• Journal of the Korean Society of Manufacturing Process Engineers
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• v.21 no.2
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• pp.23-30
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• 2022

After drilling, reaming is required to process a workpiece for obtaining an excellent surface quality. In general, a cermet is defined as a "composite of a ceramic hard phase and metal-bonded phase." Cermets have excellent abrasion resistance, thermal resistance, and performance in finishing operations that require surface roughness and processing precision. However, although cermets have significant advantages, research on them is insufficient. In this study, workpiece SM45C was machined using drills and cermet reamers. The cermet reamer was processed for drag finishing for 0, 4, and 6 min. The experimental results showed the effects of drag finishing on surface roughness and dimensional accuracy.

• Tribology and Lubricants
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• v.3 no.2
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• pp.50-55
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• 1987

윤활제가 없는 경우와 고체 윤활제를 사용하였을 경우 세라믹 SiC의 마찰 마모시험을 상온 및 고온에서 실시하였다. 이때 사용한 마모시험기는 Two-disk형이고, 마찰속도는 132mm/sec이며, 하중의 2.6N에서 10.4N의 범위이다. 실험결과에 의하면 고체윤활제(흑연. Mos$_2$)는 세라믹의 마찰마모를 300$\circ$C 이하에서 모두 효과적으로 감소시킬 수 있었다. 또 300$\circ$C 이하에서는 Mox$_2$가 더 효과적인 윤활제 역할을 하고 300$\circ$C 이상에서는 흑연이 더 효과적이었다. 그원인은 윤활제 피막형성 및 파괴가 윤활 효과에 지배적인 영향을 미치고 온도상승에 따라 각 윤활제의 특성이 달라지기 때문이었음이 SEM 이나 EDS에 의해 밝혀졌다. 따라서 고온에서 윤활효과를 증대시키기 위해서는 윤활피막의 접착을 강하게 해줄 수 있는 접착 첨가물이 필요하다. 고온에서 윤활이 안된 경우 마모는 결정경계를 통한 입자들의 파괴가 주로 원이되나 낮은 온도나 윤활상태에서는 결정경계에 무관한 연마 마모가 마모를 지배하고 있었다.

• Journal of the Microelectronics and Packaging Society
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• v.19 no.1
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• pp.61-66
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• 2012

Chemical Mechanical Planarization (CMP) is a polishing process used in the microelectronic fabrication industries to achieve a globally planar wafer surface for the manufacturing of integrated circuits. Pad conditioning plays an important role in the CMP process to maintain a material removal rate (MRR) and its uniformity. For metal CMP process, highly acidic slurry containing strong oxidizer is being used. It would affect the conditioner surface which normally made of metal such as Nickel and its alloy. If conditioner surface is corroded, diamonds on the conditioner surface would be fallen out from the surface. Because of this phenomenon, not only life time of conditioners is decreased, but also more scratches are generated. To protect the conditioners from corrosion, thin organic film deposition on the metal surface is suggested without requiring current conditioner manufacturing process. To prepare the anti-corrosion film on metal conditioner surface, vapor SAM (self-assembled monolayer) and FC (Fluorocarbon) -CVD (SRN-504, Sorona, Korea) films were prepared on both nickel and nickel alloy surfaces. Vapor SAM method was used for SAM deposition using both Dodecanethiol (DT) and Perfluoroctyltrichloro silane (FOTS). FC films were prepared in different thickness of 10 nm, 50 nm and 100 nm on conditioner surfaces. Electrochemical analysis such as potentiodynamic polarization and impedance, and contact angle measurements were carried out to evaluate the coating characteristics. Impedance data was analyzed by an electrical equivalent circuit model. The observed contact angle is higher than 90o after thin film deposition, which confirms that the coatings deposited on the surfaces are densely packed. The results of potentiodynamic polarization and the impedance show that modified surfaces have better performance than bare metal surfaces which could be applied to increase the life time and reliability of conditioner during W CMP.

• Journal of the korean academy of Pediatric Dentistry
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• v.27 no.1
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• pp.54-61
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• 2000

Amalgam, though a widely used dental material, does not bond to the tooth substrate Therefore, retentive preparation of the cavity is necessary. Such amalgam restorations, until corrosion products form and plug the margin, will show significant marginal leakage. Unless this is prevented early on, saliva and bacteria may enter the cavity causing postoperative hypersensitivity, dissolution and collapse of the restoration, discoloration of the margin and secondary caries, leading to shortened life-span of the restoration and pulpal pathosis. Recently, a method of restoration has been introduced whereby tooth material can be preserved, cavity margin can be sealed and preventive treatment of pit and fissure can be administered while retaining all the advantages of conventional amalgam restorations. Such sealed amalgams involve removing the carious lesion without extending the cavity for prevention and using pit and fissure sealants to seal cavity margins and pit and fissures to reduce microleakage. In this study, finishing of the amalgam and sealant application were performed after different intervals following of amalgam restoration to compare the microleakage of sealed and conventional amalgam restorations. Thirty bicuspids were prepared with Class V cavity preparations on the buccal and lingual surfaces. After amalgam placement, they were divided into the following groups and treated accordingly. Group 1 : Polishing after 24 hours Group 2 : Immediate sealant application without polishing Group 3 : No polishing, but sealant applied after thermocycling 500 times After treatment, the samples were thermocycled 500 times between $5^{\circ}C$ and $55^{\circ}C$ with a dwell time of 30 seconds. After thermocycling, the samples were dipped into 1% methylene blue kept in a $37^{\circ}C$ incubator at 100% humidity for 24 hours. The teeth were then embedded in resin and cut bucco-lingually along the tooth axis and observed with a stereomicroscope to determine the degree of microleakage, The following results were obtained : 1. Group 2 showed the least microleakeage, while group 1 showed the greatest. 2. Group 1 showed significantly greater microleakage compared to group 2 (p<0.05). However, no significant differences were found between group 1 and 3(p>0.05). No significant differences in microleakage were also found between cup 2 and 3(p<0.05).

• The Journal of Korean Academy of Prosthodontics
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• v.57 no.4
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• pp.350-355
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• 2019

For the success of complete denture, three essential requirements such as retention, stability and support are needed. Moreover, due to the absorption of residual ridge and scarring due to the surgery, when making a complete denture, which is difficult to form the mandibular lingual margins, various considerations such as the arrangement of the Non-anatomical dl non-anatomical teeth, the polished surface impression, the internally weighted metal framework and the use of the denture adhesive cream are necessary. In this case report, the patient has a severely resorbed edentulous ridge from severe periodontitis and has some soft tissue problems after the glossectomy due to tongue cancer. To obtain additional retention and stability, some trials such as polished surface impression taking, internally weighted metal insertion and minimal pressure impression were done for the better result. Moreover To make a metal framework that precisely shapes the desired three-dimensional shape and reduces the complicated process, minimal pressure impression method and direct metal laser sintering technique were used.

• Journal of Dental Rehabilitation and Applied Science
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• v.34 no.4
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• pp.324-330
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• 2018

In order to produce a stable denture for severe alveolar bone loss area, it is not only important that .0a suitable occlusion is established but also to consider compatibility with the surrounding muscle to form a suitable polished surfaces. Neutral zone is defined as a potential area where the neuromuscular system of the tongue, cheeks and lips is balanced can be determined through the neutral zone impression technique. And if artificial teeth are aligned within the neutral zone and the polished surface follows the anatomical form of the dynamic muscle, higher stability and retention of the denture may be obtained through coordination with the surrounding muscle tissue. This case is being reported since the concept of the neutral zone was applied to a patient with severely atrophic residual alveolar ridge and the result was clinically satisfactory in both function and aesthetics.

• Journal of the Korean Ceramic Society
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• v.42 no.1
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• pp.37-42
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• 2005

Lightweight aggregate was made using glass abrasive sludge and graphite in this study. This study tried to draw the correlation between lightweight aggregate's properties and internal pore. The precursor was made by added different graphite contents and was burned for 20 min. at $700^{circ}C$ and $800^{circ}C$. The volume change of aggregate was checked at before and after homing, and confirmed that the homing temperature effected more than expanding agent on volume change. The size and area of pore in aggregate increased according to the amount of expanding agent and homing temperature but it didn't bring about big effect above $1\%$ of expanding agent. The absorbtion ratio, thermal conductivity and porosity have a high correlation, so each coefficient of correlation showed above $0.8\pm$.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.72-72
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• 2003

전기 및 전자산업의 발달과 더불어 규석 관련 제품에 대하여 고기능성 초미립 분말이 요구되고 있으며, 한편으로는 취급과 활용성이 우수한 형상인 구형 분말을 요구하고 있다. 본 연구에서는 평균 입도 1.0$\mu\textrm{m}$이하의 규석 초미립 분말 제조기술 개발과 유기용매 및 계면활성제 등을 첨가하여 형상이 구형인 기능성 분말과 항균, 항곰팡이 효과가 우수한 교질 상태의 실리카를 제조하여 기능성 재료 및 코팅용 실란 등에 활용이 가능하도록 물리적 단순공정을 통하여 평균 입도 1.0$\mu\textrm{m}$이하의 초미립 규석분말을 제조함으로써 고무, 타이어, 토너, 도료, EMC(epoxy molding compound) 등의 충전제, 이형제, 연마재 등으로 활용이 가능하게 하였으며 제조된 규석 초미립 분말은 분산성이 양호하도록 spray dryer 방법으로 건조하여 각 제품에 알맞은 적용이 용이하도록 하였다.

• Journal of the Korean Ceramic Society
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• v.37 no.12
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• pp.1172-1177
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• 2000

최근 콘크리트 보호 재료는 코팅을 이용하는 과거의 방법에서 함침을 이용하는 기법으로 전환하였다. 이중 발수제는 콘크리트의 표면의 특성을 변화시키는 것으로 친수성의 콘크리트를 소수성 물질을 결합시켜 물에 의한 젖음을 방어하는 것으로 콘크리트에 사용하였을 경우 콘크리트의 고유한 표면 장력을 작게 변화시키고 장력이 큰 물질 중의 하나인 물의 흡수를 방어하게 한다. 본 실험은 발수제의 성능 평가를 위하여 다공질의 재료인 콘크리트의 접촉각을 측정하여 그 변화를 관찰하였으며, 발수제들의 우수한 기능 중의 하나인 통기성을 시편의 중량 감소로 측정하였다. 발수제로 n-octyl ethoxy silane을 사용한 콘크리트 시편의 흡수 능력은 사용하지 않은 것의 약 10% 정도로 측정되었으며 시편의 수분 중량 감소는 7일 동안 90~130%로 관찰되어 통기성이 유지되어 콘크리트의 강도 유지에 효과적임을 알 수 있었다. 또한 겉보기 접촉각은 처리하지 않은 시편에서 24~33$^{\circ}$로 측정되었으나 처리된 시편의 최초면에서 130~141$^{\circ}$이었으며 2mm의 연마면에서는 127~132$^{\circ}$로 측정되어 콘크리트 표면 장력 변화가 유지되고 있음을 알 수 있었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05c
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• pp.45-48
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• 2003

The polishing mechanism of W-CMP process has been reported as the repeated process of passive layer formation by oxidizer and abrasion action by slurry abrasives. Thus, it is important to understand the effect of oxidizer on tungsten passivation layer in order to obtain higher removal rate (RR) and very low non-uniformity (NU%) during W-CMP process. In this paper, we investigated the effects of oxidizer on W-CMP process with three different kinds of oxidizers, such as $H_2O_2$, $Fe(NO_3)_3$, and $KIO_3$. In order to compare the removal rate and non-uniformity of three oxidizers, we used alumina-based slurry of pH 4. According to the CMP tests, three oxidizers showed different removal mechanism on tungsten surface. Also, the microstructures of surface layer by AFM image were greatly influenced by the slurry chemical, composition of oxidizers. The difference in removal rate and roughness of tungsten surface are believed to caused by modification in the mechanical behavior of $Al_2O_3$ abrasive particles in CMP slurry. Our stabilized slurries can be used a guideline and promising method for improved W-CMP process.