• Journal of Information Display
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• v.2 no.3
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• pp.78-85
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• 2001

The growth of carbon nanotubes(CNTs) in anodic aluminum oxide(AAO) template and their application to a field emitter are described. AAO templates were fabricated by anodizing bulk aluminum and sputtered thin Al film on Nb-coated Si wafers. After Co catalyst had been electrochemically deposited into the bottom of the pores in AAO template, CNTs were grown by pyrolyzing $C_2H_2$. Depending on the reaction conditions, CNTs grew up to or over the top of the pores in AAO template with different structures. The morphology and structure of CNTs were observed with a scanning electron microscope and a transmission electron microscope. The diameter of CNTs strongly depended on the size of the pores in AAO template and the growing conditions. The electron field emission measurement of the samples resulted in the turn-on field of 1.9-2.2 $V/{\mu}m$ and the field enhancement factor of 2450-5200. The observation of high field enhancement factors is explained in terms of low field screening effect.

• Membrane Journal
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• v.19 no.1
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• pp.19-24
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• 2009

Sol-gel process is relatively simple, easy to use, cheap to install, and results in thin coating layers with superior physical and gas barrier properties. Films coated by the sol-gel process can be used as insulating films or packaging films for foods, chemicals, drugs, and beverages, etc. In this study, alumina sol was synthesized from aluminum isopropoxide and silane coupling agent was added to make coating solutions. In addition, biaxially oriented polypropylene (BOPP) was coated using several alumina sol solutions and their oxygen permeabilities were measured. The experimental results indicate that in the best case, the oxygen permeability of coated film was reduced by 85% compared to that of pure BOPP.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.195-195
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• 2010

In recent years, Anodic aluminum oxide(AAO) has become popular and attractive materials. It can be easily fabricated and self-organized pore structures. It has been widely used as a biosensor membrane, photonic crystal for optical circuit and template for nanotube growth etc. In previous papers, the theory was developed that AAO shows anisotropic optical properties, since it has anisotropic structure with numerous cylindrical pores. It gives rise to the anisotropy of the refractive index called as birefringence. It can be used as conventional polarizing elements with high efficiency and low cost. Therefore, we would like to compare the theory and experimental results in this study. One method which can measure effective refractive index of thin film is the prism coupling technique. It can give accurate results fast and simply. Furthermore, we can also measure separately the refractive index with different polarization using polarization of the laser (TE mode and TM mode). We calculated the effective refractive index with effective medium approximations (EMAs) by pore size in the SEM image. EMAs are physical models that describe the macroscopic system as the homogeneous and typical method of all mean field theories.

• Journal of the Korean Vacuum Society
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• v.15 no.1
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• pp.64-72
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• 2006

We demonstrated organic light-emitting devices (OLEDs) based on the organic thin-film materials such as tris-(8-hydroxyquinoline) aluminum $(Alq_3)$. The structure of OLEDs was vacuum deposited upon transparent and thin glass substrates pre-coated with a transparent, conducting indium tin oxide thin film. The luminance characteristics, current, capacitance, and dispersion factor for degraded OLEDs, which were made by various bias currents $(0.5mA\;{\leq}\;I_{Bias}\;{\leq}9mA)$, are studied. The current dependences of lifetime were divided at approximately 2mA, and they represented nearly linear behaviors but had different slopes in a logarithmic plot of lifetime versus bias current. With lighting OLEDs, the anomaly of capacitance, as shown in the CV curve, occurred because of two factors, polarization in the bulk of organic materials and the interface between the metal and organic layers. In decayed OLEDs that had lower bias currents of less than 2mA, it was found that the degradation of luminance was related to both the decrease of polarization and to the lowering of the injection barrier.

• Journal of the Microelectronics and Packaging Society
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• v.10 no.1
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• pp.1-5
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• 2003

The multi-layered OELDs(organic electroluminescent devices) were prepared on the patterened ITO (indium tin oxide)/glass substrates by the vacuum thermal evaporation method. The $Alq_3$ (tris-(8-hydroxyquinoline)aluminum) low molecule compound was used as the light emission layer. TPD(triphenyl-diamine) and $\alpha-NPD$ were used as the hole transport layer. CuPc (Copper phthalocyanine) was also used as the hole injection layers. In addition, QD2 (quinacridone2) organic material with $10\AA$ thickness was deposited in the $Alq_3$ emission layer to improve the luminance efficiency. The threshold voltage was about 7V for all devices. The luminance and efficiency of devices was improved by substitution the $\alpha-NPD$ for TPD as the hole as the hole transport layer. The luminance efficiency of the OELD sample with QD2 thin film in the $Alq_3$ emission layer was found to be 1.55 lm/W, which is about 8 times larger value compared to the sample without QD2 thin layer.

• Journal of the Semiconductor & Display Technology
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• v.12 no.3
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• pp.41-46
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• 2013

Efficient and inexpensive solar cells are necessary for photo-voltaic to be widely adopted for mainstream electricity generation. For this to occur, the recombination losses of charge carriers (i.e. electrons or holes) must be minimized using a surface passivation technique suitable for manufacturing. Recently it has been shown that aluminum oxide thin films are negatively charged dielectrics that provide excellent surface passivation of silicon solar cells to attract positive-charged holes. Especially aluminum oxide thin film is a quite suitable passivation on the rear side of p-type silicon solar cells. This paper, it demonstrate the interfacial microstructure and electrical properties of mono-crystalline silicon surface passivated by $Al_2O_3$ films during firing process as applied for screen-printed solar cells. The first task is a comparison of the interfacial microstructure and chemical bonds of PECVD $Al_2O_3$ and of PEALD $Al_2O_3$ films for the surface passivation of silicon. The second is to study electrical properties of double-stacked layers of PEALD $Al_2O_3$/PECVD SiN films after firing process in the temperature range of $650{\sim}950^{\circ}C$.

• Korean Chemical Engineering Research
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• v.57 no.4
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• pp.519-524
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• 2019

Even though stainless steel foil is not a highly efficient material for film-type solar cell, it has strong passivation capability without additional process. In this study, silicone resin was employed during a-Si:H thin film solar cell fabrication for the purpose of planarization and electrical insulation. In the first stage of process, silicone resin was coat onto the stainless steel (STS) using spin coater with thickness of $2{\sim}3{\mu}m$ and followed by aluminum deposition using ion beam application. Unexpectedly buckling was formed during aluminum deposition process. After subsequent fabrication processes, solar cell performance was evaluated. In voltage-current data, slight increase of cell performance was obtained and interpreted by the increase of light scattering.

• Journal of the Korean Vacuum Society
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• v.18 no.5
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• pp.377-383
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• 2009

Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire substrate by using radio-frequency magnetron sputtering and were performed in the temperature range of $600-900^{\circ}C$ by rapid thermal annealing (RTA). The crystallographic structure and the surface morphology were investigated by using X-ray diffraction and scanning electron microscopy, respectively. The crystallinity of the films was improved with increasing the annealing temperature and the average size of crystalline grains was found to be 50 nm. All the thin films showed an average transmittance of 92% in the wavelength range of 400-1100 nm. As the annealing temperature was increased, the bandgap energy was decreased and the violet photoluminescence (PL) signal at 400 nm replaced the ultraviolet PL signal. The electrical properties of the thin films showed a significant dependence on the annealing temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.25-28
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• 1999

Metal ferroelectric semiconductor Field Effect- Transistors(MFSFET) with various gate electrodes, that are aluminum, platinum and poly -Si, using LiNbO$_3$/Si(100) structures were fabricated and the properties of the FETs have been discussed. The drain current of the state of FET with Pt electrode was more than 3 orders of magnitude larger than the state current at the same gate voltage of 1.5 V, 7.rich means the memory operation of the MFSFET. A write voltage as low as about $\pm$4 V, which is applicable to low power integrated circuits, was used for polarization reversal. The retention properties of the FET using Al electrode were quite good up to about 10$^3$s and using Pt electrode remained almost the same value of its initial value over 2 days at room temperature.

• Polymer(Korea)
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• v.33 no.1
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• pp.79-83
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• 2009

Thin electric insulation layers were coated on aluminum plates and aluminum condenser cases by plasma polymerization of HMDSO+$O_2$. Electric resistances of the films were higher than 1.0 M$\Omega$ if they are thicker than 0.5 ${\mu}m$ independently of the type of films but their surface morphologies and adhesion strengths were dependent on the process conditions. Deposition rate and adhesion strength of the films were dependent on $O_2$/HMDSO flow ratio and discharge power. The best result was obtained at $O_2$/HMDSO flow ratio of 4 and discharge power of 60 W. Adhesion strength could also be highly improved if aluminum was pre-treated in boiling water for 30 min through the formation of Al-O-Si bonding between the film and the aluminum surface. The coated films showed excellent chemical and thermal resistances.