Study on the Application of Photosensitive Resin to Reduce the Tolerance of Polymer Thick Film Resistors (폴리머 후막저항의 허용편차 개선을 위한 감광성 레진 적용에 대한 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2008.06a
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- pp.532-532
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- 2008