• 제목/요약/키워드: Alignment Pattern

검색결과 180건 처리시간 0.03초

Brewster Angle Microscope를 이용한 액정 배향막 연구 (A Study of Liquid Crystal Alignment Layer Using Brewster Angle Microscope)

  • 정치섭
    • 한국전기전자재료학회논문지
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    • 제12권1호
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    • pp.81-87
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    • 1999
  • The surface morphology of liquid crystal alignment layer has been investigated by using Brewster angle microscope(BAM) for the first time. The samples used in this work for liquid crystal alignment layer were mechanically rubbed polyimide films. The rubbing pattern on this layer has been analyzed with the terms of microgroove and rubbing induced optical birefringence. For the mechanically rubbed surface, the geometrical factors of microgroove play the major role for the formation of rubbing pattern. We propose that the BAM can be used as a powerful tool not only for observing the rubbing pattern, but also for inspecting the surface defects.

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A Pattern Summary System Using BLAST for Sequence Analysis

  • Choi, Han-Suk;Kim, Dong-Wook;Ryu, Tae-W.
    • Genomics & Informatics
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    • 제4권4호
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    • pp.173-181
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    • 2006
  • Pattern finding is one of the important tasks in a protein or DNA sequence analysis. Alignment is the widely used technique for finding patterns in sequence analysis. BLAST (Basic Local Alignment Search Tool) is one of the most popularly used tools in bio-informatics to explore available DNA or protein sequence databases. BLAST may generate a huge output for a large sequence data that contains various sequence patterns. However, BLAST does not provide a tool to summarize and analyze the patterns or matched alignments in the BLAST output file. BLAST lacks of general and robust parsing tools to extract the essential information out from its output. This paper presents a pattern summary system which is a powerful and comprehensive tool for discovering pattern structures in huge amount of sequence data in the BLAST. The pattern summary system can identify clusters of patterns, extract the cluster pattern sequences from the subject database of BLAST, and display the clusters graphically to show the distribution of clusters in the subject database.

Calibration Method for the Panel-type Multi-view Display

  • Kim, Jonghyun;Lee, Chang-Kun;Hong, Jong-Young;Jang, Changwon;Jeong, Youngmo;Yeom, Jiwoon;Lee, Byoungho
    • Journal of the Optical Society of Korea
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    • 제19권5호
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    • pp.477-486
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    • 2015
  • We propose a novel calibration method which can be applied to all kinds of panel-type multi-view displays. We analyze how the angular, the axial, and the lateral misalignment affects the 3D image quality in a panel-type multi-view display. We demonstrate the ray optics simulation with a 3-view slanted parallax barrier system using pentile display for the quantitative calculation. Based on the analysis, we propose a new alignment pattern for all kinds of panel-type multi-view displays. The proposed pattern is sensitive to all of the angular, the axial, and the lateral misalignments. The high spatial frequency images and on and off alignment in the proposed pattern help observers to calibrate the system easily. We theoretically show the generality of the proposed alignment pattern and verify the pattern with image simulations and experiments.

전사 공정을 이용한 산화막 정렬 패턴 제작과 액정 배향 특성 연구 (Parallel pattern fabrication on metal oxide film using transferring process for liquid crystal alignment)

  • 오병윤
    • 전기전자학회논문지
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    • 제23권2호
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    • pp.594-598
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    • 2019
  • HfZnO 박막 위 패턴 전사 기법을 이용하여 기존의 러빙법을 대체하는 배향 공정에 대하여 연구하였다. 정렬 패턴은 레이저 간섭 리소그래피를 이용하여 실리콘 웨이퍼 위에 제작하였다. 졸겔 공정을 이용하여 HfZnO 용액을 제작하였고, 유리기판 위에 스핀코팅하였다. 미리 제작한 정렬패턴을 스핀코팅된 HfZnO 위에 올려놓고, $100^{\circ}C$에서 30분간 소성하였다. HfZnO 박막에 평행한 그루브가 형성되었음을 atomic force microscopy 와 scanning electron microscopy로부터 확인할 수 있었다. HfZnO 박막을 이용하여 액정 셀을 제작하였으며, POM 분석으로부터 액정이 균일하게 정렬되었음을 확인할 수 있었다. 액정은 $0.25^{\circ}$의 프리틸트 각을 가졌으며, 수평배향 특성을 보여주었다. 액정 분자는 평행한 그루브에 의한 HfZnO 박막 표면 이방성에 의하여 균일하게 정렬되었음을 확인할 수 있었다.

임프린팅을 이용한 BiLaO 패터닝과 액정 디스플레이 소자의 응용 (Patterning of BiLaO film using imprinting process for liquid crystal display)

  • 이주환
    • 전기전자학회논문지
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    • 제25권1호
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    • pp.64-68
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    • 2021
  • 정렬 패턴을 전사공정을 이용하여 BiLaO 박막 위에 패터닝하고 소성온도에 따른 액정 배향 특성에 대하여 연구 하였다. 졸겔 공정을 제작한 BiLaO 은 유리 기판 위에 스핀코팅으로 증착한 후 미리 제작된 정렬패턴을 전사하여 100, 150, 200, 250 ℃ 의 온도에서 소성하였다. POM분석으로부터 200℃ 이하의 소성온도에서 액정배향은 균일하지 않았고, 250 ℃의 소성온도에서 균일한 액정 배향 특성을 확인 할 수 있었고, 결정 회절 법 분석으로 부터도 확인 가능하였다. 전사 공정 시 250 ℃의 온도에서 패턴이 전사되었음을 Atomic force microscopy 을 통하여 확인 할 수 있었다. 250 ℃의 온도에서 전사된 정렬 패턴에 의하여 박막의 이방성을 획득 하였고 이방성 박막 위에서 액정 분자들이 고르게 배향 될 수 있었다. 따라서 BiLaO 산화막의 전사에 의한 액정 배향 공정은 소성온도에 영향을 받는다는 것을 확인 할 수 있었다.

3차원 하이브리드 비전 정렬 시스템에 관한 연구 (On the Development of a Spatial Hybrid Visual Alignment System)

  • 황재웅;권상주
    • 반도체디스플레이기술학회지
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    • 제10권4호
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    • pp.79-87
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    • 2011
  • In this paper, suggested is a hybrid-type visual alignment system to align mask and panel in 3-D space, where mask and panel are to be controlled independently by two individual positioning mechanisms in order to compensate for spatial misalignments. In the hybrid visual alignment system, the below 4-PPR parallel mechanism provides in-plain motions to pattern mask like the other conventional alignment systems while the above 4-RPS parallel mechanism is to move glass panel to achieve a complete spatial alignment. For the control of the hybrid alignment system, first, inverse kinematic solutions for the parallel mechanisms are given to determine the driving distance of each active joint, and also an efficient way to determine the spatial alignment error is developed by exploiting three in-plane cameras.

마이크로 패터닝 가공을 위한 공구 정렬에 관한 연구 (Sharp Edge Tool Alignment for Micro Pattern Machining)

  • 박순섭;원종호
    • 한국기계가공학회지
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    • 제8권3호
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    • pp.1-6
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    • 2009
  • This paper presents a geometrical error compensation of tool alignment for sharp edge bite on B axis controlled machine. In precision micro patterning, bite alignment is crucial parameter for machined surface. To decrease bite alignment error, plus tilted bite from B axis center is touched to reference work piece(pin gauge) and checked the deviation from original position. Same process is repeated for maximum touch deviation value. From this touched position value, wheel alignment error in X axis and Z axis can be calculated on B axis center. Experimental results show that this compensation method is efficient to correct sharp edge bite alignment.

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VA 액정 셀의 러빙방향에 따른 패턴 확인 (Pattern Check According To The Rubbing Direction Of The LC VA Cell)

  • 김정하;김학래;송장근
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2015년도 추계학술대회
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    • pp.481-483
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    • 2015
  • LCD의 특성을 이해하기 위해 Vertical Alignment Liquid Crystal Cell을 만들어보고, 전류를 흘려 Cell에 나타나는 pattern을 확인한다. 다양한 rubbing 방향을 주어 완성된 Cell에 나타나는 여러 가지 pattern들을 확인, 비교해보고 그 pattern의 발생 원인에 대해 연구한다. Cell에 전류를 가해주면 line이 나타나는데 가해준 전압과 주파수가 높을수록 line이 많이 나타나는 것을 확인할 수 있었다.

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평판 디스플레이 비전 정렬 시스템의 기구학 및 제어 (Kinematics and Control of a Visual Alignment System for Flat Panel Displays)

  • 권상주;박찬식;이상무
    • 제어로봇시스템학회논문지
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    • 제14권4호
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    • pp.369-375
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    • 2008
  • The kinematics and control problem of a visual alignment system is investigated, which plays a crucial role in the fabrication process of flat panel displays. The first solution is the inverse kinematics of a 4PPR parallel alignment mechanism. It determines the driving distance of each joint to compensate the misalignment between mask and panel. Second, an efficient vision algorithm for fast alignment mark recognition is suggested, where by extracting essential feature points to represent the geometry of a mark, the geometric template matching enables much faster object recognition comparing with the general template matching. Finally, the overall visual alignment process including the kinematic solution, vision algorithm, and joint control is implemented and experimental results are given.

2대의 카메라를 이용한 PCB의 위치 오차 측정 및 보정 (Measurement and Correction of PCB Alignment Error Using Two Cameras)

  • 김천환;신동원
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2000년도 제15차 학술회의논문집
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    • pp.302-302
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    • 2000
  • This paper presents the measurement and correction of PCB alignment errors for PCB-manufacturing machines. The conventional PCB-manufacturing machine doesn't have enough accuracy to accommodate the demand for high-resolution circuit pattern and high-density mounting capacity of electronic chips. It is because of alignment errors of PCB loaded to the PCB-manufacturing machine. Therefore, this study focuses on the development of the system which is able to measure and correct alignment errors whit high-accuracy. An automatic optical inspection part measures the PCB alignment error using two cameras, and the high-accuracy 3-axis stage makes correct of these error. The operating system is run in the environment of Window 98 (or NT). Finally we implemented this system to PCB screen printer and PCB exposure system.

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