• Title/Summary/Keyword: 유도결합형

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전면발광 유기광소자용 박막 봉지를 위한 유도결합형 화학 기상 증착 장치 (Inductively Coupled Plasma Chemical Vapor Deposition System for Thin Film Ppassivation of Top Emitting Organic Light Emitting Diodes)

  • 김한기
    • 한국전기전자재료학회논문지
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    • 제19권6호
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    • pp.538-546
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    • 2006
  • We report on characteristics of specially designed inductively-coupled-plasma chemical vapor deposition (ICP-CVD) system for top-emitting organic light emitting diodes (TOLEDs). Using high-density plasma on the order of $10^{11}$ electrons/$cm^3$ generated by linear-type antennas connected in parallel and specially designed substrate cooling system, a 100 nm-thick transparent $SiN_{x}$ passivation layer was deposited on thin Mg-Ag cathode layer at substrate temperature below $50\;^{\circ}C$ without a noticeable plasma damage. In addition, substrate-mask chucking system equipped with a mechanical mask aligner enabled us to pattern the $SiN_x$ passivation layer without conventional lithography processes. Even at low substrate temperature, a $SiN_x$ passivation layer prepared by ICP-CVD shows a good moisture resistance and transparency of $5{\times}10^{-3}g/m^2/day$ and 92 %, respectively. This indicates that the ICP-CVD system is a promising methode to substitute conventional plasma enhanced CVD (PECVD) in thin film passivation process.

Langmuir Probe를 이용한 유도결합형 플라즈마의 측정 (Measurement of Inductively Coupled Plasma Using Langmuir Probe)

  • 이영환;조주웅;김광수;최용성;박대희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 하계학술대회 논문집 C
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    • pp.1719-1721
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    • 2003
  • In this paper, electrical characteristics of inductively coupled plasma in an electrodeless fluorescent lamp were investigated using a Langmuir probe with a variation of Ar gas pressure. The RF output was applied in the range of 5-50W at 13.56MHz. The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of -100V ${\sim}$ +100V. When the pressure of Ar gas was increased, electric current was decreased. There was a significant electric current increase when the applied RF power was increased from 10 W to 30 W. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

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유도결합형 Ar, Ne 가스에서의 플라즈마 발광 특성 (Luminescence Properties of Argon and Neon Gas Using an Inductively Coupled Plasma)

  • 허인성;이영환;이종찬;최용성;박대희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.220-223
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    • 2004
  • Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of luminance as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10[mTorr] to 300[mTorr] or 500[mTorr] and the RF power was varied from 10[W] to 200[W]. It was found that the luminance tends to be decreased when argon and neon pressure is increased, and the luminance is increased as RF power is increased. It was also found that the luminance per unit RF power is high when the argon and neon pressure is low and when the RF power is in the range of $30[W]{\sim}40[W]$ or 10[W].

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유도결합형 BCl3/Ar 플라즈마를 이용한 Al2O3 박막의 식각 특성 (A Study of Al2O3 Thin Films Etching Characteristics Using Inductively Coupled BCl3/Ar Plasma)

  • 김용근;권광호
    • 한국전기전자재료학회논문지
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    • 제24권6호
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    • pp.445-448
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    • 2011
  • In this study, the etching characteristics of $Al_2O_3$ thin films were investigated using an ICP (inductively coupled plasma) of $BCl_3$/Ar gas mixture. The etch rate of $Al_2O_3$ thin films as well as the $SiO_2/Al_2O_3$ etch selectivity were measured as functions of $BCl_3$/Ar mixing ratio (0~100% Ar) at a constant gas pressure (10 mTorr), total gas flow rate (40 sccm), input power (800 W) and bias power (100 W). The behavior of the $Al_2O_3$ etch rate was shown to be quite typical for ion-assisted etch processes with a dominant chemical etch pathway. To analyze the etching mechanism using DLP (double langmuir probe), OES (optical emission spectroscopy) and surface analysis using XPS (x-ray photoelectron spectroscopy) were carried out.

유도결합형 플라즈마 마그네트론 스피터로 제작된 CrN 코팅막의 전기화학적 물성 비교 연구 (A comparative study of electrochemical properties in CrN films prepared by inductively coupled plasma magnetron sputtering)

  • 장훈;전성용
    • 한국표면공학회지
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    • 제55권2호
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    • pp.70-76
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    • 2022
  • In this paper, we compared the properties of the chromium nitride (CrN) films prepared by inductively coupled plasma magnetron sputtering (ICPMS). As a comparison, CrN film prepared by a direct current magnetron sputtering (dcMS) is also studied. The crystal structure, surface and cross-sectional microstructure and composite properties of the as-deposited CrN films are compared by x-ray diffraction, field emission scanning electron microscopy, nanoindentation tester and corrosion resistance tester, respectively. It is found that the as-deposited CrN films by ICPMS grew preferentially on (200) plane when compared with that by dcMS on (111) plane. As a result, the films deposited by ICPMS have a very compact microstructure with high hardness: the nanoindentation hardness reached 19.8 GPa and 13.5 GPa by dcMS, respectively. Besides, the residual stress of CrN films prepared by ICPMS is also relatively large. After measuring the corrosion resistance, the corrosion current of films prepared by ICPMS was three order of magnitude smaller than that of CrN films deposited by dcMS.

옻 추출물의 세포독성 및 자궁 경부암 바이러스 암 유발인자 E6 와 E7의 작용에 미치는 효과 (The Effects of Rhus Extracts on The Cytotoxicity on Cancer Cells and E6 and E7 Oncogenes of Human Papillomavirus Type 16)

  • 조영식;정옥;조정원;이경애;심정현;김광수;이홍수;성기승;윤도영
    • 한국식품과학회지
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    • 제32권6호
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    • pp.1389-1395
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    • 2000
  • 자궁 경부암은 매년 약 50만명 정도씩 사망하는 여성의 치명적인 사망원인의 하나이다. 인두유종 바이러스(HPV) 16형 및 18형과 자궁 경부암과의 긴밀한 관련성은 잘 알려져 있다. 옻 추출물 Rhus가 HPV 16형의 E6, E7 발암 유전자를 억제하는지 여부를 측정하였다. 이 Rhus는 자궁 경부암 세포주(C-33A, SiHa, Caski)와 HaCaT keratinocytes의 분열은 농도 의존적으로 억제하였다. In vitro binding assay와 효소면역측정법에 의하면 Rhus가 암 억제인자인 p53과 결합하여 분해 시키는데 필수적인 E6와 E6AP와의 결합을 억제할 뿐더러 암 억제인자 Rb와 E7과의 결합을 억제하였다. RT-PCR에 의하면 Rhus에 의해 E6 mRNA의 level이 감소하였으나 E7 mRNA는 변하지 않았음을 보여주었다. 이들 결과에 의하면 Rhus가 HPV 16형의 E6와 E7의 발암성을 억제함을 보여 주므로 HPV에 의해 유도된 자궁 경부암의 치료에 유효할 것으로 사료되어 좀 더 자세한 in vitro실험 등이 요구된다.

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유도 결합형 플라즈마를 이용한 아르곤 가스의 휘도 특성 (Luminance Properties of Argon Gas Using Inductively Coupled Plasma)

  • 이영환;허인성;황명근;최용성;박대희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 C
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    • pp.1915-1917
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    • 2004
  • Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of luminance as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10 [mTorr] to 500 [mTorr] and the RF power was varied from 10 [W] to 200 [W]. It was found that the luminance tends to be decreased when argon pressure is increased, and the luminance is increased as RF power is increased. It was also found that the luminance per unit RF power is high when the argon pressure is low and when the RF power is in the range of 30 [W]${\sim}$40 [W].

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외부코일형 전자유도결합방전을 이용한 무전극 램프의 광출력 특성 (Light Output Characteristics of an Electrodeless Discharge Lamp Using H-Discharge of External Coil Configuration)

  • 김현관;곽재영;송상빈;여인선
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1401-1403
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    • 1995
  • This paper investigates the light output characteristics of an electrodeless H-discharge lamp. The existing cylindrical fluorescent lamps were wound around with an induction coil of varying size, and were driven by RF power. The light output and the luminous efficacy were measured according to variations of the induction coil gap and the lamp power, respectively. The experimental results show that the luminous efficacy of the lamp is as much as existing electrodeless lamps and the luminous efficacy of lamps are high between 10W and 20W. Theoretical analyses using computer simulation show that the circuit matching is easier in the external coil configuration than in the internal one, and that the current and the power distributions near the coil are shower in t.

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유도 결합형 열 플라즈마의 특성 연구 (A Study on the Characteristics of the Inductively Coupled thermal Plasma)

  • 신홍민;최경철;김원규;황기웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1991년도 추계학술대회 논문집 학회본부
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    • pp.419-422
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    • 1991
  • A mathematical model was developed to predict the temperature, the density, and the velocity distribution of an inductively coupled thermal plasma. It was for an atmospheric pressure argon thermal plasma generated by a 4 MHz radio frequency power. It has been shown that the hottest region can be moved toward centrial region by applying an external magnetic field. Based on the results of the simulation. an ICP(Inductively Coupled thermal Plasma) system was constructed and thermal plasma was generated.

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가변부하시스템에서의 적응제어에 관한 연구 (A study on the adaptive control used in a system with variable load)

  • 강대규;전내석;이성근;김윤식;안병원;박영산
    • 한국정보통신학회논문지
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    • 제5권6호
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    • pp.1122-1127
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    • 2001
  • 본 논문에서는 공기압축기 구동용 유도전동기를 대상으로 부하토크관측기와 신경망을 이용 한 피드포워드 보상기를 결합한 속도 적응제어시스템을 제안한다. 공기압축기를 구동하는 전동기는 피스톤 의 상하운동에 의해 급격한 가변형의 부하를 받게 되고, 이로 인해 운전특성에 문제가 발생된다. 신경망 추정기를 이용하여 속도 제어기의 이득을 실시간으로 동조함으로써 전동기의 속도제어 특성을 개선한다. 제안된 시스템에 대한 이론적 해석과 시뮬레이션을 통해 그 타당성을 검정한다.

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