• Title/Summary/Keyword: Active RF

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박막트랜지스터 효율 향상을 위한 ZnO 박막의 특성에 대한 연구

  • Park, Yong-Seop;Choe, Eun-Chang;Lee, Seong-Uk;Hong, Byeong-Yu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.63-63
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    • 2009
  • Many researchers have been studied as active and transparent electrode using ZnO (Zinc oxide) inorganic semiconductor material due to their good properties such as wide band-gap and high electrical properties compared with amorphous-Si. In this study, we fabricated ZnO films by the RF magnetron sputtering method at a low temperature for a channel layer in thin-film transistor (TFT) and investigated the characteristics of sputtered ZnO films. Also, the electrical properties of TFT using ZnO channel layer such as field effect mobility(${\mu}$), threshold voltage ($V_{th}$), and $I_{on/off}$ ratio are investigated for the application of the display and electronic devices.

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Fabrication of Lithium Nickel Cobaltate Thin-film for the Cathode Material of Microbattery

  • Kim, Duksu;Kim, Mun-Kyu;Son, Jong-Tae;Kim, Ho-Gi
    • Journal of the Korean Ceramic Society
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    • v.38 no.8
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    • pp.683-686
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    • 2001
  • Electrochemically active lithium nickel cobalt oxide thin-film was not fabricated until now. The thin-film was deposited by RF magnetron sputtering at room temperature, and its initial phase was amorphous. By varying deposition condition, the different characteristics of thin-film were achieved. Using electrochemical analyses, the relationship between physical and electrochemical characteristics was identified. Crystallized thin-film by RTA (Rapid Thermal Annealing) was shown a good capacity and cycle property.

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Substrate Network Modeling and Parameter- Extraction Method for RF MOSFETs (RF MOSFET의 기판 회로망 모델과 파라미터 추출방법)

  • 심용석;강학진;양진모
    • Journal of Korea Society of Industrial Information Systems
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    • v.7 no.5
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    • pp.147-153
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    • 2002
  • In this paper, a substrate network model to be used with BSIM3 MOSFET model for submicron MOSFETs in giga hertz frequencies and its direct parameter extraction with physically meaningful values are proposed. The proposed substrate network model includes a conventional resistance and single inductance originated from ring-type substrate contacts around active devices. Model parameters are extracted from S-parameter data measured from common-bulk configured MOS transistors with floating gate and use where needed without any optimization process. The proposed modeling technique has been applied to various-sized MOS transistors. The substrate model has been validated for frequency up to 300Hz.

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Design of a SiGe HBT MMIC Double Balaned Up-converter for WLAN Applications (C-BAND WLAN용 SiGe HBT MMIC 이중평형형 상향주파수 혼합기)

  • 서정욱;정병희;오영수;채규성;김창우
    • Proceedings of the IEEK Conference
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    • 2003.07a
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    • pp.346-349
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    • 2003
  • A SiGe HBT MMIC double balaced up-converter has been designed and fabricated for C-band WLAN applications. The up-converter is based on the Gilbert cell mixer with an active baluns for differential inputs of LO and IF signals. The designed up-converter exhibits a conversion gain 12.5dB for a -10 dBm LO power. It also exhibits LO-RF isolation of 19.3dBc, and IF-RF isolation of 23.3 dBc at a 1-dB compression point of -14.2dBm

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Effects of AlN Ratio on Microstructure of AlN Films Grown by PAMBE (PAMBE를 이용하여 성장된 AlN 박막의 미세구조에 미치는 Al/N 비율 영향)

  • 홍성의;한기평;백문철;조경익;윤순길
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.12
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    • pp.972-978
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    • 2001
  • Some effects of Al/N ratio on microstructure of AlN films grown on Si(111) substrates by PAMBE were investigated. Al/N ratio was controlled by rf power of N$_2$ plasma source system. Al excess or N excess conditions were obtained below or above 350 W rf power, respectively. Surface roughness and morphology of AlN film grown at Al/N=1.0 showed the best result. Under Al excess condition, it was suggested that excess Al atoms which did not contribute to the growth of AlN film prevent the normal crystal growth and make abnormal growth of some columns. However, under N excess condition, it was explained that some of the excess active N source turned into gas state and then desorbed out from substrate.

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Monolithic film Bulk Acoustic Wave Resonator using SOI Wafer (SOI 웨이퍼를 이용한 압전박막공진기 제작)

  • 김인태;김남수;박윤권;이시형;이전국;주병권;이윤희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.12
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    • pp.1039-1044
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    • 2002
  • Film Bulk Acoustic Resonator (FBAR) using thin piezoelectric films can be made as monolithic integrated devices with compatibility to semiconductor process, leading to small size, low cost and high Q RF circuit elements with wide applications in communications area. This paper presents an MMIC compatible suspended FBAR using SOI micromachining. It is possible to make a single crystal silicon membrane using a SOI wafer In fabricating active devices, SOI wafer offers advantage which removes the substrate loss. FBAR was made on the 12㎛ silicon membrane. Electrode and Piezoelectric materials were deposited by RF magnetron sputter. The maximum resonance frequency of FBAR was shown at 2.5GHz range. The reflection loss, K$^2$$\_$eff/, Q$\_$serise/ and Q$\_$parallel/ in that frequency were 1.5dB, 2.29%, 220 and 160, respectively.

Self-Oscillating, Third-Harmonic Mode-Locked l-GHz Nd:YLF Laser

  • Yu, Tae-Jun;Sung, Jai-Hee;Nam, Chang-Hee
    • Journal of the Optical Society of Korea
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    • v.3 no.2
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    • pp.51-54
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    • 1999
  • A Nd:YLF laser has been actively mode-locked at the third-order harmonic cavity frequency using a lithium niobate phase modulator. Self-oscillating pulses of 14 ps duration, 1 GHz repetition rate, and 10mV average power at 1053 nm wavelength have been obtained. A 1GHz rf signal to drive a phase modulator was obtained by using 1GHz pulse train without rf synthesizer as a driver of an active mode locker.

The Slab Waveguide $CO_2$ Laser with Unstable Resonator of Negative Branch (Negative branch의 불안정 공진기를 갖는 슬랩형 도파관 $CO_2$ 레이저)

  • 김규식;우삼용;이영우;최종운
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.12
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    • pp.586-591
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    • 2003
  • We have developed the radio frequency excited slab waveguide $CO_2$ laser, The dimension of active area is $2{\times}40{\times}400$ mm to get a laser gain. Two pieces of concave mirror are used to make the unstable resonator of negative branch. The radio frequency is 123 MHz and RF input power is from 100 to 900 W. The laser gas is set to a pressure of 10 ∼ 60 torr and the mixing ration is $CO_2$:$N_2$:He=1:1:3. The laser output power of 50.9 W was obtained with laser power to RF power efficiency of 6.5 %.

The Design and Fabrication of an Active DR-Based RF Module for Location Tracking (능동형 DR 기반의 위치 추적용 RF 모듈의 설계 및 제작)

  • Kim, Dong-Ok
    • Journal of The Institute of Information and Telecommunication Facilities Engineering
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    • v.9 no.2
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    • pp.48-55
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    • 2010
  • This paper proposes a realtime tracking algorithm of mobile object in indoor or outdoor environment. For this purpose the proposed system selects location data closer to mobile objects in real time using Triangulation method and DCM (Database Correlation Method). Also, this system utilizes the adjusted location data selected by using Kalman filter to improve the location accuracy of transfer object. Be studied in existing the Kalman filter have unstable location data until its settlement because of it extracts current values by using the past the information. However, proposed location tracking system don't apply existent Kalman filter to this system and it permits precisional tracking location by using more effective methods.

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Effect of Titanium Addition on Indium Zinc Oxide Thin Film Transistors by RF-magnetron Sputtering (RF-magnetron sputtering을 이용한 TiIZO 기반의 산화물 반도체에 대한 연구)

  • Woo, Sanghyun;Lim, Yooseong;Yi, Moonsuk
    • Journal of the Institute of Electronics and Information Engineers
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    • v.50 no.7
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    • pp.115-121
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    • 2013
  • We fabricated thin film transistors (TFTs) using TiInZnO(TiIZO) thin films as active channel layer. The thin films of TiIZO were deposited at room temperature by RF-magnetron co-sputtering system from InZnO(IZO) and Ti targets. We examined the effects of titanium addition by X-ray diffraction, X-ray photoelectron spectroscopy and the electrical characteristics of the TFTs. The TiIZO TFTs were investigated according to the radio-frequency power applied to the Ti target. We found that the transistor on-off currents were greatly influenced by the composition of titanium addition, which suppressed the formation of oxygen vacancies, because of the stronger oxidation tendency of Ti relative to that of Zn or In. A optimized TiIZO TFT with rf power 40W of Ti target showed good performance with an on/off current ratio greater than $10^5$, a field-effect mobility of 2.09 [$cm^2/V{\cdot}s$], a threshold voltage of 2.2 [V] and a subthreshold swing of 0.492 [V/dec.].