• 한국결정성장학회지
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• 제25권2호
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• pp.45-50
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• 2015

본 논문에서는 Al 조성이 점진적으로 변화된 AlGaN 에피층을 HVPE (hydride vapor phase epitaxy) 방법에 의하여 성장하였다. 소스영역의 온도는 $950^{\circ}C$, 성장 영역의 온도는 $1145^{\circ}C$에서 연속적으로 (0001) 사파이어 기판위에 성장되었고, AlGaN 에피층은 시간당 100 nm의 성장률을 보였다. FE-SEM 측정과 EDS 측정으로부터 성장층의 Al 변화를 확인하였으며, AFM 측정결과 2인치 기판위에 성장된 graded AlGaN 에피층의 거칠기는 수십 nm였다. Al 조성의 변화는 XRD 측정에 의하여 확인하였으며, Al 조성 74 %의 (002) AlGaN의 주피크 관측과 함께 연속적으로 (002) AlN 층의 피크가 확인되었다. 이는 하나의 층에 사파이어 기판으로부터 Al 조성이 점진적으로 변화하는 에피층을 HVPE 방법으로 얻었음을 증명하며, 이 결과로부터 다양한 광소자 및 전자소자의 응용이 기대된다.

• 대한전자공학회논문지SD
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• 제46권8호
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• pp.6-11
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• 2009

VA Mode LC를 사용하는 Full-HD급 LCOS 마이크로디스플레이에서 셀 상하 간격의 변화에 따른 전기광학적 특성의 변화에 관하여 3차원 LC code를 이용하여 연구하였다. 5가지의 다른 셀 상하 간격 (1.4 ${\mu}m$, 1.8 ${\mu}m$, 2.1 ${\mu}m$, 2.4 ${\mu}m$ 그리고 2.8 ${\mu}m$)의 변화에 따라 Reflectance-Voltage 특성, 반사광 및 반사율 분포, Optical Fill Factor 그리고 명암비를 비교하였다. Surface Anchoring 효과에 의해 상하 간격이 증가하면서 반사율은 증가하였으나 Optical Fill Factor와 명암비를 고려할 경우, 중간 수준의 간격인 2.1 ${\mu}m$ 의 특성이 가장 우수함을 확인할 수 있었다. 동일한 구조를 갖고 있는 0.7 인치 LCOS 패널을 제작하여 광학적 측정을 해 본 결과 시뮬레이션 결과와 통일함을 확인할 수 있었다.

• 센서학회지
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• 제16권2호
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• pp.159-164
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• 2007

Thin films of platinum were deposited on a $Al_{2}O_{3}/ONO(SiO_{2}-Si_{3}N_{4}-SiO_{2})/Si$-substrate with an 2-inch Pt(99.99 %) target at room temperature for 20, 30 and 60 min by DC magnetron sputtering, respectively X-ray diffract meter (XRD) was used to analyze the crystallanity of the thin films and field emission scanning electron microscopy (FE-SEM) was employed for the investigation on crystal growth. The densification and the grain growth of the sputtered films have a considerable effect on sputtering time and annealing temperatures. The resistance of the Pt thin films was decreased with increasing deposition time and sintering temperature. Pt micro heater thin film deposited for 60 min by DC magnetron sputtering on an $Al_{2}O_{3}$/ONO-Si substrate and annealed at $600^{\circ}C$ for 1 h in air is found to be a most suitable micro heater with a generation capacity of $350^{\circ}C$ temperature and 645 mW power at 5.0 V input voltage. Adherence of Pt thin film and $Al_{2}O_{3}$ substrate was also found excellent. This characteristic is in good agreement with the uniform densification and good crystallanity of the Pt film. Efforts are on progress to find the parameters further reduce the power consumption and the results will be presented as soon as possible.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.451-451
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• 2010

최근들어 80인치 이상의 대경 고화질 display 및 휴대용 projection display 제작이 가능한 LCoS (Liquid Crystal on Silicon) display에 대한 관심이 높아지고 있다. LCoS projection display는 높은 개구율, 빠른 응답속도, 고화질, 대형 디스플레이 임에도 불구하고 낮은 제조단가 등의 여러 가지 장점을 가지고 있다. LCoS projection display의 핵심 기술로는 높은 투과도와 낮은 반사율을 갖는 유리기판, 무기 배향막 증착 기술, Si back plane과의 접합기술 등이 있다. 이 중 LCoS projection display 제작을 위한 첫 단계인 유리기판은 가시광선 영역에서 96% 이상의 높은 투과도와 3% 미만의 반사도를 요구하는 기술을 필요로 한다. 본 연구에서는 indium이 doping된 tin oxide (ITO)를 투명 전도성막으로 사용하고, $SiO_2/MgF_2$ 이중 박막을 반사방지막으로 채택하여 고투과도 및 저반사율을 갖는 유리기판 제조에 응용하였다. 먼저 15nm 두께의 ITO 박막을 DC sputtering을 이용하여 8-inch 크기의 corning1737 유리기판 상에 증착한 후, 그 반대편에 e-beam evaporation 장비를 사용하여 120nm 두께의 반사 방지막을 증착하였다. 또한 유리기판 상에 증착된 투명 전도성막의 표면개질을 위하여 Ar plasma를 이용하여 treatment를 수행하였다. 이 때 sputtering 조건은 DC power, Ar 유량 및 압력을 조절함으로서 높은 투과도를 갖는 최적의 조건을 구현하였고, e-beam evaporation을 이용한 반사방지막 증착 조건은 $SiO_2$와 $MgF_2$의 계면에서 빛의 반사를 최소화할 수 있는 최적의 조건을 구현하였다. 제작된 유리기판은 가시광선 영역에서 97% 이상의 투과도를 보였으며, 최대 2.8%의 반사율을 보여, LCoS display 제작에 적합함을 확인할 수 있었다. 또한 Ar plasma 처리 후 ITO 박막의 면저항 값은 $100\;{\omega}/{\Box}$, 표면 거칠기는 rms 값 기준 0.095nm, 접촉각 $20.8^{\circ}$의 특성을 보여, 타 index matched transparent conducting oxide가 coating된 유리기판에 비해 우수한 특성을 보였다.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2006년도 춘계학술대회 논문집
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• pp.239-242
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• 2006

LCD-BLU (Liquid Crystal Display - Back Light Unit) is one of kernel parts of LCD unit and it consists of several optical sheets(such as prism, diffuser and protector sheets), LGP (Light Guiding Plate), light source (CCFL or LED) and mold frame. The LGP of LCD-BLU is usually manufactured by forming numerous dots with $50{\sim}200$ um in diameter on it by etching process. But the surface of the etched dots of LGP is very rough due to the characteristics of the etching process during the mold fabrication, so that its light loss is high along with the dispersion of light into the surface. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current etched dot patterned LGP, optical pattern design with 50um micro-lens was applied in the present study. The micro-lens pattern fabricated by modified LiGA with thermal reflow process was applied to the optical design of LGP. The attention was paid to the effects of different aspect ratio (i.e. $0.2{\sim}0.5$) of optical pattern conditions to the brightness distribution of BLU with micro-lens patterned LGP. Finally, high aspect ratio micro-lens patterned LGP showed superior results to the one made by low aspect ratio in average luminance.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.75-76
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• 2006

LCD-BLU (Liquid Crystal Display - Back Light Unit) is one of kernel parts of LCD unit and it consists of several optical sheets(such as prism, diffuser and protector sheets), LCP (Light Guide Plate), light source (CCFL or LED) and mold frame. The LGP of LCD-BLU is usually manufactured by forming numerous dots with $50{\sim}200{\mu}m$ in diameter on it by erosion method. But the surface of the erosion dots of LGP is very rough due to the characteristics of the erosion process during the mold fabrication, so that its light loss is high along with the dispersion of light into the surface. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current dot patterned LGP, optical pattern design with $50{\mu}m$ micro-lens was applied in the present study. Especially, the negative and positive micro-lens pattern fabricated by modified LiGA with thermal reflow process was applied to the optical design of LGP. The attention was paid to the effects of different pattern conditions to the brightness distribution of BLU with micro-lens patterned LGP. Finally, negative micro-lens patterned LGP showed superior results to the one made by positive in average luminance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.218-218
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• 2012

Recently, hexagonal manganites have attracted much attention because of the coexistence of ferroelectricity and antiferromagnetic (AFM) order. The crystal structure of hexagonal manganites consists of $MnO_5$ polyhedra in which $Mn^{3+}$ ion is surrounded by three oxygen atoms in plane and two apical oxygen ions. The Mn ions within Mn-O plane form a triangular lattice and couple the spins through the AFM superexchange interaction. Due to incomplete AFM coupling between neighboring Mn ions in the triangular lattice, the system forms a geometrically-frustrated magnetic state. Among hexagonal manganites, $YMnO_3$, in particular, is the best known experimentally since the f states are empty. In addition, for applications, $YMnO_3$ thin films have been known as promising candidates for non-volatile ferroelectric random access memories. However, $YMnO_3$ has low magnetic order temperature (~70 K) and A-type AFM structure, which hinders its applications. We have synthesized $YMn1_{-x}Cr_xO_3$ (x = 0, 0.05 and 0.1) samples by the conventional solid-state reaction. The powders of stoichiometric proportions were mixed, and calcined at $900^{\circ}C$ for $YMn1_{-x}Cr_xO_3$ for 24 h. The obtained powders were ground, and pressed into 5-mm-thick disks of 1/2-inch diameter. The disks were directly put into the oven, and heated up to $1,300^{\circ}C$ and sintered in air for 24 h. The phase of samples was checked at room temperature by powder x-ray diffraction using a Rigaku Miniflex diffractometer with Cu $K{\alpha}$ radiation. All the magnetization measurements were carried out with a superconducting quantum-interference-device magnetometer. Our experiments point out that the Cr-doped samples show the characteristics of a spin-glass state at low temperatures.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.249-249
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• 2009

We have grown large area BSTO($(Ba_{1-x}Sr_x)TiO_3$) thin films (x=0.4) on 2 inch diameter MgO (001) single crystal substrates using a pulse laser deposition(PLD) system. Substrate temperature and oxygen pressure in the deposition chamber, and the laser optics for ablating a target have been controlled to obtain the uniform thickness and preferred orientation of the films. Results of x-ray diffraction and rocking curve analysis revealed that the BSTO films were grown on MgO substrates with a preferred orientation (002), and the full width half maximum of the rocking curve was measured to be 0.86 degree at optimum condition. Roughness of the films have been measured to be $3.42{\AA}$ rms by using atomic force microscopy. We have successfully deposited the large area BSTO thin films of $4000{\AA}$ thickness on 50 mm diameter MgO substrates.