• Journal of the Korean Solar Energy Society
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• v.26 no.4
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• pp.55-61
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• 2006

Titanium oxide ($TiO_2$) films are deposited on the indium tin oxide (ITO) substrate in an $Ar/O_2$ atmosphere by using reactive RF (Radio Frequency) magnetron sputtering technique, and Electrochromic properties and durability of $TiO_2$ films deposited at different preparation conditions are investigated by using UV-VIS spectrophotometer and cyclic voltammetry Li+ interalation/deintercalation in $TiO_2$ films shows that the electrochromic properties and durability of as-deposited films strongly depend on gas pressure $TiO_2$ films formed in our sputtering conditions are found to remain transparent, irrespective of their Li+ ion contents. The optimum sputtering conditions for film as passive counter electrode in electrochromic devices are working pressure of $1.0\;{\times}\;10^{-2}\;torr$ and oxygen flow raes of $10{\sim}15\;sccm$, respectively.

• Journal of the Korean Solar Energy Society
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• v.30 no.3
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• pp.90-97
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• 2010

$TiO_2$ thin films for solar energy utilization were prepared on ITO coated glass by r.f magnetron sputtering with variations of working pressure, oxygen flow rate and annealing temperature. Ion insertion and extraction reaction, and ion storage properties of films were investigated by using a cyclic voltammetry. Transmittance of thin films in as-prepared, colored and bleached states was measured by UV-VIS spectrophotometer. The samples deposited in our sputtering conditions showed poor electrochromic properties. Improvement in ion storage properties of $TiO_2$ thin film was observed after annealing at temperature of $400^{\circ}C$ in air for 2 hours. It was found that $TiO_2$ thin film in electrochromic device could be used as a passive counter-electrode.