• Title/Summary/Keyword: Ag films

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금속/유기발광박막 간의 접합특성 연구 (Studies on Contact Characteristics in Metal/OEL this films)

  • 이호철;강수창;신무환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.96-98
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    • 1999
  • 유기전계발광소자(OELD)의 성능 향상을 위한 많은 연구가 진행되고 있지만 아직까지 금속전극과 유기발 광층 사이의 접촉저항(Contact Resistance)에 관한 연구는 거의 보고되지 않고 있다. Ohmic 접합에서 접촉 저항은 효율적이고 신뢰성 있는 소자제작에 있어서 간과되어서는 안될 매우 중요한 부분이다. 본 연구에서는 금속전극과 유기발광충 사이의 접촉저항에 관해서 논의하고자 한다. 본 연구에서 제작된 샘플은 금속전극으로 Ag, 유기발광재료로서 Alq$_3$를 사용하였으며, Alq3의 두께를 100 $\AA$에서 500 $\AA$까지 각각 다르게 하여 서로 다른 두께의 유기발광층을 가지는 샘플을 제작하였다. 금속전극의 매트릭스 구조에 의해 형성된 적선의 크기는 3 mm x 2 mm이며, 제작된 샘플의 접촉비저항은 TLM(Transmission Line Measurement) 방법을 이용하여 구하였다. Planar한 TLM model로부터 새로운 vertical model을 유추하였으며, 이를 근거로 접촉저항 및 transfer length 등을 계산하였다. 상온에서 측정된 전체 저항값은 유기발광층의 두께가 증가함 에 따라 증가하는 경향을 나타냈으며, 이 때 계산된 접촉비저항은 1.49$\times$$10^1$ $\Omega$-$\textrm{cm}^2$ 이다. 접촉저항은 전극 사이의 거리의 증가에 따라 증가하지만, 측정시간의 thermal budget의 영향으로 상대적으로 전체저항이 감 소하였으나, 저항감소분의 포화에 따라서, 거리에 비례하여 다시 저항이 증가하였다.

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플라즈마 환원 기술을 응용한 장수명의 은나노와이어/Reduced Graphene Oxide 하이브리드 투명전극 개발 (Development of AgNW/Reduced Graphene Oxide Hybrid Transparent Electrode with Long-Term Stability Using Plasma Reduction)

  • 정성훈;안원민;김도근
    • 한국표면공학회지
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    • 제49권1호
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    • pp.87-91
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    • 2016
  • The development of high performance transparent electrode with flexibility have been required for flexible electronics. Here, we demonstrate the silver nanowire and reduced graphene oxide hybrid transparent electrode for replacing brittle indium-tin-oxide electrode by spray coating technique and plasma reduction. The spray coating system is applied to deposit silver nanowire and over coated graphene oxide films and it has a great potential to scale-up. The resistance of silver nanowire transparent electrode is reduced by 10% and the surface roughness is decreased after graphene oxide coating. The over-coated graphene oxide is successfully reduced by $H_2$ plasma treatment and it is effective in increasing the environmental stability of electrode. The lifetime of silver nanowire and reduced graphene oxide hybrid electrode at $85^{\circ}C$ of Celsius degree of temperature and 85% of relative humidity has much increased.

Preparation of New Polyelectrolyte/ Silver Nanocomposites and Their Humidity-Sensitive Properties

  • Park, Min-Su;Lim, Tae-Ho;Jeon, Young-Min;Kim, Jong-Gyu;Gong, Myoung-Seon;Joo, Sang-Woo
    • Macromolecular Research
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    • 제16권4호
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    • pp.308-313
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    • 2008
  • A simple strategy was developed based on polyelectrolyte/silver nanocomposite to obtain humidity-sensitive membranes. The major component of a humid membrane is the polyTEAMPS/silver nanocomposite obtained by thermal heating the mixture of a polyelectrolyte and silver isopropylcarbamate complex. Humidity sensors prepared from polyTEAMPS/silver (w/w=100/0 and 100/6) nanocomposites had an average impedance of 292, 8.83 and $0.86\;k{\Omega}$, and 5,327, 140 and $0.93\;k{\Omega}$ at 30,60 and 95% relative humidity (RH), respectively. Hysteresis, temperature dependence and response time were also measured. Activation energies and complex impedance spectroscopy of the various components of the polyelectrolyte/silver nanocomposite films were examined for the humidity-sensing membrane.

Electrochromic Performance of NiOx Thin Film on Flexible PET/ITO Prepared by Nanocrystallite-Dispersion Sol

  • Kwak, Jun Young;Jung, Young Hee;Park, Juyun;Kang, Yong-Chul;Kim, Yeong Il
    • 대한화학회지
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    • 제65권2호
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    • pp.125-132
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    • 2021
  • An electrochromic nickel oxide thin film was fabricated on a flexible PET/ITO substrate using a nanocrystallite- dispersed coating sol and bar coater. Nanocrystalline NiOx of 3-4 nm crystallite size was first synthesized by base precipitation and thermal conversion. This NiOx nanocrystallite powder was mechanically dispersed in an alcoholic solvent mixed with a silane binder to prepare a coating sol for thin film. This sol method is different from the normal sol-gel method in that it does not require the conversion of precursor by heat treatment. Therefore, this method provides a very facile method to prepare NiOx thin films on any kind of substrate and it can be easily applied to mass production. The electrochromic performance of this NiOx thin film on PET/ITO electrode with a thickness of about 400 nm was investigated in a nonaqueous LiClO4 electrolyte solution by cyclic voltammetric and repeated chronoamperometric measurements in conjunction with spectrophotometry. The visible light modulation of 44% and the colorization efficiency of 41 ㎠/C at 550 nm were obtained at the step potentials of -0.8/+1.2 V vs Ag and a duration of 30 s.

Striation of coated conductors by photolithography process

  • Byeong-Joo Kim;Miyeon Yoon;Myeonghee Lee;Sang Ho Park;Ji-Kwang Lee;Kyeongdal Choi;Woo-Seok Kim
    • 한국초전도ㆍ저온공학회논문지
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    • 제25권4호
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    • pp.50-53
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    • 2023
  • In this study, the photolithography process was chosen to reduce the aspect ratio of the cross-section of a high-temperature superconducting (HTS) tape by dividing the superconducting layer of the tape. Reducing the aspect ratio decreases the magnetization losses in the second-generation HTS tapes generated by AC magnetic fields. The HTS tape used in the experiment has a thin silver (Ag) layer of about 2 ㎛ on top of the REBCO superconducting layer and no additional stabilizer layer. A dry film resist (DFR) was laminated on top of the HTS tape by a lamination method for the segmentation. Exposure to a 395 nm UV lamp on a patterned mask cures the DFR. Dipping with a 1% Na2CO3 solution was followed to develop the uncured film side and to obtain the required pattern. The silver and superconducting layers of the REBCO films were cleaned with an acid solution after the etching. Finally, the segmented HTS tape was completed by stripping the DFR film with acetone.

IDT 전극 패턴 임베디드 압전 에너지 하베스터의 특성 (Energy Harvesting Characteristics of Interdigitated (IDT) Electrode Pattern Embedded Piezoelectric Energy Harvester)

  • 이민선;김창일;윤지선;박운익;홍연우;백종후;조정호;박용호;장용호;최범진;정영훈
    • 한국전기전자재료학회논문지
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    • 제29권9호
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    • pp.581-588
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    • 2016
  • Piezoelectric thick films of a soft $Pb(Zr,Ti)O_3$ (PZT) based commercial material were produced by a conventional tape casting method. Thereafter, the interdigitated (IDT) Ag-Pd electrode pattern was printed on the $25{\mu}m$ thick piezoelectric film at room temperature. Co-firing of the 10-layer laminated piezoelectric thick films was conducted at $1,100^{\circ}C$ and $1,150^{\circ}C$ for 1 h, respectively. Piezoelectric cantilever energy harvesters were successfully fabricated using the IDT electrode pattern embedded piezoelectric laminates for 3-3 operation mode. Their energy harvesting characteristics were investigated with an excitation of 120 Hz and 1 g under various resistive loads (ranging from $10k{\Omega}$ to $200k{\Omega}$). A parabolic increase of voltage and a linear decrease of current were shown with an increase of resistive load for all the energy harvesters. In particular, a high output power of 3.64 mW at $100k{\Omega}$ was obtained from the energy harvester (sintered at $1,150^{\circ}C$).

Characteristics of photo-thermal reduced Cu film using photographic flash light

  • Kim, Minha;Kim, Donguk;Hwang, Soohyun;Lee, Jaehyeong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.293.1-293.1
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    • 2016
  • Various materials including conductive, dielectric, and semi-conductive materials, constitute suitable candidates for printed electronics. Metal nanoparticles (e.g. Ag, Cu, Ni, Au) are typically used in conductive ink. However, easily oxidized metals, such as Cu, must be processed at low temperatures and as such, photonic sintering has gained significant attention as a new low-temperature processing method. This method is based on the principle of selective heating of a strongly absorbent film, without light-source-induced damage to the transparent substrate. However, Cu nanoparticles used in inks are susceptible to the growth of a native copper-oxide layer on their surface. Copper-oxide-nanoparticle ink subjected to a reduction mechanism has therefore been introduced in an attempt to achieve long-term stability and reliability. In this work, a flash-light sintering process was used for the reduction of an inkjet-printed Cu(II)O thin film to a Cu film. Using a photographic lighting instrument, the intensity of the light (or intense pulse light) was controlled by the charged power (Ws). The resulting changes in the structure, as well as the optical and electrical properties of the light-irradiated Cu(II)O films, were investigated. A Cu thin film was obtained from Cu(II)O via photo-thermal reduction at 2500 Ws. More importantly, at one shot of 3000 Ws, a low sheet resistance value ($0.2527{\Omega}/sq.$) and a high resistivity (${\sim}5.05-6.32{\times}10^{-8}{\Omega}m$), which was ~3.0-3.8 times that of bulk Cu was achieved for the ~200-250-nm-thick film.

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집속이온빔 (FIB) 레지스트를 위한 비정질 $Se_{75}Ge_{25}$ 박막의 이온 및 광유기특성 (-The Optical- and Ion-Induced Characteristics of a-$Se_{75}Ge_{25}$ Thin Film for Focused Ion Beam (FIB)-)

  • 이현용;박태성;김종빈;이영종;정홍배;조광섭;강승언;황호정;박선우
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1992년도 하계학술대회 논문집 B
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    • pp.843-846
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    • 1992
  • This thesis was investigated on optical-and ion-induced characteristics in positive(a-$Se_{75}Ge_{25}$) and negative (Ag/a-$Se_{75}Ge_{25}$) resists for focused-ion-beam microlithogaphy. The a-$Se_{75}Ge_{25}$ inorganic thin film shows an increase in optical absorption after exposure to$\sim$$10^{16}$ dose(ions/$cm^{2}$) of Ga ions. The observed shift in the absorption edge toward longer wavelengths is consistent with that in films exposed to band-gap photons ($\sim$$10^{20}$ photons/$cm^{2}$). But, ion induced shift is twice as much as that in film exposed to optical radiation. This result may be related with microstructural rearrangements with in the short range of SeGe network. Due to changes in the short range order, the chemical bonding may be affected, which results in increased chemical dissolution in ion-induced film. Also, this resist exhibits good thermal stability because of its high Tg(~220$^{\circ}C$). The composition of deposited film measured by AES is consistent with that of bulk.

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Effect of Applied Voltage Bias on Electrochemical Migration in Eutectic SnPb Solder Alloy

  • Lee, Shin-Bok;Jung, Ja-Young;Yoo, Young-Ran;Park, Young-Bae;Kim, Young-Sik;Joo, Young-Chang
    • Corrosion Science and Technology
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    • 제6권6호
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    • pp.282-285
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    • 2007
  • Smaller size and higher integration of electronic systems make narrower interconnect pitch not only in chip-level but also in package-level. Moreover electronic systems are required to operate in harsher conditions, that is, higher current / voltage, elevated temperature / humidity, and complex chemical contaminants. Under these severe circumstances, electronic components respond to applied voltages by electrochemically ionization of metals and conducting filament forms between anode and cathode across a nonmetallic medium. This phenomenon is called as the electrochemical migration. Many kinds of metal (Cu, Ag, SnPb, Sn etc) using in electronic packages are failed by ECM. Eutectic SnPb which is used in various electronic packaging structures, that is, printed circuit boards, plastic-encapsulated packages, organic display panels, and tape chip carriers, chip-on-films etc. And the material for soldering (eutectic SnPb) using in electronic package easily makes insulation failure by ECM. In real PCB system, not only metals but also many chemical species are included. And these chemical species act as resources of contamination. Model test systems were developed to characterize the migration phenomena without contamination effect. The serpentine-shape pattern was developed for analyzing relationship of applied voltage bias and failure lifetime by the temperature / humidity biased(THB) test.

Hot Wall Epitaxy 법에 의한 CdIn2S4 단결정 박막의 성장과 광전류 특성 (Growth and Photocurrent Properties of CdIn2S4/GaAs Single Crystal Thin Film by Hot Wall Epitaxy)

  • 이상열;홍광준;박진성
    • 센서학회지
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    • 제11권5호
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    • pp.309-318
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    • 2002
  • 수평 전기로에서 $CdIn_2S_4$ 다결정을 합성하여 HWE(Hot Wall Epitaxy)방법으로 $CdIn_2S_4$ 단결정 박막을 반절연성 GaAs (100)기판에 성장시켰다. $CdIn_2S_4$ 단결정 박막의 성장 조건은 증발원의 온도 $630^{\circ}C$, 기판의 온도 $420^{\circ}C$였고 성장 속도는 $0.5\;{\mu}m/hr$였다. $CdIn_2S_4$ 단결정 박막의 결정성의 조사에서 10 K에서 광발광(photoluminescence) 스펙트럼이 463.9 nm (2.6726 eV)에서 exciton emission 스펙트럼이 가장 강하게 나타났으며, 또한 이중 결정 X-선 요동 곡선(DCRC)의 반폭치(FWHM)도 127 arcsec로 가장 작아 최적 성장 조건임을 알 수 있었다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293K에서 각각 $9.01{\times}10^{16}/cm^3$, $219\;cm^2/V{\cdot}s$였다. $CdIn_2S_4$/SI(Semi-Insulated) GaAs(100) 단결정 박막의 광흡수와 광전류 spectra를 293K에서 10K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap $E_g(T)$는 Varshni 공식에 따라 계산한 결과 $2.7116eV-(7.74{\times}10^{-4}eV/K)T^2$/(T+434K)이었으며 광전류 스펙트럼으로부터 Hamilton matrix(Hopfield quasicubic mode)법으로 계산한 결과 crystal field splitting ${\Delta}cr$값이 0.1291 eV이며 spin-orbit ${\Delta}so$값은 0.0248 eV임을 확인하였다. 10K일 때 광전류 봉우리들은 n = 1일때 $A_1$-, $B_1$-와 $C_1$-exciton 봉우리임을 알았다.