• 제목/요약/키워드: Ag films

검색결과 572건 처리시간 0.031초

PRAM을 위한 $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ (x= 0, 0.05, 0.1) 박막의 특성 (Characteristics of $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ (x= 0, 0.05, 0.1) thin films for PRAM)

  • 김성원;송기호;이현용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.21-22
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    • 2008
  • In the paper, we report several experimental data capable of evaluating the phase transformation characteristics of $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ (x =0, 0.05, 0.1) thin films. The $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ phase change thin films have been prepared by thermal evaporation. The crystallization characteristics of amorphous$Ag_x(Ge_2Sb_2Te_5)_{1-x}$ thin films were investigated by using nano-pulse scanner with 658 nm laser diode (power; 1~17 mW, pulse duration; 10~460 ns) and XRD measurement. It was found that the more Ag is doped, the more crystallization speed was 50 improved. In comparision with $Ge_2Sb_2Te_5$ thin film, the sheet resistance$(R_{amor})$ of the amorphous $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ thin films were found to be lager than that of $Ge_2Sb_2Te_5$ film($R_{amor}$ $\sim10^7\Omega/\square$ and $R_{cryst}$ 10 $\Omega/\square$). That is, the ratio of $R_{amor}/R_{cryst}$ was evaluates to be $\sim10^6$ This is very helpful to writing current reduction of phase-change random acess memory.

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$Sb_2S_3$ 박막과 Ag 도핑한 $Sb_2S_3$ 박막의 광학적인 특성 (Optical Properties of $Sb_2S_3$ and Ag Doped $Sb_2S_3$ Thin Films)

  • 김종기;박정일;이현용;이영종;정홍배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1959-1961
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    • 1999
  • We prepared the $Ag[100\AA])/Sb_2S_3[3000\AA]$ films using the thermal evaporator. The films were exposed by the blue-pass filtered mercury lamp and the polarized He-Ne laser. We have investigated the dependence of the induced optical energy with Ag-doping and have observed the transmittance variation near the optical absorption edge with the light source. It was shown that the energy gap of this thin film was largely changed by exposing He-Ne laser, the light source of the near energy gap of this thin film. It is because of the structural change from Ag-doping. It is investigated that the dissolution, the diffusion, and the field effect of the Ag thin film generate the Ag spatial distribution.

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Ag 함량이 진공증발법으로 형성된 광금지대 (Ag,Cu)(In,Ga)Se2 태양전지에 미치는 영향 (Effects of Ag Content on Co-evaporated Wide Bandgap (Ag,Cu)(In,Ga)Se2 Solar Cells)

  • 박주완;윤재호;조준식;유진수;이희덕;김기환
    • Current Photovoltaic Research
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    • 제3권1호
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    • pp.16-20
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    • 2015
  • Ag addition in chalcopyrite materials is known to lead beneficial changes in aspects of structural and electronic properties. In this work, the effects of Ag alloying of $Cu(In,Ga)Se_2$-based solar cells has been investigated. Wide bandgap $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ (x = 0.75~0.8) films have been deposited using a three-stage co-evaporation with various Ag/(Ag+Cu) ratios. With Ag alloying the $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ (x~0.8) films were found to have greater grainsize and film thickness. Device were also fabricated with the $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ (x~0.8) films and their J-V and quantum efficiency measurements were carried out. The highest-efficiency $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ solar cell with Eg > 1.5 eV had an efficiency of 12.2% with device parameters $V_{OC}=0.810V$, $J_{SC}=21.7mA/cm^2$, and FF = 69.0%.

THE EFFECT OF OVER AND UNDERLAYER ON THE MAGNETORESISTANCE IN Co-Ag NANO-GRANULAR ALLOY FILMS

  • Kim, Yong-Hyuk;Lee, Seong-Rae
    • 한국자기학회지
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    • 제5권5호
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    • pp.451-455
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    • 1995
  • The composition and thickness dependence and the ferromagnetic under- and overlayer effect on the magnetoresistance ratio and saturation field of the Co-Ag nano-granular films were investigated. The maximum magnetoresistance (23% at R.T.) in the as-deposited state was obtained in the $3000{\AA}$ $Co_{30} Ag_{70}$ bare alloy film. As the thickness of the alloy films decreased below $500{\AA}$, the MR ratio decreased because of the resistivity increase and the non-uniform film formation. We showed that the ferromagnetic over- and underlayer could reduce the saturation field of the nano-granular films via exchange coupling effect. The magnetoresistance and the saturation field of the $100{\AA}$ alloy film were 3.65 % and 2.85 kOe respectively and those of the under- and overlayered alloy films with $200{\AA}$ Fe were 3.3 % and 1.23 kOe respectively.

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Se-base로 한 비정질 칼코게나이드 박막의 훌로그래픽 격자 형성 (A Study on Holographic Grating Formation in Se-base Amorphous Chalcogenide Thin Films)

  • 구용운;최혁;남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.181-182
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    • 2007
  • In this paper, we investigated the diffraction grating efficiency on $Ge_{75}Se_{25}$ and Ag-doped amorphous chalcogenide $Ag/Ge_{75}Se_{25}$ thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on $Ge_{75}Se_{25}$ and Ag/$Ge_{75}Se_{25}$ thin films. As a result. for the films, the diffraction efficiency on Ag/$Ge_{75}Se_{25}$ double layer, was better than single $Ge_{75}Se_{25}$ thin films. The recording speed of DPSS laser is higher than that of He-Ne laser.

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전자빔 표면 조사에 따른 SnO2/Ag/SnO2 박막의 특성 연구 (The Effect of electron beam surface irradiation on the properties of SnO2/Ag/SnO2 thin films)

  • 장진규;김현진;최재욱;이연학;공영민;허성보;김유성;김대일
    • 한국표면공학회지
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    • 제54권6호
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    • pp.302-306
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    • 2021
  • SnO2 30/Ag 15/SnO2 30 nm(SAS) tri-layer films were deposited on the glass substrates with RF and DC magnetron sputtering and then electron beam is irradiated on the surface to investigate the effect of electron bombardment on the opto-electrical performance of the films. electron beam irradiated tri-layer films at 1000 eV show a higher figure of merit of 2.72×10-3 Ω-1 than the as deposited films due to a high visible light transmittance of 72.1% and a low sheet resistance of 14.0 Ω/☐, respectively. From the observed results, it is concluded that the post-deposition electron irradiated SnO2 30/Ag 15/SnO2 30 nm tri-layer films can be used as a substitute for conventional transparent conducting oxide films in various opto-electrical applications.

알루미나 기판에 스크린 프린팅된 Ag(Ta,Nb)O3 후막의 유전특성 및 초고주파 특성에 대한 연구 (An Investigation on the Dielectric and Microwave Properties of Ag(Ta,Nb)O3 Thick Films on the Alumina Substrates)

  • 이규탁;고중혁
    • 한국전기전자재료학회논문지
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    • 제24권11호
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    • pp.925-928
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    • 2011
  • Perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. This article was investigated ferroelectric materials $Ag(Ta,Nb)O_3$ thick film. In this study, we have fabricated the $Ag(Ta,Nb)O_3$ thick film on the $Al_2O_3$ substrates by screen printing method. The $Ag(Ta,Nb)O_3$ thick film were fabricated by the mixed oxide method. The sintering temperature and time were 1,150$^{\circ}C$, 2 hr. The electrical properties of $Ag(Ta,Nb)O_3$ thick film were investigated at 30~100$^{\circ}C$.

전착법에 의한 ZnO 박막의 결정구조 및 광흡수 특성 (Crystal Structure and Optical Absorption of ZnO Thin Films Grown by Electrodeposition)

  • 최춘태;서정남
    • 센서학회지
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    • 제9권6호
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    • pp.455-460
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    • 2000
  • 질산 아연, $Zn(NO_3)_2$, 수용액 속에서 전착에 의해 ITO 유리기판에 ZnO 박막을 성장하였다. 성장 매개 변수로 용액농도, 성장온도, 및 전착 전위를 선택하였으며, 성장된 박막은 SEM사진과 XRD 및 광흡수 계수 측정을 통해 연구되었다. 성장된 ZnO 박막은 육방정계 wurtzite 구조를 가지며, 질산아연 수용액농도가 0.1mol/liter, 성장온도 $60^{\circ}C$ 및 Ag/AgCl 기준전극에 대한 전위 -0.7V인 조건에서 양질의 ZnO 박막이 성장되었다.

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금속원소 도핑에 따른 초고경도 나노구조 TiN 박막의 합성 및 형성 거동에 관한 연구 (A study on the synthesis and formation behavior of nanostructrued TiN films by metal doping)

  • 명현식;한전건
    • 한국진공학회지
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    • 제12권3호
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    • pp.193-199
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    • 2003
  • 아크-마그네트론 복합 공정법에 의해 Cu, Ag 도핑된 TiN 나노 복합 화합물 박막을 합성하고 각 금속원소 종류 및 함량에 따른 기계적 특성 및 나노 구조로의 상변화 거동을 관찰하였다. 합성된 박막은 약 40 ㎬의 높은 경도치를 나타내었으며 2 at% 미만의 낮은 금속 원소 함량에서 최대 경도간을 나타내었다. 금속 원소 함량이 증가할수록 결정립 미세화 및 다결정화가 진행되어 초고경도 특성을 나타내는 나노구조 박막이 합성되었으며 도핑되는 금속원소 종류에 따라 나노 구조로의 상변화 기구가 상이함을 관찰하였다. TiN 박막내 도핑된 Cu는 Ti와 일부 결합을 이루면서 Ti의 자리를 치환하는 것으로 나타났으나, Ag는 Ti와 결합을 이루거나 Ti 격자 자리를 치환하는 것이 아니라 독립적으로 결정립계에 존재하여 charge transfer만을 발생시키는 것으로 관찰되었다.

Screen Printing법을 이용한 PMN-PZT 후막의 제조 및 특성 연구 (Fabrication and Characterization of PMN-PZT Thick Films Prepared by Screen Printing Method)

  • 김상종;최형욱;백동수;최지원;김태송;윤석진;김현재
    • 한국전기전자재료학회논문지
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    • 제13권11호
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    • pp.921-925
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    • 2000
  • Characteristics of Pb(Mg, Nb)O$_3$-Pb(Zr, Ti)O$_3$system thick films fabricated by a screen printing method were investigated. The buffer layer were coated with various thickness of Ag-Pd by screen printing to investigate the effect as a diffusion barrier and deposited Pt as a electrode by sputtering on Ag-Pb layer. The printed thick films were burned out at 650$\^{C}$ and sintered at 950$\^{C}$ in O$_2$condition for each 20, 60min after printing with 350mesh screen. The thickness of piezoelectric thick film was 15∼20㎛ and Ag-Pb layer acted as a diffusion barrier above 3㎛ thickness. The PMN-PZT thick films were screen printed on Pt/Ag-Pb(6m) and sintered by 2nd step (650$\^{C}$/20min and 950$\^{C}$/1h) using paste mixed PMN-PZT and binder in the ratio of 70:30, and the remnant polarization of thick film was 9.1$\mu$C/㎠ in this conditions.

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