• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 1999.06a
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• pp.67-72
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• 1999

Scanning probe Microscope(SPM) such as Scanning Tunneling Microscope(STM) and Atomic Force Microscope(AFM) was shown to be the powerful tool for nano-scale characterization of material surfaces Using this technique, surface morphology of the cyclically deformed Cu or Cu-Al single crystal was observed. The surface became proportionately rough as the number of cycles increased, but after some number of cycles no further change was observed. Slip steps with the heights of 100 to 200 nm and the widths of 1000 to 2000 nm were prevailing at the stage. The slipped distance of one slip system at the surface was not uniform. and formation of the extrusions or intrusions was assumed to occur such place. By comparing the morphological change caused by crystallographic orientation, strain amplitude, number of cycles or stacking fault energy, some interesting results which help to clarify the basic mechanism of fatigue damage were obtained. Furthermore, applicability of the scanning tunneling microscopy to fatigue damage is discussed.

• Journal of Korean Ophthalmic Optics Society
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• v.10 no.2
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• pp.119-126
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• 2005

The purpose of this study was analyzed to compare on the physical characters of two companies of color contact lenses. Artificial tear solution was used for measuring the rate of protein deposits and wettability. The surface roughness of lenses was measured by SEM(scanning electron microscope, Japan) and AFM(atomic force microscope, MultimodeTM, USA). As a results, The color contact lenses was not different from general soft contact lenses in a respect of other properties. However, the colored contact lenses showed a severe crack on the surface under SEM observation. There was no irregularity on the surface of the colored contact lenses in AFM photograph. The dyes were deposited in inside of lenses by microscope observation.

• Journal of Mechanical Science and Technology
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• v.18 no.5
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• pp.789-797
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• 2004

The nanoscale sensing and manipulation have become a challenging issue in micro/nano-robotic applications. In particular, a feedback sensor-based manipulation is necessary for realizing an efficient and reliable handling of particles under uncertain environment in a micro/nano scale. This paper presents a piezoresistive MEMS cantilever for nanoscale force measurement in micro robotics. A piezoresistive MEMS cantilever enables sensing of gripping and contact forces in nanonewton resolution by measuring changes in the stress-induced electrical resistances. The calibration of a piezoresistive MEMS cantilever is experimentally carried out. In addition, as part of the work on nanomanipulation with a piezoresistive MEMS cantilever, the analysis on the interaction forces between a tip and a material, and the associated manipulation strategies are investigated. Experiments and simulations show that a piezoresistive MEMS cantilever integrated into a micro robotic system can be effectively used in nanoscale force measurements and a sensor-based manipulation.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.37 no.4
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• pp.467-473
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• 2013

In this study, two-dimensional finite element models were developed and experiments were conducted using an atomic force microscope to investigate the tribological characteristics of an SU-8 layer coated on a patterned wafer for microsystem applications. The results revealed that both the adhesion and the friction forces measured by the atomic force microscope were lower for the SU-8 coated surface than for the bare silicon surface. This is attributed to the hydrophobicity of SU-8. Another important result derived from the finite element analysis was the critical load required to fracture the SU-8 film with respect to the thickness. The critical loads for thicknesses of 200, 400, and 800 nm were approximately 13, 22, and 28 mN, respectively, which corresponded to a Hertzian contact pressure of 1.2-1.8 GPa. These results will aid in the design of a suitable SU-8 thickness for microsystem components that are in contact with one another.

• Clean Technology
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• v.20 no.2
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• pp.130-135
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• 2014

It is investigated that the surface properties of mercaptopyruvic-acid layer formed on gold surfaces may make an effect on the distribution of either gold particle adsorbed to the zirconia surface or vice versa. For the investigation, the atomic force microscope was used to measure the surface forces between the surfaces as a function of the salt concentration and pH value. The forces were quantitatively analyzed with the derjaguin-landau-verwey-overbeek (DLVO) theory to estimate the electrostatic properties, potential and charge density, of the surfaces for each condition of salt concentration and pH value. The estimatedvalue dependence on the salt concentration was explained with the law of mass action, and the pH dependence was interpreted with the ionizable groups on the surface. The salt concentration dependence of the surface properties, found from the measurement at pH 4 and 8, was predictable from the law. It was found that the mercaptopyruvic-acid layer had higher values for the surface charge densities and potentials than the zirconia surfaces at pH 4 and 8, which may be attributed to the ionizedfunctional-groups of the mercaptopyruvic-acid layer.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.2
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• pp.148-153
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• 2013

This study demonstrates a novel hybrid surface polishing process combining non-traditional electrochemical polishing(ECP) with external artificial ultrasonic vibration. ECP, typical noncontact surface polishing process, has been used to improve surface quality without leaving any mechanical scratch marks formed by previous mechanical processes, which can polish work material by electrochemical dissolution between two electrodes surfaces. This research suggests vibration electrochemical polishing(VECP) assisted by ultrasonic vibration for enhancing electrochemical reaction and surface quality compared to the conventional ECP. The localized roughness of work material is measured by atomic force microscopy(AFM) for detailed information on surface. Besides roughness, overall surface quality, material removal rate(MRR), and productivity etc. are compared with conventional ECP.

• Journal of Magnetics
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• v.14 no.4
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• pp.172-174
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• 2009

Nanolithography by atomic force microscope local oxidation was applied to the fabrication of planar-type Ni/Ni oxide/Ni junctions from 10 nm-thick Ni films. The junction characteristics were sensitive to the lithography conditions such as the bias voltage. Successful oxidation produced junctions of nonlinear current-voltage characteristics, implying the formation of oxide barriers. Magnetoresistance (MR) at low temperatures resembled that of spin valves.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.2
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• pp.194-201
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• 2005

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

• International Journal of Precision Engineering and Manufacturing
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• v.7 no.4
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• pp.8-13
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• 2006

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.637-640
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• 2005

In this paper, we investigate the characteristics of a piezoresistive AFM cantilever in the range of $0\~30{\mu}N$ by using nano force calibrator (NFC), which consists of a high precision balance with resolution of 1 nN and 1-D fine positioning stage. Brief modeling of the cantilever is presented and then, the calibration results are shown. Tests revealed a linear relationship between the probing force and sensor output (resistance change), and the force vs. deflection. From this relationship, the force constant of the cantilever was calculated to 3.45 N/m with a standard deviation of 0.01 N/m. It shows that there is a big difference between measured and nominal spring constant of 1 N/m provided by the manufacturer s specifications.