• Food Science and Industry
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• v.40 no.1
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• pp.27-35
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• 2007

측정불확도란 시험결과에 대하여 측정량을 합리적으로 추정한 값들의 분산 특성을 나타내는 파라미터(parameter)로써 ILAC(국제시험소인정협력체) 등의 국제기구와의 측정결과에 대한상호인정 및 신뢰성 확보에 필수적인 요소이다. 국제표준(ISO/IEC 17025)에 맞는 시험분석 결과의 도출을 위해서는 먼저 소급성을 유지하고 그에 따른 불확도를 산출하여야 한다. 소급성은 실험의 모든 과정에 불확도를 가지고 끊기지 않는 비교연결을 통한 국제(국가)표준과 연관시키는 시스템으로, sampling에서 측정결과의 도출까지 소급성을 유지하는 것만이 측정결과의 신뢰성(정확 및 정밀)을 유지하는 최상의 시스템이다. Guide to the Expression of Uncertainty in Measurements(GUM)에 의한 불확도 계산 절차는 측정량(measurand)의 함수 표현, 입력량의 표준불확도(standard uncertainty)의 계산(표준편차, 평균의 표준편차), 합성표준불확도(combined uncertainty)의 계산, 확장불확도(expanded uncertainty)의 계산을 통한 통계적 추정을 하는 것이다. 오렌지 쥬스 중 카드뮴을 분석함에 있어서, 실험실에 대해서는 국제표준화(ISO17025) 시스템을 도입하고 분석시약 및 기기에 대하여 소급성을 유지하여, 분석결과의 신뢰성을 확보하기 위한 측정불확도를 산출하였다.

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2009.06a
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• pp.391-392
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• 2009

• Journal of Korean Institute of Fire Science & Engineering
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• v.3 no.2
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• pp.43-47
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• 2007

• Journal of Sensor Science and Technology
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• v.4 no.1
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• pp.43-50
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• 1995

We measured the traceability error for nine high temperature calibration service centers including KRISS through the round-robin test. In this test the type S thermocouple, which used as a calibration standard thermometer commonly, was accommodated as a test thermocouple. Intercomparison data of three institutions were coincident with KRISS's data within ${\pm}0.5^{\circ}C$, which was the calibration uncertainty of the type S thermocouple, but the remaining six institution's data were deviated from the assigned uncertainty level. Deviation of the intercomparison data increased gradually according to the increase of the test temperature. and the maximum difference was so large as about $2.0^{\circ}C$ at the highest test temperature, gold point. In this study we found the traceability error of high temperature calibration service center for a high temperature standard was within $2.0^{\circ}C$.

• Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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• v.22 no.4
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• pp.367-374
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• 2004

In order for the measurement results of an electro-optical distance meter(EDM), which is widely used in surveying, to be reliable, an EDM should be calibrated. For the calibration of an EDM, we have settled a traceability chain, which connects the EDM under calibration to the definition of metre. The chain starts from the iodine stabilized He-Ne laser which realizes the definition of metre, and then connected to a stabilized laser interferometer, a standard EDM, and finally to the EDM under calibration through the baseline. We achieved the expanded calibration uncertainties of the scale and length measurement of an EDM being evaluated to be 6$\times$10$^{-6}$ and 0.2 mm, respectively. Two different calibration methods, and their results are compared.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.645-648
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• 2005

Microscopy has enabled the development of many advanced technologies, and higher level microscopic techniques are required according to the increase of research in nano-technology and bio-technology fields. Therefore, in many applications, we need to measure the dimension of micro-scale parts accurately, not just to observe their shapes. To establish the meter-traceability in microscopy, gratings have been widely used as a magnification standard. KRISS provides the certification service of magnification standards using an optical diffractometer and a metrological AFM (MAFM). They are based on different measurement principles, and so can give complementary information for each other. In this paper, we describe the configuration of each system and measurement procedures to certificate grating pitch values of magnification standards. Several measurement results are presented, and the discussion about them are also given. Using the optical diffractometer, we can calibrate a grating specimen with uncertainty of less than 50 pm. The MAFM can measure a grating specimen of down to 100 nm pitch value, and the calibrated values usually have uncertainty less than 500 pm.

• Journal of the Korean Society for Precision Engineering
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• v.17 no.6
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• pp.40-45
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• 2000

교정은 모든 측정분야에서 어렵고 까다로운 주제인데, 특히 정전센서, 레이저간섭계, AFM, STM 등을 포함하는 나노메트롤로지(nanometrology : 나노측정) 분야에서는 그러하다. 나노측정에서는 전체 측정범위가 센서들의 한계분해능 값과 비슷한데, 이러한 측정에서 높은 소급성을 유지하기는 매우 어렵기 때문이다.(중략)

• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1779-1781
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• 2003

For reliability of high voltage test results in test laboratory, traceability of measuring systems is to be needed. In this paper, it deals with traceability and uncertainty of AC voltage measuring system which is tested by comparison with reference divider.

• Korean Journal of Optics and Photonics
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• v.15 no.4
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• pp.321-324
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• 2004

We have composed an experimental system using the superposition method to measure the nonlinearity of photodetectors for optical fiber power measurements. Also we have measured the nonlinearity of a high power detector and of a low power detector. The two detectors have shown good linearity within 0.01% and 0.02%, respectively, in the 50 ㏈ dynamic range. These detectors are used as reference detectors in optical fiber characteristics measurements.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.9
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• pp.68-75
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• 2007

The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.