• 제목/요약/키워드: 재료상수

검색결과 728건 처리시간 0.033초

체적의 변화를 통한 방광벽 두께와 기계적 재료상수 변화가 배뇨근 활동에 미치는 영향 (Effect of Bladder Wall Thickness Through Change of Bladder Volume and Material Properties on Detrusor activity Study)

  • 전수민;이문규;최범규
    • 한국정밀공학회지
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    • 제29권5호
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    • pp.584-590
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    • 2012
  • The structural and functional disorder of a detrusor induces a bladder hypertrophy and degenerates a bladder muscle gradually by preventing normal urination. Thus, the thickness of the bladder wall has been increased in proportion to the degree of bladder outlet obstruction. In this study, the mechanical characteristics of the detrusor is analyzed for the physical properties and the thickness changes of the bladder muscle using a mathematically analytic method. In order to obtain the mechanical property of the bladder muscle, the tensile test of porcine bladder tissue is performed because its property is similar to that of human. The result of tensile test is applied to the mathematically model as Mooney Rivlin coefficients which represent the hyperelastic material. The model of the bladder is defined as the spherical shape with the initial volume of 50ml. The principal stress and strain according to the thickness are analyzed. Also, computer simulations for three types of the material property for the model of the bladder are performed based on the fact that the stiffness of the bladder is weakened as the progress of the benign prostatic hyperplasia. As a result, the principal stress is 341kPa at the initial thickness of 2.2mm, and is 249kPa at 6.5mm. As the bladder wall thickness increases, the principal stress decreases. The principal stress and strain decrease as the stiffness of the bladder decreases under the same thinkness.

Ge를 첨가한 Nb$_3$Sn 초전도 선에서의 교류손실 및 미세조직 변화 (Influence of Ge addition on AC loss and micro-structure in $Nb_{3}Sn$ wires)

  • 하도우;이남진;오상수;하홍수;송규정;권영길;류강식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.104-107
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    • 2001
  • In order to investigate the effect of Ge addition to the Cu matrix on the microstructure and the critical current density, four kinds of internal tin processed Nb$_3$Sn strands with pure Cu and Cu 0.2, 0.4, 0.6 wt % Ge alloys were drawn to 0.8 mm diameter. The microstructure and critical current of internal tin processed Nb$_3$Sn wires that were heat treated at temperatures ranging from 68$0^{\circ}C$ to 74$0^{\circ}C$ for 240h were investigated. The Ge addition to the matrix did not make workability worse. A Ge rich layer in the Cu-Ge matrix suppressed the growth of the Nb$_3$Sn layer and promoted grain coarsening. The greater the Ge content in the matrix, the lower the net Jc result after Nb$_3$sn reaction heat treatment. There was no significant variation in Jc observed with heat treatment temperature ranging from 68$0^{\circ}C$ to 74$0^{\circ}C$. The values of AC loss of Ge added wires were decreased to 40 % compare with no addition wire. Low AC loss was due to segregation of Ge rich layer in the Cu-Ge matrix. If Ge added wire with thin Nb filaments were fabricated, slow diffusion rate of Sn would be overcome and decreased AC loss that is weak Point of internal tin method.

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Eu이 도핑된 LiGdF4의 Down-conversion을 이용한 염료감응형 태양전지의 효율 향상 (Improving Efficiencies of DSC by Down-conversion of LiGdF4:Eu)

  • 김현주;송재성;김상수
    • 한국전기전자재료학회논문지
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    • 제17권3호
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    • pp.323-328
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    • 2004
  • Down-conversion of Eu$^{3+}$ doped LiGdF$_4$ (LGF) for increasing the cell efficiency on dye-sensitized Ti $O_2$ solar cells has been studied. The dye sensitized solar cell (DSC) consisting of mesoporous Ti $O_2$ electrode deposited on transparent substrate, an electrolyte containing I$^{[-10]}$ /I$_3$$^{[-10]}$ redox couple, and Pt counter electrode is a promising alternative to the inorganic solar cell. The structure of DSC is basically a sandwich type, viz., FTO glass/Ru-red dye-absorbed Ti $O_2$/iodine electrolyte/sputtered Pt/FTO glass. The cell without down converter had open circuit potential of approximately 0.66 Volt, the short circuit photocurrent density of 1.632 mA/$\textrm{cm}^2$, and fill factor of about 50 % at the excitation wavelength of 550 nm. In addition, 5.6 mW/$\textrm{cm}^2$ incident light intensity beam was used as a light source. From this result, the calculated monochromatic efficiency at the wavelength of 550 nm of this cell was about 9.62 %. The incident photon to current conversion efficiency (IPCE) of N3 used as a dye in this work is about 80 % at around 590 nm and 610 nm, which is the emission spectrum of Eu$^{3+}$ doped LGF, results in efficiency increasing of DSC.C.

구리배선용 베리어메탈로 쓰이는 Ta-N/Ta/Si(001)박막에 관한 X-선 산란연구 (X-ray Scattering Study of Reactive Sputtered Ta-N/Ta/Si(001)Film as a Barrier Metal for Cu Interconnection)

  • 김상수;강현철;노도영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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    • pp.79-83
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    • 2001
  • In order to compare the barrier properties of Ta-N/Si(001) with those of Ta-N/Ta/Si(001), we studied structural properties of films grown by RF magnetron sputtering with various $Ar/N_2$ ratios. To evaluate the barrier properties, the samples were annealed in a vacuum chamber. Ex-situ x-ray scattering measurements were done using an in-house x-ray system. With increasing nitrogen ratio in Ta-N/Si(001), the barrier property of Ta-N/Si(001) was enhanced, finally failed at $750^{\circ}C$ due to the crystallization and silicide formation. Compared with Ta-N/Si(001), Ta-N/Ta/Si(001) forms silicides at $650^{\circ}C$. However it does not crystallize even at $750^{\circ}C$. With increasing nitrogen composition in Ta-N/Ta/Si(001), the formation of tantalum silicide was reduced and the surface roughness was improved. To observe the surface morphology of Ta-N/Ta/Si(001) during annealing, we performed an in-situ x-ray scattering experiment using synchrotron radiation of the 5C2 at Pohang Light Source(PLS). Addition of Ta layer between Ta-N and Si(001) improved the surface morphology and reduced the surface degradation at high temperatures. In addition, increasing $N_2/Ar$ flow ratio reduced the formation of tantalum silicide and enhanced the barrier properties.

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IBAD-MgO 템플릿을 이용한 SmBCO 박막선재의 제조 (Fabrication of SmBCO Coated Conductors using IBAD-MgO Template)

  • 하홍수;김호섭;양주생;정예현;김호겸;유권국;고락길;송규정;하동우;오상수;염도준;박찬;유상임;문승현;주진호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.30-31
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    • 2006
  • We have fabricated SmBCO coated conductor on IBAD-MgO substrates using unique co-evaporation method. The batch type co-deposition system was specially designed and named as EDDC(evaporation using drum m dual chamber) that is possible to deposit superconducting layer with different composition ratio at low temperature of $700^{\circ}C$. In this study, we have investigated the influence of SmBCO phase composition and texture of IBAD-MgO template on the critical current density. We have changed the deposition rates of Sm, Ba and Cu during co-evaporation to examine the optimal composition ratio shown better critical current density. The composition ratio and surface morphology of SmBCO coated conductors were analyzed by the EDX and SEM, respectively. A higher critical current density was measured at superconducting phase composition ratio of Ba deficiency, Sm or Cu rich compared to the Sm1Ba2Cu3Ox stoichiometry.

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사파이어를 기판으로 이용하여 HVPE법으로 제작한 Freestanding GaN의 특성 (Properties of Freestanding GaN Prepared by HVPE Using a Sapphire as Substrate)

  • 이영주;김선태
    • 한국재료학회지
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    • 제8권7호
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    • pp.591-595
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    • 1998
  • 이 연구에서는 HVPE법으로 두께가 350$\mu\textrm{m}$, 면적이 100$\textrm{mm}^2$인 크랙이 없는 freestanding GaN 단결정 기판을 제작하고, 그 특성을 조사하였다. 제작된 GaN 기판의 격자상수는 $c_{o}$ =5.18486$\AA$이었고, 이중 X-선 회절피크의 반치폭은 650 arcsec 이었다. 10K의 온도에서 측정한 PL 스펙트럼은 에너지 밴드 갭 부근에서 중성 도너와 중성 억셉터에 구속된 여기자 및 자유여기자의 소멸에 의한 발광과 결정 결함고 관계하는 깊은 준위에 의한 1.8eV 부근 발광으로 구성되었다. 또한 라만 E2(high)모드 주파수는 567cm-1로서 벌크 GaN 단결정의 값과 같았다. 한편, GaN 기판의 전기저항도형은 n형이었고, 전기 비저항은 0.02$\Omega$.cm이었으며, 캐리어 이동도와 농도는 각각 283$\textrm{cm}^2$/V.s와 1.1$\times$$10^{18}$$cm^{-3}$이었다.

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고주파 유전체 $(Pb_{0.62}Ca_{0.38})ZrO_{3}$의 Mn 첨가에 따른 유전특성 변화 (Effect of Mn doping on the dielectric properties of $(Pb_{0.62}Ca_{0.38})ZrO_{3}$ at microwave frequency)

  • 권부연;김우경;여철현;최승철
    • 한국재료학회지
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    • 제5권1호
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    • pp.36-41
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    • 1995
  • $(Pb_{0.62}Ca_{0.38})ZrO_{3}$계에서의 조성 x=0.38의 $(Pb_{0.62}Ca_{0.38})ZrO_{3}$에 Mn 성분을 첨가하여 $1300^{\circ}C$에서 2시간 소결한 세라믹스의 소결성 및 고주파 유전특성을 연구하였다. Mn의 첨가로 소결온도가 낮아지며 치밀한 소결체를 얻을 수 있었다. 하소온도가 높아짐에 따라 하소과정에서 합성반응이 충분히 이루어져 소결체의 최종 소결과정에 영향을 미처 유전체의 유전상수와 품질계수 Q값이 증가하였다. Mn의 첨가량에 따른 물성변화는 Mn의 첨가량이 0.15wt%까지의 첨가범위에서는 $Mn^{4+}$$Mn^{3+}$ 또는 $Mn^{2+}$로 환원됨에 따라 산소공공이 생성되며, 억셉터로 작용하여 품질계수 Q값이 1300정도까지 증가하였고, 유전율은 90-100 정도로 변화가 없었다. 그러나 Mn 첨가량이 0.5 wt%이상일때 유전손실이 매우 증가되며 동시에 품질계수 Q값이 점차 감소하였다.

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졸-겔 법으로 성장시킨 Nb가 첨가된 Bi4Ti3O12 박막의 미세구조와 전기적 성질 (Microstructures and Electrical Properties of Niobium-doped Bi4Ti3O12 Thin Films Fabricated by a Sol-gel Route)

  • 김상수;장기완;한창희;이호섭;김원정;최은경;박문흠
    • 한국재료학회지
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    • 제13권5호
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    • pp.317-322
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    • 2003
  • Bismuth layered structure ferroelectric thin films, $Bi_4$$Ti_3$$O_{12}$ / (BTO) and Nb-doped BTO (BTN) were prepared on the Pt(111)/Ti/$SiO_2$/Si(100) substrates by a sol-gel route. We investigated the Nb-doping effect on the grain orientation and ferroelectric properties. $Nb^{5+}$ ion substitution for $Ti^{4+}$ ion in perovskite layers of BTO decreased the degree of c-axis orientation and increased the remanent polarization (2Pr). The fatigue resistance of Nb-doped BTO thin film was shown to be superior to that of BTO, and the leakage current of Nb-doped BTO thin film was decreased about 1 order of magnitude compared with BTO. The improvement of ferroelectric properties with $Nb^{5+}$ doping in BTO could be attributed to the changes in space charge densities and grain orientation in the thin film.

열처리 조건이 Bi1-xLaxTi3O12 (x=0.75) 박막의 특성에 미치는 효과 (Effects of Annealing Conditions on the Properties of Bi1-xLaxTi3O12 Thin Films)

  • 박문흠;김상수;강민주;하태곤
    • 한국재료학회지
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    • 제14권10호
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    • pp.701-706
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    • 2004
  • Bismuth layered structure ferroelectric thin films, La-substituted $Bi_{4}Ti_{3}O_{12}$ ($Bi_{1-x}La_{x}Ti_{3}O_{12}$, x=0.75, BLT) were prepared on the $Pt(111)/Ti/SiO_2/Si(100)$ substrates by a sol-gel spin coating process. The thin films were annealed in various conditions, i.e., oxygen, nitrogen and vacuum atmospheres for various annealing time. We investigated the annealing condition effects on the grain orientation and ferroelectric properties. The measured XRD patterns revealed that the BLT thin films showed only $Bi_{4}Ti_{3}O_{12}$-type phase with random orientation. $La^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of $Bi_{4}Ti_{3}O_{12}$ decreased the degree of c-axis orientation and increased the remanent polarization ($2P_{r}$). The remanent polarization ($2P_{r}$) and the coercive field ($2E_{c}$) of the BLT thin film annealed at $650^{\circ}C$ for 5 min in oxygen atmosphere were $87{\mu}C/cm^2$ and 182 kV/cm, respectively, at an applied electric field of 240 kV/cm. For all of the BLT thin films annealed in various conditions, the fatigue resistance was shown. The improvement of ferroelectric properties with La substitution in $Bi_{4}Ti_{3}O_{12}$ could be attributed to the changes in space charge densities and grain orientation in the thin film.

화학기상증착법에 의한$TiO_2$박막의 구조 및 전기적 특성에 관한 연구 (Characterization of Structure and Electrical Properties of $TiO_2$Thin Films Deposited by MOCVD)

  • 최상준;이용의;조해석;김형준
    • 한국재료학회지
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    • 제5권1호
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    • pp.3-11
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    • 1995
  • Titanium oxide$(TiO_{2})$ 박막을 금속 알콕사이드 물질인 $(Ti(OC_3H_7)_4$(titanium isopropoxide)를 이용하여 p-Si(100) 기판위에 상압 화학 기상 증착법으로 증착시켰다. $(TiO_{2})$ 박막의 증착기구는 단순경 계층 이론으로 잘 설명되었으며, 화학반응 지배 기구 영역에서 겉보기 활성화 에너지는 18.2kcal/mol이었다. 증착된 박막은 $250^{\circ}C$이상에서 anatase상의 결정질 박막이었으며, 고온에서 열처리를 했을 경우에 rutile상으로 전이하였다. 박막의 상전이에는 열처리 온도외에도 열처리 시간과 박막의 두께가 영향을 미쳤다. 정전용량-전압특성을 조사해 본 결과 전형적인 MOS 다이오드구조의 특성을 보였으며, 비유전율 상수는 약 80정도였다. 제조한 $(TiO_{2})$ 박막의 열처리 공정 후에는 정전용량이 감소하였으며, 첨가물을 사용한 박막은 열처리 전과 같았다. 이때 $V_{FB}$는 -0.5 ~ 1.5V였다. 전기전도 특성을 알아보기 위하여 전류-전압특성을 조사하였으며 증착된 박막의 전도기구는 hopping mechanism이었다. 전기적 특성을 개선하기 위해서 후열처리 방법과 박막 증착시 Nb, Sr을 첨가하였으며, 모두 누설전류의 감소와 정전파괴전압의 증가를 가져왔다.

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