• Journal of the Korean Society for Precision Engineering
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• v.12 no.3
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• pp.144-152
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• 1995

TV microphonic phenomenon (black patterns overlapped on the image when TV sound is set too high) was studied experimentally. It was found that this phenomenon was due to the vibration generated at speakers, and transmitted to the CRT through the TV cabinet structure. Based on this fact, a simulative study was carried out on the assumption that the vibratory motion of the shadow mask located in the CRT could cause the landing error of electronic beam. The result of the simulation corresponded qualitatively with experi- mentally observed facts.

• Archives of design research
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• v.12 no.3
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• pp.203-212
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• 1999

Requested from the Andong MBC station to do visualization work on hahoe Pyulshin-gut (Hahoe Mask Dance Drama) of Hahoe village, the traditional cultural asset of Andong Province, as a part of specialization project for local cultural asset, this study describes the work process and result for about 3 months from June 1, 1998 to August 20, 1998. In addition, this study describes the data collection at the fundamental preliminary research stage, analysis process and full-swing artwork process among the work process as well as the final visual type. This study is concluded with the summery on the problem and point of consideration when local self-governing organization do visualization work on character business or traditional asset similar to this project.

• Journal of the Korea Society of Computer and Information
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• v.27 no.9
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• pp.157-167
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• 2022

This study attempted to investigate what kind of perception people in their 20s have about masks and to find out the characteristics of each type by categorizing the perception. The Q methodology was used for the study. The cognition types of masks were categorized into three. Type 1 was a 'always wear impact-important type' that always wears masks and thinks masks affect non-verbal communication and the wearer's image. Type 2 was a 'function-important negative recognition type' that wears masks to prevent germs and thinks that masks have a great negative impact. Type 3 was a 'concealment wear positive image type' that wears a mask to cover the face and thinks that a person looks young when wearing a mask. It is thought that the development of masks of various designs and functions reflecting the needs of consumers should be carried out. Also, it is thought that various products should be developed and sold so that consumers can choose according to important considerations such as design, fit, and function.

• Journal of the Institute of Convergence Signal Processing
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• v.23 no.2
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• pp.97-106
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• 2022

In this study, H&E staining is necessary to distinguish cells. However, dyeing directly requires a lot of money and time. The purpose is to convert the phase image of unstained cells to the amplitude image of stained cells. Image data taken with FPM was created with Phase image and Amplitude image using Matlab's parameters. Through normalization, a visually identifiable image was obtained. Through normalization, a visually distinguishable image was obtained. Using the GAN algorithm, a Fake Amplitude image similar to the Real Amplitude image was created based on the Phase image, and cells were distinguished by objectification using MASK R-CNN with the Fake Amplitude image As a result of the study, D loss max is 3.3e-1, min is 6.8e-2, G loss max is 6.9e-2, min is 2.9e-2, A loss max is 5.8e-1, min is 1.2e-1, Mask R-CNN max is 1.9e0, and min is 3.2e-1.

• Proceedings of the Optical Society of Korea Conference
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• 2001.02a
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• pp.72-73
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• 2001

대용량 정보의 보안이 매우 중요해짐에 따라 활발히 진행 중인 광정보의 보안에 대한 연구 중에서 광학적 위상암호화는 많은 양의 정보를 한린에 암호화하고 해독할 수 있다(·：). 특히 Javidi 등이 제안한 Fresnal 영역 임의 위상판(random phase mask; RPM)을 이용한 암호화 방법은 3차원 위치 정보를 암호화 키로 사용한다. 이와 같은 암호화 방법에 회전에 의한 위상변화를 추가하면 암호화 수준을 높일 수 있다. (중략)

• Proceedings of the Optical Society of Korea Conference
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• 2000.08a
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• pp.56-57
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• 2000

본 연구에서는 반도체 레이저로부터 조사되는 빔을 CRT 모니터의 shadow mask에 입사시켜 반사되는 빔을 렌즈를 통하여 센서로 사용한 위치검출소자(PSD)와 CCD에 확대 결상시켜 측정하였다. 센서로 사용한 PSD는 검출영역이 12mm, 위치분해능은 0.2um이며, 센서의 검출면상에서의 입사빔의 위치에 따라 매우 선형적인 특성을 가지며, 실시간적으로 처리할 수 있다는 장점을 갖고 있다. CCD는 1/3inch(512$\times$480pixels)를 사용하였다. (중략)

• Korean Chemical Engineering Research
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• v.46 no.3
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• pp.465-472
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• 2008

Fabrication of nanostructured materials and synthesis of nanomaterials have intensively studied to realize electronic devices for nanotechnology. By using nanoporous alumina mask, nanostructured material can be fabricated in the form of uniform array. The size and the density of the nanostructured materials can be controllable by changing the pore diameter and the density of the alumina mask. This method is possible low cost and on large scale process, and feasible to contribute the fusion technology consisting of information technology, nanotechnology, and biotechnology. Therefore, these techniques provide alternative approaches for development of new electronic applications. In this paper, the fabrication technique and its applications of nanoporous alumina mask are described and nanostructured materials such as quantum dots, nanoholes, and nanorods are introduced.

• Journal of the Microelectronics and Packaging Society
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• v.6 no.3
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• pp.65-71
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• 1999

The effects of mask materials and etching solutions on the dimensional accuracy of V-groove were studied for the alignment between optoelectronic devices and optical fibers in optical packaging. PECVD nitride, LPCVD nitride, or thermal oxide($SiO_2$) was used as a mask material. The anisotropic etching solution was KOH(40wt%) or the mixture of KOH and IPA. LPCVB nitride has the best etching selectivity and thermal oxide was etched most rapidly in KOH(40wt%) at $85^{\circ}C$ among the mask materials studied here. The V-groove size enlarged than the designed value. This phenomenon was due to the undercutting benearth the mask layer from the etching toward Si (111) plane. The etch rate of (111) plane wart 0.034 - 0.037 $\mu\textrm{m}$/min in KOH(40wt%). This rate was almost same regardless of mask materials. When IPA added to KOH(40wt%), the etch rate of (100) plane and (111) plane decreased, but etching ratio of (100) to (111) plane increased. Consequently, the undercutting phenomenon due to etching toward (111) plane decreased and the size of V-groove could be controlled more accurately.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.3
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• pp.197-203
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• 2004

New lithography techniques are employed for the patterning of arbitrary shapes in nanometer scale. When, in the photolithography, the electromagnetic waves such as UV and X-ray are incident on the mask patterned in nanometer scale, the diffraction effect is unavoidable and degrades images of the mask imprinted on wafer. Only a convex lens is well-known Fourier transformer. It is possible to make the mask Fourier-transformed with the convex lens, even though the size of pattern on the mask is very large compared to the wavelength of electromagnetic wave. If the mask, modified according to new technique described in this paper, was placed at the front of the lens and was illuminated with laser beam, the nanometer-size patterns are only formed on the plane called Fourier transform plane. The new method presented here is quite simple setup and comparable with present and next generation lithographies such as UV/EUV photolithograpy and electron projection lithography when compared in attainable minimum linewidth. In this paper, we showed our theoretical research work in the field of Fourier optics, . In the near future, we are going to verify this theoretical work by experiments.

• Korean Journal of Cognitive Science
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• v.22 no.4
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• pp.365-384
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• 2011

A recent study of visual working memory(VWM) under a change detection paradigm proposed an idea that the comparison process of VWM representations against incoming perceptual inputs can be performed more rapidly than the process of forming durable memory representations into VWM. To test this hypothesis, we compared the size of interference effect caused by pattern-backward masks following after either the sample(sample-mask condition) or test items (test-mask condition). In Experiment 1, subjects performed a color change detection task for four colored-boxes, and pattern masks with mask-onset asynchronies(MSOA) of either 64ms or 150ms followed each item location either after the sample or after the test items. The change detection accuracy was both comparable in the sample-mask condition regardless of the MSOAs, whereas the accuracy in the trials with a MSOA of 150ms was substantially higher than the MSOA of 65ms in the test-masking condition. In Experiment 2, we manipulated setsizes to 1, 2, 3, 4 items and also MSOAs to 117ms, 234ms, 350ms, 484ms and compared the pattern of interference across a variety of setsize and MSOA conditions. The sample-mask condition yielded a pattern of masking interference which became more evident as the setsize increases and as the MSOA was shorter. However, this pattern of interference was less apparent in the test-mask condition. These results indicate that the comparison process between remembered items in VWM and perceptual inputs is less vulnerable to interference from pattern-backward masking than VWM consolidation is, and thus support for the recent idea that the comparison process in VWM can be performed very fast and accurately.