• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.60-60
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• 2003

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.361-362
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• 2008

• Journal of the Microelectronics and Packaging Society
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• v.19 no.1
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• pp.61-66
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• 2012

Chemical Mechanical Planarization (CMP) is a polishing process used in the microelectronic fabrication industries to achieve a globally planar wafer surface for the manufacturing of integrated circuits. Pad conditioning plays an important role in the CMP process to maintain a material removal rate (MRR) and its uniformity. For metal CMP process, highly acidic slurry containing strong oxidizer is being used. It would affect the conditioner surface which normally made of metal such as Nickel and its alloy. If conditioner surface is corroded, diamonds on the conditioner surface would be fallen out from the surface. Because of this phenomenon, not only life time of conditioners is decreased, but also more scratches are generated. To protect the conditioners from corrosion, thin organic film deposition on the metal surface is suggested without requiring current conditioner manufacturing process. To prepare the anti-corrosion film on metal conditioner surface, vapor SAM (self-assembled monolayer) and FC (Fluorocarbon) -CVD (SRN-504, Sorona, Korea) films were prepared on both nickel and nickel alloy surfaces. Vapor SAM method was used for SAM deposition using both Dodecanethiol (DT) and Perfluoroctyltrichloro silane (FOTS). FC films were prepared in different thickness of 10 nm, 50 nm and 100 nm on conditioner surfaces. Electrochemical analysis such as potentiodynamic polarization and impedance, and contact angle measurements were carried out to evaluate the coating characteristics. Impedance data was analyzed by an electrical equivalent circuit model. The observed contact angle is higher than 90o after thin film deposition, which confirms that the coatings deposited on the surfaces are densely packed. The results of potentiodynamic polarization and the impedance show that modified surfaces have better performance than bare metal surfaces which could be applied to increase the life time and reliability of conditioner during W CMP.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.3 no.1
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• pp.38-44
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• 2004

An internal finishing process by the application of magnetic abrasive machining has been developed as a new technology to obtain a fine inner surface of non-ferromagnetic pipe. In this paper, an abrasive slurry circulation system was designed and manufactured. As a result, it was found that a fine inner surface of pipe was available by the use of these machining methods. The basic machining characteristics of pin-type magnetic tools were analyzed experimentally. In addition, the experimental results show that pin-type magnetic tools have more machining efficiency than Iron particles as magnetic tools.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.11 no.1
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• pp.7-12
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• 2012

Chemical mechanical polishing(CMP) technology is faced with the challenge of processing new electronic materials. This paper focuses on the balance between chemical and mechanical reactions in the CMP process that is required to cope with a variety of electronic materials. The material properties were classified into the following categories: easy to abrade(ETA), difficult to abrade(DTA), easy to react(ETR) and difficult to react(DTR). The chemical and mechanical balance for the representative ETA-ETR, DTA-ETR, ETA-DTR and DTA-DTR materials was considered for defect-free surfaces. This paper suggests the suitable polishing methods and examples for each electronic material.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.4 no.1
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• pp.7-12
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• 2005

An internal finishing process by the application of magnetic abrasive finishing has been developed as a new technology to obtain a fine inner surface of pipe. In this paper, another method of magnetic abrasive machining in which the N and S magnetic poles are vibrated and a workpiece is rotated only is tried in a non-ferromagnetic pipe(SUS304), and its finishing characteristics is experimently investigated by various effective factors such as vibrating frequency and amplitude. From the experimental results, it is found that the vibration effects of magnetic poles on the finishing characteristics are large in internal finishing.

• Journal of the KSME
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• v.30 no.4
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• pp.367-373
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• 1990

초정밀 절삭용 다이아몬드 공구의 날끝 형상에 관해서는 여러 가지 설계안이 개발되어 제각기 성공적으로 사용되고 있지만 제품 품질의 균일성, 즉 성능과 수명의 차이는 아직까지 미해결이다. 또한, 초정밀공구의 날끝 능선에 관해서 최근 측정 데이터가 발표되고 있으나, 양호한 날끝능선, 불량한 능선 및 소정의 다듬질이 이루어지지 못하고 수명에 달해버린 능선 등에 대한 제각기의 형상, 구조 등이 밝혀지지 않고 있으며, 공구의 제작법을 개발하는 것은 금후의 연구과제로 남 아있다. 그리고, 단결정 바이트의 연마에 대해서는 많은 기술적인 진전이 이루어져 왔으나, 수 명의 차이는 해결하지 못하고 있다. 이는 날끝능선의 연마방향과 더불어 다이아몬드의 이방성, 원석의 품질 등과 관련이 있다고 볼 수 있다. 공구의 마멸과정이 결정방위에 의존하는 것은 당연하겠지만, 공구의 연마가공에서는 이방성 그 자체가 공구마멸에 나타나는 문제 및 경사면과 여유면의 마멸과 달리 예리한 인선을 둔화시키는 날끝 능선의 마멸은 어떻게 진행되는가가 문 제이며, 공구의 결정방위와 성능, 수명과의 관련은 실험적으로 해명되어야 할 것이다. 또한 재 료인 다이아몬드 원석에 있어서도, 커다란 결함이 발견된 것은 제외되지만 극히 경미한 결함은 어디까지 허용될 것인지가 문제이다. 내부응력, 착색 등 결함의 인자는 다양하지만 제각기 공구 의 성능 및 수명과의 관련은 명확하게 밝혀져 있지 않다. 이러한 인자 중에서도 어느 것이 가장 크게 영향을 미치는지 확인된다면 커다란 진보가 이루어질 것으로 기대된다.

• Journal of IKEEE
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• v.23 no.4
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• pp.1175-1181
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• 2019

In this paper, we have studied the chemical mechanical polishing(CMP) characteristics of mixed abrasive silica slurry(MAS) retreated by adding of manganese oxide(MnO₂) abrasives within 1:10 diluted silica slurry. A slurry designed for optimal performance should produce high removal rates, acceptable polishing selectivity with respect to the underlying layer, low surface defects after polishing, and good slurry stability. The polishing performances of MnO₂ abrasive-added MAS are evaluated with respect to their particle size distribution, surface morphology, and CMP performances such as removal rate and non-uniformity. As an experimental result, we obtained the comparable slurry characteristics compared to original silica slurry in the view-point of high removal rate and low non-uniformity. Therefore, our proposed MnO₂-MAS can be useful to save on the high cost of slurry consumption since we used a 1:10 diluted silica slurry.

• 기계와재료
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• v.3 no.2 s.8
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• pp.55-66
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• 1991

• Transactions of the Korean Society of Mechanical Engineers A
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• v.25 no.1
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• pp.47-53
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• 2001

Results ar presented of a new process for internal precision finishing of slender fine ceramic pipes using a magnetic field generated by a permanent magnets. For finishing the interior surface of a long pipe, a new type of finishing equipment was developed which can be very easily used in an industrial surrounding. In general, the pipe is so slender that a conventional finishing tool is hardly inserted into the pipe deeply, being impossible to finish. Therefore, a new technology has been considered to finish inside of a slender ceramic pipe by a simple technique. In this experimental, Magnetic Abrasive Machining is applied for the inner surface of silicon nitride fine ceramic pipe using ferromagnetic particles mixed with chromium-oxide powder. It is shown the initial roughness of 2.6㎛ Ry(0.42㎛ Ra) in the inside surface can be precisely finished to the roughness of 0.1㎛ Ry(0.01㎛ Ra). This paper discusses the outline of the processing by the application of magnetic abrasive machining and a few finishing characteristics.