• Applied Microscopy
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• v.30 no.3
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• pp.249-254
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• 2000

We investigated the microstructure, electrical property, and magnetic property of Co/Al multilayer after annealing treatment. CoAl was formed during depositing Co/Al multilayer due to the interfacial reaction. After annealing treatment, $Co_2Si$ was formed at the Co/Si interface. The sheet resistance of Co 2 nm/Al 2 nm multilayer have the lowest value and the Rs of multilayer decreased with the increase of annealing temperature due to the formation of $Co_2Si$ phase. The Ms of 2 nm Co/2 nm Al multilayer have the lowest value and the Ms of multilayer increased with the increase of film thickness.

• Journal of the Microelectronics and Packaging Society
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• v.7 no.2
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• pp.37-42
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• 2000

The comparative study of texture of Al/Ti thin films deposited on low-dielectric polymer and $SiO_2$substrates has been investigated. Fifty-nm-thick Ti films and 500-nm-thick Al-1%Si-0.5%Cu (wt%) films were deposited sequentially onto low-k polymers and $SiO_2$by using a DC magnetron sputtering system. The texture of Al thin film was determined using X-ray diffraction (XRD) theta-2theta ($\theta$-2$\theta$) and rocking curve and the microstructure of Al/Ti films on low-k polymer and $SiO_2$substrates was characterized by cross-sectional transmission electron microscopy (TEM). Both the $\theta$-2$\theta$ method and rocking curve measurement suggest that Al/Ti thin films deposited on $SiO_2$have stronger texture than those deposited on low-k polymer. The texture of Al thin films strongly depended on that of Ti films. Cross-sectional TEM revealed that grains of Ti films on $SiO_2$substrates had grown perpendicular to the substrate, while the grains of Ti alms on SiLK substrates were formed randomly. The lower degree of (111) texture of Al thin films on low-k polymer was due to Ti underlayer.

• Journal of the Semiconductor & Display Technology
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• v.16 no.1
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• pp.1-5
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• 2017

Encapsulation of organic based devices is essential issue due to easy deterioration of organic material by water vapor. Thin layer of encapsulation film is required to preserve transparency yet protecting materials in it. Atomic layer deposition(ALD) is a promising solution because of its low temperature deposition and quality of the deposited film. $Al_2O_3$ or $Al_2O_3/TiO_2/Al_2O_3$ multilayer film has shown excellent environmental protection characteristics despite of thin thicknesses of the films. $Al_2O_3/TiO_2/Al_2O_3$ multilayer and 1.5 dyad layer of $Al_2O_3/polymer/Al_2O_3$ deposited by ALD was measured to have water vapor transmittance rate(WVTR) well below the detection limit($5.0{\times}10^{-5}g/m^2day$) of MOCON Aquatran 2 equipment.

• Korean Chemical Engineering Research
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• v.45 no.3
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• pp.215-218
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• 2007

The aim of this study is to test the feasibility of Pt/Al-MCM-41 for the dioxin decomposition reaction. For model reaction, 1,2-dichlorobenzene was decomposed instead of dioxin. $Pt/{\gamma}-Al_2O_3$ was compared with Pt/Al-MCM-41. Al-MCM-41 catlaysts were prepared by post grafting method and the Pt/Al-MCM-41 catalysts with Si/Al = 15, 30 showed higher catalytic activity than $Pt/{\gamma}-Al_2O_3$. Their higher catalytic activities were related with acid amounts. Especially Al-MCM-41 with ion exchanged with $H^+$ enhanced catalytic activity.

• Journal of the Korean Ceramic Society
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• v.34 no.6
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• pp.591-600
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• 1997

Al2O3/Al composites were produced by displacement reaction method, which was carried out by immersing the sintered silica preform, which was prepared from fused silica powder, in molten aluminum. Because the molten aluminum did not penetrate into the silica preform with higher than 20% of porosity when the displacement reaction was accomplished at 100$0^{\circ}C$ for 10 hours in air atmosphere, the optimum range of sintering temperature of silica preform was from 135$0^{\circ}C$ to 140$0^{\circ}C$. The microstructure of this Al2O3/Al composites showed three-dimentionally co-continuous alumina, which provides wear resistance and high stiffness, and aluminium which acts as a toughnening phase. The grain size of the alumina in composites did not change with the particle size of the silica preform. The exact shape of the preform was retained and a net-shaped composite was produced. The representative Al2O3/Al composite prepared in this study showed 3.30mg/㎤ of bulk density, 350-430 MPa of flexural strength, 7.0 MPa.m1/2 of fracture toughness, and good machinability.

• Journal of the Korean Ceramic Society
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• v.38 no.3
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• pp.225-230
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• 2001

저전압용 형광체로 주목받고 있는 SrTiO$_3$:Pr,Al 형광체를 고상반응법으로 제조하였다. 부활성체 Al이 23 mol% 첨가되었을 때 SrTiO$_3$:Pr 형광체는 최대 발광 강도를 보여주었다. 최대 발광 강도를 보인 형광체에 대해 제한시야회절상과 투과전자현미경을 이용하여 SrTiO$_3$:Pr,Al 적색 형광체내 2차상 형성에 대한 연구를 행하였고 또한 에너지 분산 분광 분석을 행하여 SrTiO$_3$:Pr,Al 형광체내 주입된 부활성제 Al의 함량을 결정하였다. 제한시야회절상의 결과에 의하면 SrTiO$_3$:Pr,Al 적색 형광체내에 단사정 SrAl$_2$O$_4$, 삼사정 Ti$_4$O$_{7}$, 육방정 SrAl$_{12}$O$_{19}$가 2차상으로 존재함을 보여 주었다. 에너지 분산 분광 분석 결과 부활성제 Al의 함량 중 일부는 SrTiO$_3$:Pr,Al 적색 형광체 격자에 고용되고 일부 Al은 SrAl$_{12}$O$_{19}$와 SrAl$_2$O$_4$의 2차상을 형성하는데 소모됨을 보여주었다.주었다.

• Journal of the Korean Ceramic Society
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• v.32 no.7
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• pp.809-816
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• 1995

Ti1-xAlxN films were successfully deposited on high speed steel and silicon wafer by plasma-assisted chemical vapor deposition using a TiCl4/AlCl3/N2/Ar/H2 gas mixture. Plasma process enabled N2 gas to nitride AlCl3, which is not possible in sense of thermodynamics. XPS analyses revealed that the deposited layer contained Al-N bond as well as Ti-N bond. Ti1-xAlxN films were polycrystalline and had single phase, B1-NaCl structure of TiN. Interplanar distance, d200, of (200) crystal plane of Ti1-xAlxN was, however, decreased with Al content, x. Al incorporation into TiN caused the grain size to be finer and changed strong (200) preferred orientation of TiN to random oriented microstructure. Those microstructural changes with Al addition resulted in the increase of micro-hardness of Ti1-xAlxN film up to 2800Kg/$\textrm{mm}^2$ compared with 1400Kg/$\textrm{mm}^2$ of TiN.

• Korean Journal of Food Science and Technology
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• v.28 no.5
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• pp.801-805
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• 1996

This study was performed to investigate the effect of serum enzyme activities in rats after administration of aluminum compound. Seventy five male Sprague-Dawley rats were divided into five groups consisting of control, $250\;ppm\;AlCl_3,\;500\;ppm\;AlCl_3,\;250\;ppm\;Al_2(SO_4)_3$ and $500ppm Al_2(SO_4)_3$ groups and kept on the diet for 2 weeks. The weight gain increased from 0.53 to 3.35% in $AlCl_3$ adiministration groups but decreased from 2.82 to 6.16% in $Al_2(SO_4)_3$, administration groups as compared to control group. As compared to control group, activities of lactate dehydrogenase (LDH) and aspartate amino transaminase (AST) in serum increased 29.43 to 57.68% and 0.68 to 9.97% in $AlCl_3$ adiministration groups, and 74.60 to 29.33% and 21.04 to 24.79% in $Al_2(SO_4)_3$ adiministration groups, respectively. However, alanine amino transminase (ALT) decreased from 12.69 to 25.42% in $AlCl_3$ adiministration groups and from 24.32 to 39.62% in $Al_2(SO_4)_3$ administration groups. Cholinesterase activity increased from 28.98 to 12.73% as compared to control group by administration of $AlCl_3$ and decreased from 3.93 to 14.48% by administration of $Al_2(SO_4)_3$.

• Applied Microscopy
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• v.29 no.3
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• pp.323-329
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• 1999

Synthesis of inorganic nanophase particles was performed to verify and understand the binding of non-ferrous metal ions including Al and $UO_2$ to the apoferritin molecules. Reconstituted inorganic particles of Al or $UO_2$ were identified by TEM as discrete electron dense cores encapsulated within the protein shell. The corresponding EDXA spectra confirm the presence of metal ions in the reconstituted ferritin. The Al cores of ferritin has been studied by TEM for the first time. Bimetallic cores with Al/Fe and $UO_2/Al$ were also produced and examined under TEM. Mixed metal cores encapsulated in the protein shell are well formed and its corresponding EDXA spectra also confirm the presence of metal ions in the mineral cores. Therefore, the present study proves that ferritin can be used to synthesize inorganic nanophase particles of Al and $UO_2$.

• Korean Journal of Materials Research
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• v.24 no.5
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• pp.236-242
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• 2014

Fabrication of reaction-bonded $Al_2O_3$ (RBAO) ceramics using Al-Zn-Mg alloy powder was studied in order to improve traditional RBAO ceramic processing using Al powder. The influence on reaction-bonding and microstructure, as well as on physical and mechanical properties, of the particulate characteristics of the $Al_2O_3$-Al alloy powder mixtures after milling, was revealed. Variation of the particulate characteristics of this $Al_2O_3$-Al alloy powder mixture with milling time was reported previously. To start, the $Al_2O_3$-Al alloy powder mixture was milled, reaction-bonded, post-sintered, and characterized. During reaction-bonding of the $Al_2O_3$-Al alloy powder mixture compacts, oxidation of the Al alloy took place in two stages, that is, there was solid- and liquid-state oxidation of the Al alloy. The solid-state oxidation exhibited strong dependence on the density of surface defects on the Al-alloy particles formed during milling. Higher milling efficiency resulted in less participation of the Al alloy in reaction-bonding. This was because of its consumption by chemical reactions during milling, and subsequent powder handling, and could be rather harmful in the case of over-milling. In contrast to very little dependence of oxidation of the Al alloy on its particle size after milling, the relative density, microstructure, and flexural strength were strongly dependent on particle size after milling (i.e., on milling efficiency). The relative density and 4-point flexural strength of the RBAO ceramics in this study were ~98% and ~365 MPa, respectively, after post-sintering at $1,600^{\circ}C$.