Etching characteristics of platinum film using $SF_6/Ar$ plasma for high-k capacitor electrode applications
($SF_6/Ar$ 플라즈마를 사용한 캐패시터 전극용 백금 박막의 식각 특성)
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- Proceedings of the Materials Research Society of Korea Conference
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- 2001.11a
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- pp.60-60
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- 2001