• Title/Summary/Keyword: 프라즈마

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AISI316L stainless steel에 저온 프라즈마 침탄처리 후 질화처리 시 공정인자에 따른 표면특성평가

  • Jeong, Gwang-Ho;Lee, In-Seop
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.11a
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    • pp.155-156
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    • 2007
  • AISI316L강에 저온 프라즈마 침탄과 저온 프라즈마 질화를 연속적으로 실시하여 표면경도와 내식성을 동시에 증가시키는 처리법에서 질화처리 시 처리시간 및 온도에 따른 표면특성변화를 조사하였다. 모든 시편의 표면에 N에 의해 확장된 오스테나이트(${\gamma}_N$)가 형성되었으며, 형성된 ${\gamma}_N$로 인하여 표면경도가 약 $3{\sim}4$배 증가하였다. 처리시간과 온도가 증가함에 따라 ${\gamma}_N$층의 두께와 표면의 N농도가 증가 하였다. 표면처리한 모든 시편은 표면의 N의 영향으로 내식성이 증가 하였다.

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Deposition Characteristics of $TEOS-O_3$ Oxide Film on Substrate (기판 막질에 따른 $TEOS-O_3$ 산화막의 증착 특성)

  • Ahn, Yong-Cheol;Park, In-Seon;Choi, Ji-Hyeon;Chung, U-In;Lee, Jeong-Gyu;Lee, Jeong-Gyu
    • Korean Journal of Materials Research
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    • v.2 no.1
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    • pp.76-82
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    • 1992
  • Deposition of $TEOS-O_3$ oxide film as inter-metal dielectric layer shows the substrate dependency according to the substrate material and pattern density and pitch size. To minimize substrate and Pattern dependency, TEOS-base and $SiH_4-base$ Plasma oxide were predeposited as underlying material on the substrate. The substrate dependency of $TEOS-O_3$ oxide film was more significant on TEOS-base plasma oxide than on $SiH_4-base$ plasma oxide. The dependency of $TEOS-O_3$ oxide film was remarkably reduced, or nearly eliminated, by $N_2$plasma treatment on TEOS-base plasma oxide, which appears to be caused by the O-Si-N structure, observed on the the surface of TEOS-base plasma oxide.

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A Study on the Nano-Plasma Rock Breaking Blasting Method Using Rapidly Expansive Metal Mixture (급팽창 금속혼합물을 이용한 나노프라즈마 바위 파쇄공법에 관한 연구)

  • Kim Sung-Kook;Ahn Myung-Seog;Cho Myung-Chan
    • Explosives and Blasting
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    • v.23 no.3
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    • pp.57-74
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    • 2005
  • In the past, explosives like dynamite was used to blast rock. However, today it is difficult to use explosives in urban blastinglike excavation for subway, building, and housing land. According to Korea Department of Construction and Transportation's proposal for blasting design manual and test blasting, from TYPE I blasting to TYPE IV blasting are recommended when we determine 0.3cm/sec(centisec) as a maximum allowable ground vibration with a distance between $25m\~120m$ from structures. This article was written to introduce one of TYPE I (reck blasting within 25m from structures) blasting method, Nano-Plasma blasting method. When Nano-Plasma blasting method is applied in urban blasting job, ground vibration (15m away from blasting point) is expected 0.1cm/sec, which is only half of a ground vibration when low ground vibration blasting method is applied. By this unique characteristic, Nano-Plasma blasting method is epochal urban blasting technique.

A Study on the Microwave Reflection of Plasma in a Magnetic Field (방전프라즈마내 자계에 의한 마이크로파 반사특성)

  • 김봉열;김정기
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.6 no.1
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    • pp.12-18
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    • 1969
  • The characteristics of microwave reflection in the media of cold gaseous plasma is analysed to various external magnetic flux density. The DC discharge plasma is generated in the rectangular waveguide which contains two electrodes and helium gas at the pressure of 10-2mm Hg. The reflected and transmitted power of microwave is measured when the electric field is parallel to, and perpendicular to the external magnetic field. It shows that the reflected power is increased as the magnetic flux density is increased in the parallel case, but the maximum value of the reflected power is occured at the cyclotron resonance (3120 Gauss) in the perpendicular case.

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A Study for plasma nonuniformity measurement by PDM Tool (PDM Tool을 이용한 plasma nonuniformity 측정에 관한 연구)

  • 김상용;서용진;이우선;정헌상;김창일;장의구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.75-78
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    • 2000
  • This paper is estimated to enhance yield improvement and device reliability using PDM(plasma damage monitoring) system capable of in-suit detection about plasma nonuniformity. PDM Tool is the non-contact method of wafer and surface potential electrode(kelvin probe). Its tool measures Vox(oxide barrier) with charge created by plasma. It's possible to inspect the wafer damage generated by plasma charge and analysis of in-situ monitoring data. we obtained the good data which is continuously prevented from plasma damage using its tool for 10weeks. This tool is contributed to preventive steps contemporaneously inspecting the difference of inter-chamber.

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