• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.366.2-366.2
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• 2014

Impedance spectroscopy allows for simultaneous characterization of interface-controlled materials and/or devices in terms of electrical and dielectric aspects. Recently, there have tremendous interests in 2-dimensional electron gas layers (2DEGs) involving $LaAlO_3$ and $SrTiO_3$ whose features incorporates extremely high mobility and carrier concentrations along with metallic responses unlike the constituents, $LaAlO_3$ and $SrTiO_3$. Impedance spectroscopy offers the following unique features, such as simultaneous determination of conductivity and dielectric constants, identification of electrical origins among bulk-, grain boundary-, and electrode-based responses. Impedance spectroscopy was applied to the 2DEG $LaAlO_3/SrTiO_3$ system, in order to extract the electrical and dielectric information operating in the 2DEG system. The unique responses of the 2DEG system are investigated in terms of temperature and device structures. The underlying mechanism of the 2DEG system is proposed with the aim to optimizing the high-mobility 2DEG responses and to expedite the associated devices towards the high-density integrated chips.

• Electrical & Electronic Materials
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• v.7 no.1
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• pp.32-41
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• 1994

In this study, the TSC spectroscopy has been applied to investigate the influence of structural change due to a process of curing reaction on the electrical properties of epoxy composites cured with acid-anhydride. Five TSC peaks appeared in -160-250[.deg.C]: in the low temperature region below glass transition temperature(T$\_$g/), three relaxation mode peaks due to action of side chains, substitution group or terminal groups have been observed, a peak associated with T$\_$g/, appeared in 110[.deg. C] and p peak due to ionic space charges located in 150[.deg.C]. Each peak was separated into elementary peaks by the partial polarization procedure, and the distribution of activation energy and relaxation time were analized to clearify the origin of each peak. Also, overaboundantly added hardener separated a .betha. peak near 10[.deg. C] into two peaks of .betha.$\_$1/(10.deg. C) and .betha.$\_$2/(20.deg. C) according to increasement of forming field, and the separated hardener was oxidated thermally with increasing surrounding temperatures. The expansion of the free volume need in molecular motion and the reduction of the structural packing density through thermal oxidation process increased TSC between .alpha. peak and .betha. peak and decreased T$\_$g/.

• Electrical & Electronic Materials
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• v.10 no.2
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• pp.97-104
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• 1997

In this paper, in order to investigate the behavior of charged particles on (Sr.Ca)TiO$_{3}$ ceramics with paraelectric properties, the characteristics of electrical conduction and thermally stimulated current was measured respectively. As a result, the conduction mechanism is divided into three regions having different mechanism as the current increased. The region I below 200[V/Cm] shows the ohmic conduction. The region B between 200[V/cm] and 2000[V/cm] can be explained by the Poole-Frenkel emission theory, and the region III above 2000[V/cm] is dominated by the tunneling effect. The three peaks of TSC were obtained at the temperature of -20[.deg. C], 20[.deg. C] and 80[.deg. C], respectively. The origins of these peaks are that the .alpha. peak observed at -20[.deg. C] looks like to be ascribed to the ionization excitation from donor level in the grain, and the .alpha.' peak observed at 20 [.deg. C] appears to show up by hopping conduction of the trapped carrier of border between the oxidation layer and the grain, and the .betha. peak observed at 80[.deg. C] seems to be resulted from hopping conduction of existing carrier in the trap site of the border between the oxidation and second phase.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.8
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• pp.26-34
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• 1997

To develop ultrathin gate oxide for ULSI MOSFETs, for the first time, we fabricated MOS capacitors with 65.angs. thick initial oxide grown by high pressure oxidation (HIPOX) at 700.deg. C in 5 atmosphere $O_{2}$ ambient and then followed by rapid thermal nitridation (RTN) in N$_{2}$O ambient. The dielectric breakdown fields of the initial HIPOX oxide are 13.0 MV/cm and 13.8MV/cm for negative and positive gate bias, respectively and are dependent on nitridation temeprature and time.The lifetimes of the HIPOX oxides extractd by TDDB method are 1.1*10$^{8}$ sec and 3.4 * 10$^{9}$ sec for negative and positive stress current, respectively. The lifetime of the HIPOX oxide dfor negative stress current increases with nitridation time in N$_{2}$O ambient at 1100.deg.C, reaching maximum value stress curretn increases with nitridation time in N$_{2}$O ambient at 1100.deg. C reacing maximum value of 1.2*10$^{9}$ sec for 30 sec of nitridation time, and then subsequently decreases at the longer nitridation time. The lifetimes of the nitrided-HIPOX oxides are longer than 10 years when nitridations are carried out longer than about 50 sec and 12 sec at 1000.deg. C, and 1100.deg. C, respectively.

• Electrical & Electronic Materials
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• v.10 no.3
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• pp.210-216
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• 1997

The th ermal and optical properties of multicomponent oxide glass optical fiber by adding heavy metal oxide Ga$_{2}$O$_{3}$(0-20wt%) were investigated. The fiber samples were made by the method of rod in tube. The optical loss of fiber was measured in 0.3-1.8.mu.m wavelength region. As Ga$_{2}$O$_{3}$ increased up to 20wt%, the transition and softening temperature of bulk glass were increased from 495.deg. C to 579.deg. C and from 548.deg. C to 641.deg. C, respectively. Whereas the thermal expansion coefficient was decreased from 102 to 79.1x10$^{-7}$ /.deg. C. The refractive index was increased from 1.621 to 1.665, and IR cut-off wavelength was enlarged from 4.64.mu.m to 6.1.mu.m. The optical loss of fiber was remarkably decreased in 1.146.mu.m-1.8.mu.m wavelength region.

• Electrical & Electronic Materials
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• v.2 no.2
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• pp.103-108
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• 1989

새로운 전도성물질 중간체 합성기술의 기초연구의 일환으로 N, N-dialkylbenzamide를 ether 용액에서 lithiation 및 carboxylation시킨 결과, 저온 (-78.deg.~-20.deg.), 짧은 반응 시간에서는 방향족 고리 Ortho-위치에 carboxylation이 일어났고 상대적 고온 (0.deg.이상)에서는 아미드의 카보닐에 치환된 ketone이 얻어졌다. 이는 온도 조건에 따라 두 반응이 상호 경쟁적으로 진행되기 때문이라고 사료된다.

• Journal of the Korean Society for Precision Engineering
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• v.13 no.7
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• pp.148-157
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• 1996

This paper deals with the applicability of linear elastic fracture mechanics under centrifugal force. Stress intensity factors K are calculated as a function of the inclination crack of length 2a, the position at different angular velocities 1200rpm, 2400rpm and at different values of the inclination crack angle .phi. ( .phi. = 0 .deg. , 15 .deg. , 30 .deg. , 45 .deg. , 60 .deg. , 75 .deg. , 90 .deg. ) and are measured in models of rotation disks using a boundary element method. Especially, stress intensity factors $K_{l}$ and $K_{ll}$ obtained separately from the crack tip of the mixed mode, were used to further investigate the influence of $K_{l}$ and $K_{ll}$ on fracture in rotating disks. With the increase in the speed of rotation, the effect of K/ sub l/became larger where as that of $K_{ll}$ became small. For the increase in the inclination crack angle .phi. , a decrease in $K_{l}$ and an increase in $K_{ll}$ were observed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.316-318
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• 2003

양자우물 구조를 사용한 HEMT(High Electron Mobility Transistor)는 고속 스위칭 소자와 초고주파 통신용 소자 및 센서에에 우수한 동작특성을 갖고 있다. 본 논문에서는 AlInAs/InP HEMT의 heterostructure를 파동방정식과 Poisson 방정식을 self-consistent 한 방법으로 해석하였다. 파동방정식으로 junction의 전자농도를 계산하고, Poisson 방정식을 해석하여 potential profile에 의한 전자 농도가 heterostructure에서 self-consistent가 되도록 연산하였다. 끝으로 AlInAs/InP 구조에서 positively ionized donor, valance band에서의 hole, conduction band의 free electron과 구조내의 2DEG를 AlGaAs/GaAs 및 AlGaAs/InGaAs/GaAs와 비교하였다.

• Electrical & Electronic Materials
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• v.3 no.4
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• pp.263-270
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• 1990

WSi$_{x}$박막을 Polycide구조로 저압화학증착법에 의해 제작한 후, 열처리를 N$_{2}$분위기에서 30분간 여러온도로 수행하였다. WSi$_{x}$박막의 전기비저항은 열처리온도의 증가에 따라 감소하였으며 1000.deg.C이상으로 열처리한 시편의 경우, 하부 다결정실리콘층의 도우핑여부에 관계없이 35.mu.m.OMEGA.-cm 정도를 나타내었다. 560.deg.C의 열처리에서 WSi$_{x}$박막은 정방정의 WSi$_{2}$ 결정질로 결정화가 되기 시작하였고 열처리온도의 증가에 따라 WSi$_{2}$결정립의 성장도 관찰되었다. 열처리온도에 따른 전기저항의 변화는 WSi$_{x}$박막의 결정립크기와 밀접한 관계가 있었다. 증착된 WSi$_{x}$박막내의 광잉실리콘원자들이 열처리중에 하부의 다결정실리콘층으로 재분배됨을 AES분석에 의해 확인하였다. Hall 측정결과 900.deg.C이상으로 열처리된 시편은 Hole도전체의 거동을 나타내었고 800.deg.C이하로 열처리된 시편은 electron도전체의 거동을 나타내었다.

• Electrical & Electronic Materials
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• v.1 no.3
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• pp.251-260
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• 1988

n형 GaAs에 음성접촉을 형성함에 있어서 Au-Ge 공융합금을 용해시키는 alloying 보다는 sintering을 필요로 하는 Su-Pd-Ge계의 새로운 융성접촉을 도입하였다. Au-Pd-Ge계의 최적의 음성조건을 조사하기 위하여 Au/Pd/Ge, Au/Ge/Pd, Au/Pd/Ge/Pd 그리고 Au/Pd/Au/Ge 음성접촉을 제조하였다. 비접촉저항을 조사하는데 있어서 sintering 온도는 390-450.deg.C사이였고 시간은 30초에서 6분 사이였다. Au-Pd-Ge계의 비접촉저항은 alloying된 Au/Pd/Ge 접촉의 그것에 필적할 만큼 낮았으며 특히 Au/Ge/Pd 접촉은 430.deg.C, 3분의 sintering 조건에서 가장 낮은 1.2*$10^{-6}$.OMEGA..$cm^{2}$의 비접촉저항을 나타냈다. Au/Ge/Pd 접촉의 표면형상 및 접촉패턴 가장자리는 450.deg.C에서 2분 이상 sintering된 접촉을 제외하고는 sintering 후에 as-deposited 상태와 다를 바가 없었다. 430.deg.C, 3분 sintering에서 가장 낮은 비접촉저항을 나타낸 Au/Ge/Pd 접촉의 비접촉저항은 430.deg.C에서 Ge/Pd 두께 변화에 비교적 변화가 적었다.