• Title/Summary/Keyword: AS TA

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Crystalline Structure and Cu Diffusion Barrier Property of Ta-Si-N Films (Ta-Si-N박막의 조성에 따른 결정구조 및 구리 확산 방지 특성 연구)

  • Jung, Byoung-Hyo;Lee, Won-Jong
    • Korean Journal of Materials Research
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    • v.21 no.2
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    • pp.95-99
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    • 2011
  • The microstructure and Cu diffusion barrier property of Ta-Si-N films for various Si and N compositions were studied. Ta-Si-N films of a wide range of compositions (Si: 0~30 at.%, N: 0~55 at.%) were deposited by DC magnetron reactive sputtering of Ta and Si targets. Deposition rates of Ta and Si films as a function of DC target current density for various $N_2/(Ar+N_2)$ flow rate ratios were investigated. The composition of Ta-Si-N films was examined by wavelength dispersive spectroscopy (WDS). The variation of the microstructure of Ta-Si-N films with Si and N composition was examined by X-ray diffraction (XRD). The degree of crystallinity of Ta-Si-N films decreased with increasing Si and N composition. The Cu diffusion barrier property of Ta-Si-N films with more than sixty compositions was investigated. The Cu(100 nm)/Ta-Si-N(30 nm)/Si structure was used to investigate the Cu diffusion barrier property of Ta-Si-N films. The microstructure of all Cu/Ta-Si-N/Si structures after heat treatment for 1 hour at various temperatures was examined by XRD. A contour map that shows the diffusion barrier failure temperature for Cu as a function of Si and N composition was completed. At Si compositions ranging from 0 to 15 at.%, the Cu diffusion barrier property was best when the composition ratio of Ta + Si and N was almost identical.

Characteristics of Ta-Ti Gate Electrode for NMOS Device (NMOS 소자의 Ta-Ti 게이트 전극 특성)

  • Kang, Young-Sub;Seo, Hyun-Sang;Noh, Young-Gin;Lee, Chung-Keun;Hong, Shin-Nam
    • Journal of Advanced Navigation Technology
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    • v.7 no.2
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    • pp.211-216
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    • 2003
  • In this paper, characteristics of Ta-Ti alloy was studied as a gate electrode for NMOS devices to replace the widely used polysilicon. Ta-Ti alloy was deposited directly on $SiO_2$ by a co-sputtering method using two of Ta and Ti targets. The sputtering power of each metal target was 100W. To compare with Ta-Ti, Ta deposited with a 100W sputtering power was fabricated as well. In order to investigate the thermal/chemical stability of the Ta-Ti alloy gate, the alloy was annealed at $600^{\circ}C$ with rapid thermal annealer. No appreciable degradation of the device was observed. Also the results of electrical analysis showed that the work function of Ta-Ti metal alloy was about 4.1eV which was suitable for NMOS devices and sheet resistance of alloy was lower than that of polysilicon.

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The Study of Differences between Traffic Accident and Non-traffic Accident Patients in the Early Stage - by Analysis of Heart Rate Variability(HRV) and Visual Analogue Scale(VAS) - (교통사고 환자와 비교통사고 환자의 심박수 변이도와 통증 지수 차이 연구)

  • Lee, Jung-Min;Hong, Seo-Young
    • Journal of Korean Medicine Rehabilitation
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    • v.20 no.2
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    • pp.101-111
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    • 2010
  • Objectives : The purpose of this study was to investigate differences between traffic accident and non-traffic accident patients in the early stage, by analysis of the heart rate variability(HRV) and visual analogue scale(VAS). Methods : This study carried out on 38 patients who complained of nuchal or lower back pain. They have received hospital treatment in Dae-Jeon Univ. Cheonan Oriental Hospital. In the TA(Traffic accident) group, the pain caused by TA and in non-TA group, the pain caused by other reasons. We measured HRV and VAS twice(pre-treatment(Tx.) and post-Tx.). Then we analyzed the data. Results : As time goes by, patients who complained of pain showed the inclination to improve ability to balance autonomic nerve system. And fatigue and pain were improved. But they showed the inclination to increase stress index. At pre-Tx., TA group had more stress and worse ability to balance autonomic nerve system, but showed lower fatigue index than non-TA group. But, as time goes by, in TA group the fatigue and autonomic balance got worse. At pre-Tx., non-TA group complained of more severe pain than TA group, but at post-Tx., TA group complained of more severe pain than non-TA group. In other words, in TA group, the decreasing rate of pain was lower than non-TA group. Conclusions : Results from this investigation showed that TA have a negative effect on stress index, ability to balance autonomic nerve system, fatigue index and decreasing rate of pain. These results are expected to consider characteristics of patients who complained of pain caused by TA.

Expression of the TaCR1 Gene Induced by Hessian Fly Larval Infestation in Wheat Carrying a H21 Gene.

  • Jang, Cheol-Seong;Seo, Yong-Weon
    • KOREAN JOURNAL OF CROP SCIENCE
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    • v.49 no.2
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    • pp.148-153
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    • 2004
  • The Hessian fly, Mayetiola destructor (Say), is known to be one of the major insect herbivores of wheat worldwide. In order to provide molecular events on interactions of the NIL with H21 and larvae of Hessian fly biotype L, the TaCR1 gene, Triticum aestivum cytokinin repressed 1, was isolated through the suppression subtractive hybridization, which was constructed using stems of the NIL with H21 at 6 days after infestation as tester and stems of the recurrent parent Coker797 without H21 at 6 days after infestation as driver. Transcript levels of TaCR1 mRNA in the NIL with H21 were highest at 6 days after infestation but in the Coker797 without H21 until 8 days were similar with those of non-infested plants. Expression of the TaCR1 gene was decreased at early time and then recovered after wounding or $H_2O$$_2$ treatment as well as 6-BAP treatment. Transcripts levels of the TaCR1 gene was changed after MeJA, SA, ethephone, or ABA treatment. In drought treatment, the TaCRl gene were increased at early stage of stress and then decreased at late stage. Expression of the TaCRl gene was continued to decrease through 24 h in the cold treatment. Although the TaCRl gene is increased through infestation in NIL with H21, further study was required to elucidate a role on resistance against larvae of Hessian fly. However, the TaCR1 gene could be used as marker gene on response of plants against abiotic stresses as well as application of plants with several hormones.

Characteristics of Sputtered Ta films by Statistical Method (통계적 실험 방법에 의한 Ta 박막의 증착 특성 연구)

  • Seo, Yu-Seok;Park, Dae-Gyu;Jeong, Cheol-Mo;Kim, Sang-Beom;Son, Pyeong-Geun;Lee, Seung-Jin;Kim, Han-Min;Yang, Hong-Seon;Park, Jin-Won
    • Korean Journal of Materials Research
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    • v.11 no.6
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    • pp.492-497
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    • 2001
  • We report the characteristics and the dependence of sputter-deposited Ta films on the process parameters. The properties of as-deposited Ta films such as deposition rate, resistivity, Rs uniformity, reflectivity, and stress were investigated and analyzed as a function of process parameter using a statistical experimental method. The functional relationships between the independent and dependent variables were predicted by surface response. The optimal deposition condition of DC magnetron sputtered Ta films was obtained at the chamber pressure of 2 mTorr, power density of 8 W/$\textrm{cm}^2$, and substrate temperature of 2$0^{\circ}C$ by means of resistivity and Rs uniformity. The fitness value for quadratic model as evaluated by the R- square was 0.85~ 0.9 without pooling. The as-deposited Ta films exhibited the resistivity of ~180$\mu$$\Omega$cm with Rs uniformity of ~2%. The transmission electron microscopy and x-ray diffractometry identified that the phase of as-deposited film was $\beta$-Ta having the grain size of 100~200.

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Study on the formation of Ta-silicides and the behavior of dopants implanted in the poly-Si substrates (Dopant가 주입된 poly-Si 기판에서 Ta-silicides의 형성 및 dopant 의 거동에 관한 연구)

  • Choi, Jin-Seok;Cho, Hyun-Choon;Hwang, Yu-Sang;Ko, Chul-Gi;Paek, Su-Hyon
    • Korean Journal of Materials Research
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    • v.1 no.2
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    • pp.99-104
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    • 1991
  • Trantalum thin films have been prepared by DC sputtering onto As, P, and $BF_2$-implanted ($5{\times}10^15cm^-2$) poly-silicon. The heat treatments by rapid thermal annealing(RTA) have been applied to these samples for the formation of silicides. We have studied the application possibility of Ta-silicide as gate electrode and bit line. The silicide formation and the dopant diffusion after the heat treatment were investigated by various methods, such as four-point probe, X-ray, SEM cross sectional views, ${\alpha}$-step, and SIMS, The tantalum disilicide($TaSi_2$) are formed in the temperature above $800^{\circ}C$, and grown in colummar structure. $TaSi_2$ has a good surface roughness, having range from $80{\AA}\;to\;120{\AA}$, and implanted dopants are incoporated into the $TaSi_2$ layer during the RTA temperature.

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A Study on the single crystal growth of the optic-grade $LiTaO_3$ as a electro-optic materials

  • Kim, B.k.;J.K. Yoon
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1996.06a
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    • pp.526-526
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    • 1996
  • The single crystal of LiTaO3 is well known eletro-optic material as well as the piezoelectric one applied to SAW filter. LiTaO3 has large electro-optic effects, so applied to optical switch, acosto-optic deflector, and optical memory device using photorefractive effects. The crystal growth of SAW-grade LiTaO3 has been studied many aspects, but there is no detail research about optic-grade crystal growth. The conditions of optic-grade LiTaO3 single crystal are as below. The optical transmittance must be over 75%, and axial and radial concentratiom uniformity below 1%. The variation of Curie temperature depending on Li/Ta ratio must be also below 2$^{\circ}C$ and no internal no internal cracks and defects. Because of the limitation of crystal quality, the growing of optic-grade LiTaO3 single crystal is very difficult compared with the growing of SAW-grade. In this research, upper conditions of optic-grade single crystal was investigated after growing of 1 inch diameter and 1.5 inch length LiTaO3 single crystal having no internal cracks and defects using Czochralski method. Curie temperature was determined with DSC and measuring capacitance and lattice parameter was calculated about the grown crystal and ceramic powder samples of various Li/Ta ratio. The result of Tc variation was below 1.2$^{\circ}C$ all over the grown crystal, so it is confirmed that LiTaO3 was grown under congruent melting composition having optical homogeniety. Also, the optical transmittance was about 78%, which was sufficient for optical device.

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Mutagenicity of Chinese Herbal Anti-cancer Drugs and Their Antimutagenic Activity to Base-pair Substitution Mutagen (치암중초약의 돌연변이유발 및 돌연변이유발 억제효과)

  • Lee, Hyun-Chul
    • The Journal of the Korean Society for Microbiology
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    • v.22 no.2
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    • pp.185-193
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    • 1987
  • Ten species of herbae, which have been used to treat cancers in Chinese medicine, were tested to investigate their mutagenicity or antimutagenicity in S. typhimurium TA97, TA98, TA100, TA1535, and TA1538. Scolopendra centipede was weakly active in reversion of the frameshift mutation in S. typhimurium TA97 strain and the base-pair substitution in TA100 and TA1535 strains. Other herbae such as Coix lachryma, Dianthus superbus, Tricanthoshse kirilowii, Eupatorium formosanum, Lithospermum erythrorhizon, Ansaema japonicum, Curcuma zedoaria, Helicteres angustifolia, and Euonymus sieboldianus did not show any of the mutagenic potential, regardless of the metabolic activation with rat hepatic microsomal fraction. Dianthus superbus, Eupatorium formosanum, and Euonymus sieboldianus exhibited suppressive activities on microbial mutagenesis of N-methyl-N'-nitrosoguanidine, a base-pair substitution mutagen, in TA1535 and TA100 tester strains. The antimutagenic activities of Dianthus superbus and Euonymus sieboldianus appeared to be dose-dependant.

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EFFECT OF PARAMAGNETIC Co$_{67}$Cr$_{33}$ UNDERLAYER ON CRYSTALLOGRAPHIC AND MAGNETIC CHARACTERISTICS OF Co-Cr-Ta LAYERS IN PERPENDICULAR MAGNETIC RECORDING MEDIA

  • Kim, Kyung-Hwan;Nakagawa, Shigeki;Takayama, Seiryu;Naoe, Masahiko
    • Journal of the Korean institute of surface engineering
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    • v.29 no.6
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    • pp.847-850
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    • 1996
  • The bi-layered films composed of Co-Cr-Ta layers and paramagnetic $Co_{67}Cr_{33}$ underlayer were deposited by suing Facing Targets Sputtering(FTS). The effects of $Co_{67}Cr_{33}$ underlayer on the crystallographic and magnetic characteristics of the Co-Cr-Ta layer deposited on the underlayer was investigated. The diffraction intensity $I_{p(002)}$ of Co-Cr-Ta layers on the $Co_{67}Cr_{33}$ layer was stronger than that of single layer and Co-Cr-Ta/Ti double layer. Therefore, the crystallinity of Co-Cr-Ta layer was imporved by the $Co_{67}Cr_{33}$ underlayer rather than Ti ones. However, te coercivity H$_{c\bot}$ of Co-Cr-Ta layers deposited on $Co_{67}Cr_{33}$ underlayer was as low as 250 Oe even at substrate temperature of $220^{\circ}C$. This H$_{c\bot}$ decrease seems to be attributed to the effect of the $Co_{67}Cr_{33}$ underlayer as well as interval time between deposition of the underlayer and the Co-Cr-Ta layer.

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