• Title/Summary/Keyword: 절연구조

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Residual Stress Behavior of PMDA/6FDA-PDA Copolyimide Thin Films (PMDA/6FDA-PDA 공중합 폴리이미드의 잔류응력 거동)

  • Jang, Won Bong;Chung, Hyun Soo;Joe, Yungil;Han, Haksoo
    • Applied Chemistry for Engineering
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    • v.10 no.7
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    • pp.1014-1019
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    • 1999
  • Copolyamic acid PMDA/6FDA-PDA(PAA) and homopolyamic acids PMDA-PDA(PAA) and 6FDA-PDA(PAA) were synthesized from 1,2,4,5-benzenetetracarboxylic dianhydride(PMDA) and 2,2'-bis(3,4-dicarboxyphenyl) hexafluoropropane dianhydride(6FDA) as the dianhydride and 1,4-phenylenediamine (PDA) as the diamine. Residual stresses were detected in-situ during thermal imidization of the co- and homopolyimide precursors as a function of processing temperature over the range of $25{\sim}400^{\circ}C$ using thin film stress analyzer(TFSA), and morphological structures were investigated by WAXD. In comparison, the resultant residual stress of polyimide films composed of different compositions decreased with the increasing content of PMDA unit in the chain and was about 5 Mpa in compression mode for PMDA-PDA. In this study, the synthesis of random PMDA/6FDA-PDA copolyimide could be completed and compensate for the difficulty of process due to high $T_g$ of PMDA-PDA and relatively higher stress of 6FDA-PDA. It showed that we can make a low level stress copolyimied having excellent mechanical properties by incorporating appropriate rod-like rigid structure PMDA-PDA unit into 6FDA-PDA polyimide backbone which generally shows higher stress due to rotational hinges such as bulky di(trifluoromethyl). Specially, PMDA/6FDA-PDA(0.9:0.1:1.0) satisfied excellent mechanical property and low level stress as an inter layer showing low dielectric constant.

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Fabrication and Properties of Conductive Carbon Fiber/Polyethylene Composite Films Fabricated under High Intensity Electric Fields : Effect of Polymer Sublayer (고전기장을 이용한 도전성 탄소섬유/폴리에틸렌 복합필름의 제조 및 특성 연구 : 고분자 점착하층의 영향)

  • Park, Min;Kim, Jun-Kyung;Lim, Soon-Ho;Ko, Moon-Bae;Choe, Chul-Rim;Mironov, V.S.;Bang, Hyo-Jae;Lee, Kwang-Hee
    • Polymer(Korea)
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    • v.24 no.2
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    • pp.268-275
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    • 2000
  • We investigated the effect of polymer sublayer on volumetric resistivity and tensile strength of carbon fiber (CF)/polyethylene composite films fabricated under high intensity electric fields. The dependence of volumetric resistivity and tensile strength of the films on the polymer sublayer thickness or mass part exhibited complex behavior according to CF content and CF layer density in the films. As the thickness of polymer sublayer increases, two groups of processes at thermo-mechanical forming stage would take effects in the properties of the films. The first group comprises the increase of polymer layer thickness having reduced CF content compared with central or upper part of the film and insufficient wetting of CF resulting in the loosened structure near upper film side. The second group, on the other hand, is the improvement of mobility of molten sublayer leading to better distribution of CF throughout the film thickness and the formation of more compact structure. The different degree of contribution of these two competing processes at varied CF content and CF layer density could explain complex dependence of the film properties on the polymer sublayer. These results are important to optimize the electrical and mechanical properties of highly conductive polymer films, which can be used as electromagnetic interference shielding materials.

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Bond Strength of Wafer Stack Including Inorganic and Organic Thin Films (무기 및 유기 박막을 포함하는 웨이퍼 적층 구조의 본딩 결합력)

  • Kwon, Yongchai;Seok, Jongwon
    • Korean Chemical Engineering Research
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    • v.46 no.3
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    • pp.619-625
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    • 2008
  • The effects of thermal cycling on residual stresses in both inorganic passivation/insulating layer that is deposited by plasma enhanced chemical vapor deposition (PECVD) and organic thin film that is used as a bonding adhesive are evaluated by 4 point bending method and wafer curvature method. $SiO_2/SiN_x$ and BCB (Benzocyclobutene) are used as inorganic and organic layers, respectively. A model about the effect of thermal cycling on residual stress and bond strength (Strain energy release rate), $G_c$, at the interface between inorganic thin film and organic adhesive is developed. In thermal cycling experiments conducted between $25^{\circ}C$ and either $350^{\circ}C$ or $400^{\circ}C$, $G_c$ at the interface between BCB and PECVD $ SiN_x $ decreases after the first cycle. This trend in $G_c$ agreed well with the prediction based on our model that the increase in residual tensile stress within the $SiN_x$ layer after thermal cycling leads to the decrease in $G_c$. This result is compared with that obtained for the interface between BCB and PECVD $SiO_2$, where the relaxation in residual compressive stress within the $SiO_2$ induces an increase in $G_c$. These opposite trends in $G_cs$ of the structures including either PECVD $ SiN_x $ or PECVD $SiO_2$ are caused by reactions in the hydrogen-bonded chemical structure of the PECVD layers, followed by desorption of water.

Peel strengths of the Composite Structure of Metal and Metal Oxide Laminate (Metal과 Metal Oxidefh 구성된 복합구조의 Peel Strength)

  • Shin, Hyeong-Won;Jung, Taek-Kyun;Lee, Hyo-Soo;Jung, Seung-Boo
    • Journal of the Microelectronics and Packaging Society
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    • v.20 no.4
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    • pp.13-16
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    • 2013
  • A lot of various researches have been going on to use heat spreader for LED module. Nano porous aluminum anodic oxide (AAO) applied LED, which is produced from anodization, is easy and economically advantageous. Convensional LED module is consist of aluminum/adhesive/copper circuit. The polymer adhesive in this module is used as heat spreader. However the thermal emission of LED component is degraded because of low heat conductivity of polymer and also reliability of LED component is reduced. Therefore, AAO in this work was applied to heat spreader of LED module which has higher heat conductivity compare to polymer. Bonding strength between AAO and copper circuit was improved with Ti/Cu seed layer by copper sputtering process (DBC) before the bonding. And this copper circuit has been fabricated by electro plating method. Peel strength of AAO and copper circuit in this work showed range between 1.18~1.45 kgf/cm with anodizing process which is very suitable for high power LED application.

Effects of the Powder Preparation Method on the Magnetic Properties of Fe-based Amorphous Alloy Powder Cores (철계 비정질 합금 분말코아의 자기적 특성에 미치는 분말 제조방식의 영향)

  • Noh, T.H.;Choi, H.Y.
    • Journal of the Korean Magnetics Society
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    • v.15 no.3
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    • pp.191-197
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    • 2005
  • In the fabrication process of Fe-based amorphous alloy powder cores by pulverization of the melt-spun ribbons and cold compaction, the effects of powder preparation method on the magnetic & electric properties, powder shapes and microstructure of cores have been investigated. The powder cores made by using rotor mill showed low effective permeability as compared to the cores prepared by ball milling. However the frequency dependence and quality factor properties were superior in the case of rotor-milling. Further the powders prepared by rotor mill had homogeneous and round shapes through strong shearing in the sieve ring, while the ball milled powders were inhomogeneous and relatively small. The lower permeability of the powder cores fabricated with rotor mill was considered to be due to the high internal stress occurred by very intensive shearing. Moreover the powder cores produced by rotor-milling showed lower core loss and good frequency dependence of effective permeability possibly due to the higher electrical insulation between magnetic particles. The dc bias property of the powder cores made by rotor-milling was better than the one by ball-milling.

A Schottky Type Ultraviolet Photo-detector using RUO$_2$/GaN Contact (RUO$_2$/GaN 쇼트키 다이오드 형 자외선 수광소자)

  • Sin, Sang-Hun;Jeong, Byeong-Gwon;Bae, Seong-Beom;Lee, Yong-Hyeon;Lee, Jeong-Hui;Ham, Seong-Ho
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.38 no.10
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    • pp.671-677
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    • 2001
  • A RuO$_2$ Schottky photo-detector was designed and fabricated with GaN layers on the sapphire substrate. For good absorption of UV light, an epitaxial structure with undoped GaN(0.5 ${\mu}{\textrm}{m}$)/n ̄-GaN(0.1${\mu}{\textrm}{m}$)/n+-GaN(1.5${\mu}{\textrm}{m}$) was grown by MOCVD. The structure had the carrier concentrations of 3.8$\times$10$^{18}$ cm ̄$^3$, the mobility of 283$\textrm{cm}^2$/V.s. After ECR etching process for mesa structure with the diameter of about 500${\mu}{\textrm}{m}$, Al ohmic contact was formed on GaN layer. After proper passivation between the contacts with Si$_3$/N$_4$, was formed on undoped GaN layer. The fabricated Schottky diode had a specific contact resistance of 1.15$\times$10$^{-5}$$\Omega$.$\textrm{cm}^2$]. It has a low leakage current of 305 pA at -5 V, which was attributed by stable characteristics of RuO$_2$ Schottky contact. In optical measurement, it showed the high UV to visible extinction ratio of 10$^{5}$ and very high responsivity of 0.23 A/W at the wavelength of 365nm.

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커패시터에의 적용을 위해 PET 필름에 스퍼터 증착한 ZrO2 박막의 특성

  • Gwon, Neung;Fei, Chen;Ryu, Han;Park, Sang-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.389.1-389.1
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    • 2014
  • 최근의 환경 및 에너지에 대한 관심으로 수요가 증가하고 있는 하이브리드 및 전기 자동차나 태양광발전, 풍력발전용의 인버터기기에는 고에너지밀도 커패시터가 필수적이 되었다. 높은 에너지 밀도를 요구하는 전력전자, 펄스파워 등의 응용분야에 사용되는 고에너지밀도 커패시터는 PET (Polyethylene terephtalate)와 PP (Polypropylene)와 같은 폴리머 유전체를 사용하는 범용 필름 커패시터가 사용되었으나 사용 요구 조건의 한계에 도달하여, 새로운 유전체를 적용하는 커패시터가 절실히 필요한 상황이다. PET와 PP와 같은 유전체는 유전상수가 2~3의 낮은 값을 가지고 있어 고에너지밀도를 구현하기가 어렵다. 본 연구에서는 새롭게 요구되고 있는 고에너지 밀도 커패시터의의 성능을 만족시키기 위하여 $20{\sim}50{\mu}m$ 두께의 PET 필름상에 세라믹 유전체인 $ZrO_2$ 박막을 스퍼터(Sputter) 증착법에 의해 코팅하여 종래의 필름 커패시터와 세라믹 커패시터의 장점을 갖는 커패시터를 제조하기 위한 박막 유전재료의 개발을 목표로 하였다. 수백 nm~수 ${\mu}m$ 두께의 $ZrO_2$ 박막을 스퍼터링 공정조건에 따라 증착한 후 박막의 결정성, 기판과의 부착성, 증착속도, 유전상수, 절연파괴강도, 온도안정성 등을 XRD, SEM, AFM, EDS, XPS, Impedance analyzer 등에 의해 평가하였다. $ZrO_2$ 유전체막은 상온에서 증착하였음에도 정방정(tetragonal)구조의 결정질로 성장하였고 증착압력이 증가함에 따라 주피크의 세기가 감소하였다. 증착 중 산소가스를 주입하였을 경우에도 결정질막으로 성장하였다. 증착막들은 산소가스의 양이 증가함에 따라 짙은 흰색으로 변하였으며 PET 기판과의 접착력도 약해졌다. 또한 거칠기는 Ar가스만으로 증착한 경우보다 증가하였으며 24~66 nm의 평균 거칠기값을 보였다. PET위에 Ar가스만으로 증착한 $ZrO_2$의 비유전율은 1kHz에서 116~87의 비유전율을 보여 PET에 비해 매우 우수한 특성을 보였다. $ZrO_2$ 막들은 300kV/cm의 전계에서 대략 10-8A 이하의 누설전류를 보였다. 증착가스비를 달리하여 제조된 시편에서도 유사한 누설전류값을 나타내었다. 300 kV/cm 전후의 전계까지 측정한 $ZrO_2$ 막의 P-E (polarization-electric field) 특성을 확인하였는데, 5 mTorr의 압력에서 증착한 막은 253 kV/cm에서 $5.5{\mu}C/cm^2$의 분극값을 보였다. P-E커브의 기울기와 분극량에 따라 에너지밀도가 달라지므로 공정조건에 따라 에너지밀도가 변화됨을 예측할 수 있었다. PET위에 스퍼터 증착한 $ZrO_2$ 유전체막은 5mTorr의 Ar가스분위기에서 제조할 때 가장 안정적인 구조를 보였으며, 고에너지밀도 커패시터에의 적용가능성을 보였다.

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X-ray properties measurement of Flat panel Digital X-ray gas detector (평판형 디지털 엑스레이 가스 검출기의 엑스선 특성 측정기술에 관한 연구)

  • Yoon, Min-Seok;Cho, Sung-Ho;Oh, Kyung-Min;Jung, Suk-Hee;Nam, Sang-Hee;Park, Ji-Goon
    • Journal of the Korean Society of Radiology
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    • v.3 no.1
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    • pp.17-21
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    • 2009
  • The Recently, large area matrix-addressed image detectors are investigated for X-ray imaging with medical diagnostic and other applications. In this paper, a new flat panel gas detector for diagnostic X-ray imaging is proposed, and its characteristics are investigated. The research of flat panel gas detector is not exist at all. Because of difficulty to inject gas against to atmospheric pressure. So almost gas detector made by chamber shape. We made flat panel sample by display technique. (ex: PDP, Fed, etc.) The experimental measurements, the transparent electrodes, dielectric layer, and the MgO protection layer were formed in front glass. And, the X-ray phosphor layer and address electrodes are formed in the rare glass. The dark current, the x-ray sensitivity and linearity as a function of electric field were measured to investigate the electrical properties. From the results, the stabilized dark current density and the significant x-ray sensitivity were obtained. And the good linearity as a function of exposure dose was showed in wide diagnostic energy range. These results means that the passive matrix-addressed flat panel gas detector can be used for digital x-ray imaging.

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Poly-Si MFM (Multi-Functional-Memory) with Channel Recessed Structure

  • Park, Jin-Gwon;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.156-157
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    • 2012
  • 단일 셀에서 비휘발성 및 고속의 휘발성 메모리를 모두 구동할 수 있는 다기능 메모리는 모바일 기기 및 embedded 장치의 폭발적인 성장에 있어 그 중요성이 커지고 있다. 따라서 최근 이러한 fusion기술을 응용한 unified RAM (URAM)과 같은 다기능 메모리의 연구가 주목 받고 있다. 이러한 다목적 메모리는 주로 silicon on insulator (SOI)기반의 1T-DRAM과 SONOS기술 기반의 비휘발성 메모리의 조합으로 이루어진다. 하지만 이런 다기능 메모리는 주로 단결정기반의 SOI wafer 위에서 구현되기 때문에 값이 비싸고 사용범위도 제한되어 있다. 따라서 이러한 다기능메모리를 다결정 실리콘을 이용하여 제작한다면 기판에 자유롭게 메모리 적용이 가능하고 추후 3차원 적층형 소자의 구현도 가능하기 때문에 다결정실리콘 기반의 메모리 구현은 필수적이라고 할 수 있겠다. 본 연구에서는 다결정실리콘을 이용한 channel recessed구조의 다기능메모리를 제작하였으며 각 1T-DRAM 및 NVM동작에 따른 memory 특성을 살펴보았다. 실험에 사용된 기판은 상부 비정질실리콘 100 nm, 매몰산화층 200 nm의 SOI구조의 기판을 이용하였으며 고상결정화 방법을 이용하여 $600^{\circ}C$ 24시간 열처리를 통해 결정화 시켰다. N+ poly Si을 이용하여 source/drain을 제작하였으며 RIE시스템을 이용하여 recessed channel을 형성하였다. 상부 ONO게이트 절연막은 rf sputter를 이용하여 각각 5/10/5 nm 증착하였다. $950^{\circ}C$ N2/O2 분위기에서 30초간 급속열처리를 진행하여 source/drain을 활성화 하였다. 계면상태 개선을 위해 $450^{\circ}C$ 2% H2/N2 분위기에서 30분간 열처리를 진행하였다. 제작된 Poly Si MFM에서 2.3V, 350mV/dec의 문턱전압과 subthreshold swing을 확인할 수 있었다. Nonvolatile memory mode는 FN tunneling, high-speed 1T-DRAM mode에서는 impact ionization을 이용하여 쓰기/소거 작업을 실시하였다. NVM 모드의 경우 약 2V의 memory window를 확보할 수 있었으며 $85^{\circ}C$에서의 retention 측정시에도 10년 후 약 0.9V의 memory window를 확보할 수 있었다. 1T-DRAM 모드의 경우에는 약 $30{\mu}s$의 retention과 $5{\mu}A$의 sensing margin을 확보할 수 있었다. 차후 engineered tunnel barrier기술이나 엑시머레이저를 이용한 결정화 방법을 적용한다면 device의 특성향상을 기대할 수 있을 것이다. 본 논문에서는 다결정실리콘을 이용한 다기능메모리를 제작 및 메모리 특성을 평가하였다. 제작된 소자의 단일 셀 내에서 NVM동작과 1T-DRAM동작이 모두 가능한 것을 확인할 수 있었다. 다결정실리콘의 특성상 단결정 SOI기반의 다기능 메모리에 비해 낮은 특성을 보여주었으나 이는 결정화방법, high-k절연막 적용 및 engineered tunnel barrier를 적용함으로써 해결 가능하다고 생각된다. 또한 sputter를 이용하여 저온증착된 O/N/O layer에서의 P/E특성을 확인함으로써 glass위에서의 MFM구현의 가능성도 확인할 수 있었으며, 차후 system on panel (SOP)적용도 가능할 것이라고 생각된다.

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Resudual Stress Behavior and Characterization of Poly(urethane-imide) Crosslinked Networks (가교형 폴리우레탄이미드의 합성을 통한 잔류 응력 거동 측정 및 특성 분석)

  • Park, Mi-Hee;Yang, Seung-Jin;Jang, Wonbong;Han, Haksoo
    • Korean Chemical Engineering Research
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    • v.43 no.2
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    • pp.305-312
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    • 2005
  • Poly(urethane-imide)s were prepared by reaction between crosslinkable endgroup containing soluble polyimide (PI) by chemical imidization and acrylate end-capped polyurethane (PU). Poly (amic acid) was prepared from 2,2'-bis(3,4-dicarboxyphenyl) hexafluoropropane dianhydride (6FDA) and 4,4'-oxydianiline (ODA) and then end-capped with maleic anhydride (MA). The PU prepolymers were prepared by the reaction of polycaprolactone diol, tolylene 2,4-diisocyanate and end-capped with hydroxyl ethyl acrylate. The effect of PU content on the residual stress behavior, morphology and thermal property was studied. The poly(urethane-imide)s were characterized by thin film stress analyzer (TFSA), XRD, TGA and DMTA. Low residual stress and slope in cooling curve were achieved by higher PU content. Compared to typical polyurethane, these polymers exhibited better thermal stability due to the presence of the imide groups. Finally the residual stress of poly(urethane-imide)s was strongly affected by the morphological structure.