• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.12
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• pp.142-148
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• 1995

Sb ${\delta}$-doped Si layers were grown by Si MBE (Molecular Beam Epitaxy) system using substrate temperature modulation technique. The Si substrate temperatures were modulated between 350$^{\circ}C$ and 600$^{\circ}C$. The doping profile was as narrow as 41$\AA$ and the doping concentration of up to 3.5${\times}10^{20}cm^{3}$ was obtained. The film quality was as good as bulk material as verified by RHEED (Reflected High Energy Electron Diffraction), SRP (Spreading Resistance Profiling) and Hall measurement. Since the film quality is not degraded after the growth a Sb ${\delta}$-doped Si layer, the ${\delta}$-doped layers can be repeated as many times as we want. The doping technique is useful for many Si devices including small scale devices and those which utilize quantum mechanical effects.

• Journal of the Microelectronics and Packaging Society
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• v.9 no.3
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• pp.1-6
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• 2002

A low temperature process technology of copper thin films has been developed by a chemical vapor deposition technology for multi-level metallzations in ULSI fabrication. The copper films were deposited on TiN/Si substrates in helium atmosphere with the substrate temperature between $130^{\circ}C$ and $250^{\circ}C$. In order to get more reliable metallizations, effects on the post-annealing treatment to the electrical properties of the copper films have been investigated. The Cu films were annealed at the $5 \times10^{-6}$ Torr vacuum condition and the electrical resistivity and the nano-structures were measured for the Cu films. The electrical resistivity of Cu films shown to be reduced by the post-annealing. The electrical resistivity of 2.0 $\mu \Omega \cdot \textrm{cm}$ was obtained for the sample deposited at the substrate temperature of $180^{\circ}C$ after vacuum annealed at $300^{\circ}C$. The resistivity variations of the films was not exactly matched with the size of the nano-structures of the copper grains, but more depended on the contamination of the copper films.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2002.05a
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• pp.180-182
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• 2002

Copper thin films are prepared by a chemical vapor deposition technology for multi-level metallzations in ULSI fabrication. The copper films were deposited on TiN/Si substrates in helium atmosphere with the substrate temperature between $120^{\circ}C$ and $300^{\circ}C$. In order to get more reliable metallizations, effects on the post-annealing treatment to the electrical properties of the copper films have been investigated. The Cu films were annealed at the $5\times$10^{-6}$ Torr vacuum condition, and the electrical resistivity and the nano-structures were measured for the Cu films. The electrical resistivity of Cu films shown to be reduced by the post-annealing. The electrical resistivity of 2.2 $\mu$$\Omega$.cm was obtained for the sample deposited at the substrate temperature of $180^{\circ}C$ after vacuum annealed at $300^{\circ}C$. The resistivity variations of the films was not exactly matched with the size of the nato-structures of the copper grains, but more depended on the deposition temperature of the copper films.

• Journal of the Korean Magnetics Society
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• v.5 no.4
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• pp.309-314
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• 1995

최근 새로운 과학기술의 발달로 자기다층박막등 자기 분야의 신소재를 비롯하여 XMCD( X-ray Magnetic Circular Dichroism), MFM(Magnetic Force Microscope)등 자성분석방법등이 개발되고 있고, 정보화 사회의 출현과 함께 자기기록에 대한 중요성이 증대되면서 자기 물성에 대한 연구는 새로운 르네상스 시기를 맞았다고 할 수 있다. 자기 현상의 근본 원리 규명에 대한 연구는 재료과학 또는 고체물성 연구과제중 가장 오랜 역사를 지닌 문제중의 하나라 할 수 있다. 자연계에 존재하는 자석은 기원전 7세기경부터 인간에게 알려진 것으로 기록되어 있고 그후 오랫동안 나침반으로 사용되어 왔다. 하지만 자석의 원리에 대한 규명은 양자역학이 생기고 전자의 스핀개념이 도입된 20세기 초에서야 시작되어졌다. 그나마 현재까지도 자기현상의 아주 기본적인 개념만이 알려진 상황이고, 금속, 부도체 또는 화합물등에서 일어나는 다양한 자기 현상들을 일관성 있게 설명하는 완전한 이론의 정립은 아직도 요원한 문제라 할 수 있다.

• Journal of the Korean institute of surface engineering
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• v.52 no.4
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• pp.211-226
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• 2019

Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of $SiO_2$, $TiO_2$, $Nb_2O_5$ thin films was clarified. These thin films had flat and dense microstructure, stable stoichiometric composition at the optimal conditions of low working pressure, high pulsed DC power and RF power(HDP). Also, the refractive index of the $SiO_2$ thin films was almost constant, but the refractive indices of $TiO_2$ and $Nb_2O_5$ thin films were changed depending on the microstructure of these films. Antireflection films of $Air/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/Glass$ structure designed by Macleod program were manufactured by our developed sputtering system. Transmittance and reflectance of the manufactured multilayer films showed outstanding value with the level of 95% and 0.3%, respectively, and also had excellent durability.

• Journal of Sensor Science and Technology
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• v.8 no.1
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• pp.53-62
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• 1999

Micro polysilicon actuators, which are widely used in the field of MEMS (Microelectromechanical System) technology, were fabricated using polysilicon thin layers. Polysilicon deposition were carried out to have symmetrical layer structures with a LPCVD (Low Pressure Chemical Vapor Deposition) system, and we have measured physical characteristics by micro test patterns, such as bridges and cantilevers to verify minimal mechanical stress and stress gradient in the polysilicon layers according to the methods of mutilayer deposition, doping, and thermal treatment, also, analyzed the properties of each specimen, which have a different process condition, by XRD, and SIMS etc.. Finally, the fabricated planar polysilicon resonator, symmetrically stacked to $6.5{\mu}m$ thickness, showed Q of 1270 and oscillation ampitude of $5{\mu}m$ under DC 15V, AC 0.05V, and 1000 mtorr pressure. The developed micro polysilicon resonator can be utilized to micro gyroscope and accelerometer sensor.

• Korean Journal of Optics and Photonics
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• v.4 no.4
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• pp.420-427
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• 1993

Dielectric thin film mirrors are embedded in multimode and single-mode fibers by a fusion splicing technique. The fibers with $45{\circ}$ angled embedded mirrors serve as ultra-compact directional couplers with low excess optical loss of 0.2 dB for multimode and 0.5 dB for single mode at 1.3 ${\mu}m$ and excellent mechanical properties. The reflectance is wavelength dependent and strongly polarization depencient. Far-field scans of the reflected output power measured with a white-light source show a pattern which is almost circularly symmetric with aspect ratio of 1.09 at 5% of the peak power. The splitting ratio in a multimode coupler measured with a diode laser source is much less dependent on input coupling conditions than in conventional fused biconical-taper couplers, indicating that these couplers are less susceptible to modal noise occuring in optical fiber communication systems. Spectral properties of multilayer internal mirrors normal to the fiber axis have been investigated experimentally, and a matrix analysis has been used to explain the results.

• Journal of the Korean institute of surface engineering
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• v.40 no.5
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• pp.241-244
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• 2007

$MgF_2$/Cr/$MgF_2$, $MgF_2$/Cu/$MgF_2$ and $MgF_2$/Al/$MgF_2$ multi-layered thin films were fabricated by evaporation system. $MgF_2$ and Cr(Cu, And Al) was selected as a low refractive index material and mid reflector layer, respectively. Optical properties including color effect were systematically studied in terms of different film layer by using spectrophotometer. Experimental results were compared to the simulation result. The films consistings of $MgF_2$/Cr/$MgF_2$, $MgF_2$/Cu/$MgF_2$, $MgF_2$/Al/$MgF_2$ multi-layered thin films showed wavelength range of $430{\sim}780nm$, typically color range between greenish yellow and orange at view angle of $45^{\circ}$. It was confirmed that this experimental result was well matched with simulation result.

• Journal of the Korean Magnetics Society
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• v.23 no.1
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• pp.7-11
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• 2013

We investigate the perpendicular magnetic anisotropy in $TiO_2$/Co/Pd on GaAs(100), MgO(100), MgO(111), Si(100), and glass substrates. We find that the roughness of $TiO_2$ depends on the $O_2$ partial pressure in the magnetron sputtering process. The perpendicular magnetic anisotropies are found in all substrates with $TiO_2$ seed layer, and the perpendicular magnetic anisotropy of Co/Pd system is insensitive on the type of the substrate when the thickness of $TiO_2$ seed layer is thicker than 5 nm. However, MgO(111) substrate promotes $TiO_2$ rutile (111) structure, and it causes largest perpendicular magnetic anisotropy in $TiO_2$/Co/Pd(111) structures.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1324_1325
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• 2009

The heterolayered $BaTiO_3/(Bi_{0.5}Na_{0.5})TiO_3$ thick films were fabricated by screen printing techniques on alumina substrates electrodes with Pt. We report the improved ferroelectric properties in the heterolayered teteragonal/rhombohedral structure composed of the $BaTiO_3$ and the $(Bi_{0.5}Na_{0.5})TiO_3$ thick films. We investigated the effects of deposition conditions on the structural and electrical properties of the heterolayered BNT/BT thick films. The structural and electrical properties of the heterolayered BNT/BT thick films were studied. All PZT heterolayered thin films show dense and homogeneous structure without the presence of the rosette structure. The dielectric constant, loss and remanent polarization oft heheterolayered BNT/BT thick films were superior to those of single composition $BaTiO_3$ and $(Bi_{1/2}Na_{1/2})TiO_3$, and those values for the heterolayered BNT/BT thick films sintered at $1100^{\circ}C$ were 916, 0.79 and $12.63{\mu}C/cm^2$.