• 제목/요약/키워드: A-LTPS

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LTPS TFT LCD 패널의 광 센서를 위한 dual slope 보정 회로 (Design of Readout Circuit with Dual Slope Correction for photo sensor of LTPS TFT-LCD)

  • 우두형
    • 대한전자공학회논문지SD
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    • 제46권6호
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    • pp.31-38
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    • 2009
  • 휴대용 기기의 소비 전력을 낮추고 영상의 질을 개선하기 위해, 주변 밝기에 따라서 LCD 모듈의 백라이트를 조정하는 방법을 사용할 수 있다. 이를 효과적으로 구현하기 위해서 LCD 패널에 광 센서와 신호취득 회로를 집적하고자 했으며, LTPS TFT 공정을 이용하여 설계했다. 서로 다른 LCD 패널의 광 센서에 대한 특성 편차를 보정하기 위해 새로운 개념의 start-up 보정 방식을 제안하였다. 이와 더불어 광 전류 정보를 디지털 형태로 전달하기 위해 time-to-digital 방식을 사용하였으며, 이를 start-up 보정 방식과 효과적으로 결합하는 dual slope 보정 방법을 제안하였다. LTPS TFT 공정을 이용하여 최종적인 신호취득 회로를 구현하고자, 간단하고 안정적인 회로 구조와 타이밍을 제안하고 설계 및 검증을 진행했다. 설계한 신호취득 회로는 별도의 검사 설비 없이 광 센서 편차의 보정이 가능하며, 60dB 범위의 입력 광에 대해 10배수 구간 마다 4 단계의 디지털 데이터를 출력한다. 신호취득 속도는 100Hz이며, 디지털 변환의 선형 오차는 18% 미만이다.

An integrated photodiode fabricated by low temperature poly-Si TFT process

  • Lee, Seung-Min;Kim, Dong-Lim;Jung, Tae-Hoon;Heo, Kon-Yi;Kim, Hyun-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1340-1343
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    • 2007
  • We have simultaneously fabricated LTPS TFTs and integrated photodiodes on the same glass substrates without any additional LTPS process. The structure of an integrated photodiode is a lateral p-i-n diode with a gate. The performances of a photodiode were improved at a negative gate voltage.

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SELAX Technology for Poly-Si TFTs Integrated with Amorphous-Si TFTs

  • Kaitoh, Takuo;Miyazawa, Toshio;Miyake, Hidekazu;Noda, Takeshi;Sakai, Takeshi;Owaku, Yoshiharu;Saitoh, Terunori
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.903-906
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    • 2008
  • We developed the advanced LTPS (A-LTPS) manufacturing process. The a-Si TFT process was combined with selectively enlarging laser crystallization (SELAX) technology to improve the carrier mobility in the region where the peripheral circuits are to be fabricated. A 2.4-inch IPS-pro LCD panel for personal digital assistant use was successfully fabricated using the developed technology.

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Recent Trend of Low Temperature Poly Silicon Technologies in TFT-LCD

  • Kim, C.W.;Kim, H.J.;Lee, H.G.;Min, H.G.;Hwang, J.W.;Cho, S.W.;Ryu, C.K.;Lee, C.;Kang, M.K.;Chung, K.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.46-49
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    • 2002
  • Recent trends of low-temperature polycrystalline Si (LTPS) TFT technologies are presented. Characteristics of LTPS TFT processes are compared with those of a-Si TFT's. In order to compete with well-established a-Si TFT-LCD technology, LTPS process has to be as simple as possible. One of the most critical processes, recrystallization of a-Si thin films, could be the process for the differentiation of LTPS technology. Along with these technical reviews, a recent development of the 5.0-inch LTPS TFT-LCD is presented. In order to achieve high-performance display characteristics and save the power consumption, the transflective mode is adopted. The 5.0-inch display with 186 pixel-per-inch, high-resolution LCD was measured to be 10% for the reflectance and 70:1 for the contrast ratio. This display is designed for a high information content hand-held PC (HHPC) application.

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Design of LTPS TFT Current Mode Multiplexer and MUX-based Logic Gates

  • Jeong, Ju-Young;Hong, Moon-Pyo
    • Journal of Information Display
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    • 제9권3호
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    • pp.1-7
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    • 2008
  • With the aim of creating a high-quality display system with value-added functions, we designed a current mode multiplexer for LTPS TFT devices. The multiplexers had less than 1 volt logic swing, and speed improvement was evident compared with that of conventional CMOS architecture. We refined the multiplexer to achieve a more stable current steering operation. By using the versatility of the multiplexer, a new NAND/AND and NOR/OR logic gates were designed through the simple modification of signal connections. Two micron LTPS TFT parameters were used during the HSPICE simulation of the circuits.

Laser crystallization in active-matrix display backplane manufacturing

  • Turk, Brandon A.;Herbst, Ludolf;Simon, Frank;Fechner, Burkhard;Paetzel, Rainer
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1261-1262
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    • 2008
  • Laser-based crystallization techniques are ideally-suited for forming high-quality crystalline Si films on active-matrix display backplanes, because the highly-localized energy deposition allows for transformation of the as-deposited a-Si without damaging high-temperature-intolerant glass and plastic substrates. However, certain significant and non-trivial attributes must be satisfied for a particular method and implementation to be considered manufacturing-worthy. The crystallization process step must yield a Si microstructure that permits fabrication of thin-film transistors with sufficient uniformity and performance for the intended application and, the realization and implementation of the method must meet specific requirements of viability, robustness and economy in order to be accepted in mass production environments. In recent years, Low Temperature Polycrystalline Silicon (LTPS) has demonstrated its advantages through successful implementation in the application spaces that include highly-integrated active-matrix liquid-crystal displays (AMLCDs), cost competitive AMLCDs, and most recently, active-matrix organic light-emitting diode displays (AMOLEDs). In the mobile display market segment, LTPS continues to gain market share, as consumers demand mobile devices with higher display performance, longer battery life and reduced form factor. LTPS-based mobile displays have clearly demonstrated significant advantages in this regard. While the benefits of LTPS for mobile phones are well recognized, other mobile electronic applications such as portable multimedia players, tablet computers, ultra-mobile personal computers and notebook computers also stand to benefit from the performance and potential cost advantages offered by LTPS. Recently, significant efforts have been made to enable robust and cost-effective LTPS backplane manufacturing for AMOLED displays. The majority of the technical focus has been placed on ensuring the formation of extremely uniform poly-Si films. Although current commercially available AMOLED displays are aimed primarily at mobile applications, it is expected that continued development of the technology will soon lead to larger display sizes. Since LTPS backplanes are essentially required for AMOLED displays, LTPS manufacturing technology must be ready to scale the high degree of uniformity beyond the small and medium displays sizes. It is imperative for the manufacturers of LTPS crystallization equipment to ensure that the widespread adoption of the technology is not hindered by limitations of performance, uniformity or display size. In our presentation, we plan to present the state of the art in light sources and beam delivery systems used in high-volume manufacturing laser crystallization equipment. We will show that excimer-laser-based crystallization technologies are currently meeting the stringent requirements of AMOLED display fabrication, and are well positioned to meet the future demands for manufacturing these displays as well.

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A 2.4-in QVGA p-Si LTPS AMLCD for Mobile Application

  • Chen, Yu-Cheng;Lin, Tai-Ming;Hsu, Tien-Chu
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1029-1032
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    • 2005
  • A 262K-color QVGA LTPS AMLCD was developed. This panel has integrated gate driver and data multiplexer (1:3) by p_Si LTPS TFT process. The commercialized driver IC was adopted to implement this display. Fine image quality, low powerconsumption and cost-efficiency feature make the panel be suitable for mobile application.

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Thin Film Transistor (TFT) Pixel Design for AMOLED

  • Han, Min-Koo;Lee, Jae-Hoon;Nam, Woo-Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.413-418
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    • 2006
  • Highly stable thin-film transistor (TFT) pixel employing both low temperature polycrystalline silicon (LTPS) and amorphous silicon (a-Si) for active matrix organic light emitting diode (AMOLED) is discussed. ELA (excimer laser annealing) LTPS-TFT pixel should compensate $I_{OLED}$ variation caused by the non-uniformity of LTPS-TFT due to the fluctuation of excimer laser energy and amorphous silicon TFT pixel is desired to suppress the decrease of $I_{OLED}$ induced by the degradation of a-Si TFT. We discuss various compensation schemes of both LTPS and a-Si TFT employing the voltage and the current programming.

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Design of Mini-LVDS Output Buffer using Low-Temperature Poly-Silicon (LTPS) thin-film transistor (TFT)

  • Nam, Young-Jin;Min, Kyung-Youl;Yoo, Chang-Sik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.685-688
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    • 2008
  • Mini-LVDS has been widely used for high speed data transmission because it provides low EMI and high bandwidth for display driver. In this paper, a Mini-LVDS output buffer with LTPS TFT process is presented which provides sufficient performance in the presence of large variation in the threshold voltage and mobility and kink effect.

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Design of line memory with low-temperature poly-silicon(LTPS) thin-film transistor (TFT) for system-on-glass (SoG)

  • Choi, Jin-Yong;Min, Kyung-Youl;Yoo, Chang-Sik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.417-420
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    • 2007
  • A 12k-bit SRAM has been developed for line memory of system-on-glass (SoG) with lowtemperature poly-silicon (LTPS) thin film transistor (TFT). For accurate sensing even with the large variation and mismatches in the characteristics of LTPS TFT, mismatch immune sense amplifier is developed. The SRAM shows 30ns read access time with 7V supply voltage while dissipating 4.05mW and 1.75mW for write and read operation, respectively

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