• The korean journal of orthodontics
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• v.35 no.6 s.113
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• pp.433-442
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• 2005

The purpose of this study was to evaluate and compare the shear bond strength of orthodontic brackets depending on the variety of adhesives and whether saliva exists, by using self-etching primer (SEP). Groups were divided according to the type of adhesive into resin adhesive (Trans bond XT) and resin-modified glass ionomer cement (Fuji Ortho LC). One group of resin adhesive used XT primer after etching with 37% phosphoric acid, and the other group used self-etching primer. One group of resin-modified glass ionomer cement only used etching for bonding, and the other group used SEP. Each of the groups were also classified by whether saliva was contaminated or not. and then the shear bond strength was measured. The results showed that when using resin adhesive, the shear bond strength of SEP was lower than the XT primer. In the resin-modified glass ionomer cement groups, the shear bond strength which depends on the priming method, did not have a meaningful difference statistically When saliva was contaminated, the group which used SEP, regardless of the adhesive variety, had a greater shear bond strength than the normal priming group. From these results, SEP showed a shear bond strength that is possible to be used clinically, regardless of the adhesive variety. It can especially be clinically useful to use SEP to bond brackets even on tooth surfaces contaminated with saliva, because it offers the appropriate bonding strength as well as shorter treatment time and easy application.

• Restorative Dentistry and Endodontics
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• v.9 no.1
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• pp.115-119
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• 1983

The purpose of this study was to compare the solubility of enamel and dentin to an etchant after fluoride application. Specimens were collected from extracted anterior and bicuspid and each tooth was cut into several pieces. These specimen were allocated in 7 group; 1%, 2%, 3% NaF, 1%, 8%, 20% $SnF_2$, and control group. Five specimens in each group was exposed to pre-determined fluoride solution for 3 minutes, and washed with running water. These specimens were etched by Hipol (commercial label) etchant for 30 seconds. Following are the findings obtained through S.E.M. 1. All specimens with acid etching revealed preferential removal of prism periphery leaving prism core. 2. Specimens treated with 1%, 2% NaF solution showed that the shape of prism tip was thin and sharp like a needle. The case of 3% NaF showed rather round shape at prism end. 3.1% of $SnF_2$ case showed similar findings with the control group but 8% and 20% $SnF_2$ case revealed needle shape at the prism and was less clear than NaF case. Preferential removal of prism periphery was partialy observed and un decalcified area is fused to prism forming reidge. 4. Dentine treated by fluoride compound in low concentration showed the orifice of dentinal tubule was clearly enlarged whereas in high concentration the orifice was not widened.

• Journal of the Korean Applied Science and Technology
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• v.20 no.1
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• pp.20-26
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• 2003

Acidic degreasing agent(AADA) was prepared by blending sorbitol, Newpol PE-68, Na-dioctyl sulfosuccinate, Tetronix T-70l, MJU-100A, n-octanoic acid, and phosphoric acid, The physical properties of AADA tested with aluminum specimen showed the following results ; when 3wt% AADA-5 was performed at 70$^{\circ}C$, the degreasing rate was 95% which is comparitively good, and the percentage of etching was 0.277% which was found to be less than that of commercialized product. when 20wt% of AADA-5 was added at 65$^{\circ}C$, the percentage of derusting was 91% and the good defoaming effect proved by following low foaming power tests respectively : Ross and Miles, and Ross and Clark methods.

• Resources Recycling
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• v.6 no.3
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• pp.9-14
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• 1997

A study has been made of the rccovery of copper (11) by solvent extraction with Alamine336 (Tri-n-oclylamine) as a extractant from hydrochloric etching solutions. The effect of extractant concentrations, hydrochloric acid, chloride Ion concentrations and phase ratio (organiclaqueaus) on copper extraction were studied. Experimental results showed that the concenl~atiano f extractant and the phase ratio strongly influenced the copper extraction, and the extraction percent of capper Increased at higher hydrochloric acid and chloride ion mncmhation. We proposed that the optimum extrachon stages of copper for continuous extraction process by analysidng thc McCabe-Thielc diagram. Stripping of copper from the loaded organic phases wn be accomplished by pure water (H, O) as a dripping reagent effectively. As the tcmpcrature is increased, thc stripping of copper is enhanced.

• The korean journal of orthodontics
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• v.33 no.1 s.96
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• pp.51-61
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• 2003

The purpose of this study was to evaluate the effects of a self-etching primer on the shear bond strength of orthodontic brackets and on the failure pattern of bracket-adhesive interfaces in dry or wet condition. Brackets were bonded to extracted human teeth according to one of three experimental protocols. In the Group P, teeth were etched with $37\%$ phosphoric acid. After the Transbond XT Primer was applied onto the etched surfaces, the brackets were bonded with Transbond XT(3M, Unitek, Monrovia, Calif) and light cured for 40 seconds. In the Group SD, a self-etching primer(3M, Unitek, Monrovia, Calif) was placed on the enamel for 3 seconds and gently evaporated with air, as suggested by the manufacturer. The brackets were then bonded with Transbond XT as in the Group P In the Group SW, artificial saliva was applied to the enamel surface for 10 seconds to allow complete hydration of the surface before application self-etching primer The brackets were then bonded following the procedures of Group SD. Each group was divided into 2 sub-groups(0.5h, 24h) according to debonding time. Shear bond strengths were measured by Instron universal testing machine. After debonding, the teeth and brackets were examined under scanning electron microscope and assessed with the adhesive remnant index. The result obtained were summarized as follows ; 1. The shear bond strengths were high enough to use clinically in all testing groups, but the shear bond strengths of Group SD and SW were significantly lower than Group P(p<0.05). 2. With respect to comparison of debonding time, 24h debonding samples exhibited heigher shear bond strength than 0.5h debonding samples in Group P, SD and SW(p<0.05). 3. In the self etching primer groups(Group SD and Group SW), there was no significant difference in mean shear bond strength between under dry and wet state(p>0.05). 4. There was a greater frequency of ARI score of 0 and 1 with the Group P. On the other hand, there was a higher frequency of ARI scores of 2 and 3 with Group SD and Group SW(p<0.05).

• Biotechnology and Bioprocess Engineering:BBE
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• v.10 no.3
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• pp.212-217
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• 2005

Desorption/ionization on silicon mass spectrometry (DIOS-MS) is a relatively new laser desorption/ionization technique for mass spectrometry without employing an organic matrix. This present study was carried to survey the experimental factors to improve the efficiency of DIOS-MS through electrochemical etching condition in structure and morphological properties of the porous silicon. The porous structure of silicon structure and its properties are crucial for the better performance of DIOS-MS and they can be controlled by the suitable selection of electrochemical conditions. The fabrication of porous silicon and ion signals on DIOS-MS were examined as a function of silicon orientation, etching time, etchant, current flux, irradiation, pore size, and pore depth. We have also examined the effect of pre- and post-etching conditions for their effect on DIOS-MS. Finally, we could optimize the electrochemical conditions for the efficient performance of DIOS-MS in the analysis of small molecule such as amino acid, drug and peptides without any unknown noise or fragmentation.

• Bulletin of the Korean Chemical Society
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• v.34 no.11
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• pp.3451-3455
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• 2013

Single-crystalline silicon nanowires (SiNWs) were fabricated by using an electroless metal-assisted etching of bulk silicon wafers with silver nanoparticles obtained by wet electroless deposition. The etching of SiNWs is based on sequential treatment in aqueous solutions of silver nitrate followed by hydrofluoric acid and hydrogen peroxide. SEM observation shows that well-aligned nanowire arrays perpendicular to the surface of the Si substrate were produced. Free-standing SiNWs were then obtained using ultrasono-method in toluene. Alkyl-derivatized SiNWs were prepared to prevent the aggregation of SiNWs and obtained from the reaction of SiNWs and dodecene via hydrosilylation. Optical characterizations of SiNWs were achieved by FT-IR spectroscopy and indicated that the surface of SiNWs is terminated with hydrogen for fresh SiNWs and with dodecyl group for dodecyl-derivatized SiNWs, respectively. The main structures of dodecyl-derivatized SiNWs are wires and rods and their thicknesses of rods and wire are typically 150-250 and 10-20 nm, respectively. The morphology and chemical state of dodecyl-derivatized SiNWs are characterized by scanning electron microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy.

• Restorative Dentistry and Endodontics
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• v.39 no.1
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• pp.32-38
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• 2014

Objectives: In this study, we evaluated the antibacterial activity of self-etching adhesive systems against Streptococcus mutans using the agar diffusion method. Materials and Methods: Three 2-step systems, Clearfil SE Bond (SE, Kuraray), Contax (CT, DMG), and Unifil Bond (UnB, GC), and three 1-step systems, Easy Bond (EB, 3M ESPE), U-Bond (UB, Vericom), and All Bond SE (AB, BISCO) were used. 0.12% chlorhexidine (CHX, Bukwang) and 37% phosphoric acid gel (PA, Vericom) were used as positive controls. Results: The antibacterial activity of CHX and PA was stronger than that of the other groups, except SE. After light activation, the inhibition zone was reduced in the case of all 2-step systems except CT. However, all 1-step systems did not exhibit any inhibition zone upon the light activation. Conclusions: SE may be better than CT or UnB among the 2-step systems with respect to antibacterial activity, however, 1-step systems do not exhibit any antibacterial activity after light curing.

• Korean Journal of Materials Research
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• v.34 no.7
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• pp.370-376
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• 2024

In this study, we report significant improvements in lithium-ion battery anodes cost and performance, by fabricating nano porous silicon (Si) particles from Si wafer sludge using the metal-assisted chemical etching (MACE) process. To solve the problem of volume expansion of Si during alloying/de-alloying with lithium ions, a layer was formed through nitric acid treatment, and Ag particles were removed at the same time. This layer acts as a core-shell structure that suppresses Si volume expansion. Additionally, the specific surface area of Si increased by controlling the etching time, which corresponds to the volume expansion of Si, showing a synergistic effect with the core-shell. This development not only contributes to the development of high-capacity anode materials, but also highlights the possibility of reducing manufacturing costs by utilizing waste Si wafer sludge. In addition, this method enhances the capacity retention rate of lithium-ion batteries by up to 38 %, marking a significant step forward in performance improvements.

• Journal of the korean academy of Pediatric Dentistry
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• v.45 no.3
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• pp.290-298
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• 2018

This study aimed to evaluate surface morphology and resin tag penetration of resin infiltration into primary anterior teeth after enamel deproteinization with sodium hypochlorite (NaOCl) prior to phosphoric acid ($H_3PO_4$) etching. Ninety primary anterior teeth with non-cavitated caries lesion were devided five groups according to enamel pretreatment as follows, group I-15% hydrochloric acid (HCl) 2min. ; group II-5.25% NaOCl 1min., 35% $H_3PO_4$ 1min. ; group III-5.25% NaOCl 2min., 35% $H_3PO_4$ 1min. ; group IV-5.25% NaOCl 1min., 35% $H_3PO_4$ 2min. ; group V-5.25% NaOCl 2min., 35% $H_3PO_4$ 2min. Fifteen teeth were examined etched surface structure using field emission-scanning electron microscope. Seventy five teeth were infiltrated with resin, maximum penetration depth and percentage penetration were analysed using dual fluorescence confocal microscopy. As the application time of NaOCl increased, ratio of enamel type I, II were increased. Percentage penetration (PP) was higher in group V than group II, III (p < 0.05). PP of group IV, V did not show any differences. Non-cavitated caries of primary anterior teeth can be treated with resin infiltration. Enamel deproteinization with NaOCl prior to 35% $H_3PO_4$ etching could be an alternative of 15% HCl etching in resin infiltration.