• Journal of the Korean Magnetics Society
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• v.27 no.4
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• pp.123-128
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• 2017

The magnetic isotropy property from the magnetoresistance (MR) curve and magnetization (MH) loop for the PtMn based spin valve (SV) multilayer films fabricated with different the bottom structure after post-annealing treatment was investigated. The exchange biased coupling field ($H_{ex}$), coercivity ($H_c$), and MR ratio of Glass/Ta(10 nm)/CoFe(6 nm)/Cu(2.5 nm)/CoFe(3 nm)/Ta(4 nm) SV multilayer film without antiferromagnetic PtMn layer are 0 Oe, 25 Oe, and 3.3 %, respectively. MR curve for the Glass/Ta(10 nm)/CoFe(6 nm)/Cu(2.5 nm)/CoFe(3 nm)/PtMn(6 nm)/Ta(4 nm) SV multilayer film showed $H_{ex}=2Oe$, $H_c=316Oe$, and MR (%) = 4.4 % with one butterfly MR curve having by the effect of antiferromagnetic PtMn layer. MR curve for the dualtype Glass/Ta(10 nm)/CoFe(6 nm)/Cu(2.5 nm)/CoFe(3 nm)/PtMn(6 nm)/CoFe(3 nm)/Cu(2.5 nm)/CoFe(6 nm)/Ta(4 nm) SV multilayer film showed $H_c=37.5Oe$ and 386 Oe, MR = 3.5 % and 6.5 % with two butterfly MR curves and square-like hysteresis MH loops. The anisotropy property in CoFe spin valve-PtMn multilayer is neglected by the effects of a very small value of $H_{ex}$ and a very slightly shape magnetic anisotropy. This result is possible to explain the effect of magnetization configuration spin array of the bottom SV film and the top SV film of PtMn layer.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.5
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• pp.486-492
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• 1999

The purpose of this research was to find out what is the dominant factor determining the $H_{ex}$ and the $H_C$ of Mn-Ir/Ni-Fe multilayers with different buffer layers. Regardless of (111) texture of Mn-Ir layer, all samples showed over the $H_{ex}$ of 155 Oe. We found out the $H_{ex}$ and the $H_C$ of Mn-Ir/Ni-Fe multilayers depend on interface morphology and grain size of Mn-Ir layer at the interface between Mn-Ir and Ni-Fe layers. The dependence of magnetroesistance ratio and coupling field on the thickness of ferromagnetic layer, thickness of Cu layer and different buffer layers have been studied. Maximum magnetoresistance ratio appeared for the sample Ta(5 nm)/Mn-Ir(10 nm)/Ni-Fe(7.5 nm)/Cu(2 nm)/Ni-Fe(6 nm)/Ta(5 nm)/Si. Magnetoresistance ratio may be related to grain of ferromagnetic layer. Coupling field may be related to the roughness and the grain size of ferromagnetic layer in the spin-valve multilayers.

• Applied Microscopy
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• v.30 no.3
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• pp.249-254
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• 2000

We investigated the microstructure, electrical property, and magnetic property of Co/Al multilayer after annealing treatment. CoAl was formed during depositing Co/Al multilayer due to the interfacial reaction. After annealing treatment, $Co_2Si$ was formed at the Co/Si interface. The sheet resistance of Co 2 nm/Al 2 nm multilayer have the lowest value and the Rs of multilayer decreased with the increase of annealing temperature due to the formation of $Co_2Si$ phase. The Ms of 2 nm Co/2 nm Al multilayer have the lowest value and the Ms of multilayer increased with the increase of film thickness.

• Korean Journal of Optics and Photonics
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• v.9 no.5
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• pp.300-306
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• 1998

We have studied the optical effects in dielectric multilayer due to the interdiffusion formed during the deposition process. We suggest a numerical method to calculate the optical properties of periodical multilayer thin-films with gradient-index profiles. Using this method the spectral transmittance and reflectance were obtained for Fabry-Perot type filters, broad-band total reflectors and antireflection filters with interdiffusion layers. Interdiffusion reduced the spectral band width of high reflectance in total reflectors, and deteriorated the characteristics of multilayer AR-coatings leading to a large variation of reflectance if the number of the layers is large.

• Korean Journal of Optics and Photonics
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• v.8 no.4
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• pp.283-290
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• 1997

Scattering measurement on high reflection dielectric multilayer mirrors deposited on quartz substrate in a vacuum chamber were performed using a total integrated scattering method. Scattering of (Ta$_2$$O_5$/SiO$_2$) multilayer mirrors deposited at 250-30$0^{\circ}C$ was 0.048-0.050% and did not change with an annealing at 30$0^{\circ}C$ for 4 hours. On the other hand, scattering of (TiO$_2$/SiO$_2$) multilayer mirror at 25$0^{\circ}C$ was 0.029% and it showed the heavy tensile stress after an annealing. The rms roughness of (Ta$_2$$O_5$/SiO$_2$) multilayer mirror was almost the same as that of (TiO$_2$/SiO$_2$)multilayer mirror. The column size of Ta$_2$$O_5$ film was smaller than that of TiO$_2$film and the packing density of (Ta$_2$$O_5$/SiO$_2$) multilayer mirrors was higher than that of (TiO$_2$/SiO$_2$) multilayer mirror. It seems that the higher packing density and smaller column size of Ta$_2$$O_5$ films lead to more scattering.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.54-54
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• 2001

End hall type 이온건을 이용하여 다층 다이아몬드상 차본(DLC) 필름을 M2 steel 기판 위에 합성하였다. 다충 다이아몬드상 카본 필름은 순수 DLC 필름과 실라콘 함유 D DLC 필름의 조합으로 구성되어 있으며, $C_6H_6$ 및 수소 희석된 30% 를 사용하여 증착 하였다. 생성된 DLC 박막의 조성은 $C_6H_6$과 $SiH_4$ 가스의 비를 조절함으로써 변화시켰으며, 250 kHz의 고주파 전원을 바이어스 전원으로 사용하여 박막의 물성을 변화시켰다. DLC 박막의 두께와 다층의 구조 및 종류(2충, 4충)는 코팅 공정의 실험 변수로서 변화시켰다. 직경 3 mm의 루비볼을 사용하여 ball-on-disk 방식으로 마모 시험을 행하였으며, 하중은 490 g, 500 rpm에서 상대습도를 5 % 이하와 80 % 이상으로 변화시켜가며 시행하였다. 100,000 cycle 회전 후 측정된 시편의 마모상태는 5 % 이하의 습 도에서 4층 구조의 박막이 2충 구조의 박막보다 2배 이상 낮은 마모률을 보였으며 그 값은 각각 $2~3{\times}\;10^{-8}\;\textrm{mm}^3/rev$와 $1~2{\times}\;10^{-7}\;\textrm{mm}^3/rev$로 나타내었다. 80% 이상의 습도에서도 마모률의 변화는 저습에서의 경우와 유사하였다. 또한 Si함유 DLC 다층 박막이 저습 및 고습에서 더욱 안정한 마찰 마모 거동을 보였다.

• 전자공학회논문지 IE
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• v.44 no.2
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• pp.21-25
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• 2007

Multilayer transparent electromagnetic wave shielding film with 1 m wide, was fabricated by using roll to roll DC plasma coating with ITO and Ag layer on PET substrate. By optimizing properly the design parameters, such as a processing condition, the surface resistance and the thickness of each layers, the homogeneous film could be obtained. Electromagnetic wave shielding film showed the high shielding effectiveness of 23dB(99.5%) in 2-18 GHz range and the transmittance of 83.1% in 400-700nm.

• Korean Journal of Materials Research
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• v.4 no.5
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• pp.493-501
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• 1994

DSC와 XRD를 사용하여 Zr/Si 다층박막의 고상반응에 의한 비정질상과 결정상 생성 및 상전이를 확인하고 이를 유효구동력 개념과 유효생성열 개념 및 phase determining factor(PDF)모델을 이용하여 예측한 결과와 비교하였다. Zr/Si 다층박막은 비정질호 반응이 잘 일어났으며 이는 유효구동력 개념으로 예측한 바와 일치하였다. Zr/Si 계에서 생성되는 최초의 결정상은 ZrSi 였으며 유효생성열과 PDF모델로부터 예측된 최초의 결정상은 PDF 모델의 예측 결과와 일치하였다. Zr/Si 다층박막의 원자조성비가 1대 1일경우와 1대 2일 경우의상전이는 ZrSi$\longrightarrow$$ZrSi_{2}$로 되었으며 이러한 상전이 과정은 유효생성열 다이아그램으로 해석되었다. ZrSi의 생성기구는 핵생성이 율속임을 규명하였고 ZrSi와 $ZrSi_{2}$의 생성에 필요한 활성화에너지는 1.64$\pm$0.19eV와 2.28$\pm$0.36eV이었다.

• Journal of the Korean Magnetics Society
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• v.27 no.3
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• pp.82-86
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• 2017

The IrMn based GMR-SV films with three different buffer layers were prepared on Corning glass by using ion beam deposition and DC magnetron sputtering method. The major and minor magnetoresistance curves for three different buffer layers beneath the structure of NiFe(15 nm)/CoFe(5 nm)/Cu(2.5 nm)/CoFe(5 nm)/NiFe(7 nm)/IrMn(10 nm)/Ta(5 nm) at room temperature have shown different magnetoresistance properties. When the samples were annealed at $250^{\circ}C$ in vacuum, the magnetoresistance ratio, the coercivity of pinned ferromagnetic layer, and the interlayer coupling field of free ferromagnetic layer were enhanced while the exchange bias coupling field did not show noticeable changes.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.365-365
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• 2013

본 실험에서는 RF magnetron sputter장비와 evaporator장비를 이용하여 다층박막 IGZO/Ag/IGZO를 제작하였다. 소결된 타겟은 In:Ga:ZnO 1:1:1mol%로 조성된 타겟을 사용하였으며, Ag는 99.999%의 순도를 가진다.다층박막 OMO구조의 Oxide layer는sputter장비를 이용 IGZO막을 제작하였으며, Metal layer는 evaporator 장비를 이용 Ag막을 제작하였다. 변수로는 Metal layer 두께에 따른 구조적, 광학적 특성 변화를 연구하였다. Oxide layer의 RF sputter 공정 조건으로는 초기압력 $3.0{\times}10^{-6}$ Torr 이하로 하였으며, 증착압력 $2.0{\times}10^{-2}$ Torr, RF power 30 W, Ar 50 sccm으로 고정시켰으며, Metal layer의 evaporator 공정조건으로는 $5.0{\times}10^{-6}$ 이하, 전압은 0.3V, 기판 회전속도는 2RPM 두께는 Thickness moniter로 3. 5. 7. 9. 11. 13. 15 nm를 확인하며 증착하였다. 분석결과로는 AFM측정결과 거칠기는 2 nm이하의 거칠기를 확인했으며, XRD측정결과 Bragg's 법칙($2\;dsin{\Theta}=n{\lambda}$)를 만족하는 피크를 찾을 수 없어 비정질 구조임을 확인할 수 있었다. 투과도 측정결과 가시광 영역에서 최대 80% 이상의 투과율을 보여주었으며, IR영역에서는 30% 이하의 투과율을 보여주었다. 에너지 밴드갬 계산결과 4.5~4.6 eV를 갖는 것을 확인하였으며, Low-e 분야에 사용가능함을 보여주었다.