• Proceedings of the IEEK Conference
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• 1999.11a
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• pp.203-207
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• 1999

In this paper we report new integration technology developed for three-dimensional metallic microstructures in an arbitrary shape. We have developed the two fabrication methods: Multi-Exposure and Single-Development (MESD) and Sacrificial Metallic Mold(SMM) techniques. Three-dimensional photoresist mold can be formed by the MESD method while unlimited number of structural levels can be realized by the SMM technique. Using these two techniques we have fabricated solenoid inductors and levitated spiral inductors for RF applications. We have achieved peak Q- factors over 40 in the 2-10㎓ range, the highest number among the inductors reported to date. Finally, we propose "On-Chip Passives" as a post IC process for monolithic integration of inductors, tunable capacitors, microwave switches, transmission lines, and mixers and filters toward future single-chip transceiver integration.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.157-158
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• 2006

A novel nanofabrication process has been developed using two-photon crosslinking (TPC) for the fabrication of three-dimensional (3D) SiCN ceramic microstructures applicable to high functional 3D devices, which can be used in harsh working environments requiring a high temperature, a resistance to chemical corrosion, as well as tribological properties. After sequential processes: TPC and pyrolysis, 3D ceramic microstructures are obtained. However, large shrinkage due to low-ceramic yield during the pyrolysis is a serious problem to be solved in the precise fabrication of 3D ceramic microstructures. In this work, silica nanoparticles were employed as a filler to reduce the amount of shrinkage. In particular, the ceramic microstructures containing 40 wt% silica nanoparticles exhibited relatively isotropic shrinkage owing to its sliding free from the substrate during pyrolysis.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.7
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• pp.30-36
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• 2004

Recently, the lead-time of a product is to be shortened in order to satisfy consumer's demand. It is thus important to reduce the manufacturing time and the cost of 3D-shaped microstructures. Micro-Electro-Mechanical Systems (MEMS) and devices are usually fabricated by lithography-based methods. Above method is not flexible for the rapid manufacture of 3D-shaped microstructures because it depends on work's experiences and requires excessive cost and time for making many masks. In this paper, the effective laser micrornachining is developed to fabricate UV sensitive polymer microstructures using laser ablation. The proposed process, named by laser microRP, is a very useful method on rapid manufacturing for 3D-shaped microstructures.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.1259-1264
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• 2007

Microstereolithography technology has potential capability for fabrication of 3D microstructures. It evolved from conventional SLA which is one of the RP processes. In a microstereolithography process, 3D microstructures can be easily fabricated by continuously stacking 2D layer which is photopolymerized using a liquid prepolymer. Combination between biocompatible/biodegradable photocurable prepolymer and 3D complex fabrication in microstereolithography makes broad application areas such as medical, pharmaceutic, and bio devices. In particular, a 3D microneedle for transdermal drug delivery and a scaffold for tissue engineering are fabricated using this technology. In this paper, the authors address development of microstereolithography system adapted to large surface and fabrication of various microstructures. In addition, to apply human body we suggest a biodegradable 3D microneedle and a scaffold using biodegradable photocurable prepolymer.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.8
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• pp.119-125
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• 2009

Fabrication of a three-dimensional (3D) metallic mold for multi-production of a microstructure was studied to settle the problem of long processing time in 3D microfabrication. To date, complicated 3D microstructures including 3D photonic crystals, 3D microlens array, 3D filter for microfludics, and something else were created successfully using the two-photon polymerization (TPP) which was considered as paving the way to fabricate a real 3D shape in nano/microscale. However, for those fabrications, much processing time and efforts were inevitably required. To solve this issue, a simple and effective way was proposed in this paper; 3D master patterns were prepared using TPP, and then counter-shaped Ni molds were fabricated by electroforming process. By using these molds, 3D microstructures can be reproduced with short-processing time and low-effort comparing to the conventional approach, TPP We report some parameters to fabricate a metallic mold precisely.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.11 s.188
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• pp.116-125
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• 2006

MEMS and LIGA technologies have been used for fabricating microstructures, but their shape is not 3D because of difficulty for preparation of many masks. To fabricate 3D microstructures, microstereolithography technology based on Digital Micromirror Device($DMD^{TM}$) was introduced. It has no need of masks and is capable of fabricating high aspect ratio microstructures. In this technology, STL file is the standard format as the same of conventional rapid prototyping system, and 3D parts are fabricated by layer-by-layer according to 2D section sliced from STL file. The UV light source is illuminated to DMD which makes bitmap images of 2D section, and they are transferred and focused on resin surface. In this paper, we addressed optical design of microstereolithography system in consideration of light path according to DMD operation and image-forming on the resin surface using optical design program. To verify the performance of implemented microstereolithography system, 3D microstructures with complexity and high aspect ratio were fabricated.

• JSTS:Journal of Semiconductor Technology and Science
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• v.2 no.4
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• pp.268-272
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• 2002

This paper presents a novel microfabrication technology of 3D microstructures with inclined/rotated UV lithography using negative photoresist, SU-8. In some cases, reflected UV as well as incident UV is used to form microstructures. Various 3D microstructures are simply fabricated such as embedded channels, bridges, V-grooves, truncated cones, and so on.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.12
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• pp.136-142
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• 2007

Precise fabrication of three-dimensional (3D) self-standing microstructures on thin glass plates via two-photon induced polymerization (TPP) has been an important issue for innovative 3D nanodevices and microdevices. However, there are still issues remaining to be solved, such as building 3D microstructures on opaque materials via TPP and being able to implant them as functional parts onto practical systems. To settle these issues simply and effectively, we propose a contact print lithography (CPL) method using an ultraviolet (UV)-curable polymer layer. We report some of the possibilities and potential of CPL by presenting our results for transplanting 3D microstructures onto large-area substrates and also our examination of some of the effects of the process parameters on successful transplantation.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.40 no.8
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• pp.731-736
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• 2016

Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.1
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• pp.122-129
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• 2008

Two-photon stereolithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 nm resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereolithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereolithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of $600*600*100\;{\mu}m$ were fabricated.