• Title/Summary/Keyword: 3D films

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Design of Superconducting Elements for the 6.6kV 200A Superconducting Fault Current Limiter (6.6kV 200A 초전도 한류기용 초전도소자 설계)

  • Kang J.S.;LEE B.W.;Park K.B.;Oh I.S.
    • Proceedings of the KIEE Conference
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    • summer
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    • pp.518-520
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    • 2004
  • In these days, there is a demand to develop fault current limiters(FCLs) to reduce excessive fault current and protect electrical equipments which are installed in the transmission and distribution power systems. We considered the resistive superconducting FCLs among the various kinds of FCLs. In this study, in order to develop the resistive superconducting FCL of 6.6kV 200A $3\phi$, we designed the new mask pattern for etching YBCO films by means of numerical analysis method, current limiting experiments and visualization of bubbles in films and investigated dielectric performance of the designed mask by using elecrtostatic numerical analysis method and breakdown experiments. We etched YBCO films by using the newly designed mask, connected the etched films in series and in parallel, and designed the 6.6kV resistive SFCL and then we observed the current limiting characteristics of the SFCL.

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Improvement of Sealing Property of Electrostatic Chuck by Applying Polysilazane Sealant (폴리실라잔계 실란트를 이용한 정전척 실링특성 향상 연구)

  • Choi, Jaeyoung;Park, Hyunsu;Son, Min Kyu;Jeong, Chang-oh;Kim, Woo-Byoung
    • Journal of the Korean institute of surface engineering
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    • v.49 no.6
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    • pp.567-574
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    • 2016
  • We have analyzed chemical properties of polysiloxane and polysilazane films, respectively, as sealing materials for electrostatic chuck (ESC) and have investigated the possibility of polysilazane as an alternative sealant to polysiloxane. It has been revealed that Si-O with organic bonding ($Si-CH_3$) existed in polysiloxane films compared to only pure Si-O bonding in polysilazane films. The sealing property of polysilazane has been found outstanding even in a short time of application. In the polysiloxane films containing $H_2O$, pin holes have been found possibly due to $CO_2$ gas evolution, and low adhesion with Si substrate has been observed after heat stress test in connection with the existence of organic bonding. After acid resistance test in 0.5 vol.% HF, 68 wt.% $HNO_3$, and 37 wt.% HCl solution, polyilazane films have shown a longer survival times. Compared to the conventional polysiloxane sealant, polysilazane is expected as a new sealing material because of good thermal and chemical stability.

A Stydy on the Development of 800 MHz band Pass Fiters using Polycrystal AIN Film (다결정 AIN 박막을 이용한 800 MHz 대 표면탄성파 대역통과 필터개발에 관한 연구)

  • 이형규;최익권;용윤중;이재영
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.8 no.4
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    • pp.382-389
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    • 1997
  • We present the results on the applicability of the polycrystalline AIN thin films for a surface acoustic wave filter operating at 800 MHz frequency. The films show the FWHM of 3 .deg. from th X-ray rocking curve, which indicates that the c-axis of the films is pre- ferentially oriented along the growth direction. The fabricated band pass filters exhibit the center frequency of 865 MHz with 3dB band-width of 45 MHz. From the measured frequency response, the electro-mechanical coupling constant of 0.8% and the SAW velocity of 5,709 m/s are obtained. Thus, we conclude that the sputtered AIN films are feasible for the fabrication of uper UHF band SAW filters.

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Fabrication and Test of the 3.8 ㎸ Resistive SFCL Based on YBCO Films (3.8 ㎸급 7직렬 저항형 고온초전도한류기의 제작 및 시험)

  • 심정욱;김혜림;현옥배;박권배;이방욱;강종성;오일성
    • Progress in Superconductivity
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    • v.5 no.2
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    • pp.136-140
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    • 2004
  • We fabricated and tested a resistive superconducting fault current limiters (SFCL) operated at 3.8 ㎸ based on YBCO thin films. The SFCL was composed of 7 components connected in series. Each component was designed to be capable of current limiting at 600 V, and has a SiC shunt resistor ( $R_{s}$) of 40 Ω in Parallel. Short circuit tests were carried out fur 0 and 90 degree faults lasting fur 5 cycles. The test results showed that the 7 components were quenched simultaneously under the safe quenches and evenly shared the applied voltage. The SFCL successfully suppressed the fault currents below 94 $A_{peak}$ within the quarter cycle after fault.t.t.

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Sr modified $PbTiO_3$ thin films for tunable microwave device application (MOD법에 의한 Sr modified $PbTiO_3$ 박막 제조 및 Tunable microwave device 응용 특성 연구)

  • Kang, D.H.;Cho, S.C.;Cha, H.J.;Cho, B.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.749-751
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    • 2002
  • $(Pb_{1-x}Sr_x)TiO_3$ $(0.6{\leq}x{\leq}0.8)$ thin films were prepared by the MOD method for tunable microwave device application and their characteristics were investigated as a function of Sr content(x) and applied field. Thin films showed a homogeneous microstructure and the tetragonality(c/a) was slightly decreased with increasing Sr content. With increasing Sr content, Curie temperature of the thin films showed a decreasing tendency. For the PST thin films, the dielectric constant at room temperature, Tc, and $tan{\delta}$ were 750~1900, $-70^{\circ}{\sim}-30^{\circ}C$ and 0.025~0.04, respectively.

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MAGNETITE AND MAGHEMITE THIN FILMS FOR MAGNETIC RECORDING

  • Chin, T.S.;Chang, W.D.
    • Journal of the Korean Magnetics Society
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    • v.5 no.5
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    • pp.623-626
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    • 1995
  • High coercivity thin $Fe_{3}O_{4}$ and ${\gamma}-Fe_{2}O_{3}$ films were deposited on Si substrate under well controlled $O_{2}$ partial pressure by dcreactive magnetron sputtering. The coercivity of as-deposited maggnetite films is below 640 Oe. After cxidizing at $360^{\circ}C$ for 10 minutes, the films transform to maghemite ${\gamma}-Fe_{2}O_{3}$ completely, and the coercivity increases greatly to 2100~4120 Oe, depending on modification of not with minor addition of Co or/and Mn. The orign of coercivity enhancement is attributed mainly to magnetic anisotropy arisen from interfacial stress. The addition of 5 at% Co and 5 at% Mn greatly enhances coercivity and squareness ratio. These films are potential for ultra-high density recording applications.

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Effect of Substrate Bias Voltage on DLC Films Prepared by ECR-PECVD (ECR-PECVD 방법으로 제작된 DLC 박막의 기판 Bias 전압 효과)

  • 손영호;정우철;정재인;박노길;김인수;김기홍;배인호
    • Journal of the Korean Vacuum Society
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    • v.9 no.4
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    • pp.328-334
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    • 2000
  • DLC (Diamond-Like Carbon) films were deposited by ECR-PECVD (electron cyclotron resonance plasma-enhanced chemical vapor deposition) method with the variation of substrate bias voltage under the others are constant except it. We have investigated the ion bombardment effect induced by the substrate bias voltage on films during the deposition of film. The characteristics of the film were analyzed using the Dektak surface profiler, SEM, FTIR spectroscopy, Raman spectroscopy and Nano Indentation tester. FTIR spectroscopy analysis shows that the amount of dehydrogenation in films was increased with the increase of substrate bias voltage and films thickness was decreased. Raman scattering analysis shows that integrated intensity ratio $(I_D /I_G)$ of the D and G peak was increased as the substrate bias voltage increased, and films hardness was increased. From these results, it can be concluded that films deposited at this experimental have the enhanced characteristics of DLC because of the ion bombardment effect on films during the deposition of film.

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Effects of Ag Additives on Electrical and Optical Properties of As2Se3 Thin Films (비정질 As2Se3 박막에 첨가된 은이 전기 및 광학적 성질에 미치는 효과)

  • Lee, Chanku;Lee, Sudae;Kim, Douk Hoon;Mun, Jung Hak
    • Journal of Korean Ophthalmic Optics Society
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    • v.1 no.2
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    • pp.63-69
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    • 1996
  • D.c conductivity and optical transmittance of amorphous ($As_2Se_3$)Ag, (x =0, 2, 5, 10mol%) thin films were measured in order to find effects of Ag additives on electrical and optical properties of the films. The d.c. activation energy and the optical gap decreased with increasing Ag contents the Urbach tail was approximately unchangeable for variation of Ag contents. For Ag contents of 5mol% and less, the rate of decrease of the d.c activation energy was more rapidly than that of the optical gap with increasing Ag contents. For Ag contents more than 5mol%, the rate of decrease of the d.c activation energy and the optical gap were nearly the same each other with decreasing Ag contents. So it was appeared that the Fermi level of the films comes close to the mobility edge for Ag contents of 5mol% and less, and the mobility edge comes close the Fermi level for Ag contents more than 5mol%.

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A Study on the Stability of Langmuir-Blodgett(LB) Films of Saturated Fatty Acid Monolayer (포화지방산 단분자층 LB막의 안정성에 관한 연구)

  • Park, Keun-Ho
    • Journal of the Korean Applied Science and Technology
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    • v.31 no.3
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    • pp.352-358
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    • 2014
  • We were investigated the stability through the electrochemical characteristics of saturated fatty acid(C12, C14, C16, C18) monolayer LB films by cyclic voltammetry. Saturated fatty acid monolayer LB films was deposited on the indium tin oxide(ITO) glass by the LB method. The electrochemical properties were measured by cyclic voltammetry with a three-electrode system in 0.1 N $NaClO_4$ solution. The measuring range was continuously oxidized to 1650 mV, with an initial potential of -1350 mV was reduced. Scanning rates of 50, 100, 150, 200, and 250 mV/s were set. As a result, LB monolayer films of saturated fatty acid were appeared on irreversible processes by the oxidation current from the cyclic voltammogram. Diffusion coefficient(D) of saturated fatty acid(C12, C14, C16, and C18) was calculated 22.231, 2.461, 7.114 and 2.371 ($cm^2s^{-1}{\times}10^{-4}$) in 0.1 N $NaClO_4$ solution, respectively.

Stress-induced the enhancement of magnetoresistance in La0.75Ca0.25MnO3 thin films grown on Si (100) substrates

  • Lee, J.C.;D.G, Yu;S.Y. Ie;K.H. Jeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.131-131
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    • 2000
  • We witnessed the enhancement of mangetoresistance (MR) in La0.75Ca0.25MnO3 thin films grown on Si (100) substrates by RF magnetron sputtering. The films are polycrystalline with (100) and (110) orientations. The lattice constants of films are reduced as much as 0.9% compared to the one of the bulk sample, which proves that the compressive stress on films was imposed by Si sbustrate. It is found that the MR value (Δ$\rho$/$\rho$0) of films are 0.33, 0.29 and 0.27 under a magnetic field of 1.5T for each films with deposition temperature of $700^{\circ}C$, 75$0^{\circ}C$ and 80$0^{\circ}C$, respectively. The correlation between the MR values and lattice constants of films is discussed. It is concluded that the compressive stress on films cause the enhancement of MR values of thin films grown on Si (1000 substrates. Some mechanism of compressive stress induced by Si substrate is suggested.

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