• Journal of the Microelectronics and Packaging Society
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• v.22 no.3
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• pp.31-38
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• 2015

In order to achieve a high speed and high quality silicon wafer bonding, the room-temperature direct bonding using atmospheric pressure plasma and sprayed water vapor was developed. Effects of different plasma fabrication parameters, such as flow rate of $N_2$ gas, flow rate of CDA (clear dry air), gap between the plasma head and wafer surface, and plasma applied voltage, on plasma activation were investigated using the measurements of the contact angle. Influences of the annealing temperature and the annealing time on bonding strength were also investigated. The bonding strength of the bonded wafers was measured using a crack opening method. The optimized condition for the highest bonding strength was an annealing temperature of $400^{\circ}C$ and an annealing time of 2 hours. For the plasma activation conditions, the highest bonding strength was achieved at the plasma scan speed of 30 mm/sec and the number of plasma treatment of 4 times. After optimization of the plasma activation conditions and annealing conditions, the direct bonding of the silicon wafers was performed. The infrared transmission image and the cross sectional image of bonded interface indicated that there is no void and defects on the bonded wafers. The bonded wafer exhibited a bonding strength of average $2.3J/m^2$.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.36 no.2
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• pp.197-204
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• 2012

We explore the evolution of metal plasma generated by high laser irradiances and its effect on the surrounding air by using shadowgraph images after laser pulse termination and X-ray diffraction (XRD) of aluminum plasma ablated by a high-power laser pulse (>1000 mJ/pulse) and oxygen from air. Hence, the formation of laser-supported detonation and combustion processes has been investigated. The essence of this paper is in observing the initiation of chemical reaction between the ablated aluminum plasma and oxygen from air by the high-power laser pulse (>1000 mJ/pulse) and in conducting a quantitative comparison of the chemically reactive laser-initiated waves with the classical detonation of an exploding aluminum (dust) cloud in air. The findings in this work may lead to a new method of initiating detonation from a metal sample in its bulk form without any need to mix nanoparticles with oxygen for initiation.

• Applied Chemistry for Engineering
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• v.28 no.2
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• pp.171-176
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• 2017

The nitrogen plasma thermal decomposition and recovery processes for $CHClF_2$ (Chlorodifluoromethane) refringent were investigated. The steam generator was employed to provide superheated steam reactor, supporting the decomposition reaction of refringent. Even though over 94% of R-22 was decomposed on the condition of 60 A and 9.0 kW, a higher power and specific energy density were required to achieve the complete combustion of carbon materials. In the operating condition of 60 A and 12.6 kW, $O_2$/R-22 ratio in reactants gases are a key factor to obtain much higher decomposition ratio during process. It should be noticed that injecting the mixture of $O_2$ and air was much more effective than injecting the air consisting equivalent $O_2$ amount.

• Korean Journal of Food Science and Technology
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• v.47 no.2
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• pp.224-232
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• 2015

The effects of cold plasma (CP) treatments on the physicochemical and biodegradable properties of a corn biomass-containing polyester (CBPE) film were studied. The CBPE film was treated with CP generated by $N_2$, $O_2$, He, Ar, or dry air at 400-900 W and 667 Pa for 10-40 min. The glass transition temperature of the CBPE film ($-30.2--28.6^{\circ}C$) was not affected by the CP treatment, while the elastic modulus and water vapor permeability decreased (p<0.05). The ink printability was improved by the treatment and the improved printability was maintained during storage for 56 days at room temperature. Roughness of the film increased after treatments and the level of roughness appeared to increase during storage. Heat and microbial biodegradability of the CBPE film was improved by the air-CP treatment (p<0.05). These results have demonstrated the potential of applying CP treatments to improve the flexibility, printability, and biodegradability of CBPE films.

• Textile Coloration and Finishing
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• v.11 no.2
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• pp.27-37
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• 1999

Polypropylene(PP) films were treated with plasma glow discharge to produce peroxy radicals on the surfaces. The peroxy radicals formed on the PP film surfaces were subsequently used for the graft polymerization of acrylic acid and acrylamide in an aqueous solution by heating, respectively. Introduction of acrylic acid and acrylamide on the PP film could be confirmed by the observation of carbonyl and primary amine absorptions based on carboxylic acid and amide, respectively. And introduction of functional group could be confirmed by weight analysis and ESCA. The water contact angle(90$^{\circ}$) of PP film was constant, irrespective of elapsed time, while plasma-treated and functional monomer-grafted PP films were slowly increased with elapsed time, showing the rearrangement of surface polar groups in air condition. The water contact angle$(90^\circ)$ of PP film was decreased by the plasma treatment$(56^\circ)$ and further decreased by the grafting of acrylic acid$(34^\circ)$ and acrylamide$(37^\circ)$, indicating increased hydrophilicity of the modified surfaces. The water contact angle of plasma-treated PP film increased a little as time elapsing. The half-life periods of surface voltage on acrylic acid-(31sec) and acrylamide-grafted PP(42sec) were significantly decreased when compared to those on PP(950sec) and plasma-treated PP film(241sec). In the experiments using acid, basic and disperse dyes, absorbance and $\Delta{E}$ values of functional monomer-grafted PP films were significantly increased than that of oxygen plasma-treated one.

• Journal of IKEEE
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• v.28 no.1
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• pp.38-45
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• 2024

Most previous works about magnetic effect on plasma emission were interested in emission enhancement which was useful to various fields of plasma application. On the contrary, the following work is interested in plasma dissipation rarely reported in prior researches and expected to help advance plasma-controlling technique. Nd:YAG laser (1064 nm, 6 ns) was focused on three kinds of metals (Al, Ti and STS) and air. The permanent magnetic field (0.4 T) of Nd₂Fe₁₄B magnet was provided passing throughout laser-induced plasma. The spectra of plasma in both the presence and absence of the magnetic field were observed with varying laser power and delay time of the spectrograph. In this work it was uniquely discovered that the plasma always dissipated easily in the presence of magnetic field irrespective of the laser power. With the O I(777.42 nm)-line shape function fitted to Lorentz profile, its half width at half maximum (HWHM) was evaluated to verify that the magnetic field increased the plasma density. It is concluded that magnetic field facilitates not only plasma emission enhancement but also plasma dissipation, increasing recombination rate which is proportional to plasma density.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.9
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• pp.103-109
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• 2007

LCD (Liquid Crystal Display) is widely used electronic product. It needs too many processes such as PECVD (Plasma Enhanced Vapor Deposition), Sputtering, Photo-lithography, Dry etch. Each process is important but inspection process is more important because most companies emphasis on the six sigma. Recently, LCD inspection system is composed with inlet, inspector, outlet air pads. LCD is inspected on air pad which is shooting air from air hole. This paper studies on pad design of air bearing for LCD inspection to minimize LCD fluctuation. This design is able to reduce fluctuation and then satisfies CCD inspectional range. Also inspection pad needs to adequate stable area.

• Journal of Convergence for Information Technology
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• v.11 no.6
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• pp.146-153
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• 2021

Recently, research on perovskite semiconductor materials has been performed, and the evaluation of properties using surface treatment for this material is the basis for subsequent studies. We studied the results of surface treatment of perovskite thin films exposed to air for about 6 months by generating oxygen plasma with an atmospheric pressure plasma equipment. The reason for exposure for 6 months is that the perovskite thin film is made of organic and inorganic substances, so when exposed to air, the surface changes through reaction with oxygen or water vapor. Therefore, this change is to investigate whether it is possible to restore the original film. The surface shape and the ratio of elements were analyzed by varying the process time from 1 s to 1200 s in an oxygen plasma atmosphere. It was found that the crystal grains change over a process time of 5 s or more. In order to maintain the properties of the deposited film, it is the optimal process condition between 2 s and 5 s.

• Journal of Korean Society of Environmental Engineers
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• v.34 no.7
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• pp.459-466
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• 2012

In order to improved treatment performance of dielectric barrier discharge (DBD) plasma, plasm + UV process and gas-liquid mixing method has been investigated. This study investigated the degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical). The basic DBD plasma reactor of this study consisted of a plasma reactor (consist of quartz dielectric tube, titanium discharge (inner) and ground (outer) electrode), air and power supply system. Improvement of plasma reactor was done by the combined basic plasma reactor with the UV process, adapt of gas-liquid mixer. The effect of UV power of plasma + UV process (0~10 W), gas-liquid mixing existence and type of mixer, air flow rate (1~6 L/min), range of diffuser pore size (16~$160{\mu}m$), water circulation rate (2.8~9.4 L/min) and UV power of improved plasma + UV process (0~10 W) were evaluated. The experimental results showed that RNO degradation of optimum plasma + UV process was 7.36% higher than that of the basic plasma reactor. It was observed that the RNO decomposition of gas-liquid mixing method was higher than that of the plasma + UV process. Performance for RNO degradation with gas-liquid mixing method lie in: gas-liquid mixing type > pump type > basic reactor. RNO degradation of improved reactor which is adapted gas-liquid mixer of diffuser type showed increase of 17.42% removal efficiency. The optimum air flow rate, range of diffuser pore size and water circulation rate for the RNO degradation at improved reactor system were 4 L/min, 40~$100{\mu}m$ and 6.9 L/min, respectively. Synergistic effect of gas-liquid mixing plasma + UV process was found to be insignificant.

• Journal of the Korean Vacuum Society
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• v.11 no.1
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• pp.68-75
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• 2002

It is observed the characteristic of the microwave air plasma in the wide range of the operating pressure, 1 mTorr ~ 760 Torr. The microwave air plasma was generated by an AC-type microwave source manufactured with a magnetron taken from a commertial microwave oven and the input power was fixed at 370 W. Characteristics of the plasmas were observed by an injection Langmuir probe and an OES(Optical Emission Spectroscopy). The breakdown electric field is drastically changed at 500 mTorr. For < 500 mTorr, the ratio of the breakdown electric field and the pressure decreased inversely to the pressure, $5.7\times10^4$V/m-Torr.However, the ratio increased linearly as 43 V/m-Torr for the operating pressure, > 500 mTorr. The minimum breakdown electric field was observed about 12. kV/m at 500 mTorr. It corresponds that the input frequency equals to the collision frequency. The effective collision cross section of the air at this pressure was calculated as $9.23\times10^{-l6}\textrm{cm}^2$.The results of the OES measurement revealed that the main ions were composed of the oxygen, argon, and nitrogen for > 500 mTorr. In contrast, only oxygen and argon ions were dominated for < 500 mTorr. ion temperature of oxygen (O(II)) in the air was decreased from about 1.2 eV to 0.5 eV as the pressure increased. Langmuir probe data shows that the plasma density for < 500 mTorr was higher that for > 500 mTorr.