• Journal of Surface Science and Engineering
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• v.34 no.5
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• pp.384-390
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• 2001

The hollow cathode discharge is a kind of plasma formation scheme in which plasma is formed inside a hollow structure, the cathode, with current to a nearby anode of arbitrary shape. In this scheme, electrons reflex radially within the hollow cathode, establishing an efficient ionization mechanism for gas within the cavity. An existence condition for the hollow cathode effect is that the electron mean-free-path for ionization is of the order of the cavity radius. Thus the size of this kind of plasma source must decrease as the gas pressure is increased. In fact, the hollow cathode effect can occur even at atmospheric pressure for cathode diameters of order 10-100 $\mu\textrm{m}$. That is, the "natural" operating pressure regime for a "micro hollow cathode discharge" is atmospheric pressure. This kind of plasma source has been the subject of increasing research activity in recent years. A number of geometric variants have been explored, and operational requirements and typical plasma parameters have been determined. Large arrays of individual tiny sources can be used to form large-area, atmospheric-pressure plasma sources. The simplicity of the method and the capability of operation without the need for the usual vacuum system and its associated limitations, provide a highly attractive option for new approaches to many different kinds of plasma applications, including plasma surface modification technologies. Here we review the background work that has been carried out in this new research field.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2003.05a
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• pp.54-54
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• 2003

MgO layer는 POP 패빌 내 유전증을 이온의 스퍼터링으로부터 보호하여 주며, 또한 높은 이차 전자 밤출 계수의 특성을 가지고 있어 구동 및 유지 전압을 낮춰 주는 역할을 한다. 그러나. MgO layer는 $H_20,{\;}CO_2,{\;}N_2,{\;}0_2$ 그리고 $H_2$와 같은 불순물 들을 쉽게 를착하는 단점이 있어, PDP의 특성 및 수명 단축에 영향을 줄 수 있다. 따라서, 본 연구에서는 atmospheric pressure plasma cleaning 과 low pressure i inductively coupled plasma (ICP) cleaning 처리에 의하여, 보호층으로 사용이 되는 MgO layer의 outgassing 특성을 조사하고자 한다. plasma cleaning에 의한 MgO layer 표면의 roughness와 불순물의 변화를 알아보기 위 하여 atomic force microscopy(AFM)과 x-ray p photoelectron spectroscopy(XPS)를 이용하여 측정 하였다. 또한, outgassing의 특성을 분석하기 위하여 MgO layer를 $400^{\circ}C$ 까지 온도를 가하여 온도에 따른 outgassing의 특성을 quadrupole mass spectrometer(QMS)를 이용하여 알아보았다. atmospheric pressure plasma cleaning 에서는 $He/O_2/Ar/N_2$의 gas를 사용하였으며, low pressure ICP cleaning 에 서는 Ar의 gas를 사용하였다. atmospheric pressure plasma cleaning는 low pressure ICP C cleaning과 비교해 더 낮은 outgassing을 관잘 할 수 있었으나. MgO 표면의 roughness는 low pressure ICP cleaning 후 더 낮은 것을 알 수 있었다. 또한 $He/O_2/Ar/N_2$의 gas를 사용 한 atmospheric pressure plasma cleaning 과 $Ar/O_2$의 gas를 사용한 ICP cleaning에서 이 차전자방출계수(SEEC)가 약 1.5~2.5배 증가된 것을 알 수 있었다.

• Journal of the Microelectronics and Packaging Society
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• v.16 no.3
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• pp.53-59
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• 2009

Low pressure mercury lamp type UV equipments have been widely used for cleaning and modification of PCB surfaces. To enhance the productivity of the process, we newly developed remote DBD type atmospheric pressure plasma equipment. The productivity of both equipments could be compared by measuring surface contact angle for various transferring speed. By the result of the measurement, we could verify that the productivity of the atmospheric pressure plasma be superior to the productivity of the UV equipment. XPS experiments confirmed that the surface effect of the UV and atmospheric pressure plasma processing are similar for each other. Organic contamination level was reduced after the processing and some surface elements were oxidized for both cases. Finally, the atmospheric pressure plasma equipment was adapted to flip chip BGA's flux printing process and it was concluded that the printing uniformity be enhanced by the atmospheric pressure plasma surface treatment.

• New & Renewable Energy
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• v.9 no.2
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• pp.23-29
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• 2013

Furnace and laser is currently the most important doping process. However furnace is typically difficult appling for selective emitters. Laser requires an expensive equipment and induces a structural damage due to high temperature using laser. This study has developed a new atmospheric pressure plasma source and research atmospheric pressure plasma doping. Atmospheric pressure plasma source injected Ar gas is applied a low frequency (a few 10 kHz) and discharged the plasma. We used P type silicon wafers of solar cell. We set the doping parameter that plasma treatment time was 6s and 30s, and the current of making the plasma is 70 mA and 120 mA. As result of experiment, prolonged plasma process time and highly plasma current occur deeper doping depth and improve sheet resistance. We investigated doping profile of phosphorus paste by SIMS (Secondary Ion Mass Spectroscopy) and obtained the sheet resistance using generally formula. Additionally, grasped the wafer surface image with SEM (Scanning Electron Microscopy) to investigate surface damage of doped wafer. Therefore we confirm the possibility making the selective emitter of solar cell applied atmospheric pressure plasma doping with phosphorus paste.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.10
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• pp.1802-1806
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• 2007

Nowadays, many configurations and applications of small atmospheric plasma source have been investigated with growing interest, as it provides the bacteria inactivation, the surface modification and removal of unwanted small regions, and so on. In this paper, the non-thermal micro plasma source under atmospheric pressure by means of submicrosecond pulse voltage waveforms is suggested. Plasma operates in helium is appears as a small (sub-mm) glow at the tip of a plasma gun. Electrical measurements show that the plasma source operates at low voltage (about 500V) and the power consumption is about 1W at 25kHz. Moreover, the emission spectrum shows the relatively higher emission intensity of oxygen particles than those of helium and nitrogen.

• Applied Chemistry for Engineering
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• v.22 no.3
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• pp.261-265
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• 2011

The sterilization effects of atmospheric pressure plasma with the mixture of argon and oxygen were analyzed. The plasma reactor with the shape of dielectric barrier discharge produced the uniform distribution of glow discharge and generated ozone gas effectively according to the various process parameters. The sterilization for E. coli was affected by power, oxygen ratio in the mixture gas, treatment time and distance between reactor and sample. The concentration of ozone was a major source for the sterilization of E. coli, which was enhanced by the increase of power and oxygen ratio. In this study, the effect of atmospheric pressure plasma treatment for the sterilization was confirmed and its result can deliver the atmospheric pressure plasma treatment as the novel sterilization method instead of conventional methods.

• Food Science and Preservation
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• v.23 no.7
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• pp.960-966
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• 2016

This study was conducted to explore the potential for use of atmospheric pressure dielectric barrier discharge plasma (atmospheric pressure DBD plasma) as a non-thermal sterilization technology for microorganisms in dried red pepper. The effects of key parameters such as power, exposure time and distance on the sterilization efficiency and the quality of red dried pepper by the atmospheric pressure DBD plasma treatment were investigated. The results revealed that the plasma treatment was very effective for sterilization of Staphylococcus aureus, with 15 min of treatment at 1.0 kW and 20 mm sterilizing 82.6% of the S. aureus. Increasing the power or exposure time and decreasing the exposure distance led to improved sterilization efficiency. The atmospheric pressure DBD plasma treatment showed no effect on the ASTA (American spice trade association) value or hardness of dried red pepper. Furthermore, no effects of atmospheric pressure DBD plasma treatment were observed on the sensory properties of dried red pepper. To assess the storage stability, the dried red pepper was treated with atmospheric pressure DBD plasma (1.5 kW power, 15 min exposure time and 10 mm exposure distance), then stored for 12 weeks at $25^{\circ}C$. Consequently, the ASTA value, hardness and capsaicin concentration of dried red pepper were maintained.

• Korean Chemical Engineering Research
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• v.57 no.3
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• pp.432-437
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• 2019

An atmospheric pressure floating electrode-dielectric barrier discharge (FE-DBD) system having flexible electrodes was developed and its plasma characteristics was investigated. Polytetrafluoroethylene (PTFE), polydiemethylsiloxane (PDMS), and polyethylene terephthalate (PET) were used as flexible dielectrics for flexible powered-electrodes. The optical intensity and electron temperature of the atmospheric pressure FE-DBD plasma increased with the voltage applied to the powered electrode, and increased in the order of PTFE < PDMS < PET at a fixed voltage. This behavior was explained in terms of the change in the capacitance of the flexible dielectrics with the dielectric type and voltage, implying that the plasma characteristics of an atmospheric pressure FE-DBD having flexible electrodes can be controlled by modulating the flexible dielectrics for the flexible powered-electrode and the voltage applied to the powered electrode. Because an atmospheric pressure FE-DBD system can generate a plasma along the curvature of skins, it is expected to have useful applications in plasma medicine.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.161.2-161.2
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• 2015

Melanin is a black pigment, responsible for hair and skin color. In order to find the melanin stimulatory technique which prove useful for a gray and a white hair-preventive agent or tanning agent, we developed atmospheric pressure plasma jet (APPJ) and tested for tyrosinase activity and melanin production in melanoma (B16F10) cells in vitro. We found plasma dose dependent increase in melanin production. To explore the contributing mechanism in melanin synthesis, intracellular reactive oxygen species (ROS) and MAP kinase signaling pathways were studied. Furthermore, the development of plasma technology for melanin synthesis and planning for in-vivo future studies will be discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1444-1446
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• 2009

The atmospheric pressure plasma polymerization of acrylate monomers was carried out to have dielectrics with easy preparation and high performance. The effects of discharge power, monomer concentration and deposition time on film properties were investigated using various characterization tools. With proper conditions, smooth dielectric layer of 100nm thickness was obtained. Dielectric property as organic dielectric layer has been studied for future applications in organic thin film transistors(OTFT).