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Interaction Between TCP and MAC-layer to Improve TCP Flow Performance over WLANs (유무선랜 환경에서 TCP Flow의 성능향상을 위한 MAC 계층과 TCP 계층의 연동기법)

  • Kim, Jae-Hoon;Chung, Kwang-Sue
    • Journal of KIISE:Information Networking
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    • v.35 no.2
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    • pp.99-111
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    • 2008
  • In recent years, the needs for WLANs(Wireless Local Area Networks) technology which can access to Internet anywhere have been dramatically increased particularly in SOHO(Small Office Home Office) and Hot Spot. However, unlike wired networks, there are some unique characteristics of wireless networks. These characteristics include the burst packet losses due to unreliable wireless channel. Note that burst packet losses, which occur when the distance between the wireless station and the AP(Access Point) increase or when obstacles move temporarily between the station and AP, are very frequent in 802.11 networks. Conversely, due to burst packet losses, the performance of 802.11 networks are not always as sufficient as the current application require, particularly when they use TCP at the transport layer. The high packet loss rate over wireless links can trigger unnecessary execution of TCP congestion control algorithm, resulting in performance degradation. In order to overcome the limitations of WLANs environment, MAC-layer LDA(Loss Differentiation Algorithm)has been proposed. MAC-layer LDA prevents TCP's timeout by increasing CRD(Consecutive Retry Duration) higher than burst packet loss duration. However, in the wireless channel with high packet loss rate, MAC-layer LDA does not work well because of two reason: (a) If the CRD is lower than burst packet loss duration due to the limited increase of retry limit, end-to-end performance is degraded. (b) energy of mobile device and bandwidth utilization in the wireless link are wasted unnecessarily by Reducing the drainage speed of the network buffer due to the increase of CRD. In this paper, we propose a new retransmission module based on Cross-layer approach, called BLD(Burst Loss Detection) module, to solve the limitation of previous link layer retransmission schemes. BLD module's algorithm is retransmission mechanism at IEEE 802.11 networks and performs retransmission based on the interaction between retransmission mechanisms of the MAC layer and TCP. From the simulation by using ns-2(Network Simulator), we could see more improved TCP throughput and energy efficiency with the proposed scheme than previous mechanisms.

Analysis of Heating Characteristics of Multi-Layered Insulation Curtain with Silica Aerogel in Greenhouses (실리카 에어로겔을 이용한 다겹보온커튼의 온실 난방 특성 분석)

  • Jin, Byung-Ok;Kim, Hyung-Kweon;Ryou, Young-Sun;Lee, Tae-Seok;Kim, Young-Hwa;Oh, Sung-Sik;Kang, Geum-Choon
    • Journal of Bio-Environment Control
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    • v.29 no.4
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    • pp.320-325
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    • 2020
  • This study aimed to analyze thermo-keeping and economic feasibility by utilizing silica aerogel, which has been attracting attention as a new material, complementing the disadvantages of the conventional multi-layered thermal screen, and producing and installing multi-layered thermal screen. The multi-layered thermal screen used in the experiment was produced in two combinations using a non-woven fabric containing silica aerogel and measured and compared the temperature and fuel consumption changes due to differences in practice with the multi-layered thermal screen being sold and used on the market. Experimental results show that the temperature and relative humidity changes due to the differences of the multi-layered thermal screens in the single-span greenhouse and the multi-span greenhouse were small but remained almost the same temperature and relative humidity. It is judged that this shows that the multi-layered thermal screen using silica aerogel is not inferior to the conventional multi-layered thermal screen. As a result of a comparative analysis of heating energy, the aerogel-based multi-layered thermal screen reduced fuel consumption by about 15% in the single-span greenhouse and about 20% in the multi-span greenhouse compared to the conventional multi-layered thermal screen. It is clear that heating energy is saved as a greenhouse size and duration increase. It was found that the silica aerogel-based multi-layered screen was more breathable and warmer than the conventional multi-layered thermal screen, but It was found that the multi-layered screen used in the multi-span greenhouse was heavier and stiff compared with the conventional multi-layered thermal screen, indicating less workability and operability. Therefore, improvements were applied to the multi-layered screens used in the single-span greenhouses. It was confirmed that the replacement of internal insulation materials reduced thickness and improved stiffness so that there could be sufficient possibility for farmers to use.

Effects of Light Intensity, Light Quality and Photoperiod for Growth of Perilla in a Closed-type Plant Factory System (완전제어형 식물공장에서 광량과 광질, 광주기가 들깨의 생장에 미치는 영향)

  • Sul, Seonggwan;Baek, Youngtaek;Cho, Young-Yeol
    • Journal of Bio-Environment Control
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    • v.31 no.3
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    • pp.180-187
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    • 2022
  • In order to select suitable light in a plant factory, electric energy use efficiency and light use efficiency should be considered simultaneously to consider operating costs as well as quantitative and functional aspects. The growth characteristics, electric energy use efficiency, light use efficiency by light intensity, LED ratio, and photoperiod conditions were compared together. Light intensity is 60, 130, 230, and 320 µmol·m-2·s-1 treatments, and light quality is the mixing ratio of red light and blue light 8:2, 6:4, 4:6, and 2:8 treatments. Photoperiod is 9, 12, 15, and 18 hours treatments based on the daytime. In the light intensity experiment, the growth rate increased as the light intensity increased, but there was no significant difference in the light use efficiency. When comparing the leaf fresh weight per power consumption, only the 320 µmol·m-2·s-1 treatment group showed significantly low efficiency, and there was no significant difference in the other treatments, so 230 µmol·m-2·s-1, which produced the most, was the most efficient. In the light quality experiment, the ratio of red light and blue light was measured to be high at the same time as the growth rate and light use efficiency in RB 8:2, and there was no significant difference in color difference and flavonoids content, so a Red:Blue ratio of 8:2 was the most suitable condition. In the photoperiod experiment, the longer the photoperiod, the higher the growth rate. However, there was no significant difference in the growth rate over 12 hours of daytime, so 12 hours considering the light consumption efficiency was a suitable condition. Based on the above results, LED light environmental conditions for perilla growth in plant factories were light intensity, light quality, and day length of 230 µmol·m-2·s-1 or more, 8:2, and 12 hours or more, respectively.

Analysis of the Effect of the Etching Process and Ion Injection Process in the Unit Process for the Development of High Voltage Power Semiconductor Devices (고전압 전력반도체 소자 개발을 위한 단위공정에서 식각공정과 이온주입공정의 영향 분석)

  • Gyu Cheol Choi;KyungBeom Kim;Bonghwan Kim;Jong Min Kim;SangMok Chang
    • Clean Technology
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    • v.29 no.4
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    • pp.255-261
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    • 2023
  • Power semiconductors are semiconductors used for power conversion, transformation, distribution, and control. Recently, the global demand for high-voltage power semiconductors is increasing across various industrial fields, and optimization research on high-voltage IGBT components is urgently needed in these industries. For high-voltage IGBT development, setting the resistance value of the wafer and optimizing key unit processes are major variables in the electrical characteristics of the finished chip. Furthermore, the securing process and optimization of the technology to support high breakdown voltage is also important. Etching is a process of transferring the pattern of the mask circuit in the photolithography process to the wafer and removing unnecessary parts at the bottom of the photoresist film. Ion implantation is a process of injecting impurities along with thermal diffusion technology into the wafer substrate during the semiconductor manufacturing process. This process helps achieve a certain conductivity. In this study, dry etching and wet etching were controlled during field ring etching, which is an important process for forming a ring structure that supports the 3.3 kV breakdown voltage of IGBT, in order to analyze four conditions and form a stable body junction depth to secure the breakdown voltage. The field ring ion implantation process was optimized based on the TEG design by dividing it into four conditions. The wet etching 1-step method was advantageous in terms of process and work efficiency, and the ring pattern ion implantation conditions showed a doping concentration of 9.0E13 and an energy of 120 keV. The p-ion implantation conditions were optimized at a doping concentration of 6.5E13 and an energy of 80 keV, and the p+ ion implantation conditions were optimized at a doping concentration of 3.0E15 and an energy of 160 keV.

Prediction of Transpiration Rate of Lettuces (Lactuca sativa L.) in Plant Factory by Penman-Monteith Model (Penman-Monteith 모델에 의한 식물공장 내 상추(Lactuca sativa L.)의 증산량 예측)

  • Lee, June Woo;Eom, Jung Nam;Kang, Woo Hyun;Shin, Jong Hwa;Son, Jung Eek
    • Journal of Bio-Environment Control
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    • v.22 no.2
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    • pp.182-187
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    • 2013
  • In closed plant production system like plant factory, changes in environmental factors should be identified for conducting efficient environmental control as well as predicting energy consumption. Since high relative humidity (RH) is essential for crop production in the plant factory, transpiration is closely related with RH and should be quantified. In this study, four varieties of lettuces (Lactuca sativa L.) were grown in a plant factory, and the leaf areas and transpiration rates of the plants according to DAT (day after transplanting) were measured. The coefficients of the simplified Penman-Monteith equation were calibrated in order to calculate the transpiration rate in the plant factory and the total amount of transpiration during cultivation period was predicted by simulation. The following model was used: $E_d=a*(1-e^{-k*LAI})*RAD_{in}+b*LAI*VPD_d$ (at daytime) and $E_n=b*LAI*VPD_n$ (at nighttime) for estimating transpiration of the lettuce in the plant factory. Leaf area and transpiration rate increased with DAT as exponential growth. Proportional relationship was obtained between leaf area and transpiration rate. Total amounts of transpiration of lettuces grown in plant factory could be obtained by the models with high $r^2$ values. The results indicated the simplified Penman-Monteith equation could be used to predict water requirements as well as heating and cooling loads required in plant factory system.

Actual State of Structures and Environmental Control Facilities for Tomato Greenhouses in Chungnam Region (충남지역 토마토 재배온실의 구조와 환경조절설비 실태분석)

  • Nam, Sang-Woon;Kim, Young-Shik
    • Korean Journal of Agricultural Science
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    • v.36 no.1
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    • pp.73-85
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    • 2009
  • An investigation was conducted to get the basic data for establishing structural safety and environmental management of tomato greenhouses in Chungnam region. The contents of the investigation consisted of actual state of greenhouse structures and environmental control facilities. Most of greenhouses were arch type single-span plastic houses and they had too low height for growing tomatoes. Frameworks of multi-span greenhouses were suitable, but those of single-span were mostly insufficient. Every greenhouse had thermal curtain movable or covering fixed inside the greenhouse for energy saving, and heating facilities were mostly warm air heater. Irrigation facilities were mostly drip tube and controlled by manual operation or timer. Almost all of the greenhouses didn't install high level of environmental control facilities such as ventilator, air circulation fan, $CO_2$ fertilizer, insect screen, supplemental light, and cooling device.

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Properties of the interfacial oxide and high-k dielectrics in $HfO_2/Si$ system ($HfO_2/Si$시스템의 계면산화막 및 고유전박막의 특성연구)

  • 남서은;남석우;유정호;고대홍
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2002.11a
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    • pp.45-47
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    • 2002
  • 반도체 소자의 고집적화 및 고속화가 요구됨에 따라 MOSFET 구조의 게이트 절연막으로 사용되고 있는 SiO₂ 박막의 두께를 감소시키려는 노력이 이루어지고 있다. 0.1㎛ 이하의 소자를 위해서는 15Å 이하의 두께를 갖는 SiO₂가 요구된다. 하지만 두께감소는 절연체의 두께와 지수적인 관계가 있는 누설전류를 증가시킨다[1-3]. 따라서 같은 게이트 개패시턴스를 유지하면서 누설전류를 감소시키기 위해서는 높은 유전상수를 갖는 두꺼운 박막이 요구되는 것이다. 그러므로 약 25정도의 높은 유전상수를 갖고 5.2~7.8 eV 정도의 비교적 높은 bandgap을 갖으며, 실리콘과 열역학적으로 안정한 물질로 알려진 HfO2[4-5]가 최근 큰 관심을 끌고 있다. 본 연구에서는 HfO₂ 박막을 실제 소자에 적용하기 위하여 전극 및 열처리에 따른 HfO₂ 박막의 미세구조 및 전기적 특성에 관한 연구를 수행하였다. 이를 위해, HfO₂ 박막을 reactive DC magnetron sputtering 방법으로 증착하고, XRD, TEM, XPS를 사용하여 ZrO₂ 박막의 미세구조를 관찰하였으며, MOS 캐패시터 구조의 C-V 및 I-V 특성을 측정하여 HfO₂ 박막의 전기적 특성을 관찰하였다. HfO₂ 타겟을 스퍼터링하면 Ar 스퍼터링에 의해 에너지를 가진 산소가 기판에 스퍼터링되어 Si 기판과 반응하기 때문에 HfO₂ 박막 형성과 더불어 Si 기판이 산화된다[6]. 그래서 HfO₂같은 금속 산화물 타겟 대신에 순수 금속인 Hf 타겟을 사용하고 반응성 기체로 O₂를 유입시켜 타겟이나 시편위에서 high-k 산화물을 만들면 SiO/sub X/ 계면층을 제어할 수 있다. 이때 저유전율을 갖는 계면층은 증착과 열처리 과정에서 형성되고 특히 500℃ 이상에서 high-k/Si를 열처리하면 계면 SiO₂층은 증가하는 데, 이것은 산소가 HfO₂의 high-k 박막층을 뚫고 확산하여 Si 기판을 급속히 산화시키기 때문이다. 본 방법은 증착에 앞서 Si 표면을 희석된 HF를 이용해 자연 산화막과 오염원을 제거한 후 Hf 금속층과 HfO₂ 박막을 직류 스퍼터링으로 증착하였다. 우선 Hf 긍속층이 Ar 가스 만의 분위기에서 증착되고 난 후 공기중에 노출되지 않고 연속으로 Ar/O₂ 가스 혼합 분위기에서 반응 스퍼터링 방법으로 HfO₂를 형성하였다. 일반적으로 Si 기판의 표면 위에 자연적으로 생기는 비정질 자연 산화막의 두께는 10~15Å이다. 그러나 Hf을 증착한 후 단면 TEM으로 HfO₂/Si 계면을 관찰하면 자연 산화막이 Hf 환원으로 제거되기 때문에 비정질 SiO₂ 층은 관찰되지 않았다. 본 실험에서는 HfO2의 두께를 고정하고 Hf층의 두께를 변수로 한 게이트 stack의 물리적 특성을 살펴보았다. 선증착되는 Hf 금속층을 0, 10, 25Å의 두께 (TEM 기준으로 한 실제 물리적 두께) 로 증착시키고 미세구조를 관찰하였다. Fig. 1(a)에서 볼 수 있듯이 Hf 금속층의 두께가 0Å일때 13Å의 HfO₂를 반응성 스퍼터링 방법으로 증착하면 HfO₂와 Si 기판 사이에는 25Å의 계면층이 생기며, 이것은 Ar/O₂의 혼합 분위기에서의 스퍼터링으로 인한 Si-rich 산화막 또는 SiO₂ 박막일 것이다. Hf 금속층의 두께를 증가시키면 계면층의 성장은 억제되는데 25Å의 Hf 금속을 증착시키면 HfO₂ 계면층은 10Å미만으로 관찰된다. 그러므로 Hf 금속층이 충분히 얇으면 플라즈마내 산소 라디칼, 이온, 그리고 분자가 HfO₂ 층을 뚫고 Si 기판으로 확산되어 SiO₂의 계면층을 성장시키고 Hf 금속층이 두꺼우면 SiO/sub X/ 계면층을 환원시키면서 Si 기판으로의 산소의 확산은 막기 때문에 계면층의 성장은 억제된다. 따라서 HfO₂/Hf(Variable)/Si 계에서 HfO₂ 박막이 Si 기판위에 직접 증착되면, 순수 HfO₂ 박막의 두께보다 높은 CET값을 보이고 Hf 금속층의 두께를 증가시키면 CET는 급격하게 감소한다. 그러므로 HfO₂/Hf 박막의 유효 유전율은 단순 반응성 스퍼터링에 의해 형성된 HfO₂ 박막의 유전율보다 크다. Fig. 2에서 볼 수 있듯이 Hf 금속층이 너무 얇으면 계면층의 두께가 두꺼워 지고 Hf 금속층이 두꺼우면 HfO₂층의 물리적 두께가 두꺼워지므로 CET나 EOT 곡선은 U자 형태를 그린다. Fig. 3에서 Hf 10초 (THf=25Å) 에서 정전 용량이 최대가 되고 CET가 20Å 이상일 때는 high-k 두께를 제어해야 하지만 20Å 미만의 두께를 유지하려면 계면층의 두께를 제어해야 한다.

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Development of A Material Flow Model for Predicting Nano-TiO2 Particles Removal Efficiency in a WWTP (하수처리장 내 나노 TiO2 입자 제거효율 예측을 위한 물질흐름모델 개발)

  • Ban, Min Jeong;Lee, Dong Hoon;Shin, Sangwook;Lee, Byung-Tae;Hwang, Yu Sik;Kim, Keugtae;Kang, Joo-Hyon
    • Journal of Wetlands Research
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    • v.24 no.4
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    • pp.345-353
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    • 2022
  • A wastewater treatment plant (WWTP) is a major gateway for the engineered nano-particles (ENPs) entering the water bodies. However existing studies have reported that many WWTPs exceed the No Observed Effective Concentration (NOEC) for ENPs in the effluent and thus they need to be designed or operated to more effectively control ENPs. Understanding and predicting ENPs behaviors in the unit and \the whole process of a WWTP should be the key first step to develop strategies for controlling ENPs using a WWTP. This study aims to provide a modeling tool for predicting behaviors and removal efficiencies of ENPs in a WWTP associated with process characteristics and major operating conditions. In the developed model, four unit processes for water treatment (primary clarifier, bioreactor, secondary clarifier, and tertiary treatment unit) were considered. Additionally the model simulates the sludge treatment system as a single process that integrates multiple unit processes including thickeners, digesters, and dewatering units. The simulated ENP was nano-sized TiO2, (nano-TiO2) assuming that its behavior in a WWTP is dominated by the attachment with suspendid solids (SS), while dissolution and transformation are insignificant. The attachment mechanism of nano-TiO2 to SS was incorporated into the model equations using the apparent solid-liquid partition coefficient (Kd) under the equilibrium assumption between solid and liquid phase, and a steady state condition of nano-TiO2 was assumed. Furthermore, an MS Excel-based user interface was developed to provide user-friendly environment for the nano-TiO2 removal efficiency calculations. Using the developed model, a preliminary simulation was conducted to examine how the solid retention time (SRT), a major operating variable affects the removal efficiency of nano-TiO2 particles in a WWTP.

Determination of Efficient Operating Condition of UV/H2O2 Process Using the OH Radical Scavenging Factor (수산화라디칼 소모인자를 이용한 자외선/과산화수소공정의 효율적인 운전 조건도출)

  • Kim, Seonbaek;Kwon, Minhwan;Yoon, Yeojoon;Jung, Youmi;Hwang, Tae-Mun;Kang, Joon-Wun
    • Journal of Korean Society of Environmental Engineers
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    • v.36 no.8
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    • pp.534-541
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    • 2014
  • This study investigated a method to determine an efficient operating condition for the $UV/H_2O_2$ process. The OH radical scavenging factor is the most important factor to predict the removal efficiency of the target compound and determine the operating condition of the $UV/H_2O_2$ process. To rapidly and simply measure the scavenging factor, Rhodamine B (RhB) was selected as a probe compound. Its reliability was verified by comparing it with a typical probe compound (para-chlorobenzoic acid, pCBA); the difference between RhB and pCBA was only 1.1%. In a prediction test for the removal of Ibuprofen, the RhB method also shows a high reliability with an error rate of about 5% between the experimental result and the model prediction using the measured scavenging factor. In the monitoring result, the scavenging factor in the influent water of the $UV/H_2O_2$ pilot plant was changed up to 200% for about 8 months, suggesting that the required UV dose could be increased about 1.7 times to achieve 90% caffeine removal. These results show the importance of the scavenging factor measurement in the $UV/H_2O_2$ process, and the operating condition could simply be determined from the scavenging factor, absorbance, and information pertaining to the target compound.

Evaluation of Seismic Performance of High Strength Reinforced Concrete Exterior Beam-Column Joints Using High Ductile Fiber-Reinforced Mortar (고인성섬유 복합모르타르를 활용한 고강도 철근콘크리트 외부 보-기둥 접합부의 내진성능평가)

  • Ha, Gee-Joo;Shin, Jong-Hak
    • Journal of the Korea Concrete Institute
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    • v.25 no.4
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    • pp.419-428
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    • 2013
  • In this study, experimental research was carried out to evaluate the constructability and seismic performance of high strength R/C exterior beam-column joints regions, with or without the shear reinforcement, using high ductile fiber-reinforced mortar. Five specimens of retrofitted the exterior beam-column joint regions using high ductile fiber-reinforced mortar are constructed and tested for their retrofit performances. Specimens designed by retrofitting the exterior beam-column joint regions (BCJNSP series) of existing reinforced concrete building showed a stable mode of failure and an increased its maximum load-carrying capacity by 1.09~2.03 times in comparison with specimen of BCJNS due to the effect of enhancing dispersion of crack control at the time of initial loading and bridging of fiber from retrofitting new high ductile materials during testing. Specimens of BCJNSP series attained its maximum load carrying capacity by 0.92~0.96 times and increased its energy dissipation capacity by 1.62 times when compared to standard specimen of BCJC with a displacement ductility of 4.