• 제목/요약/키워드: AlN thin films

검색결과 337건 처리시간 0.029초

삼중층 구조를 갖는 $(Te_{86}Se_{14})_{50}Bi_{50}$ 박막의 광기록 특성 (Optical Recording Properties of $(Te_{86}Se_{14})_{50}Bi_{50}$ Thin Films with Trilayer Structure)

  • 김병훈;이현용;이영종;정홍배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1988년도 추계학술대회 논문집 학회본부
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    • pp.164-167
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    • 1988
  • This paper reports optical properties and hole formation of a 488nm-optimumed trilayer structure utiluzed Te-based thin films as a recording layer, and the application of trilayer to 830nm. The optical recording characteristics of metallic recording media are enhanced significantly by incoporating the metal (Al) layer into an antireflection trilayer structure. Due to the interference condition inherent in the design of the trilayer structure, reflectance from holes is ranked a low fraction. the hole formation is carried out by laser by $Ar^+$ laser(488nm). For 20nsec laser pulse duration, the hole opening threshold power of $(Te_{86}Se_{14})_{50}Bi_{50}$ trilayer is lower than that of monolayor that used in this experiments. Hole shapes of the whole sample were clean. For the application of the diode laser, the thickness of dielectric is varied by$\lambda$/4n. In order to compare the monolayer with the trilayer reflectance was measured.

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태양전지용 다결정 실리콘 박막의 용액 성장법에 관한 연구 (Polycrystalline silicon films for solar cell application by solution growth)

  • Soo Hong Lee;Martin A. Green
    • 한국결정성장학회지
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    • 제4권2호
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    • pp.119-130
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    • 1994
  • 저팽창 보로실리케이트 유리기판상에 직접 결정질실리콘 박막을 성장시켜 주는 것이 고순도 금속을 사용한 용액성장법으로는 어려운 관계로 18가지 다른 코팅을 유리기판상에 입혀 실험한 결과 알루미늄과 마그네슘 처리한 기판과 스퍼터링 방법으로 유리기판상에 실리콘 박막을 열처리해준 후 용액성장시켜준 기판의 경우에 양호한 결과가 나왔다. 성장온도 $420^{\circ}C~520^{\circ}C$ 범위에서 성장시킨 이박막은 태양전지와 태양전지의 모듈가격을 낮추는데 응용될 것으로 사료된다.

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A Study on Development of Advanced Environmental-Resistant Materials Using Metal Ion Processing

  • Fujita Kazuhisa;Kim Hae-Ji
    • Journal of Mechanical Science and Technology
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    • 제20권10호
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    • pp.1670-1679
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    • 2006
  • The development of the oxidation, wear and corrosion resistant materials that could be used in severe environmental conditions is needed. The elementary technologies for surface modification include ion implantation and/or thin film coating. Furthermore, in order to develop ion implantation technique to the specimens with three-dimensional shapes, plasma-based ion implantation (PBII) techniques were investigated. As a result, it was found that the ion implantation and/or thin film coating used in this study were/was effective for improving the properties of materials, which include implantations of various kinds of ions into TiAl alloy, TiN films formed on surface of base material and coatings in high-temperature steam. The techniques proposed in this study provide useful information for all of the material systems required to use at elevated temperature. For the practical applications, several results will be presented along with laboratory test results.

SiON buffer layer를 이용한 MFIS Capacitor의 제작 및 특성 (Fabrications and properties of MFIS capacitor using SiON buffer layer)

  • 정상현;정순원;인용일;김광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.70-73
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    • 2001
  • MFIS(Metal-ferroelectric-insulator- semiconductor) structures using silicon oxynitride(SiON) buffer layers were fabricatied and demonstrated nonvolatile memory operations. Oxynitride(SiON) films have been formed on p-Si(100) by RTP(rapid thermal process) in O$_2$+N$_2$ ambient at 1100$^{\circ}C$. The gate leakage current density of Al/SiON/Si(100) capacitor was about the order of 10$\^$-8/ A/cm$^2$ at the range of ${\pm}$ 2.5 MV/cm. The C-V characteristics of Al/LiNbO$_3$/SiON/Si(100) capacitor showed a hysteresis loop due to the ferroelectric nature of the LiNbO$_3$ thin films. Typical dielectric constant value of LiNbO$_3$ film of MFIS device was about 24. The memory window width was about 1.2V at the electric field of ${\pm}$300 kV/cm ranges.

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다결정 AIN 박막을 이용한 800 MHz 대 표면탄성파 대역통과 필터개발에 관한 연구 (A Stydy on the Development of 800 MHz band Pass Fiters using Polycrystal AIN Film)

  • 이형규;최익권;용윤중;이재영
    • 한국전자파학회논문지
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    • 제8권4호
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    • pp.382-389
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    • 1997
  • 본 논문에서는 다결정 AlN 박막을 이용하여 800 MHz 대역의 표면탄성파 펼터를 시험제작한 연구 결과를 제시한다. 고주파 스퍼터링 방법에 의하여 실리콘 기판위에 증착시켜 X선 rocking curve의 반치폭이 $3^{\circ}$이고 박막 성장 방향으로 결정의 c축이 우선 배향된 박막을 얻었다. 임펄수 모텔링 기법을 이용하여 시험제작된 표면탄성파 필터는 중심주파수 865 MHz, 3 dB 대역폭 45 MHz이며 측정된 주파수 응답곡선으로부터 유도된 전기기계 결합상수는 0.8 %, 표면탄성파 전달속도는 5,709 m/s이다.

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AZO Anode 전극을 적용한 OLED 소자의 제작과 전기적.광학적 특성 분석 (Analysis on the Electrical.optical Properties and fabrication of OLED with AZO Anode Electrode)

  • 진은미;신은철;김태완;박춘배
    • 한국전기전자재료학회논문지
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    • 제20권4호
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    • pp.357-362
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    • 2007
  • AZO(Aluminum-doped Zinc Oxide) films are attractive materials as transparent conductive electrode because they are inexpensive, nontoxic and abundant element compared with ITO(Indium Tin Oxide). AZO films have been deposited on glass (corning 1737) substrates by RF magnetron sputtering. The AZO film was post-annealed at $600^{\circ}C$ for 2 hr with $N_2$ atmosphere. The AZO films were used as an anode contact to fabricate OLEDs(Organic Light Emitting Diodes). OLEDs with $AZO/TPD/Alq_3/Al$ configuration were fabricated by thermal evaporation. We investigated that the electric, structural and optical properties of AZO thin films, which measured using the methods of XRD, SEM, Hall measurement and Spectrophotometer. The current density-voltage and luminescence-voltage properties of devices were studied and compared with ITO devices fabricated under the same conditions.

18% 효율 Cu(In,Ga)Se2 박막태양전지용 ZnSnO 버퍼층의 원자층 증착법 및 분석 (Characterization of Atomic-Layer Deposited ZnSnO Buffer Layer for 18%- Efficiency Cu(In,Ga)Se2 Solar Cells)

  • 김선철;김승태;안병태
    • Current Photovoltaic Research
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    • 제3권2호
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    • pp.54-60
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    • 2015
  • ZnSnO thin films were deposited by atomic layer deposition (ALD) process using diethyl zinc ($Zn(C_2H_5)_2$) and tetrakis (dimethylamino) tin ($Sn(C_2H_6N)_4$) as metal precursors and water vapor as a reactant. ALD process has several advantages over other deposition methods such as precise thickness control, good conformality, and good uniformity for large area. The composition of ZnSnO thin films was controlled by varying the ratio of ZnO and $SnO_2$ ALD cycles. The ALD ZnSnO film was an amorphous state. The band gap of ZnSnO thin films increased as the Sn content increased. The CIGS solar cell using ZnSnO buffer layer showed about 18% energy conversion efficiency. With such a high efficiency with the ALD ZnSnO buffer and no light soaking effect, AlD ZnSnO buffer mighty be a good candidate to replace Zn(S,O) buffer in CIGSsolar cells.

RF 마그네트론 스퍼터링을 이용한 FBAR 소자용 ZnO 박막의 특성 (Characteristics of ZnO thin films by RF magnetron sputtering for FBAR application)

  • 김선영;이능헌;김수길;박성현;정민곤;신영화;지승한;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 하계학술대회 논문집 C
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    • pp.1523-1525
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    • 2003
  • Due to the rapid development of wireless networking system, researches on the communication devices are mainly focus on microwave frequency devices such as filters, resonators, and phase shifters. Among them, Film bulk acoustic resonator (FBAR) has been paid extensive attentions for their high performance. In this research, ZnO thin films were deposited by RF-magnetron sputtering on Al/$SiO_2$/Si wafer and then crystalline properties and surface morphology were examined. To measure crystalline structure and surface morphology X-ray diffraction (XRD) and Scanning Electron Microscope (SEM) were employed. It was showed that crystalline properties of ZnO thin films were strongly dependant on the deposition conditions. As increasing the deposition temperature and the deposition pressures, the peak intensities of ZnO(002) plane were increased until $300^{\circ}C$, then decreased rapidly. At the sputtering conditions of RF power of 213 W and working pressure of 15 m Torr, ZnO film had excellent c-axis orientation, surface morphology, and adhesion to the substrate. In conclusion we optimized smooth surface with very small grains as well as highly c-axis oriented ZnO film for FBAR applications.

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전도성 고분자를 Buffer층으로 사용한 유기 발광 소자의 제작과 특성 연구 (Characteristics of organic electroluminescent devices using conducting polymer materials with buffer layers)

  • 이호식;박종욱;김태완;강도열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 추계학술대회 논문집
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    • pp.125-128
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    • 1998
  • Electroluminescent(EL) devices based on organic thin films have attracted lots of interests in large-area light-emitting display. One of the problems of such device is a lifetime, where a degradation of the cell is possibly due to an organic layer's thickness, morphology and interface with electrode. In this study, light-emitting organic electroluminescent devices were fabricated using Alq$_3$(8-hydroxyquinolinate aluminum) and TPD(N,N'-diphenyl-N,N'-bis(3-methylphenyl)-[1-1'-biphenyl]-4,4'-diamine).Where Alq$_3$ is an electron-transport and emissive layer, TPD is a hole-transport layer. The cell structure is ITO/TPD/Alq$_3$/Al and the cell is fabricated by vacuum evaporation method. In a measurement of current-voltage characteristics, we obtained a turn-on voltage at about 9 V. And we used other buffer layer of PPy(Polypyrrole) with ITO/PPy/TPD/Alq$_3$/Al structure. We observed a surface morphology by AFM(Atomic Force Microscopy), UV/visible absorption spectrum, and PL(Photoluminescence) spectrum. We obtained the UV/visible absorption peak at 358nm in TPD and at 359nm in Alq$_3$, and at 225nm and the PL peaks at 410nm in TPD and at 510nm in Alq$_3$ and at 350nm. We also studied EL spectrum in the cell structure of ITO/TPD/Alq$_3$/Al and ITO/PPy/TPD/Alq$_3$/Al and we observed the EL spectrum peak at 510nm from our cell

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표면텍스처링된 이중구조 Ag/Al:Si 후면반사막의 광산란 특성 (Light Scattering Properties of Highly Textured Ag/Al:Si Bilayer Back Reflectors)

  • 장은석;백상훈;장병열;박상현;윤경훈;이영우;조준식
    • 한국재료학회지
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    • 제21권10호
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    • pp.573-579
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    • 2011
  • Highly textured Ag, Al and Al:Si back reflectors for flexible n-i-p silicon thin-film solar cells were prepared on 100-${\mu}m$-thick stainless steel substrates by DC magnetron sputtering and the influence of their surface textures on the light-scattering properties were investigated. The surface texture of the metal back reflectors was influenced by the increased grain size and by the bimodal distribution that arose due to the abnormal grain growth at elevated deposition temperatures. This can be explained by the structure zone model (SZM). With an increase in the deposition temperatures from room temperature to $500^{\circ}C$, the surface roughness of the Al:Si films increased from 11 nm to 95 nm, whereas that of the pure Ag films increased from 6 nm to 47 nm at the same deposition temperature. Although Al:Si back reflectors with larger surface feature dimensions than pure Ag can be fabricated at lower deposition temperatures due to the lower melting point and the Si impurity drag effect, they show poor total and diffuse reflectance, resulting from the low reflectivity and reflection loss on the textured surface. For a further improvement of the light-trapping efficiency in solar cells, a new type of back reflector consisting of Ag/Al:Si bilayer is suggested. The surface morphology and reflectance of this reflector are closely dependent on the Al:Si bottom layer and the Ag top layer. The relationship between the surface topography and the light-scattering properties of the bilayer back reflectors is also reported in this paper.