easily generate high density plasma and provide faster deposition rate and wider process windows. In this study, $Ar/CH_4$ gas mixtures are used for hydrogenated amorphous carbon film deposition. When microwave power of 1000 W is applied, 40 cm long uniform $Ar/CH_4$ plasma could be obtained in gas pressure of 200~400 mTorr. The Vickers hardness measurement of hydrogenated amorphous carbon film on steel surface was evaluated. It was found the optimized deposition condition at $Ar:CH_4=25:25$ sccm, 300 mTorr with microwave power of 1000W and RF bias power of 100W. By deposition of hydrogenated amorphous carbon film, contact angle on steel surfaces increases from $43.9^{\circ}$ to $93.2^{\circ}$.

Fabrication of amorphous carbon thin film using laser ablation technique (레이저 증착법에 의한 비정질 탄소계 박막의 제작)

  • Ryu, Jeong-Tak;Kim, Yeon-Bo;Cho, Kyung-Jae;Oura, K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.484-487
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    • 2001
  • Amorphous carbon thin films were deposited using laser ablation technique on Si(100) substrates at different temperatures. In this study, effects of the substrate temperature on the properties of amorphous carbor, films were systematically investigated. The surface morphologic and structural properties of the films were studied by scanning electron microscopy (SEM) and raman spectroscope, respectively. With increasing of the substrate temperature, the surface morphologies were changed significantly. Moreover the intensity ratio of D-band and G-band and the full width at half maximum of these bands were dependent on substrate temperatures.

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Carbon-Silica Membrane for Gas Separation (탄소-실리카막을 이용한 기체분리)

  • Lee, Young-Moo;Park, Ho-Bum
    • Proceedings of the Membrane Society of Korea Conference
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    • 2004.03a
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    • pp.77-102
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    • 2004
  • Carbon materials obtained from organic polymers are usually amorphous structure. The structure of carbon materials is not nearly as well defined as that of zeolite. Carbon are amorphous materials with comparatively wide pore size distribution as compared to the crystalline zeolites with monodisperse ultramicropore and micropore dimensions. (omitted)

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Effect of Specific Surface Area on the Reaction of Silicon Monoxide with Porous Carbon Fiber Composites

  • Park, Min-Jin;Lee, Jae-Chun
    • The Korean Journal of Ceramics
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    • v.4 no.3
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    • pp.245-248
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    • 1998
  • Porous carbon fiber composites (CFCs) having variable specific surface area ranging 35~1150 $\m^2$/g were reacted to produce silicon carbide fiber composites with SiO vapor generated from a mixture of Si and $SiO_2$ at 1673 K for 2 h under vacuum. Part of SiO vapor generated during conversion process condensed on to the converted fiber surface as amorphous silica. Chemical analysis of the converted CFCs resulting from reaction showed that the products contained 27~90% silicon carbide, 7~18% amorphous silica and 3~63% unreacted carbon, and the composition depended on the specific carbide, 7~18% amorphous silica and 3~63% unreacted carbon, and the composition depended on the specific surface area of CFCs. CFC of higher specific surface area yielded higher degree of conversion of carbon to silicon and conversion products of lower mechanical strength due to occurrence of cracks in the converted caron fiber. As the conversion of carbon to silicon carbide proceeded, pore size of converted CFCs increased as a result of growth of silicon carbide crystallites, which is also linked to the crack formation in the converted fiber.

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Deposition of Diamond Film by Hydrogen-oxyacetylen Combustion Flame

  • Ko, Chan-Kyoo;Park, Dong-Wha
    • The Korean Journal of Ceramics
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    • v.4 no.1
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    • pp.1-4
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    • 1998
  • Diamond film was deposited on Mo substrate at atmospheric pressure using combustion flame apparatus with the addition of H2. At a temperature above 100$0^{\circ}C$, parts of the film were converted into graphites and these were etched by hydrogen atoms. With increasing $C_2H_2/O_2$ ratio, the nucleation density of the film increased. But the greater part of the film was formed with cauliflower-shaped amorphous carbon. These amorphous carbn were crystallized etching amorphous carbon.

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The Effect of Hydrogen on the Tribological Properties of Hydrogenated Amorphous Carbon Films

  • Shin, Jong-Han;Lim, Dae-Soon
    • The Korean Journal of Ceramics
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    • v.3 no.2
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    • pp.96-100
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    • 1997
  • Hydrogenated amorphous carbon films were deposited on silicon substrates by using an RF PECVD. The hydrogen/methane ratio was varied from 50% to 88% to study the effect of hytdrogen in the film on the tribological properties. The friction and wear behaviors of the deposited films were investigated by ball-on-disk type wear tester. FT-IR spectra were used to characterize the structure of the films. Tribological properties of carbon films were correlated with their structure such as ratio of "polymer-like" stretching type and that of sp2 bonding. The result showed that the annealing caused a decrease in the amount of wear of contacted $Si_3N_4$ balls and a increase in the coefficient of friction. Possible explanation for annealing effect was discussed by the hydrogen desorption.esorption.

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