• Progress in Superconductivity and Cryogenics
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• v.2 no.2
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• pp.11-14
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• 2000

We fabricated a resistive superconducting fault current limiter (SFCL) of meander type based on a YBCO film. In order to disperse the heat generated at hot spots in the YBCO film the film was coated with a gold shunt layer. When diodes were inserted in the parallel circuit to restrict the temperature increase in the SFCL element by reducing power supply cycles, the voltage could be increased to $\sqrt{2}$ times with the same quench resistance at a half and full cycles.

• Progress in Superconductivity and Cryogenics
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• v.4 no.1
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• pp.84-88
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• 2002

The resistive fault current limiter (SFCL) is a very attractive device for power networks. But it has a serious Problem in using YBCO films for fault current limiter is inhomogeneities caused by imperpect manufacturing. So simultaneous quenches are a difficult problem which elements for current limiting are connected in series for increasing voltage ratings. We investigated extended electric field-current characteristics for current limiting element of YBCO film when O-130mT magnetic field is applied. And quench characteristics were investigated in over all element and between elements of YBCO films. From the experiments, it was shown that applied magnetic fields using solenoid coil induced uniform quench distribution for over all stripes and simultaneous quench in all elements for current limiting of YBCO film was realized. We have achieved resistive fault current limiter of 1.2kV/20A rating using magnetic field.

• Progress in Superconductivity and Cryogenics
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• v.4 no.1
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• pp.13-16
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• 2002

$SrZrO_3 $resistive oxide barriers on Ag sheathed Bi2223 tapes were prepared by the sol-gel and dip coating method to reduce AC coupling loss. The performance of the dip-coated $SrZrO_3 $ thin films was evaluated in terms of bond strength by varying the Sr/Zr mol ratio and the amount of organic vehicle (ethyl cellulose and a-terpineol) additives. The bond strength of the coatings increased as the Sr/Zr ratio decreased and the amount of organic vehicle rose, respectively. It was found that the effect of organic vehicle addition was more pronounced, suggesting that the adherence of the $SrZrO_3 $ films on Bi2223 tapes was governed primarily by the amount of organic vehicle additive.

• Proceedings of the KIEE Conference
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• 1995.11a
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• pp.361-363
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• 1995

High quality $Y_1Ba_2Cu_3O_{7-x}$ thin films have been fabricated by pulsed Nd:YAG laser deposition using an unusual 'off-axis' target-substrate geometry. Various properties of superconducting $Y_1Ba_2Cu_3O_{7-x}$ thin films have been studied systematically as a function of oxygen pressure during the deposition, in both 'on-axis' and the unusual 'off-axis' target substrate geometry. In the 'off-axis' geometry, one can completely eliminate the so-called 'laser droplets' form the thin surface and thus obtain smooth high qualify films. It is found that films with optimum structural and electrical properties are obtained at a lower oxygen pressure range during the 'off-axis' deposition when compared with that required in the 'on-axis' deposition geometry.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05c
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• pp.208-211
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• 2002

$Bi_2Sr_2CuO_x$(Bi-2201) thin films were fabricated by atomic layer-by-layer deposition using an ion beam sputtering method. 10 wt% and 90 wt% ozone mixed with oxygen were used with ultraviolet light irradiation to assist oxidation. At early stages of the atomic layer by layer deposition, two dimensional epitaxial growth which covers the substrate surface would be suppressed by the stress and strain caused by the lattice misfit, then three dimensional growth takes place. Since Cu element is the most difficult to oxidize, only Sr and Bi react with each other predominantly, and forms a buffer layer on the substrate in an amorphous-like structure, which is changed to $SrBi_2O_4$ by in-situ anneal.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.300-303
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• 2001

BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coefficient of Bi element exhibits a characteristic temperature dependence : almost a constant value of 0.49 below $730^{\circ}C$ and decreases linearly with temperature over $730^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, $Bi_{2}O_{3}$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi 2212 phase formation in the co-deposition process.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.308-311
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• 2001

Bi-2212 and Bi-2223 thin films are prepared by IBS(ion beam sputtering) technique. Three phases of Bi-2201, Bi-2212 and Bi-2223 appear as stable ones in spite of the conditions for thin film fabrication of Bi-2212 and Bi-2223 compositions, depending on substrate temperature($T_{sub}$) and ozone pressure( $PO_3$ ). It is found out that these phases show similar $T_{sub}$ and $PO_3$ dependence, and that the stable regions of these phases are limited within very narrow temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.304-307
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• 2001

High quality BSCCO thin films have been fabricated by means of an ion beam sputtering at various substrate temperatures, $T_{sub}$, and ozone gas pressures, $PO_3$. The correlation diagrams of the BSCCO phases appeared against $T_{sub}$ and $PO_3$ are established in the 2212 and 2223 compositional films. In spite of 2212 compositional sputtering, Bi220l and Bi2223 phases as well as Bi2212 one come out as stable phases depending on $T_{sub}$ and $PO_3$. From these results, the thermodynamic evaluations of ${\Delta}H$ and ${\Delta}S$ S, which are related with Gibbs' free energy change for single Bi2212 or Bi2223 phase are performed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.329-330
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• 2005

Bi-Sr-Ca-Cu-O thin films have been fabricated by sputter deposition method. During the deposition, 10 and 90 wt%-ozone/oxygen mixture gas of typical pressure of $1\sim9\times10^{-5}$ Torr are supplied with ultraviolet light irradiation for oxidation. XRD and RHEED investigations reveal out that a buffer layer with some different compositions is formed at the early deposition stage of less than 10 units cell and then Bi-2201 oriented along the c-axis is grown.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.327-328
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• 2005

Bi-system thin films are prepared by ion beam sputtering technique. Three phases of Bi-2201, Bi-2212 and Bi-2223 appear as stable ones in spite of the conditions for thin film fabrication of Bi-2212 and Bi-2223 compositions, depending on substrate temperature($T_{sub}$) and ozone pressure($PO_3$). It is found out that these phases show similar $T_{sub}$ and $PO_3$ dependence, and that the stable regions of these phases are limited within very narrow temperature.