• Title/Summary/Keyword: 13.56 MHz

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Analysis of H-ICP Source by Noninvasive Plasma Diagnostics of Etching Process

  • Park, Kun-Joo;Kim, Min-Shik;Lee, Kwang-Min;Chae, Hee-Yeop;Lee, Hi-Deok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.126-126
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    • 2009
  • Noninvasive plasma diagnostic technique is introduced to analyze and characterize HICP (Helmholtz Inductively Coupled Plasma) source during the plasma etching process. The HICP reactor generates plasma mainly through RF source power at 13.56MHz RF power and RF bias power of 12.56MHz is applied to the cathode to independently control ion density and ion energy. For noninvasive sensors, the RF sensor and the OES (Optical emission spectroscopy) were employed since it is possible to obtain both physical and chemical properties of the reactor with plasma etching. The plasma impedance and optical spectra were observed while altering process parameters such as pressure, gas flow, source and bias power during the poly silicon etching process. In this experiment, we have found that data measured from these noninvasive sensors can be correlated to etch results. In this paper, we discuss the relationship between process parameters and the measurement data from RF sensor and OES such as plasma impedance and optical spectra and using these relationships to analyze and characterize H-ICP source.

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A Study on the Characteristics of TRIODE Etching (TRIODE 장치를 이용한 건식 식각 특성에 관한 연구)

  • Shin, Jae-Yeol;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1988.11a
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    • pp.199-202
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    • 1988
  • TRIODE etching characteristics are studied. 13.56 MHz is applied to the Lower electrode and 100 KHz to the upper electrode. Wafers are etched on the lower electrode and we investigate their characteristics and compare then with those of RIE. It shows TRIODE etch rate is much higher than that of RIE but the surface is more contaminated.

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An Optimal Capacitance of RFID Antenna for Auto-Tracking Systems (자동 트래킹 시스템을 위한 RFID 안테나의 최적 Capacitance)

  • Jang, Gee-Young;Rim, Seong-Rak
    • Proceedings of the KAIS Fall Conference
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    • 2011.05a
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    • pp.444-446
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    • 2011
  • RFID(13.56MHz)를 이용한 자동 트래킹 시스템은 기본적으로 RFID 안테나와 리더부, Card(Tag)로 구성된다. 본 논문에서는 RFID 안테나의 크기와 출력 거리에 영향을 미치는 최적 Capacitance 값을 도출하는 방법을 제시한다. 제시한 방법의 타당성을 검토하기 위하여 RFID 안테나의 크기가 $0.0856{\times}0.05398m$이고 출력거리가 10~12cm에 가장 적합한 Capacitance 값을 도출하여 시제품를 설계 제작하여 정상적인 동작 상태를 확인하였다.

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A Study of RFID System Enable to High Speed Recognition (고속인식이 가능한 무선인식 시스템에 관한 연구)

  • 윤상문;백선기;김윤집;박면규;이기서
    • Proceedings of the KSR Conference
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    • 2002.05a
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    • pp.522-529
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    • 2002
  • In this Paper, it has a proposal of the RFID(RFID : Radio Frequency Identification) system for high-speed recognition between the tag attached a mobile object moving high-speed and the static reader. It used 13.56MHz frequency at ISM band, and designed a reader in order to recognize a mobile object moving high-speed. It will be expected that RFID system enables a smooth railway signal control applying in railway system through the cyclic loop antenna.

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Plasma 부하를 갖는 System에서의 Automatching 회로

  • Hwang, Gi-Ung;Kim, Won-Gyu;Lee, Seok-Hyeon
    • Proceedings of the KIEE Conference
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    • 1985.07a
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    • pp.224-227
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    • 1985
  • During operation of an RF glow discharge system, it can be observed that the reflected power tends to increase in small value, due to changes in the impedance of the system. This problem can be relieved by adding an automatic impedance matching circuit to the system. This paper presents a detailed method of automatically matching the input impedance of a 50 ohm transmission line to an RF glow discharge system at 13.56 MHZ.

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A preparation of organic thin films by capacitive coupled plasma polymerization method (내전극 정전 결합형 플라즈마 중합 장치에 의한 유기 박막의 작성)

  • 김종택;박구범;이덕출;윤문수
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1990.10a
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    • pp.45-46
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    • 1990
  • In this study, we fabricated Plasma polymerized styrene thin films which used a new capacitive type apparatus. RE Power supply (13.56 MHz) was used and styrene monomer was adopted. After the preparation of thin films the molecular structure of Plasma polymerized styrene films was analyzed by some analyses as IR, FT-IR, Gas chromatography and so on.

R&D activities of a-Si:H thin film solar cells by LG Electronics

  • Lee, Don-Hui
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.19-19
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    • 2007
  • Recently, we have developed p-i-n hydrogenated amorphous silicon (a-Si:H) single junction (SJ) thin film solar cells with RF (13,56MHz) plasma enhanced chemical vapor deposition (PECVD) systems, and also successfully fabricated the mini-modules (>300$cm^2$), using laser scribing technique to form an integrated series connection, The efficiency of a mini-module was 7.4% (Area=305$cm^2$, $I_{SC}$=0.25A, $V_{OC}$=14.74V, FF=62%).

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Design and Implementation of Firmware for RFID Reader (RFID 리더를 위한 펌웨어 설계 및 구현)

  • Jang, Gee-Young;Rim, Seong-Rak
    • Proceedings of the Korea Information Processing Society Conference
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    • 2011.11a
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    • pp.73-75
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    • 2011
  • 본 논문에서는 RFID 리더를 위한 펌웨어를 설계, 구현한다. 정의한 메시지 포멧 데이터 맵을 RFID 리더를 통해 태그 데이터 읽기, 쓰기의 펌웨어 개발방법을 제시한다. 제시한 RFID(13.56MHz) 리더의 펌웨어 타당성을 검토하기 위해 RFID 리더에 개발된 펌웨어를 다운로드하여, 정의한 메세지 포멧과 데이터 맵의 형태로 태그의 읽기, 쓰기를 확인하였다.

SF6와 NF3를 이용한 SiNx의 건식식각특성과 관련된 변수에 대한 연구

  • O, Seon-Geun;Park, Gwang-Su;Lee, Yeong-Jun;Jeon, Jae-Hong;Seo, Jong-Hyeon;Lee, Ga-Ung;Choe, Hui-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.241-241
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    • 2012
  • $SF_6$$NF_3$는 디스플레이 장치의 제조공정 중 $SiN_x$박막을 건식식각공정에서 사용되고 있다. 이 논문에서는 이 두 가스에 대한 건식식각의 특성을 관찰하기 위해서 CCP-RIE를 이용하여 가스와 산소의 유량비($SF_6$/$O_2$>, $NF_3$/$O_2$), 압력, 전력 비(13.56 MHz/2 MHz)를 변화시키는 다양한 공정조건하에서 실험을 진행하였다. 이 실험에서 $NF_3$를 이용한 $SiN_x$ 박막 건식식각률이 $SF_6$를 이용한 건식식각률보다 모든 공정 조건하에서 높게 나타났다. 불소원자의 OES 강도와 V/I probe 를 이용하여 건식식각률과 비례하는 상관관계 변수를 발견하였고 이를 플라즈마 변수와 관련하여 해석하였다.

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