Hydrophobic characteristic of SiOxCyHz film by controlling the plasma process for HMDS precursor with hydrogen gas (HMDS와 수소를 이용한 플라즈마 공정 제어를 통한 소수성을 가지는 SiOxCyHz 박막합성)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2012.05a
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- pp.341-342
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- 2012