• Title/Summary/Keyword: Aluminum Oxide

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Orthodontic bracket bonding to glazed full-contour zirconia

  • Kwak, Ji-Young;Jung, Hyo-Kyung;Choi, Il-Kyung;Kwon, Tae-Yub
    • Restorative Dentistry and Endodontics
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    • v.41 no.2
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    • pp.106-113
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    • 2016
  • Objectives: This study evaluated the effects of different surface conditioning methods on the bond strength of orthodontic brackets to glazed full-zirconia surfaces. Materials and Methods: Glazed zirconia (except for the control, Zirkonzahn Prettau) disc surfaces were pre-treated: PO (control), polishing; BR, bur roughening; PP, cleaning with a prophy cup and pumice; HF, hydrofluoric acid etching; AA, air abrasion with aluminum oxide; CJ, CoJet-Sand. The surfaces were examined using profilometry, scanning electron microscopy, and electron dispersive spectroscopy. A zirconia primer (Z-Prime Plus, Z) or a silane primer (Monobond-S, S) was then applied to the surfaces, yielding 7 groups (PO-Z, BR-Z, PP-S, HF-S, AA-S, AA-Z, and CJ-S). Metal bracket-bonded specimens were stored in water for 24 hr at $37^{\circ}C$, and thermocycled for 1,000 cycles. Their bond strengths were measured using the wire loop method (n = 10). Results: Except for BR, the surface pre-treatments failed to expose the zirconia substructure. A significant difference in bond strengths was found between AA-Z ($4.60{\pm}1.08MPa$) and all other groups ($13.38{\pm}2.57-15.78{\pm}2.39MPa$, p < 0.05). For AA-Z, most of the adhesive remained on the bracket. Conclusions: For bracket bonding to glazed zirconia, a simple application of silane to the cleaned surface is recommended. A zirconia primer should be used only when the zirconia substructure is definitely exposed.

Lifetime analysis of organic light-emitting diodes in ITO/Buffer $layer/TPD/Alq_3/LiAl$ structure (유기 발광소자 ITO/Buffer $layer/TPD/Alq_3/LiAl$ 구조에서의 수명 분석)

  • Chung, Dong-Hoe;Choi, Woon-Shik;Park, Kwon-Hwa;Lee, Joon-Ung;Kim, Jin-Chol;Kim, Tae-Wan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.158-161
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    • 2004
  • We have studied a lifetime in organic light-emitting diodes depending on buffer layer. A transparent electrode of indium-tin-oxide(ITO) was used as an anode. And the cathode for electron injection was LiAl. Phthalocyanine Copper(CuPc), Poly(3,4-ethylenedioxythiophene):poly (PEDOT:PSS), or poly (9-vinylcarbazole)(PVK) material was used as a buffer layer. A thermal evaporation was performed to make a thickness of 40nm of TPD layer at a rate of $0.5{\sim}1\;{\AA}/s$ at a base pressure of $5{\times}10^{-6}\;torr$. A material of tris(8-hydroxyquinolinate) Aluminum($Alq_3$) was used as an electron transport and emissive layer. A thermal evaporation of $Alq_3$ was done at a deposition rate of $0.7{\sim}0.8[{\AA}/s]$ at a base pressure of $5{\times}10^{-6}\;torr$. By varying the buffer material, hole injection at the interface could be controlled because of the change in work function. Devices with CuPc and PEDOT:PSS buffer layer are superior to the other PVK buffer layer.

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Effect of Al2O3 Surface Passivation by Thermal Oxidation of Aluminum for AlGaN/GaN Structure (Al의 열산화 방법을 이용한 AlGaN/GaN 구조의 표면 Al2O3 패시베이션 효과)

  • Kim, Jeong-Jin;Ahn, Ho-Kyun;Bae, Seong-Bum;Pak, Young-Rak;Lim, Jong-Won;Moon, Jae-Kyung;Ko, Sang-Chun;Shim, Kyu-Hwan;Yang, Jeon-Wook
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.11
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    • pp.862-866
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    • 2012
  • Surface passivation of AlGaN/GaN heterojunction structure was examined through the thermal oxidation of evaporated Al. The Al-oxide passivation increased channel conductance of two dimensional electron gas (2DEG) on the AlGaN/GaN interface. The sheet resistance of 463 ohm/${\Box}$ for 2DEG channel before $Al_2O_3$ passivation was decreased to 417 ohm/${\Box}$ after passivation. The oxidation of Al induces tensile stress to the AlGaN/GaN structure and the stress seemed to enhance the sheet carrier density of the 2DEG channel. In addition, the $Al_2O_3$ films formed by thermal oxidation of Al suppressed thermal deterioration by the high temperature annealing.

Change in Electrical Properties of Al2O3/GaN MIS Structures according to the Thickness of Al2O3 Thin Film and Annealing Temperature (산화알루미늄 박막의 두께 및 열처리 온도에 따른 Al2O3/GaN MIS 구조의 전기적 특성 변화)

  • Kwak, No-Won;Lee, Woo-Seok;Kim, Ka-Lam;Kim, Hyun-Jun;Kim, Kwang-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.6
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    • pp.470-475
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    • 2009
  • We deposited $Al_2O_3$ thin films on GaN by remote plasma atomic layer deposition (RPALD) technique, trimethylaluminum(TMA) and oxygen were used as precursors, at fixed process condition, the number of cycle were changed. Growth rate per cycle was $1.2\;{\AA}$/cycle. and Growth rate was in proportion to a number of cycle, the GaN MIS capacitors that $Al_2O_3$ thin film were deposited above 12 nm, have excellent electrical properties, a low electrical leakage current density(${\sim}10^{-10}\;A/cm^2$ at 1.5 MV), but below 12 nm, we can see the degradation of the leakage current density. After post deposition annealing, Dielectric constant was estimated by 1 MHz high-frequency C-V method, it was varied with the anealing temperature from 6.9 at no post anealed to 7.6 at $800^{\circ}C$, and we can see a improvement of the leakage current density and breakdown voltage by post deposition anealing below $700^{\circ}C$, but, after anealed at $800^{\circ}C$, we can see the degradation of the leakage current density and breakdown voltage.

Types & Characteristics of Chemical Substances used in the LCD Panel Manufacturing Process (LCD 제조공정에서 사용되는 화학물질의 종류 및 특성)

  • Park, Seung-Hyun;Park, Hae Dong;Ro, Jiwon
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.29 no.3
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    • pp.310-321
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    • 2019
  • Objectives: The purpose of this study was to investigate types and characteristics of chemical substances used in LCD(Liquid crystal display) panel manufacturing process. Methods: The LCD panel manufacturing process is divided into the fabrication(fab) process and module process. The use of chemical substances by process was investigated at four fab processes and two module processes at two domestic TFT-LCD(Thin film transistor-Liquid crystal display) panel manufacturing sites. Results: LCD panels are manufactured through various unit processes such as sputtering, chemical vapor deposition(CVD), etching, and photolithography, and a range of chemicals are used in each process. Metal target materials including copper, aluminum, and indium tin oxide are used in the sputtering process, and gaseous materials such as phosphine, silane, and chlorine are used in CVD and dry etching processes. Inorganic acids such as hydrofluoric acid, nitric acid and sulfuric acid are used in wet etching process, and photoresist and developer are used in photolithography process. Chemical substances for the alignment of liquid crystal, such as polyimides, liquid crystals, and sealants are used in a liquid crystal process. Adhesives and hardeners for adhesion of driver IC and printed circuit board(PCB) to the LCD panel are used in the module process. Conclusions: LCD panels are produced through dozens of unit processes using various types of chemical substances in clean room facilities. Hazardous substances such as organic solvents, reactive gases, irritants, and toxic substances are used in the manufacturing processes, but periodic workplace monitoring applies only to certain chemical substances by law. Therefore, efforts should be made to minimize worker exposure to chemical substances used in LCD panel manufacturing process.

Preparation and Properties of EPDM/Zinc Methacrylate Hybrid Composites (에틸렌 프로필렌 디엔 고무/메타크릴산아연 하이브리드 복합체의 제조와 물성에 관한 연구)

  • Chang, Young-Wook;Won, Jong-Hoon;Joo, Hyun-Seok
    • Elastomers and Composites
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    • v.40 no.1
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    • pp.59-65
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    • 2005
  • Zinc methacrylate(ZMA) was incorporated into ethylene-propylene diene rubber(EPDM) by direct mixing of the metal salt with the rubber or was in-situ prepared in the rubber matrix through neutralization reaction of zinc oxide(ZnO) and methacrylic acid(MAA). Tensile and tear tests showed that ZMA had a great reinforcing effect for the EPDM. It was also found that ZMA reinforced EPDM vulcanizates can retain their mechanical properties under thermo-oxidative aging. Moreover the incorporation of ZMA induces a substantial improvement in the adhesive strength of the EPDM onto aluminum substrate. The reinforcing effect and an enhancement in adhesion was greatly manifested when the ZMA is in-situ formed with an excess amount of ZnO. The extraordinary improvement in the properties is supposed to be related with the formation of ionic crosslink as well as the degree of dispersion or ZMA domain in the rubber matrix.

Preparation and Microwave Absorption Properties of the Fe/TiO2/Al2O3 Composites

  • Li, Yun;Cheng, Haifeng;Wang, Nannan;Zhou, Shen;Xie, Dongjin;Li, Tingting
    • Nano
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    • v.13 no.11
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    • pp.1850125.1-1850125.12
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    • 2018
  • To reduce the imbalance of impedance matching between the magnetic metal nanowires and free space, $Fe/TiO_2$ core/shell nanowire arrays with different diameters were fabricated in the templates of anodic aluminum oxide membranes by electrodeposition. The influences of the microstructure on the microwave absorption properties of the $Fe/TiO_2/Al_2O_3$ composites were studied by the transmission/reflection waveguide method. It was demonstrated experimentally that both the interfacial polarization and the diameter of the $Fe/TiO_2$ core/shell nanowires have critical effects on the microwave absorption properties. We also investigated the angle dependence of the microwave absorption properties. Due to the interfacial polarization and associated relaxation, the $Fe/TiO_2/Al_2O_3$ composites exhibited optimal microwave absorption properties when microwave propagation direction was accordant with the axis of the nanowires. Finally, we managed to obtain an optimal reflection loss of below -10 dB (90% absorption) over 10.2-14.8 GHz, with a thickness of 3.0 mm and the minimum value of -39.4 dB at 11.7 GHz.

Low-Temperature Sintering Behavior of Aluminum Nitride Ceramics with Added Copper Oxide or Copper

  • Hwang, Jin-Geun;Oh, Kyung-Sik;Chung, Tai-Joo;Kim, Tae-Heui;Paek, Yeong-Kyeun
    • Journal of the Korean Ceramic Society
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    • v.56 no.1
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    • pp.104-110
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    • 2019
  • The low-temperature sintering behavior of AlN was investigated through a conventional method. $CaF_2$, CuO and Cu were selected as additives based on their low melting points. When sintered at $1600^{\circ}C$ for 8 h in $N_2$ atmosphere, a sample density > 98% was obtained. The X-ray data indicated that eutectic reactions below $1200^{\circ}C$ were found. Therefore, the current systems have lower liquid formation temperatures than other systems. The liquid phase showed high dihedral angles at triple grain junctions, indicating that the liquid had poor wettability on the grain surfaces. Eventually, the liquid was likely to vaporize due to the unfavorable wetting condition. As a result, a microstructure with clean grain boundaries was obtained, resulting in higher contiguity between grains. From EDS analysis, oxygen impurity seems to be well removed in AlN lattice. Therefore, it is believed that the current systems are beneficial for reducing sintering temperature and improving oxygen removal.

Physical characteristics of ceramic/glass-polymer based CAD/CAM materials: Effect of finishing and polishing techniques

  • Ekici, Mugem Asli;Egilmez, Ferhan;Cekic-Nagas, Isil;Ergun, Gulfem
    • The Journal of Advanced Prosthodontics
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    • v.11 no.2
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    • pp.128-137
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    • 2019
  • PURPOSE. The aim of this study was to compare the effect of different finishing and polishing techniques on water absorption, water solubility, and microhardness of ceramic or glass-polymer based computer-aided design and computer-aided manufacturing (CAD/CAM) materials following thermocycling. MATERIALS AND METHODS. 150 disc-shaped specimens were prepared from three different hybrid materials and divided into five subgroups according to the applied surface polishing techniques. All specimens were subjected up to #4000 grit SiC paper grinding. No additional polishing has been done to the control group (Group I). Other polishing procedures were as follows: Group II: two-stage diamond impregnated polishing discs; Group III: yellow colored rubber based silicone discs; Group IV: diamond polishing paste; and Group V: Aluminum oxide polishing discs. Subsequently, 5000-cycles of thermocycling were applied. The analyses were conducted after 24 hours, 7 days, and 30 days of water immersion. Water absorption and water solubility results were analyzed by two-way ANOVA and Tukey post-hoc tests. Besides, microhardness data were compared by Kruskal-Wallis and MannWhitney U tests (P<.05). RESULTS. Surface polishing procedures had significant effects on water absorption and solubility and surface microhardness of resin ceramics (P<.05). Group IV exhibited the lowest water absorption and the highest microhardness values (P<.05). Immersion periods had no effect on the microhardness of hybrid ceramic materials (P>.05). CONCLUSION. Surface finishing and polishing procedures might negatively affect physical properties of hybrid ceramic materials. Nevertheless, immersion periods do not affect the microhardness of the materials. Final polishing by using diamond polishing paste can be recommended for all CAD/CAM materials.

Micro-shear bond strengths of resin-matrix ceramics subjected to different surface conditioning strategies with or without coupling agent application

  • Gunal-Abduljalil, Burcu;Onoral, Ozay;Ongun, Salim
    • The Journal of Advanced Prosthodontics
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    • v.13 no.3
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    • pp.180-190
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    • 2021
  • Purpose. This study aimed to assess the influence of various micromechanical surface conditioning (MSC) strategies with or without coupling agent (silane) application on the micro-shear bond strength (µSBS) of resin- matrix ceramics (RMCs). Materials and Methods. GC Cerasmart (GC), Lava Ultimate (LU), Vita Enamic (VE), Voco Grandio (VG), and Brilliant Crios (BC) were cut into 1.0-mm-thick slices (n = 32 per RMC) and separated into four groups according to the MSC strategy applied: control-no conditioning (C), air-borne particle abrasion with aluminum oxide particles (APA), 2W- and 3W-Er,Cr:YSGG group coding is missing. The specimens in each group were further separated into silane-applied and silane-free subgroups. Each specimen received two resin cement microtubules (n = 8 per subgroup). A shear force was applied to the adhesive interface through a universal test machine and µSBS values were measured. Data were statistically analyzed by using 3-way ANOVA and Tukey HSD test. Failure patterns were scrutinized under stereomicroscope. Results. RMC material type, MSC strategy, and silanization influenced the µSBS values (P<.05). In comparison to the control group, µSBS values increased after all other MSC strategies (P<.05) while the differences among these strategies were insignificant (P>.05). For control and APA, there were insignificant differences between RMCs (P>.05). The silanization decreased µSBS values of RMCs except for VE. Considerable declines were observed in GC and BC (P<.05). Conclusion. MSC strategies can enhance bond strength values at the RMC - cement interface. However, the choice of MSC strategy is dependent on RMC material type and each RMC can require a dedicated way of conditioning.